Patents by Inventor Jianping Zhao

Jianping Zhao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11022569
    Abstract: A low-angle self-swinging type computed tomography (CT) device is provided, having an X-ray accelerator and a plurality of rows of detectors and includes a slip ring, such that the slip ring with the accelerator and the detectors thereon is capable of performing a single-pendulum reciprocating movement while an object to be inspected passes through the slip ring, a three-dimensional CT image of the object is displayed, thereby achieving accurate inspection for large-scale objects, such as van containers.
    Type: Grant
    Filed: July 9, 2018
    Date of Patent: June 1, 2021
    Assignee: NUCTECH COMPANY LIMITED
    Inventors: Kejun Kang, Zhiqiang Chen, Yuanjing Li, Li Zhang, Ziran Zhao, Yaohong Liu, Jianping Gu, Liang Li, Yuxiang Xing
  • Patent number: 11005546
    Abstract: An antenna system is disclosed. The system includes: N radio frequency channels, configured to send a radio frequency signal to drive one or two columns of M columns of antennas, and N<M?2N; the M columns of antennas, configured to receive radio frequency signals, where only one column of two columns of antennas driven on a same radio frequency channel are connected to one of the M?N phase shifters, and is also connected to one of the M?N power splitters; the M?N power splitters, where any of the M?N power splitters is configured to split power for the two columns of antennas connected to the radio frequency channel; and the M?N phase shifters, where any of the M?N phase shifters is configured to adjust a phase of a radio frequency signal received by an antenna connected to the phase shifter.
    Type: Grant
    Filed: September 26, 2019
    Date of Patent: May 11, 2021
    Assignee: HUAWEI TECHNOLOGIES CO., LTD.
    Inventors: Qingming Xie, Jianping Zhao, Yang Geng
  • Patent number: 10991554
    Abstract: A system and method for using plasma to treat a substrate are described. The system includes a substrate holder disposed within a plasma processing system, and arranged to support a substrate, a first signal generator for coupling a first signal at a first frequency to plasma in the plasma processing system, and a second signal generator for coupling a second signal at a second frequency to plasma in the plasma processing system, wherein the second frequency being less than the first frequency. The system further includes an amplitude modulation circuit for modulating the first signal between a high amplitude state and a low amplitude state in response to an amplitude modulation signal, and a timing circuit configured to define the amplitude modulation signal that synchronizes the amplitude modulation of the first signal with a target phase for each cycle of the second signal.
    Type: Grant
    Filed: September 21, 2018
    Date of Patent: April 27, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Jianping Zhao, Peter L. G. Ventzek, Barton Lane
  • Publication number: 20210082667
    Abstract: A method of operating a plasma processing system includes determining a first frequency to power a first plasma within a plasma processing chamber. The method includes generating a first amplified RF signal having the first frequency at a broadband power amplifier. The method includes supplying the first amplified RF signal to process a substrate disposed in the plasma processing chamber using a first plasma process including the first plasma. The method includes determining a second frequency to power a second plasma within the plasma processing chamber. The method includes generating a second amplified RF signal having the second frequency at the broadband power amplifier. The method includes supplying the second amplified RF signal to process the substrate disposed in the plasma processing chamber using a second plasma process including the second plasma.
    Type: Application
    Filed: December 17, 2019
    Publication date: March 18, 2021
    Inventors: Jianping Zhao, Peter Ventzek
  • Publication number: 20210082666
    Abstract: An exemplary plasma processing system includes a plasma processing chamber, an electrode for powering plasma in the plasma processing chamber, a tunable radio frequency (RF) signal generator configured to output a first signal at a first frequency and a second signal at a second frequency. The second frequency is at least 1.1 times the first frequency. The system includes a broadband power amplifier coupled to the tunable RF signal generator, the first frequency and the second frequency being within an operating frequency range of the broadband power amplifier. The output of the broadband power amplifier is coupled to the electrode. The broadband power amplifier is configured to supply, at the output, first power at the first frequency and second power at the second frequency.
    Type: Application
    Filed: September 17, 2019
    Publication date: March 18, 2021
    Inventors: Jianping Zhao, Peter Ventzek
  • Publication number: 20210036437
    Abstract: An antenna system, a feeding network reconfiguration method, and an apparatus is disclosed. The antenna system may include an antenna array, a reconfigurable network unit, a control unit, and K radio frequency channels. The antenna array may include L antenna subarrays, and the reconfigurable network unit may divide the L antenna subarrays into M antenna subarray groups, and separately connect the M antenna subarray groups to the K radio frequency channels; any one of the K radio frequency channels may perform signal processing on a signal received by a connected antenna subarray group and/or a to-be-transmitted signal; and the control unit may control the reconfigurable network unit to adjust a mapping relationship between an antenna subarray group connected to each radio frequency channel and the antenna subarrays.
    Type: Application
    Filed: October 18, 2020
    Publication date: February 4, 2021
    Inventors: Guanxi Zhang, Long Shen, Yongyong Wang, Zhongming Qin, Jianping Zhao
  • Patent number: 10879610
    Abstract: This application discloses an antenna apparatus, including an antenna array and an adjustable phase shifter. In each row of antenna elements in the antenna array, antenna elements on a same radio frequency RF channel are spaced by M antenna elements, where M is used to determine a quantity of beams in a first beam group and a quantity of beams in a second beam group, and M is an integer greater than 1. When the adjustable phase shifter is at a first angle, the first beam group is obtained; or when the adjustable phase shifter is at a second angle, the second beam group is obtained. This application discloses a beam adjustment method. In this application, a plurality of beams can be formed in a horizontal direction, and the beams are grouped by using an adjustable phase shifter, thereby effectively improving beam adjustment flexibility.
    Type: Grant
    Filed: December 5, 2019
    Date of Patent: December 29, 2020
    Assignee: HUAWEI TECHNOLOGIES CO., LTD.
    Inventors: Yannian Lou, Ni Ma, Wangjun Wu, Peng Chen, Jianping Zhao, Qingming Xie
  • Patent number: 10868363
    Abstract: An antenna system and a signal transmission method are provided. The antenna system includes: an antenna array and a matching network, where an S parameter matrix of the matching network matches an S parameter matrix of the antenna array and the matching network is configured to perform pre-distortion on a to-be-transmitted signal or de-distortion on a received signal, and the antenna array is configured to transmit the pre-distorted to-be-transmitted signal. According to the antenna system and the signal transmission method provided in this application, pre-distortion may be performed on a signal that needs to be transmitted by the antenna array or de-distortion may be performed on a signal received by the antenna array, so as to configure energy that is coupled from each antenna array element to an adjacent antenna array element, thereby reducing a coupling effect between antenna array elements.
    Type: Grant
    Filed: June 4, 2018
    Date of Patent: December 15, 2020
    Assignee: HUAWEI TECHNOLOGIES CO., LTD.
    Inventors: Ni Ma, Yueheng Li, Wei Gu, Tuanjie Xue, Jianping Zhao
  • Patent number: 10796916
    Abstract: A processing system is disclosed, having a power transmission element with an interior cavity that propagates electromagnetic energy proximate to a continuous slit in the interior cavity. The continuous slit forms an opening between the interior cavity and a substrate processing chamber. The electromagnetic energy may generate an alternating charge in the continuous slit that enables the generation of an electric field that may propagate into the processing chamber. The electromagnetic energy may be conditioned prior to entering the interior cavity to improve uniformity or stability of the electric field. The conditioning may include, but is not limited to, phase angle, field angle, and number of feeds into the interior cavity.
    Type: Grant
    Filed: March 30, 2018
    Date of Patent: October 6, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Merritt Funk, Jianping Zhao, Lee Chen
  • Patent number: 10743195
    Abstract: According to a communication method and a base station that are provided in embodiments of the present invention, the base station transmits a broad beam that covers a sector of the base station and narrow beams whose coverage areas completely fall within a coverage area of the broad beam, which implements that under a premise that a coverage area of the sector of the base station maintains unchanged by using the broad beam, enhanced coverage of the sector is further achieved by using the narrow beams, thereby improving spectral efficiency. In the solutions, a sector coverage area of the broad beam transmitted by the base station still maintains unchanged, and therefore, a coverage relationship between sectors is not affected. In addition, neither an additional site backhaul resource nor additional standardization support is required in the solutions.
    Type: Grant
    Filed: May 15, 2018
    Date of Patent: August 11, 2020
    Assignee: HUAWEI TECHNOLOGIES, CO., LTD.
    Inventors: Yan Peng, Hongrui Zhou, Jing Yang, Ni Ma, Jianping Zhao
  • Publication number: 20200136226
    Abstract: A feeding device is disclosed. The feeding device includes a body and at least one first port, the body includes at least one first contour port, and each of the at least one first contour port corresponds to one of the at least one first port; and the first contour port includes at least two sub-ports, and the at least two sub-ports of the first contour port are connected, by using at least one power splitter, to the first port corresponding to the first contour port. In the foregoing implementation solution, the first contour port is divided into several sub-ports, and the first port and the several sub-ports are connected by using the at least one power splitter.
    Type: Application
    Filed: December 24, 2019
    Publication date: April 30, 2020
    Inventors: Qingming Xie, Gaonan Zhou, Qiuyan Liang, Jianping Zhao
  • Publication number: 20200112099
    Abstract: This application discloses an antenna apparatus, including an antenna array and an adjustable phase shifter. In each row of antenna elements in the antenna array, antenna elements on a same radio frequency RF channel are spaced by M antenna elements, where M is used to determine a quantity of beams in a first beam group and a quantity of beams in a second beam group, and M is an integer greater than 1. When the adjustable phase shifter is at a first angle, the first beam group is obtained; or when the adjustable phase shifter is at a second angle, the second beam group is obtained. This application discloses a beam adjustment method. In this application, a plurality of beams can be formed in a horizontal direction, and the beams are grouped by using an adjustable phase shifter, thereby effectively improving beam adjustment flexibility.
    Type: Application
    Filed: December 5, 2019
    Publication date: April 9, 2020
    Inventors: Yannian LOU, Ni MA, Wangjun WU, Peng CHEN, Jianping ZHAO, Qingming XIE
  • Publication number: 20200021346
    Abstract: An antenna system is disclosed. The system includes: N radio frequency channels, configured to send a radio frequency signal to drive one or two columns of M columns of antennas, and N<M?2N; the M columns of antennas, configured to receive radio frequency signals, where only one column of two columns of antennas driven on a same radio frequency channel are connected to one of the M?N phase shifters, and is also connected to one of the M?N power splitters; the M?N power splitters, where any of the M?N power splitters is configured to split power for the two columns of antennas connected to the radio frequency channel; and the M?N phase shifters, where any of the M?N phase shifters is configured to adjust a phase of a radio frequency signal received by an antenna connected to the phase shifter.
    Type: Application
    Filed: September 26, 2019
    Publication date: January 16, 2020
    Inventors: Qingming XIE, Jianping ZHAO, Yang GENG
  • Patent number: 10424462
    Abstract: A processing system is disclosed, having a multiple power transmission elements with an interior cavity that may be arranged around a plasma processing chamber. Each of the power transmission elements may propagates electromagnetic energy that may be used to generate plasma within the plasma process chamber. The power transmission elements may be designed to accommodate a range of power and frequency ranges that range from 500 W to 3500 W and 0.9 GHz to 9 GHz. In one embodiment, the power transmission elements may include a rectangular interior cavity that enables the generation of a standing wave with two or more modes. In another embodiment, the power transmission elements may have a cylindrical interior cavity that may be placed along the plasma processing chamber or have one end of the cylinder placed against the plasma processing chamber.
    Type: Grant
    Filed: November 6, 2014
    Date of Patent: September 24, 2019
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Merritt Funk, Megan Doppel, John Entralgo, Jianping Zhao, Toshihisa Nozawa
  • Patent number: 10388528
    Abstract: This disclosure relates to a plasma processing system for controlling plasma density near the edge or perimeter of a substrate that is being processed. The plasma processing system may include a plasma chamber that can receive and process the substrate using plasma for etching the substrate, doping the substrate, or depositing a film on the substrate. This disclosure relates to a plasma processing system that may be configured to enable non-ambipolar diffusion to counter ion loss to the chamber wall. The plasma processing system may include a ring cavity coupled to the plasma processing system that is in fluid communication with plasma generated in the plasma processing system. The ring cavity may be coupled to a power source to form plasma that may diffuse ions into the plasma processing system to minimize the impact of ion loss to the chamber wall.
    Type: Grant
    Filed: May 25, 2016
    Date of Patent: August 20, 2019
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Lee Chen, Zhiying Chen, Jianping Zhao, Merritt Funk
  • Patent number: 10381745
    Abstract: Embodiments of the present invention provide a beam forming network, including: a first 180-degree bridge for equal-power division, a 180-degree bridge for unequal-power division, a 90-degree phase shifter, and a second 180-degree bridge for equal-power division. A coupling port of a sum input port of the first 180-degree bridge for equal-power division is connected to a difference input port of the 180-degree bridge for unequal-power division, a straight-through port of the sum input port of the first 180-degree bridge for equal-power division is connected to an input port of the 90-degree phase shifter, an output port of the 90-degree phase shifter is connected to a difference input port of the second 180-degree bridge for equal-power division, and a straight-through port of a sum input port of the 180-degree bridge for unequal-power division is connected to a sum input port of the second 180-degree bridge for equal-power division.
    Type: Grant
    Filed: January 26, 2017
    Date of Patent: August 13, 2019
    Assignee: Huawei Technologies Co., Ltd.
    Inventors: Yang Geng, Guanxi Zhang, Jianping Zhao
  • Patent number: 10375812
    Abstract: A surface wave plasma (SWP) source couples microwave (MW) energy into a processing chamber through, for example, a radial line slot antenna, to result in a low mean electron energy (Te). An ICP source, is provided between the SWP source and the substrate and is energized at a low power, less than 100 watts for 300 mm wafers, for example, at about 25 watts. The ICP source couples energy through a peripheral electric dipole coil to reduce capacitive coupling.
    Type: Grant
    Filed: March 28, 2016
    Date of Patent: August 6, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Jianping Zhao, Lee Chen, Merritt Funk, Radha Sundararajan
  • Patent number: 10354841
    Abstract: The present invention provides a SWP (surface wave plasma) processing system that does not create underdense conditions when operating at low microwave power and high gas pressure, thereby achieving a larger process window. The DC ring subsystem can be used to adjust the edge to central plasma density ratio to achieve uniformity control in the SWP processing system.
    Type: Grant
    Filed: April 7, 2016
    Date of Patent: July 16, 2019
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Jianping Zhao, Lee Chen, Barton G. Lane, Merritt Funk, Radha Sundararajan
  • Patent number: 10354837
    Abstract: The invention is an plasma processing system with a plasma chamber for processing semiconductor substrates, comprising: a radio frequency or microwave power generator coupled to the plasma chamber; a low pressure vacuum system coupled to the plasma chamber; and at least one chamber surface that is configured to be exposed to a plasma, the chamber surface comprising: a YxOyFz layer that comprises Y in a range from 20 to 40%, O in a range from greater than zero to less than or equal to 60%, and F in a range of greater than zero to less than or equal to 75%. Alternatively, the YxOyFz layer can comprise Y in a range from 25 to 40%, O in a range from 40 to 55%, and F in a range of 5 to 35% or Y in a range from 25 to 40%, O in a range from 5 to 40%, and F in a range of 20 to 70%.
    Type: Grant
    Filed: January 12, 2018
    Date of Patent: July 16, 2019
    Assignee: Tokyo Electron Limited
    Inventor: Jianping Zhao
  • Patent number: 10333220
    Abstract: Embodiments of the present invention disclose an interleaved polarized multi-beam antenna, including: at least one dual-polarized antenna element, where the dual-polarized antenna element includes a +45-degree-polarized first antenna element and a ?45-degree-polarized second antenna element; and a first Butler matrix and a second Butler matrix, where the first Butler matrix is connected to the first antenna element so that the first antenna element transmits a first target beam, and the second Butler matrix is connected to the second antenna element so that the second antenna element transmits a second target beam. The first target beam and the second target beam in the embodiments are alternately arranged, and any two adjacent first target beam and second target beam have different polarization characteristics; therefore, complexity, a loss, and costs of implementation of a Butler matrix can be effectively reduced, and interference between adjacent multiplexed beams can be effectively decreased.
    Type: Grant
    Filed: June 28, 2017
    Date of Patent: June 25, 2019
    Assignee: HUAWEI TECHNOLOGIES CO., LTD.
    Inventors: Jianping Zhao, Yang Geng, Qingming Xie