Patents by Inventor Jigeng Xu
Jigeng Xu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9862146Abstract: A method and apparatus for additive fabrication which provides a substrate which helps the newly hardened resin layer to separate from the substrate while providing a substrate of appropriate strength and durability. In an embodiment, the substrate is a multi-layer substrate comprising a transport layer and a structural layer, the transport layer comprising a polyolefin or a fluoropolymer, and the structural layer comprising a semi-crystal line thermoplastic polymer.Type: GrantFiled: June 15, 2012Date of Patent: January 9, 2018Assignee: DSM IP ASSETS B.V.Inventors: Marco Marcus Matheus Driessen, Michelle Elizabeth Seitz, Paulus Antonius Maria Steeman, John Edmond Southwell, Jigeng Xu, Richard Thomas, Micha Sandor Nicolaas Hubert Mulders
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Patent number: 9090020Abstract: The invention relates to a radiation curable composition comprising from about 50 wt % to about 70 wt % of a cycloaliphatic diepoxide, from about 5 wt % to about 15 wt % of a polyol, from about 5 wt % to about 15 wt % of an oxetane, from about 10 wt % to about 20 wt % of an aromatic diacrylate, a radical photoinitiator and a cationic photoinitiator. The invention further relates to a process for making a three dimensional article from the resin composition of the invention, to the three-dimensional article itself and to the use of the composition of the invention.Type: GrantFiled: November 13, 2013Date of Patent: July 28, 2015Assignee: DSM IP ASSETS B.V.Inventor: Jigeng Xu
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Patent number: 9034236Abstract: The invention relates to a substrate-based method for forming a three-dimensional object by additive fabrication by coating a liquid radiation curable resin comprising from 30 to 80 wt % of cationically curable compounds on a substrate, contacting the liquid radiation curable resin with a previously cured layer, selectively exposing the layer of liquid radiation curable layer to actinic radiation thereby forming a cured layer, separating the cured layer at the substrate, and repeating the steps a sufficient number of time in order to build up a three-dimensional object.Type: GrantFiled: December 16, 2010Date of Patent: May 19, 2015Assignee: DSM IP ASSETS B.V.Inventors: Jigeng Xu, Ken Dake
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Publication number: 20140353878Abstract: A method and apparatus for additive fabrication which provides a substrate which helps the newly hardened resin layer to separate from the substrate while providing a substrate of appropriate strength and durability. In an embodiment, the substrate is a multi-layer substrate comprising a transport layer and a structural layer, the transport layer comprising a polyolefin or a fluoropolymer, and the structural layer comprising a semi-crystal line thermoplastic polymer.Type: ApplicationFiled: June 15, 2012Publication date: December 4, 2014Applicant: DSM IP ASSETS B.V.Inventors: Marco Marcus Matheus Driessen, Michelle Elizabeth Seitz, Paulus Antonius Maria Steeman, John Edmond Southwell, Jigeng Xu, Richard Thomas, Micha Sandor Nicolaas Hubert Mulders
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Patent number: 8871133Abstract: Waste reduction, including hazardous waste reduction in photoimaging processes can be accomplished by improving diffusional resolution of cationic curable compositions. The addition of fluorinated polymers including fluorinated surfactants provides improved diffusional resolution in cationic and/or radical based photoimaging formulations allowing for image accuracy improvements, and reduced product and process waste quantity and disposal cost. These fluorinated surfactants also allow for increased cure speed, and non-hazardous constituent formulations that result in less wasted material and time.Type: GrantFiled: March 20, 2012Date of Patent: October 28, 2014Assignee: DSM IP Assets B.V.Inventors: John Lawton, Jigeng Xu, John Southwell, Gordon Smith, Willem D. Weenink
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Publication number: 20140093699Abstract: The invention relates to a radiation curable composition comprising from about 50 wt % to about 70 wt % of a cycloaliphatic diepoxide, from about 5 wt % to about 15 wt % of a polyol, from about 5 wt % to about 15 wt % of an oxetane, from about 10 wt % to about 20 wt % of an aromatic diacrylate, a radical photoinitiator and a cationic photoinitiator. The invention further relates to a process for making a three dimensional article from the resin composition of the invention, to the three-dimensional article itself and to the use of the composition of the invention.Type: ApplicationFiled: November 13, 2013Publication date: April 3, 2014Inventor: Jigeng XU
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Publication number: 20120259031Abstract: Disclosed is a photocurable resin composition for additive fabrication comprising a polymerizable component that is polymerizable by free-radical polymerization, cat ionic polymerization, or both free-radical polymerization and cationic polymerization, and a photoinitiating system capable of initiating the free-radical polymerization, cationic polymerization, or both free-radical polymerization and cationic polymerization. The photocurable resin composition is a liquid at about 25° C., and is capable of curing to provide a solid upon irradiation with light emitted from a light emitting diode (LED), wherein the light has a wavelength of from about 100 nm to about 900 nm. Also disclosed is a three-dimensional article prepared from the photocurable resin composition for additive fabrication, and a process for preparing three-dimensional articles by additive fabrication.Type: ApplicationFiled: December 16, 2010Publication date: October 11, 2012Applicant: DSM IP ASSETS, B.V.Inventors: Ken Dake, Jigeng Xu, Timothy Bishop
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Publication number: 20120251841Abstract: Liquid radiation curable resins for additive fabrication comprising an R-substituted aromatic thioetber triaryl sulfonmm tetrakis(pentafluorophenyl)borate cationic photoinitiator is disclosed. A process for using the liquid radiation curable resins for additive fabrication and three-dimensional articles made from the liquid radiation curable resins for additive fabrication are also disclosed.Type: ApplicationFiled: December 16, 2010Publication date: October 4, 2012Applicant: DSM IP ASSETS, B.V.Inventors: John Edmund Southwell, Jigeng Xu, Kangtai Ren, Ken Dake, Sam East
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Publication number: 20120251829Abstract: The invention relates to a substrate-based method for forming a three-dimensional object by additive fabrication by coating a liquid radiation curable resin comprising from 30 to 80 wt % of cationically curable compounds on a substrate, contacting the liquid radiation curable resin with a previously cured layer, selectively exposing the layer of liquid radiation curable layer to actinic radiation thereby forming a cured layer, separating the cured layer at the substrate, and repeating the steps a sufficient number of time in order to build up a three-dimensional object.Type: ApplicationFiled: December 16, 2010Publication date: October 4, 2012Applicant: DSM IP ASSETS, B.V.Inventors: Jigeng Xu, Ken Dake
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Publication number: 20120178020Abstract: Waste reduction, including hazardous waste reduction in photoimaging processes can be accomplished by improving diffusional resolution of cationic curable compositions. The addition of fluorinated polymers including fluorinated surfactants provides improved diffusional resolution in cationic and/or radical based photoimaging formulations allowing for image accuracy improvements, and reduced product and process waste quantity and disposal cost. These fluorinated surfactants also allow for increased cure speed, and non-hazardous constituent formulations that result in less wasted material and time.Type: ApplicationFiled: March 20, 2012Publication date: July 12, 2012Applicant: DSM IP ASSETSInventors: John LAWTON, Jigeng Xu, John Southwell, Gordon Smith, Willem D. Weenink
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Publication number: 20100201019Abstract: Waste reduction, including hazardous waste reduction in photoimaging processes can be accomplished by improving diffusional resolution of cationic curable compositions. The addition of fluorinated polymers including fluorinated surfactants provides improved diffusional resolution in cationic and/or radical based photoimaging formulations allowing for image accuracy improvements, and reduced product and process waste quantity and disposal cost. These fluorinated surfactants also allow for increased cure speed, and non-hazardous constituent formulations that result in less wasted material and time.Type: ApplicationFiled: January 28, 2010Publication date: August 12, 2010Inventors: John Lawton, Jigeng Xu, John Southwell, Gordon Smith, Willem D. Weenink
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Publication number: 20100001437Abstract: Waste reduction, including hazardous waste reduction in photoimaging processes can be accomplished by improving diffusional resolution of cationic curable compositions.Type: ApplicationFiled: April 29, 2009Publication date: January 7, 2010Applicant: DSM IP ASSETS B.V.Inventors: John LAWTON, Jigeng XU, John SOUTHWELL, Gordon SMITH, Willem D. WEENINK
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Publication number: 20080286450Abstract: Waste reduction, including hazardous waste reduction in photoimaging processes can be accomplished by improving diffusional resolution of cationic curable compositions. The addition of fluorinated polymers including fluorinated surfactants provides improved diffusional resolution in cationic and/or radical based photoimaging formulations allowing for image accuracy improvements, and reduced product and process waste quantity and disposal cost. These fluorinated surfactants also allow for increased cure speed, and non-hazardous constituent formulations that result in less wasted material and time.Type: ApplicationFiled: January 26, 2007Publication date: November 20, 2008Applicant: DSM IP Assets B.V.Inventors: John Lawton, Jigeng Xu, John Southwell, Gordon Smith, Willem Weenink
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Publication number: 20080103226Abstract: The invention relates to a radiation curable composition comprising from about 50 wt % to about 70 wt % of a cycloaliphatic diepoxide, from about 5 wt % to about 15 wt % of a polyol, from about 5 wt % to about 15 wt % of an oxetane, from about 10 wt % to about 20 wt % of an aromatic diacrylate, a radical photoinitiator and a cationic photoinitiator. The invention further relates to a process for making a three dimensional article from the resin composition of the invention, to the three-dimensional article itself and to the use of the composition of the invention.Type: ApplicationFiled: October 31, 2006Publication date: May 1, 2008Applicant: DSM IP ASSETS B.V.Inventor: Jigeng Xu
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Publication number: 20080064780Abstract: The invention relates to a radiation curable composition comprising relative to the total weight of the composition (A) 0-29 wt % of a cationically curable component having a linking aliphatic ester group, (B) 10-85 wt % of an epoxygroup containing component other than A, (C) 1-50 wt % of an oxetanegroup containing component, (D) 1-25 wt % of a multifunctional acrylate and a radical photoinitiator and a cationic photoinitiator.Type: ApplicationFiled: November 9, 2007Publication date: March 13, 2008Applicant: DSM IP Assets B.V.Inventors: Jens Thies, Aylvin Dias, John Lawton, David Winmill, Jigeng Xu, Xiaorong You
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Publication number: 20070154840Abstract: The invention relates to a radiation curable composition comprising relative to the total weight of the composition (A) 0-29 wt % of a cationically curable component having a linking aliphatic ester group, (B) 10-85 wt % of an epoxygroup containing component other than A, (C) 1-50 wt % of an oxetanegroup containing component, (D) 1-25 wt % of a multifunctional acrylate and a radical photoinitiator and a cationic photoinitiator.Type: ApplicationFiled: January 8, 2007Publication date: July 5, 2007Applicant: DSM IP Assets B.V.Inventors: Jens Thies, Aylvin Dias, John Lawton, David Winmill, Jigeng Xu, Xiaorong You
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Publication number: 20070149667Abstract: The present invention provides curable compositions and rapid prototyping processes using the same. In one embodiment, the compositions include one or more aromatic epoxies and one or more aliphatic epoxies which after full cure exhibit a heat deflection temperature of at least 105° C. and an elongation at break of at least 1.5%.Type: ApplicationFiled: January 11, 2007Publication date: June 28, 2007Applicant: DSM IP Assets B.V.Inventor: Jigeng Xu
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Patent number: 7183040Abstract: The invention relates to a radiation curable composition comprising relative to the total weight of the composition (A) 0–29 wt % of a cationically curable component having a linking aliphatic ester group, (B) 10–85 wt % of an epoxygroup containing component other than A, (C) 1–50 wt % of an oxetanegroup containing component, (D) 1–25 wt % of a multifunctional acrylate and a radical photoinitiator and a cationic photoinitiator.Type: GrantFiled: July 21, 2003Date of Patent: February 27, 2007Assignee: DSM IP Assets B.V.Inventors: Jens C Thies, Aylvin J. A. A. Dias, John A. Lawton, David L. Winmill, Jigeng Xu, Xiaorong You
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Publication number: 20060172230Abstract: Waste reduction, including hazardous waste reduction in photoimaging processes can be accomplished by improving diffusional resolution of cationic curable compositions. The addition of fluorinated polymers including fluorinated surfactants provides improved diffusional resolution in cationic and/or radical based photoimaging formulations allowing for image accuracy improvements, and reduced product and process waste quantity and disposal cost. These fluorinated surfactants also allow for increased cure speed, and non-hazardous constituent formulations that result in less wasted material and time.Type: ApplicationFiled: February 2, 2005Publication date: August 3, 2006Applicant: DSM IP Assets B.V.Inventors: John Lawton, Jigeng Xu, John Southwell, Gordon Smith, Willem Weenink
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Publication number: 20060073343Abstract: The present invention provides curable compositions and rapid prototyping processes using the same. In one embodiment, the present compositions include one or more aromatic epoxies and one or more aliphatic epoxies, and, after full cure, exhibit a heat deflection temperature of at least 105° C. and an elongation at break of at least 1.5%.Type: ApplicationFiled: November 21, 2005Publication date: April 6, 2006Applicant: DSM IP Assets B.V.Inventor: Jigeng Xu