Patents by Inventor Jin-Hoon Cho
Jin-Hoon Cho has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20180329560Abstract: An electronic device includes a touch screen display; a pressure sensing circuit; a fingerprint sensing circuit at least partially overlapped with the pressure sensing circuit; a wireless communication circuit; at least one processor; and a memory electrically connected with the processor, wherein the memory stores instructions that, when executed, cause the processor to detect a touch input through the touch screen display and a pressure input through the pressure sensing circuit, in a first state of the electronic device, in which the finger print sensing circuit is deactivated; activate the fingerprint sensing circuit in response to the touch input or the pressure input; detect a fingerprint of a finger of a user by using the fingerprint sensing circuit while detecting pressure of the finger of the user to the first plate; and induce the electronic device to become in a second state or third state based at least partially on the detected pressure.Type: ApplicationFiled: May 11, 2018Publication date: November 15, 2018Inventors: Na Young KIM, Dae Hwan Kim, Seung Wook Nam, Hyung Woo Shin, Hye Mi Lee, Jin Hoon Cho, Kwang Tai Kim, Hyung Sup Byeon, Pil Joo Yoon, Hae Dong Lee
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Publication number: 20180292974Abstract: An electronic device is provided and includes a touch screen and a processor that is configured to display a first object among a plurality of sequentially arranged objects on the touch screen, display, when a first user input that satisfies a designated condition is detected via the touch screen while the first object is displayed, a second object arranged subsequent to the first object according to an arrangement order among the plurality of objects on the touch screen, and display, when a second user input that does not satisfy the designated condition is detected via the touch screen while the first object is displayed, a third object designated regardless of the arrangement order among the plurality of objects on the touch screen.Type: ApplicationFiled: April 2, 2018Publication date: October 11, 2018Inventors: Jae-Myoung LEE, Young-Mi Kim, Young-Seong Kim, Seung-Wook Nam, Hyo-Sang Bang, Sang-Su Lee, Youngjay Lee, Kyung-Soo Lim, Soe-Youn Yim, Martin Jung, Jin-Hoon Cho, Hyun-Yeul Lee
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Publication number: 20180260550Abstract: According to an embodiment of the present disclosure, an electronic device may comprise a first sensor configured to obtain first biometric information of a first authentication level from a user, a second sensor configured to obtain the first biometric information and/or second biometric information of a second authentication level higher than the first authentication level from the user, a memory configured to store at least one piece of biometric information authenticated in relation with the user, and a processor configured to compare the at least one piece of biometric information with the first biometric information obtained through the first sensor while the electronic device operates in a locked state, to activate a timer to stop input to the first sensor for a designated time when authentication based on the first biometric information fails a designated number of times based on the comparison of the first biometric information, to obtain the second biometric information through the second sensor whiType: ApplicationFiled: March 8, 2018Publication date: September 13, 2018Inventors: Hyung-Woo SHIN, Hye-Mi LEE, Jin-Hoon CHO, Pil-Joo YOON, Hae-Dong LEE
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Patent number: 9579624Abstract: A gas reactor device includes a plurality of microcavities or microchannels defined at least partially within a thick metal oxide layer consisting essentially of defect free oxide. Electrodes are arranged with respect to the microcavities or microchannels to stimulate plasma generation therein upon application of suitable voltage. One or more or all of the electrodes are encapsulated within the thick metal oxide layer. A gas inlet is configured to receive feedstock gas into the plurality of microcavities or microchannels. An outlet is configured to outlet reactor product from the plurality of microcavities or microchannels. In an example preferred device, the feedstock gas is air or O2 and is converted by the plasma into ozone (O3). In another preferred device, the feedstock gas is an unwanted gas to be decomposed into a desired form. Gas reactor devices of the invention can, for example, decompose gases such as CO2, CH4, or NOx.Type: GrantFiled: January 7, 2015Date of Patent: February 28, 2017Assignee: The Board of Trustees of the University of IllinoisInventors: J. Gary Eden, Sung-Jin Park, Jin Hoon Cho, Seung Hoon Sung, Min Hwan Kim
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Patent number: 9390894Abstract: A preferred modular microplasma microchannel reactor device includes a microchannel array arranged with respect to electrodes for generation of plasma and isolated by dielectric from the electrodes. A cover covers a central portion of the microchannel array, while leaving end portions of the microchannel array exposed. A gas inlet and product outlet are arranged to permit flow into, through and out of the microchannel array. Reactor modules of the invention include pluralities of the modular reactor devices. The reactors devices can be arranged by a housing or a frame to be in fluid communication. A system of the invention arranges pluralities of modules. Preferred module housings, frames and reactors include structural features to create alignments and connections. Preferred modules include fans to circulate feedstock and reaction product. Other reactor devices provide plasma actuation for flow.Type: GrantFiled: September 24, 2014Date of Patent: July 12, 2016Assignee: THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOISInventors: J. Gary Eden, Min Hwan Kim, Jin Hoon Cho, Sung-Jin Park
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Patent number: 9287091Abstract: A plasma system includes a plasma device, an ionizable media source, and a power source. The plasma device includes an inner electrode and an outer electrode coaxially disposed around the inner electrode. The inner electrode includes a distal portion and an insulative layer that covers at least a portion of the inner electrode. The ionizable media source is coupled to the plasma device and is configured to supply ionizable media thereto. The power source is coupled to the inner and outer electrodes, and is configured to ignite the ionizable media at the plasma device to form a plasma effluent having an electron sheath layer about the exposed distal portion.Type: GrantFiled: March 26, 2015Date of Patent: March 15, 2016Assignee: Colorado State University Research FoundationInventors: Il-Gyo Koo, Cameron A. Moore, George J. Collins, Jin-Hoon Cho
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Publication number: 20150270110Abstract: A preferred modular microplasma microchannel reactor device includes a microchannel array arranged with respect to electrodes for generation of plasma and isolated by dielectric from the electrodes. A cover covers a central portion of the microchannel array, while leaving end portions of the microchannel array exposed. A gas inlet and product outlet are arranged to permit flow into, through and out of the microchannel array. Reactor modules of the invention include pluralities of the modular reactor devices. The reactors devices can be arranged by a housing or a frame to be in fluid communication. A system of the invention arranges pluralities of modules. Preferred module housings, frames and reactors include structural features to create alignments and connections. Preferred modules include fans to circulate feedstock and reaction product. Other reactor devices provide plasma actuation for flow.Type: ApplicationFiled: September 24, 2014Publication date: September 24, 2015Inventors: J. Gary Eden, Min Hwan Kim, Jin Hoon Cho, Sung-Jin Park
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Patent number: 9117636Abstract: A plasma device is disclosed. The plasma device includes: at least one electrode including a nanoporous dielectric layer disposed on at least a portion thereof, the nanoporous dielectric layer including a plurality of pores, wherein at least a portion of the plurality of pores include a catalyst embedded therein.Type: GrantFiled: January 16, 2014Date of Patent: August 25, 2015Assignee: Colorado State University Research FoundationInventors: Il-Gyo Koo, Jin Hoon Cho, Myeong Yeol Choi, Cameron A. Moore, George J. Collins
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Publication number: 20150200076Abstract: A plasma system includes a plasma device, an ionizable media source, and a power source. The plasma device includes an inner electrode and an outer electrode coaxially disposed around the inner electrode. The inner electrode includes a distal portion and an insulative layer that covers at least a portion of the inner electrode. The ionizable media source is coupled to the plasma device and is configured to supply ionizable media thereto. The power source is coupled to the inner and outer electrodes, and is configured to ignite the ionizable media at the plasma device to form a plasma effluent having an electron sheath layer about the exposed distal portion.Type: ApplicationFiled: March 26, 2015Publication date: July 16, 2015Inventors: IL-GYO KOO, CAMERON A. MOORE, GEORGE J. COLLINS, JIN-HOON CHO
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Publication number: 20150125357Abstract: A gas reactor device includes a plurality of microcavities or microchannels defined at least partially within a thick metal oxide layer consisting essentially of defect free oxide. Electrodes are arranged with respect to the microcavities or microchannels to stimulate plasma generation therein upon application of suitable voltage. One or more or all of the electrodes are encapsulated within the thick metal oxide layer. A gas inlet is configured to receive feedstock gas into the plurality of microcavities or microchannels. An outlet is configured to outlet reactor product from the plurality of microcavities or microchannels. In an example preferred device, the feedstock gas is air or O2 and is converted by the plasma into ozone (O3). In another preferred device, the feedstock gas is an unwanted gas to be decomposed into a desired form. Gas reactor devices of the invention can, for example, decompose gases such as CO2, CH4, or NOR.Type: ApplicationFiled: January 7, 2015Publication date: May 7, 2015Inventors: J. Gary Eden, Sung-Jin Park, Jin Hoon Cho, Seung Hoon Sung, Min Hwan Kim
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Patent number: 8994270Abstract: The present disclosure provides for a plasma system. The plasma system includes a plasma device, an ionizable media source, and a power source. The plasma device includes an inner electrode and an outer electrode coaxially disposed around the inner electrode. The inner electrode includes a distal portion and an insulative layer that covers at least a portion of the inner electrode. The ionizable media source is coupled to the plasma device and is configured to supply ionizable media thereto. The power source is coupled to the inner and outer electrodes, and is configured to ignite the ionizable media at the plasma device to form a plasma effluent having an electron sheath layer about the exposed distal portion.Type: GrantFiled: September 27, 2010Date of Patent: March 31, 2015Assignee: Colorado State University Research FoundationInventors: Il-Gyo Koo, Cameron A. Moore, George J. Collins, Jin-Hoon Cho
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Patent number: 8968668Abstract: A microplasma device of the invention includes a microcavity or microchannel defined at least partially within a thick metal oxide layer consisting essentially of defect free oxide. Electrodes are arranged with respect to the microcavity or microchannel to stimulate plasma generation in said microcavity or microchannel upon application of suitable voltage and at least one of the electrodes is encapsulated within the thick metal oxide layer. Large arrays can be formed and are highly robust as lack of microcracks in the oxide avoid dielectric breakdown.Type: GrantFiled: June 20, 2012Date of Patent: March 3, 2015Assignee: The Board of Trustees of the University of IllinoisInventors: J. Gary Eden, Sung-Jin Park, Jin Hoon Cho, Seung Hoon Sung, Min Hwan Kim
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Patent number: 8957572Abstract: Preferred embodiments of the present invention include microplasma jet devices and arrays in various materials, and low temperature microplasma jet devices and arrays. These include preferred embodiment single microplasma jet devices and arrays of devices formed in monolithic polymer blocks with elongated microcavities. The arrays can be densely packed, for example having 100 jets in an area of a few square centimeters. Additional embodiments include metal/metal oxide microplasma jet devices that have micronozzles defined in the metal oxide itself. Methods of fabrication of microplasma jet devices are also provided by the invention, and the methods have been demonstrated as being capable of producing tailored micronozzle contours that are unitary with the material insulating electrodes.Type: GrantFiled: June 25, 2012Date of Patent: February 17, 2015Assignee: The Board of Trustees of the University of IllinoisInventors: J. Gary Eden, Sung-Jin Park, Jin Hoon Cho, Jeffrey H. Ma
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Publication number: 20150008825Abstract: Preferred embodiments of the present invention include microplasma jet devices and arrays in various materials, and low temperature microplasma jet devices and arrays. These include preferred embodiment single microplasma jet devices and arrays of devices formed in monolithic polymer blocks with elongated microcavities. The arrays can be densely packed, for example having 100 jets in an area of a few square centimeters. Additional embodiments include metal/metal oxide microplasma jet devices that have micronozzles defined in the metal oxide itself. Methods of fabrication of microplasma jet devices are also provided by the invention, and the methods have been demonstrated as being capable of producing tailored micronozzle contours that are unitary with the material insulating electrodes.Type: ApplicationFiled: June 25, 2012Publication date: January 8, 2015Applicant: The Board of Trustees of the University of IIlinoisInventors: J. Gary Eden, Sung-Jin Park, Jin Hoon Cho, Jeffrey H. Ma
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Publication number: 20140225498Abstract: A plasma device is disclosed. The plasma device includes: at least one electrode including a nanoporous dielectric layer disposed on at least a portion thereof, the nanoporous dielectric layer including a plurality of pores, wherein at least a portion of the plurality of pores include a catalyst embedded therein.Type: ApplicationFiled: January 16, 2014Publication date: August 14, 2014Applicant: Colorado State University Research FoundationInventors: IL-GYO KOO, JIN HOON CHO, MYEONG YEOL CHOI, CAMERON A. MOORE, GEORGE J. COLLINS
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Publication number: 20130071297Abstract: A microplasma device includes a microcavity or microchannel defined at least partially within a thick metal oxide layer consisting essentially of defect free oxide. Electrodes are arranged with respect to the microcavity or microchannel to stimulate plasma generation in said microcavity or microchannel. At least one of the electrodes is encapsulated within the thick metal oxide layer. A method of fabricating a microcavity or microchannel plasma device includes anodizing a flat or gently curved or gently sloped metal substrate to form a thick layer of metal oxide consisting essentially of nanopores that are perpendicular to the surface of the metal substrate. Material removal is conducted to remove metal oxide material to form a microcavity or microchannel in the thick layer of metal oxide.Type: ApplicationFiled: June 20, 2012Publication date: March 21, 2013Applicant: The Board of Trustees of the University of IllinoisInventors: J. Gary Eden, Sung-Jin Park, Jin Hoon Cho, Seung Hoon Sung, Min Hwan Kim
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Publication number: 20110101862Abstract: The present disclosure provides for a plasma system. The plasma system includes a plasma device, an ionizable media source, and a power source. The plasma device includes an inner electrode and an outer electrode coaxially disposed around the inner electrode. The inner electrode includes a distal portion and an insulative layer that covers at least a portion of the inner electrode. The ionizable media source is coupled to the plasma device and is configured to supply ionizable media thereto. The power source is coupled to the inner and outer electrodes, and is configured to ignite the ionizable media at the plasma device to form a plasma effluent having an electron sheath layer about the exposed distal portion.Type: ApplicationFiled: September 27, 2010Publication date: May 5, 2011Inventors: Il-Hyo Koo, Cameron A. Moore, George J. Collins, Jin-Hoon Cho