Abstract: Provided is an anti-canine PD-1 antibody, capable of binding with canine PD-1 and comprising three light-chain complementary determining regions (CDR1-3) or a conservatively modified variant maintaining its function and/or three heavy-chain complementary determining regions (CDR1-3) or a conservatively modified variant maintaining its function. Further provided is an application of the anti-canine PD-1 antibody in the preparation of medicines for treating canine cancers.

Abstract: An antenna system, a feeding network reconfiguration method, and an apparatus is disclosed. The antenna system may include an antenna array, a reconfigurable network unit, a control unit, and K radio frequency channels. The antenna array may include L antenna subarrays, and the reconfigurable network unit may divide the L antenna subarrays into M antenna subarray groups, and separately connect the M antenna subarray groups to the K radio frequency channels; any one of the K radio frequency channels may perform signal processing on a signal received by a connected antenna subarray group and/or a to-be-transmitted signal; and the control unit may control the reconfigurable network unit to adjust a mapping relationship between an antenna subarray group connected to each radio frequency channel and the antenna subarrays.

Abstract: A plasma processing system includes a plasma chamber configured to contain a plasma, a shutter chamber fluidically coupled to the plasma chamber via a first orifice, a mass spectrometer fluidically coupled to the shutter chamber, and a shutter disposed in the shutter chamber between the first orifice and the mass spectrometer in the path of a particle beam. The first orifice is configured to generate the particle beam from the plasma using a pressure differential between the shutter chamber and the plasma chamber. The mass spectrometer includes an ionizer configured to ionize species of the particle beam by sweeping through a range of electron energies in a plurality of energy steps. The shutter is configured to open and close during each of the plurality of energy steps.

Abstract: An environment-friendly impregnation solution includes in percentage by weight: 1-15% of blocked isocyanate, 0.5-10% of special amino resin, 10-50% of rubber latex, 1-5% of auxiliaries, and the balance of water, wherein the sum of the weight percentage of each component is 100%. A method for preparing the environment-friendly impregnation solution includes adding blocked isocyanate and auxiliary A into water and stirring uniformly to obtain Composition 1; adding auxiliary B into Composition 1 and stirring uniformly to obtain Composition 2; adding special amino resin into Composition 2 and stirring uniformly, then subjecting the same to grinding to obtain Composition 3; adding rubber latex into Composition 3 and stirring uniformly to obtain the environment-friendly impregnation solution, followed by packaging. The impregnation solution of the invention does not contain toxic and harmful substances such as formaldehyde and resorcinol, and the preparation method thereof is simple.

Abstract: A system includes a plasma chamber coupled to a power source, and an impedance matching network coupled between the power source and the plasma chamber, wherein the impedance matching network comprises an L-shaped network and a first adjustable inductor coupled between an input of the plasma chamber and ground, and wherein the impedance matching network is configured such that, in a predetermined frequency range, an impedance of the impedance matching network and the plasma chamber is substantially equal to an impedance of the power source.

Abstract: The present disclosure relates to a curved conformal frequency selective surface (FSS) radome. The radome includes a dielectric radome and a curved conformal FSS array arranged on an outer wall of the dielectric radome, where the dielectric radome includes a dome, a circular truncated cone and a hollow cylinder which are integrally formed from top to bottom, and the curved conformal FSS array is formed by periodically arraying foldable FSS units on an outer surface of the dielectric radome, the foldable FSS unit being of an axially symmetrical and centrally symmetrical gap structure, and having an overall shape consisting of foldable gaps on a left side, an upper side, a right side and a lower side, the four foldable gaps being sequentially connected in a square shape, and remaining parts of the foldable FSS unit except for the four foldable gaps being all metal patches.

Abstract: A feeding device is disclosed. The feeding device includes a body and at least one first port, the body includes at least one first contour port, and each of the at least one first contour port corresponds to one of the at least one first port; and the first contour port includes at least two sub-ports, and the at least two sub-ports of the first contour port are connected, by using at least one power splitter, to the first port corresponding to the first contour port. In the foregoing implementation solution, the first contour port is divided into several sub-ports, and the first port and the several sub-ports are connected by using the at least one power splitter.

Abstract: A method of operating a plasma processing system includes determining a first frequency to power a first plasma within a plasma processing chamber. The method includes generating a first amplified RF signal having the first frequency at a broadband power amplifier. The method includes supplying the first amplified RF signal to process a substrate disposed in the plasma processing chamber using a first plasma process including the first plasma. The method includes determining a second frequency to power a second plasma within the plasma processing chamber. The method includes generating a second amplified RF signal having the second frequency at the broadband power amplifier. The method includes supplying the second amplified RF signal to process the substrate disposed in the plasma processing chamber using a second plasma process including the second plasma.

Abstract: A plasma processing system includes a plasma chamber configured to contain a plasma, a shutter chamber fluidically coupled to the plasma chamber via a first orifice, a mass spectrometer fluidically coupled to the shutter chamber, and a shutter disposed in the shutter chamber between the first orifice and the mass spectrometer in the path of a particle beam. The first orifice is configured to generate the particle beam from the plasma using a pressure differential between the shutter chamber and the plasma chamber. The mass spectrometer includes an ionizer configured to ionize species of the particle beam by sweeping through a range of electron energies in a plurality of energy steps. The shutter is configured to open and close during each of the plurality of energy steps.

Abstract: A method of nitridation includes cyclically performing the following steps in situ within a processing chamber at a temperature less than about 400° C.: treating an unreactive surface of a substrate in the processing chamber to convert the unreactive surface to a reactive surface by exposing the unreactive surface to an energy flux, and nitridating the reactive surface using a nitrogen-based gas to convert the reactive surface to a nitride layer including a subsequent unreactive surface.

Abstract: A system includes a plasma chamber coupled to a power source, and an impedance matching network coupled between the power source and the plasma chamber, wherein the impedance matching network comprises an L-shaped network and a first adjustable inductor coupled between an input of the plasma chamber and ground, and wherein the impedance matching network is configured such that, in a predetermined frequency range, an impedance of the impedance matching network and the plasma chamber is substantially equal to an impedance of the power source.

Abstract: A lock assembly, comprising: a drive hub configured to be rotated in a first angular direction; a latch having a latch engaged position; a lock having a locked position; a first locking member configured such that, when the lock is in the locked position, the first locking member retains the latch in the latch engaged position; and a second locking member configured such that, when the lock is in the locked position, the second locking member prevents the drive hub from rotating in the first angular direction.

Abstract: An exemplary plasma processing system includes a plasma processing chamber, an electrode for powering plasma in the plasma processing chamber, a tunable radio frequency (RF) signal generator configured to output a first signal at a first frequency and a second signal at a second frequency. The second frequency is at least 1.1 times the first frequency. The system includes a broadband power amplifier coupled to the tunable RF signal generator, the first frequency and the second frequency being within an operating frequency range of the broadband power amplifier. The output of the broadband power amplifier is coupled to the electrode. The broadband power amplifier is configured to supply, at the output, first power at the first frequency and second power at the second frequency.

Abstract: A movable contact mechanism of a double-breakpoint circuit breaker comprises a front static contact having a first contact point at the rear end, a rear contact assembly having a connecting plate with a rear static contact at the front end, and a movable contact which are placed in the horizontal direction, wherein an insertion slot is formed in the front end of the rear static contact the front contact end of the movable static is equipped with a second contact point matched with the first contact point, and the rear insertion end of the movable contact is inserted into or separated from the insertion slot; and the opening or closing stroke of the first contact point and the second contact point is greater than the stroke that the rear insertion end of the movable contact is inserted into or separated from the insertion slot.

Abstract: A method of forming a carbon hard mask includes generating a radio frequency plasma including carbon-based ions by supplying continuous wave radio frequency power to a plasma processing chamber. The carbon-based ions have a first average ion energy. The method further includes adjusting the first average ion energy of the carbon-based ions to a second average ion energy by supplying continuous wave direct current power to the plasma processing chamber concurrently with the continuous wave radio frequency power and forming a carbon hard mask at a substrate within the plasma processing chamber by delivering the carbon-based ions having the second average ion energy to the substrate.

Abstract: An exemplary plasma processing system includes a plasma processing chamber, an electrode for powering plasma in the plasma processing chamber, a tunable radio frequency (RF) signal generator configured to output a first signal at a first frequency and a second signal at a second frequency. The second frequency is at least 1.1 times the first frequency. The system includes a broadband power amplifier coupled to the tunable RF signal generator, the first frequency and the second frequency being within an operating frequency range of the broadband power amplifier. The output of the broadband power amplifier is coupled to the electrode. The broadband power amplifier is configured to supply, at the output, first power at the first frequency and second power at the second frequency.

Abstract: A system and method for using plasma to treat a substrate are described. A plasma processing system includes a substrate holder arranged to support a substrate, a first signal generator for coupling a first signal at a first frequency to plasma in the plasma processing system, and a second signal generator for coupling a second signal at a second frequency that is less than the first frequency to the plasma in the plasma processing system. The system further includes a waveform generator configured to dynamically adjust a duty cycle of the second signal while the first signal is coupled to the plasma to spatially and temporally control the plasma density.

Abstract: A method for memory management for a browser of a terminal, a terminal, and a non-transitory computer-readable storage medium are provided. The method includes the following. Run the browser. During the running of the browser, monitor whether an operating system of the terminal running the browser fails to allocate memory to the browser. Redundant memory of the browser is released upon monitoring that the operating system fails to allocate the memory to the browser.

Abstract: An antenna system is disclosed. The system includes: N radio frequency channels, configured to send a radio frequency signal to drive one or two columns of M columns of antennas, and N<M?2N; the M columns of antennas, configured to receive radio frequency signals, where only one column of two columns of antennas driven on a same radio frequency channel are connected to one of the M?N phase shifters, and is also connected to one of the M?N power splitters; the M?N power splitters, where any of the M?N power splitters is configured to split power for the two columns of antennas connected to the radio frequency channel; and the M?N phase shifters, where any of the M?N phase shifters is configured to adjust a phase of a radio frequency signal received by an antenna connected to the phase shifter.

Abstract: A system and method for using plasma to treat a substrate are described. The system includes a substrate holder disposed within a plasma processing system, and arranged to support a substrate, a first signal generator for coupling a first signal at a first frequency to plasma in the plasma processing system, and a second signal generator for coupling a second signal at a second frequency to plasma in the plasma processing system, wherein the second frequency being less than the first frequency. The system further includes an amplitude modulation circuit for modulating the first signal between a high amplitude state and a low amplitude state in response to an amplitude modulation signal, and a timing circuit configured to define the amplitude modulation signal that synchronizes the amplitude modulation of the first signal with a target phase for each cycle of the second signal.