Patents by Inventor Ji Cui

Ji Cui has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180184900
    Abstract: The invention relates to the field of pulse diagnosis technology, more particularly, to a Bluetooth pulse diagnosis bracelet and a method for transmitting pulse data; the Bluetooth pulse diagnosis bracelet comprises: an acquisition unit and a Bluetooth transmission unit; the Bluetooth transmission unit further comprises: an information acquisition module and a transmission module; the method comprises: STEP S1, the Bluetooth pulse diagnosis bracelet monitoring the pulse data in real time; STEP S2, the Bluetooth pulse diagnosis bracelet acquiring the Bluetooth control information sent from the remote-connected intelligent terminal; STEP S3, the Bluetooth pulse diagnosis bracelet determining the meanings of the Bluetooth control information, and when the Bluetooth control information represents the communication is permitted, going to Step 4; STEP S4, the Bluetooth pulse diagnosis bracelet transmits the pulse data to the intelligent terminal according to the method of Bluetooth transmission.
    Type: Application
    Filed: July 6, 2016
    Publication date: July 5, 2018
    Inventors: Jiatuo XU, Ji CUI, Liping TU, Zhifeng ZHANG, Yimin BAO, Longtao CUI, Jingbin HUANG
  • Publication number: 20180166273
    Abstract: Described is a post-CMP cleaning solution and methods useful to remove residue from a CMP substrate or to prevent formation of residue on a surface of a CMP substrate.
    Type: Application
    Filed: November 29, 2017
    Publication date: June 14, 2018
    Inventors: Helin HUANG, Ji CUI
  • Publication number: 20170066944
    Abstract: Described are materials and methods for processing (polishing or planarizing) a substrate that contains pattern dielectric material using a polishing composition (aka “slurry”) and an abrasive pad, e.g., CMP processing.
    Type: Application
    Filed: August 31, 2016
    Publication date: March 9, 2017
    Inventors: Ji CUI, Viet LAM, Steven GRUMBINE
  • Publication number: 20170014969
    Abstract: Described are materials and methods for processing (polishing or planarizing) a substrate that contains pattern dielectric material using a polishing composition (aka “slurry”) and an abrasive pad, e.g., CMP processing.
    Type: Application
    Filed: July 12, 2016
    Publication date: January 19, 2017
    Inventors: Viet LAM, Ji CUI
  • Patent number: 9188284
    Abstract: This disclosure relates to a natural gas absorption device that includes (1) at least one porous, flexible container that has an average pore diameter and is permeable to natural gas, (2) a natural gas absorption material at least partially disposed in the container, the material having a volume average diameter larger than the average pore diameter of the container, and (3) a storage tank having an opening, the tank enclosing the container and the natural gas absorption material.
    Type: Grant
    Filed: November 27, 2012
    Date of Patent: November 17, 2015
    Assignee: Luon Energy LLC
    Inventors: Nie Luo, Ji Cui, Lizhang Yang
  • Patent number: 8889096
    Abstract: The invention provides a method of inhibiting the accumulation of DSP scale in the liquor circuit of Bayer process equipment. The method includes adding one or more particular silane based small molecules to the liquor fluid circuit. These scale inhibitors reduce DSP scale formation and thereby increase fluid throughput, increase the amount of time Bayer process equipment can be operational and reduce the need for expensive and dangerous acid washes of Bayer process equipment. As a result, the invention provides a significant reduction in the total cost of operating a Bayer process.
    Type: Grant
    Filed: February 25, 2011
    Date of Patent: November 18, 2014
    Assignee: Nalco Company
    Inventors: Timothy La, John D. Kildea, Kevin L. O'Brien, Everett C. Phillips, Kailas B. Sawant, David H. Slinkman, Frederick J. Swiecinski, Ji Cui
  • Publication number: 20140193532
    Abstract: This invention relates to novel compositions and methods of use by which the compositions of this invention are applied topically to one or more body parts of at least two individuals who bring said body parts into contact with the other individual and, when said body parts come into contact with each other, permit the formulations to interact and thereby achieve an unexpected sensation to each individual.
    Type: Application
    Filed: March 10, 2014
    Publication date: July 10, 2014
    Applicant: McNeil-PPC, Inc.
    Inventors: Nawaz Ahmad, Cheng-Ji Cui, Bryant Ison
  • Publication number: 20140103250
    Abstract: The invention provides a chemical-mechanical polishing composition comprising coated ?-alumina particles, an organic carboxylic acid, and water. The invention also provides a chemical-mechanical polishing composition comprising an abrasive having a negative zeta potential in the polishing composition, an organic carboxylic acid, at least one alkyls disulfonate surfactant, and water, wherein the polishing composition does not further comprise a heterocyclic compound. The abrasive is colloidally stable in the polishing composition. The invention further provides methods of polishing a substrate with the aforesaid polishing compositions.
    Type: Application
    Filed: December 18, 2013
    Publication date: April 17, 2014
    Inventors: Ji CUI, Steven GRUMBINE, Glenn WHITENER, Chih-An LIN
  • Patent number: 8668913
    Abstract: This invention relates to novel compositions and methods of use by which the compositions of this invention are applied topically to one or more body parts of at least two individuals who bring said body parts into contact with the other individual and, when said body parts come into contact with each other, permit the formulations to interact and thereby achieve an unexpected sensation to each individual.
    Type: Grant
    Filed: August 21, 2007
    Date of Patent: March 11, 2014
    Assignee: Personal Products Company
    Inventors: Nawaz Ahmad, Cheng-Ji Cui, Bryant Ison
  • Patent number: 8623766
    Abstract: The invention provides a chemical-mechanical polishing composition comprising coated ?-alumina particles, an organic carboxylic acid, and water. The invention also provides a chemical-mechanical polishing composition comprising an abrasive having a negative zeta potential in the polishing composition, an organic carboxylic acid, at least one alkyldiphenyloxide disulfonate surfactant, and water, wherein the polishing composition does not further comprise a heterocyclic compound. The abrasive is colloidally stable in the polishing composition. The invention further provides methods of polishing a substrate with the aforesaid polishing compositions.
    Type: Grant
    Filed: September 20, 2011
    Date of Patent: January 7, 2014
    Assignee: Cabot Microelectronics Corporation
    Inventors: Ji Cui, Steven Grumbine, Glenn Whitener, Chih-An Lin
  • Publication number: 20130343970
    Abstract: The invention provides methods and compositions for inhibiting the accumulation of DSP scale in the liquor circuit of Bayer process equipment. The method includes adding one or more particular silane based small molecules to the liquor fluid circuit. These scale inhibitors reduce DSP scale formation and thereby increase fluid throughput, increase the amount of time Bayer process equipment can be operational and reduce the need for expensive and dangerous acid washes of Bayer process equipment. As a result, the invention provides a significant reduction in the total cost of operating a Bayer process.
    Type: Application
    Filed: August 27, 2013
    Publication date: December 26, 2013
    Applicant: Nalco Company
    Inventors: Timothy La, Ji Cui, John D. Kildea, David H. Slinkman
  • Patent number: 8545776
    Abstract: The invention provides a method of inhibiting the accumulation of DSP scale in the liquor circuit of Bayer process equipment. The method includes adding one or more particular silane based small molecules to the liquor fluid circuit. These scale inhibitors reduce DSP scale formation and thereby increase fluid throughput, increase the amount of time Bayer process equipment can be operational and reduce the need for expensive and dangerous acid washes of Bayer process equipment. As a result, the invention provides a significant reduction in the total cost of operating a Bayer process.
    Type: Grant
    Filed: September 25, 2009
    Date of Patent: October 1, 2013
    Assignee: Nalco Company
    Inventors: Timothy La, Ji Cui, John D. Kildea, David H. Slinkman
  • Publication number: 20130220479
    Abstract: This disclosure relates to a natural gas absorption device that includes (1) at least one porous, flexible container that has an average pore diameter and is permeable to natural gas, (2) a natural gas absorption material at least partially disposed in the container, the material having a volume average diameter larger than the average pore diameter of the container, and (3) a storage tank having an opening, the tank enclosing the container and the natural gas absorption material.
    Type: Application
    Filed: November 27, 2012
    Publication date: August 29, 2013
    Inventors: Nie Luo, Ji Cui, Lizhang Yang
  • Patent number: 8501010
    Abstract: Diallcoxysilane and monoalkoxysilane functionalized polymers were applied as scale control agents in Bayer process. The polymer inhibitors reduced the quantity of aluminum silicate scale formed in spent liquor while significantly changed the morphology of the scale. Also a method is provided for reducing aluminum silicate scale of Bayer process by adding the dialkoxysilane and monoalkoxysilane functionalized polymer into the Bayer liquor stream.
    Type: Grant
    Filed: October 5, 2012
    Date of Patent: August 6, 2013
    Assignee: Nalco Company
    Inventor: Ji Cui
  • Patent number: 8455673
    Abstract: Disclosed and claimed is a composition that comprises a dispersion in a solvent of a compound comprising the reaction product of (1) a polyamine in which a plurality of amine groups are bonded to at least one radical comprising alkylene or arylene groups that separate the polyamine nitrogen atoms by at least four intermediate atoms in a chain, and (2) a silane which carries a plurality of silicon-bonded hydrolysable groups, and a silicon-bonded organic group that is covalently reactive with and which bonds with an amine group, to provide a reaction product molecule which comprises an average of at least about 2.5 of said silane groups per molecule. Some of these materials show superior advantage as a paint primer and some provide excellent corrosion resistance.
    Type: Grant
    Filed: November 24, 2010
    Date of Patent: June 4, 2013
    Assignee: Nalco Company
    Inventor: Ji Cui
  • Publication number: 20130072021
    Abstract: The invention provides a chemical-mechanical polishing composition comprising coated ?-alumina particles, an organic carboxylic acid, and water. The invention also provides a chemical-mechanical polishing composition comprising an abrasive having a negative zeta potential in the polishing composition, an organic carboxylic acid, at least one alkyldiphenyloxide disulfonate surfactant, and water, wherein the polishing composition does not further comprise a heterocyclic compound. The abrasive is colloidally stable in the polishing composition. The invention further provides methods of polishing a substrate with the aforesaid polishing compositions.
    Type: Application
    Filed: September 20, 2011
    Publication date: March 21, 2013
    Inventors: Ji Cui, Steven Grumbine, Glenn Whitener, Chih-An Lin
  • Patent number: 8372999
    Abstract: Disclosed and claimed is a novel protective coating for metal surfaces. The protective coating includes one part by weight of the organosilane-modified silica nanoparticles made by the disclosed process and further includes from 0.3 to 3 parts by weight of the reaction product of (1) a compound comprising a polyamine in which a plurality of amine groups are bonded to at least one radical selected from the group consisting of hydrocarbon and hydrocarbon ether groups that separate nitrogen atoms of said amine groups by at least four intermediate atoms in a chain, and (2) a silane which carries a plurality of silicon-bonded hydrolyzable groups and a silicon-bonded organic group that is covalently reactive to and which bonds with said amine group, said silane also comprising hydrolyzable groups, to provide a reaction product molecule which comprises an average of 2.5 to 3.5 silane groups per molecule.
    Type: Grant
    Filed: January 27, 2012
    Date of Patent: February 12, 2013
    Assignee: Nalco Company
    Inventors: Brian T. Holland, Ji Cui, Timothy S. Keizer
  • Patent number: 8282834
    Abstract: Dialkoxysilane and Monoalkoxysilane functionalized polymers were applied as scale control agents in Bayer process. The polymer inhibitors reduced the quantity of aluminum silicate scale formed in spent liquor while significantly changed the morphology of the scale. Also a method is provided for reducing aluminum silicate scale of Bayer process by adding the dialkoxysilane and monoalkoxysilane functionalized polymer into the Bayer liquor stream.
    Type: Grant
    Filed: September 25, 2009
    Date of Patent: October 9, 2012
    Assignee: Nalco Company
    Inventor: Ji Cui
  • Publication number: 20120125233
    Abstract: Disclosed and claimed is a novel protective coating for metal surfaces. The protective coating includes one part by weight of the organosilane-modified silica nanoparticles made by the disclosed process and further includes from 0.3 to 3 parts by weight of the reaction product of (1) a compound comprising a polyamine in which a plurality of amine groups are bonded to at least one radical selected from the group consisting of hydrocarbon and hydrocarbon ether groups that separate nitrogen atoms of said amine groups by at least four intermediate atoms in a chain, and (2) a silane which carries a plurality of silicon-bonded hydrolyzable groups and a silicon-bonded organic group that is covalently reactive to and which bonds with said amine group, said silane also comprising hydrolyzable groups, to provide a reaction product molecule which comprises an average of 2.5 to 3.5 silane groups per molecule.
    Type: Application
    Filed: January 27, 2012
    Publication date: May 24, 2012
    Inventors: Brian T. Holland, Ji Cui, Timothy S. Keizer
  • Publication number: 20120048744
    Abstract: Provided is an electrochemical cell for generating hydrogen peroxide (H202) directly from water, and an application thereof. The electrochemical cell includes: water-soluble electrolyte; an electrode structure A, in which hydrogen peroxide is generated by oxidizing water containing city water (CW) or electrolytes when voltage of time dependant polarity is applied; and an electrode structure B, in which hydrogen peroxide is generated by reducing water of the water-soluble electrolyte when the voltage of time dependant polarity is applied, wherein the polarity reversal of the voltage Ve is performed periodically or non-periodically according to the time between positive (+) voltage and negative (?) voltage.
    Type: Application
    Filed: May 12, 2010
    Publication date: March 1, 2012
    Applicant: PETRATRON, INC.
    Inventors: Kyu-Jung Kim, Nie Luo, Ji Cui