Abstract: A semiconductor arrangement and method of forming the semiconductor arrangement are provided. The semiconductor arrangement includes a device having a first surface and a second surface opposite the first surface. A first through substrate via (TSV) structure extends between the first surface and the second surface in a first region of the device. A second TSV structure extends between the first surface and the second surface in a second region of the device. The first TSV structure has a first cross-sectional area. The second TSV structure has a second cross-sectional area greater than the first cross-sectional area.

Abstract: A semiconductor package includes: a first die; a second die stacked on an upper surface of the first die, the second die including a second semiconductor substrate and a second seal ring structure that extends along a perimeter of the second semiconductor substrate; a third die stacked on the upper surface of the first die, the third die including a third semiconductor substrate and a third seal ring structure that extends along a perimeter of the third semiconductor substrate; and a connection circuit that extends through the second seal ring structure and the third seal ring structure, in a lateral direction perpendicular to the stacking direction of the first die and the second die, to electrically connect the second semiconductor substrate and the third semiconductor substrate.

Abstract: A semiconductor device includes a substrate, a chip underlying the substrate, a chip overlying the substrate, and a dummy die overlying the substrate. A pattern of the dummy die includes a first interior sidewall and a second interior sidewall, and a stress relief material between the first interior sidewall and the second interior sidewall to form a dummy die stress balance pattern.

Abstract: A semiconductor die includes a first semiconductor substrate; a first interconnect structure disposed on a front side of the first semiconductor substrate; a first through-substrate via (TSV) structure extending through the first semiconductor substrate; and a first fuse structure disposed between and electrically connecting the TSV structure and the first interconnect structure.

Abstract: A die includes: a semiconductor substrate having a front side and an opposing backside; a dielectric structure including a substrate oxide layer disposed on the front side of the semiconductor substrate and interlayer dielectric (ILD) layers disposed on the substrate oxide layer; an interconnect structure disposed in the dielectric structure; a through-silicon via (TSV) structure extending in a vertical direction from the backside of the semiconductor substrate through the front side of the semiconductor substrate, such that a first end of the TSV structure is disposed in the interconnect structure; and a TSV barrier structure including a barrier line that contacts the first end of the TSV structure, and a first seal ring disposed in the substrate oxide layer and that that surrounds the TSV structure in a lateral direction perpendicular to the vertical direction.

Abstract: An array of complementary die sets is attached to a carrier substrate. A continuous complementary-level molding compound layer is formed around the array of complementary die sets. An array of primary semiconductor dies is attached to the array of complementary die sets. A continuous primary-level molding compound layer is formed around the array of primary semiconductor dies. The bonded assembly is diced by cutting along directions that are parallel to edges of the primary semiconductor dies. The sidewalls of the complementary dies are azimuthally tilted relative to sidewalls of the primary semiconductor dies, or major crystallographic directions of a single crystalline material in the carrier substrate are azimuthally tilted relative to sidewalls of the primary semiconductor dies.

Abstract: A package structure and method of manufacturing a package structure are provided. The package structure comprises two semiconductor structures and two bonding layers sandwiched between both semiconductor structures. Each bonding layer has a plurality of bonding pads separated by an isolation layer. Each bonding pad has a bonding surface including a bonding region and at least one buffer region. The bonding regions in both bonding layers bond to each other. The buffer region of one semiconductor structure bonds to the isolation layer of the other semiconductor structure. A ratio of a surface area of the buffer region to that of the bonding region in each metal pad is from about 0.01 to about 10.

Abstract: A package structure includes a package substrate, a first die, a second die, a first underfill, and a second underfill. The first die and a second die are disposed on the package substrate. The first underfill is between the first die and the package substrate, and the first underfill includes a first extension portion extending from a first sidewall of the first die toward the second die. The second underfill is between the second die and the package substrate, and the second underfill includes a second extension portion extending from a second sidewall of the second die toward the first die, the second extension portion overlapping the first extension portion on the package substrate.

Abstract: A semiconductor package includes a first die; a second die stacked on the first die in a vertical direction; a dielectric encapsulation (DE) structure surrounding the first die and the second die in a lateral direction perpendicular to the vertical direction; and a package seal ring that extends through the DE structure and surrounds the second die and at least a portion of the first die, in the lateral direction.

Abstract: A semiconductor structure and a method for forming the semiconductor structure are disclosed. The method includes receiving a first integrated circuit component having a seal ring and a fuse structure, wherein the fuse structure is electrically connected to a ground through the seal ring; receiving a second integrated circuit component having an inductor; bonding the second integrated circuit component to the first integrated circuit component; electrically connecting the inductor to the fuse structure, wherein the inductor is electrically connected to the ground through the fuse structure; and blowing the fuse structure after a treatment.

Abstract: A semiconductor structure and a method for forming the semiconductor structure are disclosed. The method includes receiving a first integrated circuit component having a seal ring and a fuse structure, wherein the fuse structure is electrically connected to a ground through the seal ring; receiving a second integrated circuit component having an inductor; bonding the second integrated circuit component to the first integrated circuit component; electrically connecting the inductor to the fuse structure, wherein the inductor is electrically connected to the ground through the fuse structure; and blowing the fuse structure after a treatment.

Abstract: A semiconductor structure and a method for forming the semiconductor structure are disclosed. The method includes receiving a first integrated circuit component having a seal ring and a fuse structure, wherein the fuse structure is electrically connected to a ground through the seal ring; receiving a second integrated circuit component having a first capacitor; bonding the second integrated circuit component to the first integrated circuit component; electrically connecting the first capacitor to the fuse structure, wherein the first capacitor is electrically connected to the ground through the fuse structure; and blowing the fuse structure after a treatment.

Abstract: A package structure and method of manufacturing a package structure are provided. The package structure comprises two semiconductor structures and two bonding layers sandwiched between both semiconductor structures. Each bonding layer has a plurality of bonding pads separated by an isolation layer. Each bonding pad has a bonding surface including a bonding region and at least one buffer region. The bonding regions in both bonding layers bond to each other. The buffer region of one semiconductor structure bonds to the isolation layer of the other semiconductor structure. A ratio of a surface area of the buffer region to that of the bonding region in each metal pad is from about 0.01 to about 10.

Abstract: A semiconductor structure includes a first die, a second die over the first die, and a positioning member disposed within a bonding dielectric and configured to align the second die with the first die. A method for forming a semiconductor structure includes receiving a first die having a first bonding layer; forming a recess on the first bonding layer; forming a positioning member on a second die; bonding the second die over the first die using the first bonding layer; and disposing the positioning member into the recess.

Abstract: The semiconductor structure includes a die, a dielectric layer surrounding the die, a photoelectric device disposed adjacent to the die and surrounded by the dielectric layer, a first opening extending through the redistribution layer and configured to receive a light-conducting member, and a metallic shield extending at least partially through the redistribution layer and surrounding the first opening. A method for forming a semiconductor structure includes receiving a die; forming a dielectric layer to surround the die; and disposing a photoelectric device surrounded by the dielectric layer; forming a redistribution layer over the die, the dielectric layer and the photoelectric device; and removing a portion of the redistribution layer to form a first opening over the photoelectric device. A metallic shield extending at least partially through the redistribution layer and surrounding the first opening is formed during the formation of the redistribution layer.

Abstract: The semiconductor structure includes a die, a dielectric layer surrounding the die, a photoelectric device disposed adjacent to the die and surrounded by the dielectric layer, a first opening extending through the redistribution layer and configured to receive a light-conducting member, and a dielectric liner extending at least partially through the redistribution layer and surrounding the first opening. A method for forming a semiconductor structure includes forming a dielectric layer to surround a die; and disposing a photoelectric device surrounded by the dielectric layer; forming a redistribution layer over the die, the dielectric layer and the photoelectric device; forming a recess over the photoelectric device; disposing a dielectric material into the recess; removing a portion of the dielectric material to form a dielectric liner and a first opening over the photoelectric device. The dielectric liner extends at least partially through the redistribution layer and surrounding the first opening.

Abstract: A magnetic position detecting device and a method for detecting a magnetic position are provided. An induced voltage is generated by changing a position between a pattern of an inductive ruler and an alternating magnetic field of an exciting element. A position of the exciting element is resolved by a technical means of voltage resolution for positions.

Abstract: The invention discloses a calibration method for multiple IMU on multi-linkage system, the system comprising: a plurality of IMUs, wherein the plurality of IMUs is respectively arranged in a plurality of links of the multi-linkage system. Each of the IMUs further includes an accelerometer, a magnetometer, a gyroscope, and a calculation and compensation unit (CCU); the calibration method includes: CCU selecting the communication channel and initializing parameters; CCU selecting the communication channel and performing object vector information calculation, rotation compensation, and installation error compensation respectively; calculates the angle between each IMU and the position endpoints of each IMU; and outputting the compensated object vector information, the angle, and the endpoint positions.

Abstract: A magnetic position detecting device and a method for detecting a magnetic position are provided. An induced voltage is generated by changing a position between a pattern of an inductive ruler and an alternating magnetic field of an exciting element. A position of the exciting element is resolved by a technical means of voltage resolution for positions.

Abstract: A magnetic encoder has an annular main body and a magnetic encoding unit. The main body is made of material with magnetic permeability, surrounds a central axis, and includes a first surface and a second surface opposite to said first surface. The magnetic encoding unit is disposed on one of the first surface and the second surface of the main body, and includes a plurality of first and second magnetic poles, each of which is annular and is centered at the central axis. The first and second magnetic poles are arranged in an alternating sequence.