Abstract: In a multi-layer coating for a material of good transparency for visible light, with an emissivity e<0.04 and a light transmission T.gtoreq.78% and with two silver layers of different thickness, three oxide coatings are provided, and very thin metal or metal suboxide coatings as blockers, the oxide layers being alloys of the metals SnMg, SnAl, SnZr, SnTi or SnTa.

Abstract: An apparatus for the reactive coating of a substrate 1, with silicon dioxide (SiO.sub.2) for example, comprises a power source 10, 37 connected to an electrode 5 which is disposed in an evacuable coating chamber 15, 15a and interacts with a target 3 which is sputtered and the sputtered particles of which are deposited on the substrate 1, wherein argon and oxygen, for example, are supplied to the coating chamber 15, 15a. The target to be sputtered is composed of several parts, for example. A center part 3a of the target 3 opposite the substrate 1 is made of silicon (Si) and the part 3b surrounding this center portion is made of zinc (Sn), for example. Provision is made for a diaphragm 24 between the substrate 1 on the one hand, and the target 3, on the other hand. The shape of the magnetic field of the electrode 5 during the sputtering generates a sputtering of the more reactive target material 3a in the oxidic mode and of the less reactive target material 3b in the metallic mode.

Abstract: A pair of magnetron cathodes in an evacuable coating chamber are connected to the outputs of the secondary winding of a transformer, the primary winding being connected to the outputs of a medium frequency A.C. generator. An oval target is mounted on each cathode and surrounded by stainless steel bars. As an alternative the bars may be configured as plates connected to ground and mounted to the target by insulating spacers.

Abstract: A transport car open at the top and supported on rollers moves a substrate from a first coating chamber to a second coating chamber separated by a gate 7 running transversely of the direction of movement of the transport car 5. The gate 7 is formed of an upper gate part 8 and a lower gate part 9 forming a slot 10 which is adaptable to the cross section of the car. A cover associated with the top gate part and parallel to the direction of movement has an area greater than the car in order to minimize gas transfer between chambers.

Abstract: Target tiles formed from the material to be sputtered each have a parallelepipedal configuration and are each soldered, welded or cemented fixedly to a target base plate of similar dimensions, each target base plate being slightly smaller in its length (b) and slightly larger in its width (a) than the corresponding target tile, while the two marginal portions of the target base plates that project in each case beyond the lateral edges of the target tiles are fixed to the cathode body (3) by means of clamping cleats.

Abstract: A vacuum coating apparatus has a pot-like tank (2) against whose open side a portion of a substrate (1) can be held sealingly. In the tank (2) there is disposed a target (7). A shut-off plate (9) makes it possible after lowering the substrate (1) to hold this target (7) under vacuum in a source chamber (11) protected against intrusion of air.

Abstract: Magnets are arranged inside a rotating tubular target to form a racetrack-shaped plasma having two straight stretches parallel to the target axis and two end stretches connecting the straight stretches. In order to achieve uniform target erosion, the magnets are arranged so that the plasma is wider and therefore less intense over the end stretches than it is over the straight stretches.

Abstract: In a method and an apparatus for coating a substrate (26) with electrically nonconductive coatings from an electrically conductive target (25) in a reactive (e.g.

Abstract: Method for the manufacture of panes with high transmissivity in the visible spectral range and with a high reflectivity for thermal radiation. The panes are coated by cathode sputtering. To the substrates S there is applied a first coating of a material of the oxide group ZnO, SnO.sub.2, In.sub.2 O.sub.3, TiO.sub.2, ZrO.sub.2, TaO.sub.5, SiO.sub.2, Al.sub.3 O.sub.3, or mixtures thereof, or of one of the nitrides AlN, Si.sub.3 N.sub.4 or their mixtures, or of aluminum oxynitride, titanium oxynitride, zirconium oxynitride or silicon oxynitride or their mixtures, in a thickness of 20 to 60 nm. A second layer 2 follows, of one of the metals Ag, Cu or mixtures thereof, in a thickness of 5 to 30 nm, a third layer 3 of one of the metals Pd or Pt or their mixtures, in a thickness of 0.2 to 5 nm, preferably 0.

Abstract: A transparent substrate, such as glass, having a solar control coating consisting of a CrN layer between two SnO, layers. The solar control coating is arranged on the back side of the substrate which will face away from an observer when in place. A sub-oxidic alloy, such as NiCrO is then applied to the solar control coating.

Abstract: A sputtering apparatus is presented, especially one with a magnetron cathode and rotating target (1), and target cooling performed by a liquid coolant, preferably water, in which provision is made for the cooling to be concentrated on the area or areas of the rotating target (1) which are exposed to the heat produced by the plasma (12), and the magnets (28, 29, 30, 31) of the magnet assembly (23) form at least one cooling passage (34, 35).

Abstract: In an apparatus for the reactive coating of a substrate (1) with an electrically conductive material (FIG. 1 ), for example with silicon dioxide (SiO.sub.

Abstract: A coating, composed of an optically effective layer system for substrates, whereby the layer system has a high antireflective effect. On a front side of the substrate, facing the observer, in sequence from the front side to the observer, a first layer is arranged on the substrate, functioning as dielectric and comprising metal oxide. Thereupon follows a second layer comprising nitride, preferably TiN.sub.x (x is equal to or greater than 1, preferably x=1.05). A third layer follows functioning as dielectric and comprising metal oxide. Thereupon a fourth layer follows comprising nitride, preferably TiN.sub.x (x is equal to or greater than 1, preferably x=1.05). A fifth layer follows functioning as dielectric comprising metal oxide. On a backside of the substrate a TiN.sub.x -layer (x.gtoreq.1, preferably x=1.05) is arranged.

Abstract: An apparatus is presented, with a rotating target (18, 15), which is tubularly configured, with a stationary magnet unit (2) disposed within the tube, of a magnetron cathode, which produces a stationary plasma hose provided essentially with two long straight lines in front of the surface of the rotating target, which exercises an erosive action on the surface of the rotating target (18, 15), whereby the formation occurs of a narrowing of the diameter of the tubular rotating target (18, 15) in the middle portion of the tubular rotating target and the formation of margins at the two ends (14, 15) of the tubular rotating target be provided each with a dark-space shield (16, 17) which cover the margins of the tubular rotating target.

Abstract: Method for making glazing with a high transmissivity in the visible spectral range and with a high reflectivity for thermal radiation as well as low surface resistance. On substrates of mineral glass a system of coatings is built up in the following order:Coating 1: oxide from the group, tin oxide, silicon dioxide, aluminum oxide, tantalum oxide, zirconium oxide, or mixtures thereof,Coating 2: alloy of 80 weight-percent of nickel and 20 weight-percent of chromium,Coating 3: silver or a silver alloy with at least 50 weight-percent silver content,Coating 4: alloy of 80 weight-percent of nickel and 20 weight-percent of chromium,Coating 5: oxide from the group tin oxide, silicon dioxide, aluminum oxide, tantalum oxide, zirconium oxide, or mixtures thereof.Thereafter the substrate with the entire packet of coatings is heated to the softening temperature of the glass and bent to the final shape.

Abstract: A coating for applying to a front side of a substrate, which side is facing an observer, comprises a four-layer system which is optically effective and has a high anti-reflective effect. A first layer of this system is applied onto the front side of the substrate and is, preferably, a highly-refracting TiO.sub.2 layer, the second layer is applied to the first layer and is a low-refracting Al.sub.2 O.sub.3 layer, a third layer of the system is applied to the second layer and is, preferably, a high-refracting TiO.sub.2, while the fourth layer applied to the third layer is, preferably, a low-refracting SiO.sub.2 layer. The layers can be formed by either a pyrolytic method, a plasma-supported chemical vapor deposition method, a sputtering method or a chemical vapor deposition method. Preferably, they are formed by a DC-reactive sputtering method with a magnetron.

Abstract: A pair of magnetron cathodes in an evacuable coating chamber are each connected to an ungrounded output of an A.C. power supply. The discharge voltage of at least one of the cathodes is measured and the flow of reactive gas into the chamber is controlled so that the measured voltage is identical to a desired voltage.

Abstract: An apparatus for the reactive coating of a substrate 1 with an electrically insultive material, silicon dioxide SiO.sub.2, for example, comprises a power supply 10 connected to a cathode 5 which is disposed in an evacuable coating chamber 15, 15a and surrounds the magnets 7, 8, 9. This cathode electrically interacts with the target 3 which is sputtered and the sputtered particles thereof are deposited on the substrate 1. A process gas and a reactive gas, e.g. argon with oxygen, are introduced into the coating chamber 15, 15a. The apparatus comprises two electrodes 44, 5 which are electrically insulated from one another and from the sputtering chamber 25. The one electrode is a magnetron cathode 5 where the cathode base 11 and the material of the target 3 are electrically connected to each other and the other electrode functions as an anode 44 in the plasma discharge.

Abstract: An apparatus for the reactive coating of a substrate 1 with an electrically insulative material, for example silicon dioxide SiO.sub.2, comprises a power supply source 10 connected to a cathode 5 which is disposed in an evacuable coating chamber 15, 15a and surrounds the magnets 7, 8, 9. This cathode electrically interacts with the target 3 which is sputtered and the sputtered particles thereof are deposited on the substrate 1. A process gas and a reactive gas, e.g. argon with oxygen, are introduced into the coating chamber 15, 15a. The apparatus comprises two electrodes 44, 5 which are electrically insulated from one another and from the sputtering chamber 26, wherein the one electrode is a magnetron cathode 5 where the cathode base 11 and the material of the target 3 are electrically connected to each other and the other electrode functions as an anode 44 in the plasma discharge.

Abstract: In a method for the production of sheets of mineral glass with high transmission in the visible spectral range and with low solar energy transmission, a coating is sputtered onto the sheet in a coating chamber by cathode sputtering with a target of an alloy of 65% tin and 35% nickel in an atmosphere with an oxygen content. The sheet and coating are then heated at 640.degree. C. and then bent in the heated state, thus producing an especially stable and electrically conductive combination.