Patents by Inventor Ji Cui

Ji Cui has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200226803
    Abstract: A method and system for image reconstruction are provided. A projection image of a projection object may be obtained. A processed projection image may be generated based on the projection image through one or more pre-process operations. A reconstructed image including an artifact may be reconstructed based on the processed projection image. The artifact may be a detector edge artifact, a projection object edge artifact, and a serrated artifact. The detector edge artifact, the projection object edge artifact, and the serrated artifact may be removed from the reconstructed image.
    Type: Application
    Filed: March 23, 2020
    Publication date: July 16, 2020
    Applicant: SHANGHAI UNITED IMAGING HEALTHCARE CO., LTD.
    Inventors: Le YANG, Hao CHEN, Kai CUI, Juan FENG, Yecheng HAN, Yange MA, Jie NIU, Ji QI, Wanli TENG, Na ZHANG, Haihua ZHOU
  • Publication number: 20200190361
    Abstract: The invention provides a chemical-mechanical polishing composition comprising an abrasive, a self-stopping agent, an aqueous carrier, and a cationic polymer. This invention additionally provides a method suitable for polishing a dielectric substrate.
    Type: Application
    Filed: February 21, 2020
    Publication date: June 18, 2020
    Inventors: Alexander W. Hains, Juyeon Chang, Tina C. Li, Viet Lam, Ji Cui, Sarah Brosnan, Chul Woo Nam
  • Patent number: 10639766
    Abstract: Described are materials and methods for processing (polishing or planarizing) a substrate that contains pattern dielectric material using a polishing composition (aka “slurry”) and an abrasive pad, e.g., CMP processing.
    Type: Grant
    Filed: June 26, 2018
    Date of Patent: May 5, 2020
    Assignee: Cabot Microelectronics Corporation
    Inventors: Viet Lam, Ji Cui
  • Patent number: 10619075
    Abstract: The invention provides a chemical-mechanical polishing composition comprising an abrasive, a self-stopping agent, an aqueous carrier, and optionally, a cationic polymer, and provides a method suitable for polishing a substrate.
    Type: Grant
    Filed: March 23, 2018
    Date of Patent: April 14, 2020
    Assignee: Cabot Microelectronics Corporation
    Inventors: Alexander W. Hains, Juyeon Chang, Tina C. Li, Viet Lam, Ji Cui, Sarah Brosnan, Chul Woo Nam
  • Patent number: 10619076
    Abstract: The invention provides a chemical-mechanical polishing composition comprising an abrasive, a self-stopping agent, an aqueous carrier, and optionally, a cationic polymer, and provides a method suitable for polishing a substrate.
    Type: Grant
    Filed: February 8, 2019
    Date of Patent: April 14, 2020
    Assignee: Cabot Microelectronics Corporation
    Inventors: Alexander W. Hains, Juyeon Chang, Tina C. Li, Viet Lam, Ji Cui, Sarah Brosnan, Chul Woo Nam
  • Patent number: 10600214
    Abstract: A method and system for image reconstruction are provided. A projection image of a projection object may be obtained. A processed projection image may be generated based on the projection image through one or more pre-process operations. A reconstructed image including an artifact may be reconstructed based on the processed projection image. The artifact may be a detector edge artifact, a projection object edge artifact, and a serrated artifact. The detector edge artifact, the projection object edge artifact, and the serrated artifact may be removed from the reconstructed image.
    Type: Grant
    Filed: November 23, 2018
    Date of Patent: March 24, 2020
    Assignee: SHANGHAI UNITED IMAGING HEALTHCARE CO., LTD.
    Inventors: Le Yang, Haihua Zhou, Juan Feng, Kai Cui, Ji Qi, Na Zhang, Hao Chen, Jie Niu, Yecheng Han, Wanli Teng, Yange Ma
  • Publication number: 20200081701
    Abstract: The present disclosure provides an information upgrading method, an apparatus, and a storage medium for an automatic driving vehicle, where the method includes: determining a target in-vehicle client to be upgraded and acquiring target upgrade information; and further, transmitting an upgrade indication message carrying the target upgrade information to the target in-vehicle client by an over-the-air (OTA) technology, so that the target in-vehicle client performs an upgrade according to the target upgrade information. It can be seen that the effective information upgrading of the in-vehicle client in the automatic driving vehicle is achieved, and the user experience of the in-vehicle client and/or the automatic driving vehicle is improved.
    Type: Application
    Filed: July 16, 2019
    Publication date: March 12, 2020
    Applicant: Baidu Online Network Technology (Beijing) Co., Ltd.
    Inventors: Yue CUI, Yaling ZHANG, Ji TAO
  • Publication number: 20200081822
    Abstract: The application provides a method and an apparatus for testing an autonomous vehicle, and a storage medium, where the method includes: obtaining detection information of the autonomous vehicle, where the detection information is configured to indicate the test result obtained when the detecting apparatus in the autonomous vehicle tests the autonomous vehicle; further, generating a test interface according to the obtained detection information, and displaying the test interface, so that the tester can visually check various test information of the autonomous vehicle during the road running test, thereby not only saving a labor cost, but also improving a test efficiency of the road running test.
    Type: Application
    Filed: July 17, 2019
    Publication date: March 12, 2020
    Applicant: Baidu Online Network Technology (Beijing) Co., Ltd.
    Inventors: Yue Cui, Yaling Zhang, Ji Tao, Hongshun Shen
  • Publication number: 20200079392
    Abstract: The present disclosure provides an automatic driving system, fault alarm method and device, the system includes a primary monitoring device, an auxiliary monitoring device, at least one device to be detected and a fault alarm device; where the primary monitoring device and the auxiliary monitoring device are respectively connected to each device to be detected and the fault alarm device; the primary monitoring device and the auxiliary monitoring device are connected, the primary monitoring device and the auxiliary monitoring device respectively perform a fault detection on the each device to be detected; and if it is detected that any device to be detected is abnormal, the primary monitoring device or the auxiliary monitoring device sends an alarm instruction to the fault alarm device, so that the fault alarm device performs an alarm operation according to the alarm instruction.
    Type: Application
    Filed: July 18, 2019
    Publication date: March 12, 2020
    Applicant: Baidu Online Network Technology (Beijing) Co., ltd.
    Inventors: Yue Cui, Yaling Zhang, Ji Tao
  • Publication number: 20200082648
    Abstract: The disclosure provides an automatic driving system, a vehicle control method and a device. The automatic driving system includes a main monitoring equipment, a secondary monitoring equipment, at least one equipment to be detected, and a standby equipment corresponding to each equipment to be detected; the primary monitoring equipment and the secondary monitoring equipment are connected to each equipment to be detected and the standby equipment corresponding to each equipment to be detected; the primary monitoring equipment is connected to the secondary monitoring equipment. The above system and control method ensure that an equipment of the vehicle is is abnormal, the vehicle can be switched to a standby equipment of the equipment in time, which greatly reduces an incidence of a safety accident caused by a failure of the equipment.
    Type: Application
    Filed: July 15, 2019
    Publication date: March 12, 2020
    Applicant: Baidu Online Network Technology (Beijing) Co., Ltd.
    Inventors: Yue CUI, Yaling ZHANG, Ji TAO
  • Patent number: 10586355
    Abstract: A method and system for image reconstruction are provided. A projection image of a projection object may be obtained. A processed projection image may be generated based on the projection image through one or more pre-process operations. A reconstructed image including an artifact may be reconstructed based on the processed projection image. The artifact may be a detector edge artifact, a projection object edge artifact, and a serrated artifact. The detector edge artifact, the projection object edge artifact, and the serrated artifact may be removed from the reconstructed image.
    Type: Grant
    Filed: November 23, 2018
    Date of Patent: March 10, 2020
    Assignee: SHANGHAI UNITED IMAGING HEALTHCARE CO., LTD.
    Inventors: Le Yang, Haihua Zhou, Juan Feng, Kai Cui, Ji Qi, Na Zhang, Hao Chen, Jie Niu, Yecheng Han, Wanli Teng, Yange Ma
  • Patent number: 10521055
    Abstract: The present disclosure relates to a terminal, a method, an apparatus and an electronic device for determining a mode of operation. In some aspects, the terminal includes: an ultrasonic wave emitter, an ultrasonic wave signal path and a microphone. The ultrasonic wave emitter is arranged inside the terminal, a first hole is arranged on a side-frame of the terminal for accommodating the microphone, an ultrasonic wave signal emitted by the ultrasonic wave emitter propagates from inside of the terminal to a surface of the terminal via the ultrasonic wave signal path, the microphone is configured to receive an ultrasonic echo signal of the ultrasonic wave signal, and to determine whether the terminal is touched according to the ultrasonic echo signal.
    Type: Grant
    Filed: September 27, 2017
    Date of Patent: December 31, 2019
    Assignee: Beijing Xiaomi Mobile Software Co., Ltd.
    Inventors: Ji Xiang, Yuan Gao, Hongtu Cui
  • Patent number: 10522341
    Abstract: Described is a post-CMP cleaning solution and methods useful to remove residue from a CMP substrate or to prevent formation of residue on a surface of a CMP substrate.
    Type: Grant
    Filed: November 29, 2017
    Date of Patent: December 31, 2019
    Assignee: Cabot Microelectronics Corporation
    Inventors: Helin Huang, Ji Cui
  • Publication number: 20190211228
    Abstract: The invention provides a method of chemically-mechanically polishing a substrate comprising providing a substrate comprising a tungsten layer on a surface of the substrate and a silicon oxide layer on a surface of the substrate, providing a chemical-mechanical polishing composition comprising a tungsten layer and a silicon oxide layer using a chemical-mechanical polishing composition comprising a) surface-modified colloidal silica particles, comprising a negatively-charged group on the surface of the particles, wherein the surface-modified colloidal silica particles have a negative charge, a particle size of about 90 nm to about 350 nm, and a zeta potential of about ?20 mV to about ?70 mV at a pH of about 2, b) an iron compound, c) a stabilizing agent, and d) an aqueous carrier, and contacting the substrate with a polishing pad and the chemical mechanical polishing composition to polish the substrate.
    Type: Application
    Filed: January 9, 2018
    Publication date: July 11, 2019
    Inventors: William J. Ward, Matthew E. Carnes, Ji Cui, Kim Long
  • Publication number: 20190202466
    Abstract: Illustrative embodiments of the disclosure provide a method and apparatus for assessing a comfort level of a driving system. A method for generating an assessment model for comfort level in a driving system comprises acquiring a first assessment from a user on a comfort level of at least one traveling operation of the driving system, and acquiring a measurement of a traveling indicator of the driving system when performing the at least one traveling operation. The method further comprises generating the assessment model for the comfort level in the driving system based on the first assessment, the measurement of the traveling indicator, and a second assessment from the user on an overall comfort level of the driving system.
    Type: Application
    Filed: December 5, 2018
    Publication date: July 4, 2019
    Inventors: Yunyan Hu, Yaling Zhang, Yue Cui, Simin Sui, Ji Tao, Hui Zhang
  • Publication number: 20190185716
    Abstract: The invention provides a chemical-mechanical polishing composition comprising an abrasive, a self-stopping agent, an aqueous carrier, and optionally, a cationic polymer, and provides a method suitable for polishing a substrate.
    Type: Application
    Filed: February 8, 2019
    Publication date: June 20, 2019
    Inventors: Alexander W. HAINS, Juyeon CHANG, Tina C. LI, Viet LAM, Ji CUI, Sarah BROSNAN, Chul Woo NAM
  • Publication number: 20190100677
    Abstract: The invention provides a chemical-mechanical polishing composition comprising (a) an abrasive selected from the group consisting of alumina, ceria, titania, zirconia, and combinations thereof, wherein the abrasive is surface-coated with a copolymer comprising a combination of sulfonic acid monomeric units and carboxylic acid monomeric units a combination of sulfonic acid monomeric units and phosphonic acid monomeric units, (b) an oxidizing agent, and (c) water, wherein the polishing composition has a pH of about 2 to about 5. The invention further provides a method of chemically-mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. Typically, the substrate comprises tungsten or cobalt and silicon oxide.
    Type: Application
    Filed: October 3, 2017
    Publication date: April 4, 2019
    Inventors: Ji CUI, Helin HUANG, Kevin P. DOCKERY, Pankaj K. SINGH, Hung-Tsung HUANG, Chih-Hsien CHIEN
  • Publication number: 20180297169
    Abstract: Described are materials and methods for processing (polishing or planarizing) a substrate that contains pattern dielectric material using a polishing composition (aka “slurry”) and an abrasive pad, e.g., CMP processing.
    Type: Application
    Filed: June 26, 2018
    Publication date: October 18, 2018
    Inventors: Viet LAM, Ji CUI
  • Publication number: 20180244956
    Abstract: The invention provides a chemical-mechanical polishing composition comprising an abrasive, a self-stopping agent, an aqueous carrier, and optionally, a cationic polymer, and provides a method suitable for polishing a substrate.
    Type: Application
    Filed: March 23, 2018
    Publication date: August 30, 2018
    Inventors: Alexander W. HAINS, Juyeon CHANG, Tina C. LI, Viet LAM, Ji CUI, Sarah BROSNAN, Chul Woo NAM
  • Patent number: 10029345
    Abstract: Described are materials and methods for processing (polishing or planarizing) a substrate that contains pattern dielectric material using a polishing composition (aka “slurry”) and an abrasive pad, e.g., CMP processing.
    Type: Grant
    Filed: July 12, 2016
    Date of Patent: July 24, 2018
    Assignee: Cabot Microelectronics Corporation
    Inventors: Viet Lam, Ji Cui