Abstract: A method for transmitting data streams by a transmitter in a wireless communication system is provided. The transmitter performs Fourier transform for a data stream to generate a transformed stream. The transmitter repeats the transformed stream to generate a repeated stream. The transmitter maps the repeated stream on a plurality of subcarriers to generate a transmission signal. The transmitter transmits the transmission signal to a receiver. The plurality of subcarriers are selected by starting from a subcarrier having a predetermined index and hopping at a subcarrier interval.

Abstract: A method of transmitting a signal based on multi-stream CPDMA may include: allocating a plurality of data symbols to each of a plurality of data streams based on a frequency hopping pattern; applying a DFT function and a M-times repetition function to the data symbol allocated to the each of the plurality of data streams; applying a spectral weighting vector to the each of the plurality of data streams applying the DFT function and the M-times repetition function; and generating the signal based on the multi-stream CPDMA by performing an IDFT function and a cyclic prefix adding procedure with respect to the plurality of data streams to which the spectral weighting vector is applied, in which the spectral weighting vector is a vector for determining a frequency band in which the each of the plurality of data streams is used.

Abstract: An apparatus for creating an EUV light may include a droplet-supplying unit, a laser-irradiating unit, a light-concentrating unit and a guiding unit. The droplet-supplying unit may supply a droplet from which the EUV light may be created. The laser-irradiating unit may irradiate a laser to the droplet supplied from the droplet-supplying unit to create the EUV light. The light-concentrating unit may concentrate the EUV light created by the laser-irradiating unit. The guiding unit may guide the droplet to a position at which the laser may be irradiated. The guiding unit may have at least one gas-spraying hole for spraying a gas to a space between the droplet-supplying unit and the laser irradiation position to form a gas curtain configured to surround the droplet.

Abstract: A method for detecting a radio signal in a wireless communication system is provided. According to the method, a wireless device measures an input signal received by a RF unit of. The wireless device eliminates a duplicated part between the input signal and a complex conjugate signal of the input signal to generate a filtered signal. The wireless device determines whether a target signal exists in the input signal based on the filtered signal.

Abstract: A method of measuring an overlay of an object is provided. In the method, first information of a first structure may be obtained. A preliminary structure may be formed on the first structure. Second information of the preliminary structure may be obtained. The first information and the second information may be processed to obtain virtual information of a second structure that would be formed on the first structure if a process is performed on the preliminary structure. A virtual overlay between the first structure and the second structure may be measured using the virtual information.

Abstract: A method of fabricating a nanoimprint lithography template includes installing a reticle on a reticle stage of scanning lithography equipment having a light source, the reticle stage and a template stage, mounting a template substrate on the template stage, and scanning the template substrate with light from the light source in an exposure process in which the light passes through the reticle and impinges the template substrate at an oblique angle of incidence.

Abstract: A method of transmitting a signal based on multi-stream CPDMA may include: allocating a plurality of data symbols to each of a plurality of data streams based on a frequency hopping pattern; applying a DFT function and a M-times repetition function to the data symbol allocated to the each of the plurality of data streams; applying a spectral weighting vector to the each of the plurality of data streams applying the DFT function and the M-times repetition function; and generating the signal based on the multi-stream CPDMA by performing an IDFT function and a cyclic prefix adding procedure with respect to the plurality of data streams to which the spectral weighting vector is applied, in which the spectral weighting vector is a vector for determining a frequency band in which the each of the plurality of data streams is used.

Abstract: A method of measuring an overlay includes generating an original signal using first and second overlay measurement keys that are spaced apart from each other, generating a first spectrum signal by performing Fourier transform of the original signal, generating a second spectrum signal by filtering the first spectrum signal, and generating a corrected signal by performing inverse Fourier transform of the second spectrum signal.

Abstract: An exposing method includes irradiating a first light having a first energy to a first exposed region of a photoresist film through a first shot region of a mask, and irradiating a second light having a second energy to the first exposed region of the photoresist film through a second shot region of the mask.

Abstract: Provided are a lithography apparatus, a method for lithography and a stage system. The lithography apparatus includes a reticle stage having a reticle, at least one nozzle on at least one surface of the reticle stage and configured to allow shielding gas to flow to a surface of the reticle to form an air curtain, and a gas supply unit configured to supply the nozzle with the shielding gas.

Abstract: An apparatus for creating an EUV light may include a droplet-supplying unit, a laser-irradiating unit, a light-concentrating unit and a guiding unit. The droplet-supplying unit may supply a droplet from which the EUV light may be created. The laser-irradiating unit may irradiate a laser to the droplet supplied from the droplet-supplying unit to create the EUV light. The light-concentrating unit may concentrate the EUV light created by the laser-irradiating unit. The guiding unit may guide the droplet to a position at which the laser may be irradiated. The guiding unit may have at least one gas-spraying hole for spraying a gas to a space between the droplet-supplying unit and the laser irradiation position to form a gas curtain configured to surround the droplet.

Abstract: A method of inspecting a structure. The method includes preparing preliminary spectrums of reference diffraction intensities according to critical dimensions of reference structures, obtaining a linear spectrum from the preliminary spectrums in a set critical dimension range, radiating light to respective measurement structures formed on a substrate, measuring measurement diffraction intensities of the light diffracted by the measurement structures, and obtaining respective critical dimensions of the measurement structures from the measurement diffraction intensities using the linear spectrum.

Abstract: A method for transmitting data streams by a transmitter in a wireless communication system is provided. The transmitter performs Fourier transform for a data stream to generate a transformed stream. The transmitter repeats the transformed stream to generate a repeated stream. The transmitter maps the repeated stream on a plurality of subcarriers to generate a transmission signal. The transmitter transmits the transmission signal to a receiver. The plurality of subcarriers are selected by starting from a subcarrier having a predetermined index and hopping at a subcarrier interval.

Abstract: Provided are a reflective reticle chuck, a reflective illumination system including the chuck, a method of controlling the flatness of a reflective reticle using the chuck, and a method of manufacturing a semiconductor device using the chuck. The reflective reticle chuck includes a fixed portion and a mobile portion that together provide a securing surface for the reflective reticle. The mobile portion may alter a height of the securing surface relative to the fixed portion.

Abstract: A method of fabricating a nanoimprint lithography template includes installing a reticle on a reticle stage of scanning lithography equipment having a light source, the reticle stage and a template stage, mounting a template substrate on the template stage, and scanning the template substrate with light from the light source in an exposure process in which the light passes through the reticle and impinges the template substrate at an oblique angle of incidence.

Abstract: The present invention relates to a method of detecting the presence of a transmission signal of a transmitter in a reception signal in a wireless communication system based on CR technology.

Abstract: The energy distribution of exposure light directed passing through the slit of an exposure apparatus is determined. A photoresist layer on a substrate is exposed over a plurality of shots while changing the intensity of the exposure light for each shot. Then the photoresist layer is developed to form a sample photoresist layer. An image of the developed sample photoresist layer is analyzed for color intensity. Values of the color intensity across a selected one of the shots are correlated with values of the intensity of the exposure light to produce an energy distribution of the exposure light along the length of the slit. The energy distribution is used to change the slit so that a more desirable energy distribution may be realized when the slit is used in a process of manufacturing a semiconductor device.

Abstract: A method of detecting reticle error may include using an optical source of an exposure unit to cause light to be incident on a reticle installed in the exposure unit, and detecting the reticle error using only 0th diffraction light from among diffraction lights transmitted through the reticle. A method of detecting reticle error may include: installing a reticle, including a mask substrate and mask patterns having a critical dimension formed on the mask substrate, in an exposure unit to cause light to be incident on the reticle; exposing a photoresist film disposed on a wafer in the exposure unit using only 0th diffraction light from among diffraction lights transmitted through the reticle; developing the exposed photoresist film; and analyzing a thickness change, an image, or the thickness change and image of the developed photoresist film, in order to detect the reticle error at a wafer level.

Abstract: The energy distribution of exposure light directed passing through the slit of an exposure apparatus is determined. A photoresist layer on a substrate is exposed over a plurality of shots while changing the intensity of the exposure light for each shot. Then the photoresist layer is developed to form a sample photoresist layer. An image of the developed sample photoresist layer is analyzed for color intensity. Values of the color intensity across a selected one of the shots are correlated with values of the intensity of the exposure light to produce an energy distribution of the exposure light along the length of the slit. The energy distribution is used to change the slit so that a more desirable energy distribution may be realized when the slit is used in a process of manufacturing a semiconductor device.

Abstract: Methods and apparatus are disclosed that arrange mask patterns in response to the contribution of a second pattern to image intensity. In some methods of arranging mask patterns, a distribution of functions h(??x) is obtained which represents the contribution of a second pattern to image intensity on a first pattern. Neighboring regions of the first pattern are discretized into finite regions, and the distribution of the functions h(??x) is replaced with representative values h(x,?) of the discretized regions. A position of the second pattern is determined using polygonal regions having the same h(x,?). As described, the term x is the position of the first pattern and the term ? is the position of the assist.