Patents by Inventor Jen-Hao Liu
Jen-Hao Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240126327Abstract: The present disclosure provides an electronic wearable device. The electronic wearable device includes a first module having a first contact and a second module having a second contact. The first contact is configured to keep electrical connection with the second contact in moving with respect to each other during a wearing period.Type: ApplicationFiled: October 14, 2022Publication date: April 18, 2024Applicant: Advanced Semiconductor Engineering, Inc.Inventors: Chao Wei LIU, Wei-Hao CHANG, Yung-I YEH, Jen-Chieh KAO, Tun-Ching PI, Ming-Hung CHEN, Hui-Ping JIAN, Shang-Lin WU
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Patent number: 11923392Abstract: The present disclosure relates to an integrated chip. The integrated chip includes an image sensing element disposed within a substrate. A gate structure is disposed along a front-side of the substrate. A back-side of the substrate includes one or more first angled surfaces defining a central diffuser disposed over the image sensing element. The back-side of the substrate further includes second angled surfaces defining a plurality of peripheral diffusers laterally surrounding the central diffuser. The plurality of peripheral diffusers are a smaller size than the central diffuser.Type: GrantFiled: January 4, 2021Date of Patent: March 5, 2024Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Keng-Yu Chou, Chun-Hao Chuang, Jen-Cheng Liu, Kazuaki Hashimoto, Ming-En Chen, Shyh-Fann Ting, Shuang-Ji Tsai, Wei-Chieh Chiang
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Publication number: 20230365402Abstract: A semiconductor device structure is provided. The semiconductor device structure includes a first substrate including a first face and a second face opposite the first face. A second substrate is bonded to the first face of the first substrate such that the second face of the first substrate faces away from the second substrate. One or more recesses are arranged in the second face of the first substrate and are configured to compensate for thermal expansion or thermal contraction.Type: ApplicationFiled: July 18, 2023Publication date: November 16, 2023Inventors: Chih-Hang Chang, I-Shi Wang, Jen-Hao Liu
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Patent number: 11772963Abstract: A semiconductor device structure is provided. The semiconductor device structure includes a first substrate including a first face and a second face opposite the first face. A second substrate is bonded to the first face of the first substrate such that the second face of the first substrate faces away from the second substrate. One or more recesses are arranged in the second face of the first substrate and are configured to compensate for thermal expansion or thermal contraction.Type: GrantFiled: November 11, 2021Date of Patent: October 3, 2023Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chih-Hang Chang, I-Shi Wang, Jen-Hao Liu
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Publication number: 20220063993Abstract: A semiconductor device structure is provided. The semiconductor device structure includes a first substrate including a first face and a second face opposite the first face. A second substrate is bonded to the first face of the first substrate such that the second face of the first substrate faces away from the second substrate. One or more recesses are arranged in the second face of the first substrate and are configured to compensate for thermal expansion or thermal contraction.Type: ApplicationFiled: November 11, 2021Publication date: March 3, 2022Inventors: Chih-Hang Chang, I-Shi Wang, Jen-Hao Liu
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Patent number: 11211354Abstract: In an embodiment, a system includes: a circular frame comprising a first side and a second side opposite the first side, wherein the circular frame comprises an aperture formed therethrough; an insert disposed within the aperture; a first wafer disposed over the insert; a second wafer disposed over the first wafer, wherein both the first wafer and the second wafer are configured for eutectic bonding when heated; two clamps disposed on the first side along the circular frame, wherein the two clamps are configured to contact the second wafer at respective clamp locations; and a plurality of pieces configured to secure the insert within the aperture, the plurality of pieces comprising both fixed and flexible pieces, the plurality of pieces comprising two fixed pieces disposed respectively adjacent to the clamp locations along the second side of the circular frame.Type: GrantFiled: November 28, 2018Date of Patent: December 28, 2021Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Chih-Hang Chang, Richard Huang, I-shi Wang, Yin-Tun Chou, Jen-Hao Liu
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Patent number: 11192775Abstract: A microelectromechanical systems (MEMS) package with roughness for high quality anti-stiction is provided. A device substrate is arranged over a support device. The device substrate comprises a movable element with a lower surface that is rough and that is arranged within a cavity. A dielectric layer is arranged between the support device and the device substrate. The dielectric layer laterally encloses the cavity. An anti-stiction layer lines the lower surface of the movable element. A method for manufacturing the MEMS package is also provided.Type: GrantFiled: April 17, 2019Date of Patent: December 7, 2021Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chih-Hang Chang, I-Shi Wang, Jen-Hao Liu
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Patent number: 11192778Abstract: A method includes: providing a first substrate on which a plurality of first semiconductor devices is formed; providing a second substrate on which a plurality of second semiconductor devices is formed; and coupling the first and second substrates by contacting respective dummy pads of the first and second substrates, wherein at least one of the dummy pads of the first and second substrates comprises plural peaks and valleys.Type: GrantFiled: July 13, 2020Date of Patent: December 7, 2021Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Yu-Jui Chen, I-Shi Wang, Ren-Dou Lee, Jen-Hao Liu
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Patent number: 11174156Abstract: A semiconductor device structure is provided. The semiconductor device structure includes a first wafer comprising a first face and a second face opposite the first face and having a plurality of predetermined die areas. A plurality of recesses are disposed in the first face of the first wafer. A first recess of the plurality of recesses extends in a direction substantially parallel to a first edge of at least one of the plurality of predetermined die areas and laterally surrounds the at least one of the plurality of predetermined die areas. A second wafer is bonded to the second face of the first wafer.Type: GrantFiled: March 25, 2020Date of Patent: November 16, 2021Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chih-Hang Chang, I-Shi Wang, Jen-Hao Liu
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Patent number: 11034578Abstract: A multi-layer sealing film for high seal yield is provided. In some embodiments, a substrate comprises a vent opening extending through the substrate, from an upper side of the substrate to a lower side of the substrate. The upper side of the substrate has a first pressure, and the lower side of the substrate has a second pressure different than the first pressure. The multi-layer sealing film covers and seals the vent opening to prevent the first pressure from equalizing with the second pressure through the vent opening. Further, the multi-layer sealing film comprises a pair of metal layers and a barrier layer sandwiched between metal layers. Also provided is a microelectromechanical systems (MEMS) package comprising the multilayer sealing film, and a method for manufacturing the multi-layer sealing film.Type: GrantFiled: May 13, 2020Date of Patent: June 15, 2021Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Chih-Chien Yang, Ming-Lun Shih, Ren-Dou Lee, Jen-Hao Liu
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Publication number: 20200339413Abstract: A method includes: providing a first substrate on which a plurality of first semiconductor devices is formed; providing a second substrate on which a plurality of second semiconductor devices is formed; and coupling the first and second substrates by contacting respective dummy pads of the first and second substrates, wherein at least one of the dummy pads of the first and second substrates comprises plural peaks and valleys.Type: ApplicationFiled: July 13, 2020Publication date: October 29, 2020Inventors: Yu-Jui CHEN, I-Shi WANG, Ren-Dou LEE, Jen-Hao LIU
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Patent number: 10759654Abstract: The present disclosure relates to a method for manufacturing a microelectromechanical systems (MEMS) package. The method comprises providing a CMOS IC including CMOS devices arranged within a CMOS substrate. The method further comprises forming and patterning a metal layer over the CMOS substrate to form an anti-stiction layer and a fixed electrode plate and forming a rough top surface for the anti-stiction layer. The method further comprises providing a MEMS IC comprising a moveable mass arranged within a recess of a MEMS substrate and bonding the CMOS IC to the MEMS IC to enclose a cavity between the moveable mass and the fixed electrode plate and the anti-stiction layer.Type: GrantFiled: December 21, 2018Date of Patent: September 1, 2020Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Yu-Jui Chen, I-Shi Wang, Ren-Dou Lee, Jen-Hao Liu
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Publication number: 20200270121Abstract: A multi-layer sealing film for high seal yield is provided. In some embodiments, a substrate comprises a vent opening extending through the substrate, from an upper side of the substrate to a lower side of the substrate. The upper side of the substrate has a first pressure, and the lower side of the substrate has a second pressure different than the first pressure. The multi-layer sealing film covers and seals the vent opening to prevent the first pressure from equalizing with the second pressure through the vent opening. Further, the multi-layer sealing film comprises a pair of metal layers and a barrier layer sandwiched between metal layers. Also provided is a microelectromechanical systems (MEMS) package comprising the multilayer sealing film, and a method for manufacturing the multi-layer sealing film.Type: ApplicationFiled: May 13, 2020Publication date: August 27, 2020Inventors: Chih-Chien Yang, Ming-Lun Shih, Ren-Dou Lee, Jen-Hao Liu
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Publication number: 20200223689Abstract: A semiconductor device structure is provided. The semiconductor device structure includes a first wafer comprising a first face and a second face opposite the first face and having a plurality of predetermined die areas. A plurality of recesses are disposed in the first face of the first wafer. A first recess of the plurality of recesses extends in a direction substantially parallel to a first edge of at least one of the plurality of predetermined die areas and laterally surrounds the at least one of the plurality of predetermined die areas. A second wafer is bonded to the second face of the first wafer.Type: ApplicationFiled: March 25, 2020Publication date: July 16, 2020Inventors: Chih-Hang Chang, I-Shi Wang, Jen-Hao Liu
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Patent number: 10710872Abstract: A method includes: providing a first substrate on which a plurality of first semiconductor devices is formed; providing a second substrate on which a plurality of second semiconductor devices is formed; and coupling the first and second substrates by contacting respective dummy pads of the first and second substrates, wherein at least one of the dummy pads of the first and second substrates comprises plural peaks and valleys.Type: GrantFiled: December 6, 2017Date of Patent: July 14, 2020Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Yu-Jui Chen, I-Shi Wang, Ren-Dou Lee, Jen-Hao Liu
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Patent number: 10676343Abstract: A multi-layer sealing film for high seal yield is provided. In some embodiments, a substrate comprises a vent opening extending through the substrate, from an upper side of the substrate to a lower side of the substrate. The upper side of the substrate has a first pressure, and the lower side of the substrate has a second pressure different than the first pressure. The multi-layer sealing film covers and seals the vent opening to prevent the first pressure from equalizing with the second pressure through the vent opening. Further, the multi-layer sealing film comprises a pair of metal layers and a barrier layer sandwiched between metal layers. Also provided is a microelectromechanical systems (MEMS) package comprising the multilayer sealing film, and a method for manufacturing the multi-layer sealing film.Type: GrantFiled: November 28, 2018Date of Patent: June 9, 2020Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Chih-Chien Yang, Ming-Lun Shih, Ren-Dou Lee, Jen-Hao Liu
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Patent number: 10624569Abstract: A blood glucose test strip includes a test strip, a blood test area formed on a first end of the test strip, an electrode formed on a second end of the test strip, a data barcode formed on the test strip, and a clock code formed on the test strip. The data barcode may include a plurality of first bars with spaces separating the first bars, each first bar having a width. The clock code may comprise a fixed pattern of second bars with spaces separating the second bars, a width of each second bar set according to the width of at least one of the first bars. The clock code can be used to calibrate the data barcode to compensate for insertion speed and/or moisture content.Type: GrantFiled: December 5, 2018Date of Patent: April 21, 2020Assignee: Tyson Bioresearch, Inc.Inventors: Andrew Yi Chen, Chih-Ching Chang, Jen-Hao Liu
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Patent number: 10626010Abstract: A method for forming a semiconductor device structure is provided. The method includes receiving a first wafer having multiple predetermined die areas. The method also includes forming a recess in the first wafer, and the recess extends in a direction substantially parallel to an edge of one of the predetermined die areas. The method further includes receiving a second wafer. In addition, the method includes bonding the first wafer and the second wafer at an elevated temperature after the recess is formed.Type: GrantFiled: September 6, 2018Date of Patent: April 21, 2020Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Chih-Hang Chang, I-Shi Wang, Jen-Hao Liu
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Publication number: 20200024125Abstract: A microelectromechanical systems (MEMS) package with roughness for high quality anti-stiction is provided. A device substrate is arranged over a support device. The device substrate comprises a movable element with a lower surface that is rough and that is arranged within a cavity. A dielectric layer is arranged between the support device and the device substrate. The dielectric layer laterally encloses the cavity. An anti-stiction layer lines the lower surface of the movable element. A method for manufacturing the MEMS package is also provided.Type: ApplicationFiled: April 17, 2019Publication date: January 23, 2020Inventors: Chih-Hang Chang, I-Shi Wang, Jen-Hao Liu
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Publication number: 20190231242Abstract: A blood glucose test strip includes a test strip, a blood test area formed on a first end of the test strip, an electrode formed on a second end of the test strip, a data barcode formed on the test strip, and a clock code formed on the test strip. The data barcode may include a plurality of first bars with spaces separating the first bars, each first bar having a width. The clock code may comprise a fixed pattern of second bars with spaces separating the second bars, a width of each second bar set according to the width of at least one of the first bars. The clock code can be used to calibrate the data barcode to compensate for insertion speed and/or moisture content.Type: ApplicationFiled: December 5, 2018Publication date: August 1, 2019Inventors: ANDREW YI CHEN, Chih-Ching Chang, Jen-Hao Liu