Patents by Inventor Jeroen Jonkers
Jeroen Jonkers has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20090168967Abstract: A description is given of a method and an apparatus for generating radiation (12) in the wavelength range from about 1 nm to about 30 nm by means of an electrically operated discharge, which can be used in lithography or in metrology. Use is made of at least one first electrode (14) and at least one second electrode (16) at a distance therefrom, wherein at least one working gas (22) is provided between the electrodes (14, 16). A plasma is ignited in the working gas (22), the generated radiation (12) of which plasma is forwarded via a first opening (30) for further use, and wherein debris particles (28) are produced in at least one region (26) of at least one of the electrodes (14, 16). In order to retain the debris particles (28), the method is configured such that at least the region (26) is arranged with respect to the first opening (30) in such a way that the movement paths (32) of the debris particles (28) run at least predominantly outside an area delimited by the first opening (30).Type: ApplicationFiled: November 18, 2005Publication date: July 2, 2009Applicant: Koninklijke Philips Electronics, N.V.Inventors: Jeroen Jonkers, Dominik Marcel Vaudrevange
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Patent number: 7518300Abstract: The invention relates to a method and a device for the generation of a plasma through electric discharge in a discharge space which contains at least two electrodes, at least one of which is constructed from a matrix material or carrier material, such that an erosion-susceptible region with an evaporation spot is formed at least by the current flow. To present a method or a device for the generation of a plasma by electric discharge, it is suggested that a sacrificial substrate (38) is provided at least at the evaporation spot, the boiling point of said sacrificial suvstrate (38) during discharge operation lying below the melting point of the carrier material (30), such that charge carriers arising in the current flow are mainly generated from the sacrificial substrate (38).Type: GrantFiled: March 5, 2004Date of Patent: April 14, 2009Assignee: Koninklijke Philips Electronics N.V.Inventors: Eric Gerardus Theodoor Bosch, Jeroen Jonkers, Willi Neff, Günther Hans Derra
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Publication number: 20090079021Abstract: It is described a low ohmic Through Wafer Interconnection (TWI) for electronic chips formed on a semiconductor substrate (600). The TWI comprises a first connection extending between a front surface and a back surface of the substrate (600). The first connection (610) comprises a through hole filled with a low ohmic material having a specific resistivity lower than poly silicon. The TWI further comprises a second connection (615) also extending between the front surface and the back surface. The second connection (615) is spatially separated from the first connection (610) by at least a portion of the semiconductor substrate (600). The front surface is provided with a integrated circuit arrangement (620) wherein the first connection (610) is electrically coupled to at least one node of the integrated circuit arrangement (620) without penetrating the integrated circuit arrangement (620). During processing the TWI the through hole may be filled first with a non-metallic material, e.g. poly silicon.Type: ApplicationFiled: March 16, 2007Publication date: March 26, 2009Applicant: KONINKLIJKE PHILIPS ELECTRONICS N. V.Inventors: Gereon Vogtmeier, Roger Steadman, Ralf Dorscheid, Jeroen Jonkers
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Patent number: 7427766Abstract: A method of producing extreme ultraviolet radiation (EUV) or soft X-ray radiation by means of an electrically operated discharge, in particular for EUV lithography or for metrology, in which a plasma (22) is ignited in a gaseous medium between at least two electrodes (14, 16) in a discharge space (12), said plasma emitting said radiation that is to be produced. The gaseous medium is produced from a metal melt (24), which is applied to a surface in said discharge space (12) and at least partially evaporated by an energy beam, in particular by a laser beam (20).Type: GrantFiled: September 1, 2004Date of Patent: September 23, 2008Assignee: Koninklijke Philips Electronics N.V.Inventors: Jeroen Jonkers, Dominik Marcel Vaudrevange, Willi Neff
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Publication number: 20080203325Abstract: The present invention relates to a method of protecting a radiation source producing extreme ultraviolet radiation (EUV) and/or soft X-rays against short circuits. The method applies to radiation sources producing said EUV-radiation and/or soft X-rays by means of an electrically operated discharge, which is ignited in a vapor between at least two electrodes (1, 2) in a discharge space, wherein said vapor is produced from a metal melt (6), which is applied to a surface in said discharge space and at least partially evaporated by an energy beam (9). Such a radiation source has one or several small gaps (17) between said electrodes (1, 2) and/or between components (4, 5) electrically connected to said electrodes (1, 2). These gaps (17) can cause short circuits when evaporated metal condenses there.Type: ApplicationFiled: June 6, 2006Publication date: August 28, 2008Applicant: KONINKLIJKE PHILIPS ELECTRONICS, N.V.Inventors: Dominik Marcel Vaudravange, Jeroen Jonkers
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Patent number: 7397190Abstract: The invention relates to a gas discharge lamp for EUV radiation with an anode (1) and a hollow cathode (2), wherein the hollow cathode (2) has at least two openings (3, 3?) and the anode (1) has a through hole (4), which is characterized in that the longitudinal axes (5, 5?) of the hollow cathode openings (3) have a common point of intersection S lying on the axis of symmetry (6) of the anode opening (4).Type: GrantFiled: November 28, 2003Date of Patent: July 8, 2008Assignee: Koninklijke Philips Electronics, N.V.Inventors: Guenther Hans Derra, Joseph Robert Rene Pankert, Willi Neff, Klaus Bergmann, Jeroen Jonkers
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Patent number: 7315346Abstract: A lithographic projection apparatus is disclosed. The apparatus includes a support structure constructed to support a patterning structure. The patterning structure is adapted to pattern a beam of radiation according to a desired pattern. The apparatus also includes a substrate holder that is constructed to hold a substrate, a projection system that is constructed and arranged to project the patterned beam onto a target portion of the substrate, and a downstream radical source that is connected to a gas supply and is configured to provide a beam of radicals onto a surface to be cleaned.Type: GrantFiled: December 12, 2003Date of Patent: January 1, 2008Assignee: ASML Netherlands B.V.Inventors: Michael Cornelis Van Beek, Levinus Pieter Bakker, Theodorus Hubertus Josephus Bisschops, Jeroen Jonkers, Mark Kroon, Robertus Adrianus Maria Wolters, Adrianus Johannes Henricus Maas
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Publication number: 20070090304Abstract: A method of producing extreme ultraviolet radiation (EUV) or soft X-ray radiation by means of an electrically operated discharge, in particular for EUV lithography or for metrology, in which a plasma (22) is ignited in a gaseous medium between at least two electrodes (14, 16) in a discharge space (12), said plasma emitting said radiation that is to be produced. The gaseous medium is produced from a metal melt (24), which is applied to a surface in said discharge space (12) and at least partially evaporated by an energy beam, in particular by a laser beam (20).Type: ApplicationFiled: September 1, 2004Publication date: April 26, 2007Inventors: Jeroen Jonkers, Dominik Vaudrevange, Willi Neff
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Patent number: 7170586Abstract: A lithographic apparatus includes an illumination system configured to provide a beam of radiation, a support configured to support a patterning device, a substrate table and a projection system. Furthermore, the lithographic apparatus includes a plurality of EUV sources for providing EUV radiation to the illumination system and a distributor which is arranged to convert the EUV radiation from each of the EUV sources into an intermediate beam of radiation. The intermediate beam of radiation is directed from the distributor in a first direction by a mirror surface. The distributor may include a rotationally driven mirror arrangement, the axis of rotation being non-parallel to the mirror surface.Type: GrantFiled: January 20, 2006Date of Patent: January 30, 2007Assignee: ASML Netherlands B.V.Inventors: Vadim Yevgenyevich Banine, Levinus Pieter Bakker, Jeroen Jonkers, Erik Roelof Loopstra
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Publication number: 20070001571Abstract: The invention relates to a method and a device for the generation of a plasma through electric discharge in a discharge space which contains at least two electrodes, at least one of which is constructed from a matrix material or carrier material, such that an erosion-susceptible region with an evaporation spot is formed at least by the current flow. To present a method or a device for the generation of a plasma by electric discharge, it is suggested that a sacrificial substrate (38) is provided at least at the evaporation spot, the boiling point of said lying below the melting point of the carrier material (30), such that charge carriers arising in the current flow are mainly generated from the sacrificial substrate (38).Type: ApplicationFiled: March 5, 2004Publication date: January 4, 2007Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V. GROENEWOUDSEWEG 1Inventors: Eric Bosch, Jeroen Jonkers, Willi Neff, Gunther Derra
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Publication number: 20060250599Abstract: A lithographic projection apparatus includes a reflector assembly, the reflector assembly includes a first and a second reflector extending in a direction of an optical axis, the first and second reflector each having a reflective surface, a backing surface and an entry section at respectively a first and a second distance from the optical axis, the first distance being larger than the second distance, rays deriving from a point on the optical axis being cut off by the entry sections of the first and second reflectors and being reflected on the reflective surface of the first reflector and defining a high radiation intensity zone and a low radiation intensity zone between the reflectors; a radial support member configured to support the reflectors extending in the low radiation intensity zone, wherein the radial support member creates a shade in a downstream direction of the optical axis and a virtual shade in an upstream direction of the optical axis; and a structure placed in the virtual shade.Type: ApplicationFiled: July 7, 2006Publication date: November 9, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Levinus Bakker, Jeroen Jonkers, Frank Schuurmans, Hugo Visser
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Publication number: 20060245044Abstract: The invention describes a method of manufacturing a filter for retaining a substance originating from a radiation source, which filter comprises a thin layer that is transparent to extreme ultraviolet and/or soft X-ray radiation and which may be used inter alia in a device for EUV lithography. It is proposed that the filter (10) is high-temperature-resistant so as to render possible its use in particular for high-power radiation sources.Type: ApplicationFiled: August 2, 2004Publication date: November 2, 2006Applicant: Koninklijke Philips Electronics N.V.Inventors: Rolf Apetz, Jeroen Jonkers
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Patent number: 7088424Abstract: A lithographic projection apparatus includes a radiation system configured to form a beam of radiation from radiation emitted by a radiation source, as well as a support configured to hold a patterning device, which when irradiated by the beam of radiation provides the beam of radiation with a pattern. A substrate table is configured to hold a substrate, and a projection system is configured to image an irradiated portion of the patterning device onto a target portion of the substrate. The radiation system further includes an aperture at a distance from the optical axis, a reflector which is placed behind the aperture when seen from the source and a structure placed in a low radiation intensive region behind the aperture.Type: GrantFiled: January 13, 2005Date of Patent: August 8, 2006Assignee: ASML Netherlands B.V.Inventors: Levinus Pieter Bakker, Jeroen Jonkers, Frank Jeroen Pieter Schuurmans, Hugo Matthieu Visser
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Publication number: 20060138960Abstract: The invention relates to a gas discharge lamp for EUV radiation with an anode (1) and a hollow cathode (2), wherein the hollow cathode (2) has at least two openings (3, 3?) and the anode (1) has a through hole (4), which is characterized in that the longitudinal axes (5, 5?) of the hollow cathode openings (3) have a common point of intersection S lying on the axis of symmetry (6) of the anode opening (4).Type: ApplicationFiled: November 28, 2003Publication date: June 29, 2006Applicant: Koninklijke Philips Electronics N.V.Inventors: Guenther Derra, Joseph Pankert, Willi Neff, Klaus Bergmann, Jeroen Jonkers
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Publication number: 20060114441Abstract: A lithographic apparatus includes an illumination system configured to provide a beam of radiation, a support configured to support a patterning device, a substrate table and a projection system. Furthermore, the lithographic apparatus includes a plurality of EUV sources for providing EUV radiation to the illumination system and a distributor which is arranged to convert the EUV radiation from each of the EUV sources into an intermediate beam of radiation. The intermediate beam of radiation is directed from the distributor in a first direction by a mirror surface. The distributor may include a rotationally driven mirror arrangement, the axis of rotation being non-parallel to the mirror surface.Type: ApplicationFiled: January 20, 2006Publication date: June 1, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Vadim Banine, Levinus Bakker, Jeroen Jonkers, Erik Loopstra
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Patent number: 7030963Abstract: A lithographic apparatus includes an illumination system configured to provide a beam of radiation, a support configured to support a patterning device, a substrate table and a projection system. Furthermore, the lithographic apparatus includes a plurality of EUV sources for providing EUV radiation to the illumination system and a distributor which is arranged to convert the EUV radiation from each of the EUV sources into an intermediate beam of radiation. The intermediate beam of radiation is directed from the distributor in a first direction by a mirror surface. The distributor may include a rotationally driven mirror arrangement, the axis of rotation being non-parallel to the mirror surface.Type: GrantFiled: May 3, 2004Date of Patent: April 18, 2006Assignee: ASML Netherlands B.V.Inventors: Vadim Yevgenyevich Banine, Levinus Pieter Bakker, Jeroen Jonkers, Erik Roelof Loopstra
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Patent number: 7026629Abstract: A lithographic apparatus includes a first space containing a plasma source and also containing a source gas which may have a high absorption of radiation at the wavelength of the projection beam of the apparatus, this gas being restricted from entering the remainder of the lithographic system by a second space containing a buffer gas having a low absorption at the wavelength of the projection beam of the apparatus. The pressure of the buffer gas is lower than or equal to that of the source gas.Type: GrantFiled: December 26, 2002Date of Patent: April 11, 2006Assignee: ASML Netherlands B.V.Inventors: Leon Bakker, Jeroen Jonkers, Hugo Matthieu Visser
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Patent number: 6987275Abstract: A controlled aperture provides an opening through a barrier separating two parts of the apparatus to enable a pulse of radiation to be radiated from one part of the apparatus to the a second part. The controlled aperture closes the opening between the pulses of radiation to minimize the gas flow between the first and second parts.Type: GrantFiled: March 26, 2003Date of Patent: January 17, 2006Assignee: ASML Netherlands B.V.Inventors: Levinus Pieter Bakker, Jeroen Jonkers, Antonius Johannes Josephus Van Dijsseldonk, Marcel Mathijs Theodore Marie Dierichs
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Publication number: 20050243297Abstract: A lithographic apparatus includes an illumination system configured to provide a beam of radiation, a support configured to support a patterning device, a substrate table and a projection system. Furthermore, the lithographic apparatus includes a plurality of EUV sources for providing EUV radiation to the illumination system and distribution means which are arranged to convert the EUV radiation from each of the EUV sources into an intermediate beam of radiation. The intermediate beam of radiation is directed from the distribution means in a first direction by a mirror surface. The distribution means further comprise a rotationally driven mirror arrangement, the axis of rotation being non-parallel to the mirror surface.Type: ApplicationFiled: May 3, 2004Publication date: November 3, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Vadim Banine, Levinus Bakker, Jeroen Jonkers, Erik Loopstra
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Publication number: 20050148210Abstract: A lithographic projection apparatus includes a radiation system configured to form a beam of radiation from radiation emitted by a radiation source, as well as a support configured to hold a patterning device, which when irradiated by the beam of radiation provides the beam of radiation with a pattern. A substrate table is configured to hold a substrate, and a projection system is configured to image an irradiated portion of the patterning device onto a target portion of the substrate. The radiation system further includes an aperture at a distance from the optical axis, a reflector which is placed behind the aperture when seen from the source and a structure placed in a low radiation intensive region behind the aperture.Type: ApplicationFiled: January 13, 2005Publication date: July 7, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Levinus Bakker, Jeroen Jonkers, Frank Pieter Schuurmans, Hugo Visser