Patents by Inventor Ji-Won Choi

Ji-Won Choi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230271334
    Abstract: A cleaning system is provided. The cleaning system includes a robot cleaner and a station. The robot cleaner includes a pad fixing part on which a cleaning pad is detachably mounted, a lifter to lift a part of the robot cleaner at which the pad fixing part is positioned, and a pad detacher to detach the cleaning pad mounted on the pad fixing part. The station includes a pad storage box in which a cleaning pad that is to be provided to the robot cleaner is stored, a pad coupling part on which a cleaning pad that is to be coupled to the robot cleaner is rested, and a pad supplier to supply the cleaning pad stored in the pad storage box to the pad coupling part.
    Type: Application
    Filed: April 27, 2023
    Publication date: August 31, 2023
    Inventors: Sin Ae KIM, Byoung In LEE, Dong Woo HA, Seok Man HONG, Dong Jun KIM, Ji Won CHOI
  • Patent number: 11733543
    Abstract: Disclosed herein is a smart wearable lens mounted with an all-solid-state thin film secondary battery including a flexible substrate, a cathode current collector, a cathode, a solid electrolyte, an anode, and an anode current collector. The smart wearable lens mounted with the all-solid-state thin film secondary battery may be stably and continuously supplied with power and has a low self-discharge rate. In addition, the smart wearable lens may minimize aversion when humans are wearing the smart wearable lens and be suitably used for a curved lens, especially a micro-lens such as a contact lens.
    Type: Grant
    Filed: July 25, 2018
    Date of Patent: August 22, 2023
    Assignee: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Ji-Won Choi, Yong-Won Song, Hyunjung Yi, Jin Sang Kim, Chong Yun Kang, Seong Keun Kim, Seung Hyub Baek, Sang Tae Kim, Hyun Seok Lee
  • Publication number: 20230235188
    Abstract: An ink composition includes an acrylic resin including a polymerization product of a first monomer having a hydroxyl group, a second monomer having an epoxy group, a third monomer having an acrylate group, and a fourth monomer having a substituted or unsubstituted phenyl group, a first curing agent having an isocyanate group, and a second curing agent having an amine group. Durability and abrasion resistance of a window may be improved.
    Type: Application
    Filed: March 31, 2023
    Publication date: July 27, 2023
    Inventors: Ji Won Choi, Dongho Kim, Dongwoon Lee
  • Patent number: 11705549
    Abstract: Disclosed is a transparent anode thin film comprising a transparent anode active material layer, wherein the transparent anode active material layer comprises a Si-based anode active material having a composition represented by the following [Chemical Formula 1]: SiNx??[Chemical Formula 1] (wherein 0<x?1.5).
    Type: Grant
    Filed: November 19, 2020
    Date of Patent: July 18, 2023
    Assignee: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Ji-Won Choi, Jin Sang Kim, Chong Yun Kang, Seung Hyub Baek, Seong Keun Kim, Hyun-Cheol Song, Sang Tae Kim, Hyun Seok Lee
  • Patent number: 11667041
    Abstract: A cleaning system is provided. The cleaning system includes a robot cleaner and a station. The robot cleaner includes a pad fixing part on which a cleaning pad is detachably mounted, a lifter to lift a part of the robot cleaner at which the pad fixing part is positioned, and a pad detacher to detach the cleaning pad mounted on the pad fixing part. The station includes a pad storage box in which a cleaning pad that is to be provided to the robot cleaner is stored, a pad coupling part on which a cleaning pad that is to be coupled to the robot cleaner is rested, and a pad supplier to supply the cleaning pad stored in the pad storage box to the pad coupling part.
    Type: Grant
    Filed: November 4, 2019
    Date of Patent: June 6, 2023
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sin Ae Kim, Byoung In Lee, Dong Woo Ha, Seok Man Hong, Dong Jun Kim, Ji Won Choi
  • Publication number: 20230145077
    Abstract: Disclosed is a method of manufacturing an epitaxy oxide thin film of enhanced crystalline quality, and an epitaxy oxide thin film manufactured thereby according to the present invention. With respect to the manufacturing method of the epitaxy oxide thin film, which epitaxially grows an orientation film with an oxide capable of being oriented to (001), (110), and (111) on a single crystal Si substrate, because time required for raising a temperature of the orientation film up to an annealing temperature at room temperature is extremely minimized, thermal stress arising from the large difference in thermal expansion coefficients between the substrate and the orientation film is controlled, so crystalline quality of the epitaxy oxide thin film can be enhanced. Moreover, various epitaxial functional oxides are integrated into the thin film of enhanced crystalline quality so that a novel electronic device can be embodied.
    Type: Application
    Filed: October 7, 2022
    Publication date: May 11, 2023
    Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Seung Hyub BAEK, Hyung-Jin CHOI, Sung Hoon HUR, Ji-Soo JANG, Jung Ho YOON, Seong Keun KIM, Hyun Cheol SONG, Chong Yun KANG, Ji-Won CHOI, Jin Sang KIM, Byung Chul Lee
  • Patent number: 11634600
    Abstract: An ink composition includes an acrylic resin including a polymerization product of a first monomer having a hydroxyl group, a second monomer having an epoxy group, a third monomer having an acrylate group, and a fourth monomer having a substituted or unsubstituted phenyl group, a first curing agent having an isocyanate group, and a second curing agent having an amine group. Durability and abrasion resistance of a window may be improved.
    Type: Grant
    Filed: May 1, 2020
    Date of Patent: April 25, 2023
    Assignees: SAMSUNG DISPLAY CO., LTD., DONG YANG INK CO., LTD.
    Inventors: Ji Won Choi, Dongho Kim, Dongwoon Lee
  • Publication number: 20230121190
    Abstract: An injection mold apparatus of a pressure vessel includes an upper mold including an internal surface in a shape corresponding to a shape of an external surface of the pressure vessel provided with a nozzle with a closed inlet; a lower mold including an external surface in a shape corresponding to the shape of the internal surface of the pressure vessel, engaged with the upper mold, and formed with an air injection passage therein; an ejector injecting air through the air injection passage between the lower mold and the taken-out pressure vessel; an air injection rate setting device configured for controlling an injection rate of the air injected between the lower mold and the pressure vessel using the ejector; and a pneumatic controller interlocking with the air injection rate setting device and controlling a pressure of air injected.
    Type: Application
    Filed: October 7, 2022
    Publication date: April 20, 2023
    Inventors: Ha Yong LEE, Ju IL KIM, Se Young KIM, Eui Hwan SON, Min Woo CHU, Ji Won CHOI, Su Jeong KANG, Kyuyoung LEE, Young Rok YOON, Keon Chul LEE, Sukjoo HONG, Tae-Oh KWON
  • Patent number: 11618834
    Abstract: A method of manufacturing an ink blocking layer for a display device, an ink blocking layer for a display device, and a display device are provided. The method of manufacturing an ink blocking layer for a display device includes: preparing a main material including an epoxy monomer having three or more epoxy groups and a curing agent including an acid and an amine; and mixing the main material with the curing agent to prepare an epoxy resin.
    Type: Grant
    Filed: May 26, 2021
    Date of Patent: April 4, 2023
    Assignees: Samsung Display Co., Ltd., Dong Yang Ink Co., Ltd.
    Inventors: Dong Ho Kim, Ji Won Choi
  • Publication number: 20230067422
    Abstract: The present invention relates to a derivative compound in which a biphenyl group is introduced into an aminoalkanoic acid, a stereoisomer thereof, or a pharmaceutically acceptable salt thereof. The compound of the present invention exhibits excellent antifungal and fungicidal effects. Furthermore, the compound of the present invention exhibits a synergistic effect when used in combination with a conventional antifungal agent. Furthermore, the compound of the present invention provides broad-spectrum antifungal activity against a wide range of fungal pathogens. Therefore, the compound of the present invention may be widely used in fields requiring treatment with antifungal or fungicidal agents against human pathogenic fungi and animal pathogenic fungi, and phytopathogenic fungi.
    Type: Application
    Filed: September 19, 2022
    Publication date: March 2, 2023
    Inventors: Ki Duk PARK, Jong Hyun PARK, Hyeon Ji KIM, Ye Rim LEE, Siwon KIM, Ji Won CHOI, Seul Ki YEON, Jong-Seung LEE, Yong-Sun BAHN, Eunji CHEONG, Kyung-Tae LEE, Joohyeon HONG
  • Publication number: 20230056812
    Abstract: The present invention relates to a derivative compound in which a biphenyl group is introduced into an aminoalkanoic acid, a stereoisomer thereof, or a pharmaceutically acceptable salt thereof. The compound of the present invention exhibits excellent antifungal and fungicidal effects. Furthermore, the compound of the present invention exhibits a synergistic effect when used in combination with a conventional antifungal agent. Furthermore, the compound of the present invention provides broad-spectrum antifungal activity against a wide range of fungal pathogens. Therefore, the compound of the present invention may be widely used in fields requiring treatment with antifungal or fungicidal agents against human pathogenic fungi and animal pathogenic fungi, and phytopathogenic fungi.
    Type: Application
    Filed: September 19, 2022
    Publication date: February 23, 2023
    Inventors: Ki Duk PARK, Jong Hyun PARK, Hyeon Ji KIM, Ye Rim LEE, Siwon KIM, Ji Won CHOI, Seul Ki YEON, Jong-Seung LEE, Yong-Sun BAHN, Eunji CHEONG, Kyung-Tae LEE, Joohyeon HONG
  • Publication number: 20230058826
    Abstract: Provided is an apparatus for generating direct current using continuous polarization change of piezoelectric materials. For example, a piezoelectric direct current generator includes a first electrode, a polarized piezoelectric material layer disposed on a first surface of the first electrode, and a second electrode disposed on a surface opposite to the first electrode and coupled to move along the piezoelectric material layer while pressing the piezoelectric material layer.
    Type: Application
    Filed: August 17, 2022
    Publication date: February 23, 2023
    Inventors: Hyun Cheol SONG, Chong Yun KANG, Sung Hoon HUR, Seung Hyub BAEK, Seong Keun KIM, Ji Won CHOI, Jung Ho YOON, Hyun Soo KIM
  • Publication number: 20230053855
    Abstract: The present invention relates to a derivative compound in which a biphenyl group is introduced into an aminoalkanoic acid, a stereoisomer thereof, or a pharmaceutically acceptable salt thereof. The compound of the present invention exhibits excellent antifungal and fungicidal effects. Furthermore, the compound of the present invention exhibits a synergistic effect when used in combination with a conventional antifungal agent. Furthermore, the compound of the present invention provides broad-spectrum antifungal activity against a wide range of fungal pathogens. Therefore, the compound of the present invention may be widely used in fields requiring treatment with antifungal or fungicidal agents against human pathogenic fungi and animal pathogenic fungi, and phytopathogenic fungi.
    Type: Application
    Filed: September 19, 2022
    Publication date: February 23, 2023
    Inventors: Ki Duk PARK, Jong Hyun PARK, Hyeon Ji KIM, Ye Rim LEE, Siwon KIM, Ji Won CHOI, Seul Ki YEON, Jong-Seung LEE, Yong-Sun BAHN, Eunji CHEONG, Kyung-Tae LEE, Joohyeon HONG
  • Publication number: 20230010061
    Abstract: A semiconductor substrate with oxide single crystal heterostructures, to which a sacrificial layer, an epitaxy functional oxide thin film having a perovskite structure and a metal layer are grown on an oxide single crystal substrate, prepared another metal layer on a semiconductor substrate, and bonded the metal layer of the oxide single crystal substrate to the metal layer of the semiconductor substrate to be face each other, and separated the oxide single crystal substrate by selectively etching and removing only the sacrificial layer after the bonding.
    Type: Application
    Filed: June 13, 2022
    Publication date: January 12, 2023
    Inventors: SEUNG HYUB BAEK, RUIGUANG NING, Jae-Hoon HAN, Byung Chul LEE, Jungho YOON, Hyun-Cheol SONG, Seong Keun KIM, CHONG YUN KANG, Ji-Won CHOI, JIN SANG KIM
  • Publication number: 20230001678
    Abstract: A window module including a window, a first print layer, an ink layer, and a protective layer covering the ink layer. The protective layer includes a polymer resin polymerized from monomers including a first monomer which is an acrylic monomer substituted with a hydroxy group, a second monomer having an epoxy group, and at least one of a third monomer having a substituted or unsubstituted phenyl group or a fourth monomer which is an acrylic monomer having a substituted or unsubstituted bicyclic alkyl group, and thus, has excellent durability, chemical resistance, and abrasion resistance.
    Type: Application
    Filed: August 11, 2022
    Publication date: January 5, 2023
    Inventors: JI WON CHOI, Sangeun MOON, Dongho KIM, Sookkyung YOO
  • Patent number: 11479526
    Abstract: The present invention relates to a derivative compound in which a biphenyl group is introduced into an aminoalkanoic acid, a stereoisomer thereof, or a pharmaceutically acceptable salt thereof. The compound of the present invention exhibits excellent antifungal and fungicidal effects. Furthermore, the compound of the present invention exhibits a synergistic effect when used in combination with a conventional antifungal agent. Furthermore, the compound of the present invention provides broad-spectrum antifungal activity against a wide range of fungal pathogens. Therefore, the compound of the present invention may be widely used in fields requiring treatment with antifungal or fungicidal agents against human pathogenic fungi and animal pathogenic fungi, and phytopathogenic fungi.
    Type: Grant
    Filed: December 27, 2021
    Date of Patent: October 25, 2022
    Assignee: AMTIXBIO CO., LTD.
    Inventors: Ki Duk Park, Jong Hyun Park, Hyeon Ji Kim, Ye Rim Lee, Siwon Kim, Ji Won Choi, Seul Ki Yeon, Jong-Seung Lee, Yong-Sun Bahn, Eunji Cheong, Kyung-Tae Lee, Joohyeon Hong
  • Patent number: 11426985
    Abstract: A window module including a window, a first print layer, an ink layer, and a protective layer covering the ink layer. The protective layer includes a polymer resin polymerized from monomers including a first monomer which is an acrylic monomer substituted with a hydroxy group, a second monomer having an epoxy group, and at least one of a third monomer having a substituted or unsubstituted phenyl group or a fourth monomer which is an acrylic monomer having a substituted or unsubstituted bicyclic alkyl group, and thus, has excellent durability, chemical resistance, and abrasion resistance.
    Type: Grant
    Filed: May 15, 2020
    Date of Patent: August 30, 2022
    Assignees: SAMSUNG DISPLAY CO., LTD., DONG YANG INK CO., LTD.
    Inventors: Ji Won Choi, Sangeun Moon, Dongho Kim, Sookkyung Yoo
  • Patent number: 11417516
    Abstract: Provided is a dielectric layer that has a rock salt structure in a room temperature stable phase. The dielectric layer is made of a compound having a chemical formula of BexM1-xO, where M includes one of alkaline earth metals and x has a value greater than 0 and not greater than 0.19. A semiconductor memory device also is provided that includes a capacitor composed of a lower electrode; a dielectric layer disposed on the lower electrode; and an upper electrode disposed on the dielectric layer, wherein the dielectric layer has a rocksalt structure in a room temperature stable phase and is made of a compound having a chemical formula shown below, BexM1-xO, where M comprises an alkaline earth metal and x has a value greater than 0 and not greater than 0.19.
    Type: Grant
    Filed: December 19, 2018
    Date of Patent: August 16, 2022
    Assignee: Korea Institute of Science and Technology
    Inventors: Seong Keun Kim, Woo Chui Lee, Sang Tae Kim, Hyun Cheol Song, Seung Hyub Baek, Ji Won Choi, Jin Sang Kim, Chong Yun Kang, Christopher W. Bielawski, Jung Hwan Yum, Eric S. Larsen
  • Patent number: 11398483
    Abstract: A method of manufacturing an electrode layer and a method of manufacturing a capacitor using the same are provided. The method of manufacturing the electrode layer includes performing a first sub-cycle sequentially providing a tin precursor and an oxygen source on a substrate, performing a second sub-cycle sequentially providing a tin precursor, a tantalum precursor, and an oxygen source on the substrate on which the first sub-cycle is performed, and repeating a cycle including the first sub-cycle and the second sub-cycle to form a tantalum-doped tin oxide layer on the substrate. A tantalum concentration in the tantalum-doped tin oxide layer is determined by the tin precursor provided in the second sub-cycle.
    Type: Grant
    Filed: April 21, 2020
    Date of Patent: July 26, 2022
    Assignee: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Sang Tae Kim, Hyun-Cheol Song, Seung Hyub Baek, Ji-Won Choi, Jin Sang Kim, Chong Yun Kang, Seong Keun Kim
  • Publication number: 20220144755
    Abstract: The present invention relates to a derivative compound in which a biphenyl group is introduced into an aminoalkanoic acid, a stereoisomer thereof, or a pharmaceutically acceptable salt thereof. The compound of the present invention exhibits excellent antifungal and fungicidal effects. Furthermore, the compound of the present invention exhibits a synergistic effect when used in combination with a conventional antifungal agent. Furthermore, the compound of the present invention provides broad-spectrum antifungal activity against a wide range of fungal pathogens. Therefore, the compound of the present invention may be widely used in fields requiring treatment with antifungal or fungicidal agents against human pathogenic fungi and animal pathogenic fungi, and phytopathogenic fungi.
    Type: Application
    Filed: December 27, 2021
    Publication date: May 12, 2022
    Inventors: Ki Duk PARK, Jong Hyun Park, Hyeon Ji Kim, Ye Rim Lee, Siwon Kim, Ji Won Choi, Seul Ki Yeon, Jong-Seung Lee, Yong-Sun Bahn, Eunji Cheong, Kyung-Tae Lee, Joohyeon Hong