Abstract: A semiconductor memory cell includes a floating body region configured to be charged to a level indicative of a state of the memory cell selected from at least first and second states. A first region of the memory cell is in electrical contact with the floating body region. A second region of the memory cell is spaced apart from the first region and is also in electrical contact with the floating body region. A gate is positioned between the first and second regions. A back-bias region is configured to generate impact ionization when the memory cell is in one of the first and second states, and the back-bias region is configured so as not to generate impact ionization when the memory cell is in the other of the first and second states.

Abstract: NAND string configurations and semiconductor memory arrays that include such NAND string configurations are provided. Methods of making semiconductor memory cells used in NAND string configurations are also described.

Abstract: A memory cell comprising includes a silicon-on-insulator (SOI) substrate, an electrically floating body transistor fabricated on the silicon-on-insulator (SOI) substrate, and a charge injector region. The floating body transistor is configured to have more than one stable state through an application of a bias on the charge injector region.

Abstract: A semiconductor memory cell having an electrically floating body having two stable states is disclosed. A method of operating the memory cell is disclosed.

Abstract: A transparent substrate provided with a multi-layered coating is provided, the coating including the following in an order from the substrate: a first dielectric film including one or more dielectric layers, a first metallic protective layer, a first metallic layer having an infrared (IR) reflection characteristic, a second metallic protective layer, a second dielectric film including two or more dielectric layers, a third metallic protective layer, a second metallic layer having an infrared (IR) reflection characteristic, a fourth metallic protective layer, and a third dielectric film D3 including one or more dielectric layers, wherein the dielectric layer includes a metal oxide, a metal nitride, or a metal oxynitride, the metallic layer is silver (Ag) or a silver (Ag)-containing metal alloy, a normal emissivity is 2.0% or less, and a difference between a coated surface reflectance and an uncoated surface reflectance is 21% or more.

Abstract: A semiconductor device, the device including: a first level overlaid by a first memory control level; a first memory level disposed on top of said first control level, where said first memory level includes a first thinned single crystal substrate; a second memory level, said second memory level disposed on top of said first memory level, where said second memory level includes a second thinned single crystal substrate, where said memory control level is bonded to said first memory level, and where said bonded includes oxide to oxide and conductor to conductor bonding.

Abstract: A glass frit for forming a black enamel coating includes Si at 6.5 mol % to 6.9 mol %, B at 9.0 mol % to 9.3 mol %, Bi at 13.0 mol % to 13.4 mol %, Zn at 6.0 mol % to 6.3 mol %, and Al at 1.5 mol % to 2.0 mol %, and Co, Ni, and Fe, wherein a total amount of Co, Ni, and Fe is 2.9 mol % to 3.5 mol % of the glass frit in a molar ratio.

Abstract: A 3D memory device, the device comprising: a plurality of memory cells, wherein each memory cell of said plurality of memory cells comprises at least one memory transistor, wherein each of said at least one memory transistor comprises a source, a drain, and a channel; a plurality of bit-line pillars, wherein each bit-line pillar of said plurality of bit-line pillars is directly connected to a plurality of said source or said drain, wherein said bit-line pillars are vertically oriented, wherein said channel is horizontally oriented, wherein said plurality of memory cells comprise a partially or fully metalized source, and/or, a partially or fully metalized drain, and wherein said plurality of bit-line pillars comprise a thermally conductive path from said plurality of memory cells to an external surface of said device.

Abstract: Semiconductor memory cells, array and methods of operating are disclosed. In one instance, a memory cell includes a bi-stable floating body transistor and an access device; wherein the bi-stable floating body transistor and the access device are electrically connected in series.

Abstract: A coated article includes a transparent substrate, a multilayer thin film coating disposed on the transparent substrate, and a patterned area having an enamel coating formed on at least part of the transparent substrate in a predetermined pattern, wherein the multilayer thin film coating includes a first dielectric layer, a metallic functional layer having an infrared ray reflection function, and a second dielectric layer, which are sequentially disposed in a direction away from the transparent substrate, and the patterned area includes the first dielectric layer remaining on the substrate after the second dielectric layer and the metallic functional layer are removed from the multilayer thin film coating, and the enamel coating formed on the first dielectric layer.

Abstract: A 3D device comprising: a first level comprising first transistors, said first level comprising a first interconnect; a second level comprising second transistors, said second level overlaying said first level; a third level comprising third transistors, said third level overlaying said second level; a plurality of electronic circuit units (ECUs), wherein each of said plurality of ECUs comprises a first circuit, said first circuit comprising a portion of said first transistors, wherein each of said plurality of ECUs comprises a second circuit, said second circuit comprising a portion of said second transistors, wherein each of said plurality of ECUs comprises a third circuit, said third circuit comprising a portion of said third transistors, wherein each of said ECUs comprises a vertical bus, wherein said vertical bus comprises greater than eight pillars and less than three hundred pillars and provides electrical connections between said first circuit and said second circuit.

Abstract: A semiconductor device, the device including: a first level overlaid by a first memory control level; a first memory level disposed on top of said first control level, where said first memory level includes a first thinned single crystal substrate; a second memory level, said second memory level disposed on top of said first memory level, where said second memory level includes a second thinned single crystal substrate, where said memory control level is bonded to said first memory level, and where said bonded includes oxide to oxide and conductor to conductor bonding.

Abstract: A memory cell comprising includes a silicon-on-insulator (SOI) substrate, an electrically floating body transistor fabricated on the silicon-on-insulator (SOI) substrate, and a charge injector region. The floating body transistor is configured to have more than one stable state through an application of a bias on the charge injector region.

Abstract: A semiconductor device, the device including: a first level overlaid by a first memory control level; a first memory level disposed on top of said first control level, where said first memory level includes a first thinned single crystal substrate; a second memory level, said second memory level disposed on top of said first memory level, where said second memory level includes a second thinned single crystal substrate, where said memory control level is bonded to said first memory level, and where said bonded includes oxide to oxide and conductor to conductor bonding.

Abstract: A semiconductor memory instance is provided that includes an array of memory cells. The array includes a plurality of semiconductor memory cells arranged in at least one column and at least one row. Each of the semiconductor memory cells includes a floating body region configured to be charged to a level indicative of a state of the memory cell. Further includes are a plurality of buried well regions, wherein each of the buried well regions can be individually selected, and a decoder circuit to select at least one of the buried well regions.

Abstract: A 3D memory device, the device including: a plurality of memory cells, where each memory cell of the plurality of memory cells includes at least one memory transistor, where each of the at least one memory transistor includes a source, a drain, and a channel; a plurality of bit-line pillars, where each bit-line pillar of the plurality of bit-line pillars is directly connected to a plurality of the source or the drain, where the bit-line pillars are vertically oriented, where the channel is horizontally oriented; and a level of memory control circuits, where the memory control circuits is disposed either above or below the plurality of memory cells.

Abstract: A 3D device, the device including: a first level including logic circuits; a second level including a plurality of memory circuits, where the first level is bonded to the second level, where the bonded includes oxide to oxide bonds, and where the device includes first redundancy circuits to replace a faulty logic circuit and a second redundancy circuit to replace a faulty memory circuit.

Abstract: A 3D device, the device including: a first level including logic circuits; a second level including a plurality of memory circuits, where the first level is bonded to the second level, where the bonded includes oxide to oxide bonds, and where the device includes first redundancy circuits to replace a faulty logic circuit and a second redundancy circuit to replace a faulty memory circuit.

Abstract: A semiconductor metal-oxide-semiconductor field effect transistor (MOSFET) transistor with increased on-state current obtained through intrinsic bipolar junction transistor (BJT) of MOSFET has been described. Methods of operating the MOS transistor are provided.

Abstract: A 3D device, the first level including first transistors and a first interconnect; a second level with second transistors overlaying the first level; a third level with third transistors overlaying the second level; a plurality of electronic circuit units (ECUs), where each ECU includes a first circuit with a portion of the first transistors, where each of the ECUs includes a second circuit including a portion of the second transistors, where each of the plurality of ECUs includes a third circuit, which includes a portion of the third transistors, where each of the ECUs includes a vertical data bus, where the vertical data bus has between eight pillars and three hundreds pillars, where the vertical data bus provides electrical connections between the first and second circuits, where the third level includes an array of memory cells, and where the second circuit includes a memory control circuit.