Patents by Inventor Jer Lin
Jer Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7468502Abstract: A CMOS light sensor and the operation method thereof are disclosed. The CMOS light sensor has a plurality of light sensing lines and a plurality of capacitor lines. Each light sensing line has a plurality of light sensors such that the number of capacitors in each capacitor line is smaller than the number of light sensing cells in each light sensing line. The capacitors are used for holding a portion of the potentials produced by the light sensing cells due to illumination. The method of operating the CMOS light sensor includes transferring the data captured by the light sensing line to the capacitor line and reading out the data according to a pre-defined order so that the leakage of charges from the capacitor is reduced.Type: GrantFiled: July 10, 2006Date of Patent: December 23, 2008Inventors: Ben Min-Jer Lin, Shih-Huang Chen
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Patent number: 7307009Abstract: A method of defining a patterned, conductive gate structure for a MOSFET device on a semiconductor substrate includes forming a conductive layer over the semiconductor substrate and forming a capping insulator layer over the conductive layer. An anti-reflective coating (ARC) layer is formed over the capping insulator layer and a patterned photoresist shape is formed on the ARC layer. A first etch procedure using the photoresist shape as an etch mask defines a stack comprised of an ARC shape and a capping insulator shape. A second etch procedure using the stack as an etch mask defines the patterned, conductive gate structure in the conductive layer.Type: GrantFiled: November 29, 2004Date of Patent: December 11, 2007Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Li-Te S. Lin, Fang-Cheng Chen, Huin-Jer Lin, Yuan-Hung Chiu, Hun-Jan Tao
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Patent number: 7250594Abstract: A CMOS light sensor and the operation method thereof are disclosed. The CMOS light sensor has a plurality of light sensing lines and a plurality of capacitor lines. Each light sensing line has a plurality of light sensors such that the number of capacitors in each capacitor line is smaller than the number of light sensing cells in each light sensing line. The capacitors are used for holding a portion of the potentials produced by the light sensing cells due to illumination. The method of operating the CMOS light sensor includes transferring the data captured by the light sensing line to the capacitor line and reading out the data according to a pre-defined order so that the leakage of charges from the capacitor is reduced.Type: GrantFiled: April 7, 2003Date of Patent: July 31, 2007Assignee: Transpacific IP, Ltd.Inventors: Ben. Min-Jer Lin, Shih-Huang Chen
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Publication number: 20060225981Abstract: Provided is a handle assembly for carry-on luggage. The inverted U-shaped handle assembly comprises two handle units each comprising a handle rod comprising a fixed bottom support tube and a plurality of sliding tubes arranged telescopically about a tube therebelow; a locking device in the tubes; and a resilient device under of the support tube. Pressing the push button will unlock the handle units and resiliently move the handle rods upward a predetermined small distance prior to being able to fully extend the handle rods.Type: ApplicationFiled: April 12, 2005Publication date: October 12, 2006Applicant: CHAW KHONG TECHNOLOGY CO., LTD.Inventor: Jer Lin
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Patent number: 7060420Abstract: A fabrication method for a liquid crystal display. A pair of substrates is provided. An alignment layer is formed on the respective substrates. An energy beam is irradiated on a predetermined area of at least one of the alignment layers. The alignment layer is rubbed to form a first pretilt-angle area in the predetermined area exposed to the energy beam, and a second pretilt-angle area not exposed to the energy beam. The pair of substrates are bonded with a preset gap therebetween, and a liquid crystal layer is inserted between the substrates. The liquid crystals corresponding to the first pretilt angle area have a first pretilt angle of ?1, while those corresponding to the second pretilt angle area have a second pretilt angle of ?2.Type: GrantFiled: September 21, 2004Date of Patent: June 13, 2006Assignee: Chi Mei Optoelectronics Corp.Inventors: Yang-Yi Fan, Hsin-Chun Chiang, Ing Jer Lin, Yi-Chun Wong, Tsan-Yu Ho, Lung-Pin Hsin, Kang-Hung Liu, Chung-Wen Wu, Yi-An Sha
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Patent number: 6992443Abstract: A plasma display panel. The plasma display panel includes a first panel, a second panel, and a filter device. The first panel has a first substrate, a plurality of first electrodes and a protective layer. The first electrode is disposed in the vicinity of the first substrate and the protective layer. The second panel has a second substrate, a plurality of barrier ribs and a plurality of second electrodes. The barrier ribs and the second electrodes are formed on the second substrate. The barrier ribs create a plurality of cells. Center points of any three adjacent cells are connected to form an delta. The filter device includes a metallic mesh film, disposed on the first panel. The mesh film has wires intersecting each other. One of the wire and a side of the delta form an acute angle of 0 to 15 or 45 to 60°.Type: GrantFiled: March 4, 2004Date of Patent: January 31, 2006Assignee: Au Optronics Corp.Inventors: Yih-Jer Lin, Yao-Ching Su
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Publication number: 20060006529Abstract: A semiconductor package positioned on a first substrate includes a second substrate having a first surface and a second surface, a chip positioned on the first surface of the second substrate, a plurality of first bonding balls positioned on the second surface of the second substrate and arranged in a line along a first direction for connecting the second substrate to the first substrate, and at least a dummy bonding bar positioned on the second surface of the second substrate for connecting the second substrate to the first substrate and preventing the semiconductor package from inclining to one side.Type: ApplicationFiled: July 8, 2004Publication date: January 12, 2006Inventor: Min-Jer Lin
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Patent number: 6969949Abstract: A plasma display panel comprises a plurality of red, green and blue display units arranged on a substrate, so as to form plural red, green, blue display unit channels whose directions are aligned towards a ventilation hole located on the substrate, for facilitating gas charge or discharge in a good speed.Type: GrantFiled: August 8, 2003Date of Patent: November 29, 2005Assignee: AU Optronics Corp.Inventors: Yao-Ching Su, Chung-Kuang Tsai, Yih-Jer Lin
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Patent number: 6912038Abstract: The present invention discloses a method for manufacturing liquid crystal display (LCD) device by utilizing photopolymer. A first photopolymer layer is coated on the support substrate and the substrate having a buffer layer is treated by photopolymerization. A substrate is treated by processes for forming an electrode layer, an alignment layer and projections as required by general LCD manufacturing. A second photopolymer layer is coated on the substrate having a plurality electrode patterns, an alignment layer and projections. Mask exposure is applied to the substrate and the photopolymer forms a polymer wall. Alternatively molding can be applied to the substrate along with linear ultra violet exposure. The photopolymer layer is hardened by such process and forms a polymer wall with alignment. The cavities in the polymer wall are filled with mixture of liquid crystal and small amount of photopolymer.Type: GrantFiled: September 30, 2003Date of Patent: June 28, 2005Assignee: Industrial Technology Research InstituteInventors: Chi-Chang Liao, Ing-Jer Lin, Yi-Chun Wong, Chia-Rong Sheu, Lung-Pin Hsin, Kang--Hung Liu, Ching-Hsiang Chan, Yi-An Sha, Shin-Mao Huang
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Publication number: 20050121733Abstract: A process sequence for forming a MOSFET device featuring a high k gate insulator layer, wherein the use of the high k gate insulator layer requires no additional photolithographic procedures, has been developed. After deposition of a high k gate insulator layer followed by the definition of an overlying conductive gate structure, an insulator layer is deposited. An anisotropic dry etch procedure is then employed to first define offset insulator spacers on the sides of the conductive gate structure, then to selectively remove the unwanted portions of the high k gate insulator layer. The use of the high k gate insulator layer provides a thin gate insulator layer with less risk of leakage when compared to counterpart gate insulator layers such as silicon dioxide, while the integration of the definition of the offset insulator spacer step and of the high k gate layer removal procedure, results in fabrication cost savings.Type: ApplicationFiled: December 9, 2003Publication date: June 9, 2005Inventors: Fang-Cheng Chen, Ming-Hung Tsai, Hun-Jer Lin, Yung-Hung Chiu
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Publication number: 20050118755Abstract: A method of defining a patterned, conductive gate structure for a MOSFET device on a semiconductor substrate includes forming a conductive layer over the semiconductor substrate and forming a capping insulator layer over the conductive layer. An anti-reflective coating (ARC) layer is formed over the capping insulator layer and a patterned photoresist shape is formed on the ARC layer. A first etch procedure using the photoresist shape as an etch mask defines a stack comprised of an ARC shape and a capping insulator shape. A second etch procedure using the stack as an etch mask defines the patterned, conductive gate structure in the conductive layer.Type: ApplicationFiled: November 29, 2004Publication date: June 2, 2005Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Li-Te Lin, Fang-Chen Cheng, Huin-Jer Lin, Yuan-Hung Chiu, Hun-Jan Tao
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Publication number: 20050093452Abstract: A plasma display panel. The plasma display panel includes a first panel, a second panel, and a filter device. The first panel has a first substrate, a plurality of first electrodes and a protective layer. The first electrode is disposed in the vicinity of the first substrate and the protective layer. The second panel has a second substrate, a plurality of barrier ribs and a plurality of second electrodes. The barrier ribs and the second electrodes are formed on the second substrate. The barrier ribs create a plurality of cells. Center points of any three adjacent cells are connected to form an delta. The filter device includes a metallic mesh film, disposed on the first panel. The mesh film has wires intersecting each other. One of the wire and a side of the delta form an acute angle of 0 to 15 or 45 to 60°.Type: ApplicationFiled: March 4, 2004Publication date: May 5, 2005Inventors: Yih-Jer Lin, Yao-Ching Su
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Publication number: 20050077778Abstract: A luggage wheel assembly comprises an L-shaped bezel including a hollow lower portion of arcuate section, and a well defined by the lower portion for receiving a wheel; and a shock absorber extended from the wheel into the lower portion. Lower, oblique first slot and upper, oblique second slot are provided on either side of an inner wall of the lower portion respectively. A wheel mount comprises a lower hole at either side, an upper hole at either side, an axle inserted through the first slot and the lower hole at one side, a hub of the wheel, and the lower hole and the first slot at the other side, two pins inserted through the upper holes and the second slots, and two C-shaped clips put on projected shanks of the pins on the second slots for fastening. The invention can eliminate wobbles occurred when towing on uneven surfaces.Type: ApplicationFiled: August 4, 2004Publication date: April 14, 2005Applicant: CHAW KHONG TECHNOLOGY CO., LTD.Inventors: Jer Lin, Boon Lau
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Publication number: 20050064116Abstract: A polymer gel display, fabrication method and operating structure thereof. Display is enabled by utilizing the flexing characteristic of a polymer-gel sheet. A pair of substrates is separated by a predetermined gap, and a polymer-gel sheet of a first color disposed therebetween, having two ends fixed, a center area flexible and contacting no more than one of the substrates. A fluid layer of a second color is disposed between the substrates, displaying its color via the substrate not contacting the polymer-gel sheet. An external electric field is applied to the polymer-gel sheet, flexing the polymer-gel sheet toward the substrate until making contact and the first color of the polymer-gel sheet is displayed via the substrate.Type: ApplicationFiled: February 19, 2004Publication date: March 24, 2005Inventors: Yi-An Sha, Ing Jer Lin, Yi-Chun Wong, Lung-Pin Hsin, Chi-Chang Liao, Hsin-Chun Chiang, Yang-Yi Fan, Chung-Wen Wu
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Patent number: 6849531Abstract: A method of defining a gate structure for a MOSFET device featuring the employment of dual anti-reflective coating (ARC) layers to enhance gate structure resolution, and featuring a dry procedure for removal of all ARC layers avoiding the use of hot phosphoric acid, has been developed. After formation of a polysilicon layer on an underlying silicon dioxide gate insulator layer, a capping silicon oxide, a dielectric ARC layer, and an overlying organic ARC layer are deposited. A photoresist shape is formed and used as an etch mask to allow a first anisotropic RIE procedure to define the desired gate structure shape in the dual ARC layers and in the capping silicon oxide layer. After removal of the photoresist shape and the overlying organic ARC layer a second anisotropic RIE procedure is used to define a desired polysilicon gate structure, with the second anisotropic RIE procedure also resulting in the removal of the dielectric ARC shape.Type: GrantFiled: November 21, 2003Date of Patent: February 1, 2005Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Li-Te S. Lin, Fang-Chen Cheng, Huin-Jer Lin, Yuan-Hung Chiu, Hun-Jan Tao
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Publication number: 20050018124Abstract: The present invention discloses a method for manufacturing liquid crystal display (LCD) device by utilizing photopolymer. A first photopolymer layer is coated on the support substrate and the substrate having a buffer layer is treated by photopolymerization. A substrate is treated by processes for forming an electrode layer, an alignment layer and projections as required by general LCD manufacturing. A second photopolymer layer is coated on the substrate having a plurality electrode patterns, an alignment layer and projections. Mask exposure is applied to the substrate and the photopolymer forms a polymer wall. Alternatively molding can be applied to the substrate along with linear ultra violet exposure. The photopolymer layer is hardened by such process and forms a polymer wall with alignment. The cavities in the polymer wall are filled with mixture of liquid crystal and small amount of photopolymer.Type: ApplicationFiled: September 30, 2003Publication date: January 27, 2005Applicant: Industrial Technology Research InstituteInventors: Chi-Chang Liao, Ing-Jer Lin, Yi-Chun Wong, Chia-Rong Sheu, Lung-Pin Hsin, Kang-Hung Liu, Ching-Hsiang Chan, Yi-An Sha, Shin-Mao Huang
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Publication number: 20040245927Abstract: A plasma panel used as a light source of a display panel includes a first substrate having a first surface, a second substrate positioned above the first substrate, a plurality of electrode pairs extending along a first direction on the first surface, and a plurality of conductive spacers. Each of the electrode pairs includes a first electrode and a second electrode. The conductive spacers are formed on the first electrode and the second electrode for performing a discharge of opposed electrodes and supporting the second substrate.Type: ApplicationFiled: April 19, 2004Publication date: December 9, 2004Inventors: Yao-Ching Su, Yih- Jer Lin
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Publication number: 20040228981Abstract: The present invention discloses a method for manufacturing an electrophoretic display. The major feature is wrapping the colored and charged particles with photo polymeric material so as to enable an electrophoretic display. The manufacturing process includes steps as proceeding to a polymerization manufacturing process where an assist substrate having a buffer layer is coated with a first layer of photo polymeric material. The first layer of photo polymeric material then undergoes required steps such as conductive layer electrode fabricating. The second layer of photo polymeric material mixture is coated on a substrate having a plurality of electrode patterns. The assist substrate is aligned with the substrate. Then a mask exposure polymerization manufacturing process is performed so as to combining the assist substrate and the substrate and separate the charged particles solution from the polymeric material. The assist substrate is removed from the substrate and the manufacturing process is completed.Type: ApplicationFiled: September 4, 2003Publication date: November 18, 2004Applicant: Industrial Technology Research InstituteInventors: Chi-Chang Liao, Kang-Hung Liu, Ing-Jer Lin, Yi-Chun Wong, Chia-Rong Sheu
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Publication number: 20040178527Abstract: A method for manufacturing the liquid crystal display, which mainly use a auxiliary substrate with polymeric material containing liquid crystal to proceed a photo polymerization process, and then use a first polymeric material layer to proceed a process with plurality electrode, alignment layer and flanges setting in. A second polymeric material mixture coating on a substrate which has plurality electrode pattern an alignment layer and flanges on it. And then align the auxiliary substrate and the substrate to proceed exposure process and combine both due to phase separation, finally removing the assist substrate.Type: ApplicationFiled: August 11, 2003Publication date: September 16, 2004Applicant: Industrial Technology Research InstituteInventors: Chi-Chang Liao, Chih-Ming Lai, Ing-Jer Lin, Yi-Chun Wong, Lung-Pin Hsin
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Patent number: 6791263Abstract: An electrode structure of a plasma display panel (PDP) is disclosed. The electrode structure is formed on a front substrate of the PDP. The electrode structure includes a first sustaining electrode, a second sustaining electrode, and an auxiliary electrode. The first and second sustaining electrodes are formed on the substrate with a first gap existing therebetween. The auxiliary electrode is formed in the first gap. A second gap is formed between the auxiliary electrode and the second sustaining electrode. The second gap is smaller than the first gap.Type: GrantFiled: May 10, 2001Date of Patent: September 14, 2004Assignee: AU Optronics Corp.Inventors: Yao-Ching Su, Yih-Jer Lin