Abstract: A method for recycling glass includes the steps of: (a) mixing glass shards with carbon powders so as to permit adhesion of the carbon powders to the surface of each glass shard, (b) heating the glass shards so as to melt the surface of each glass shards, (c) cooling the heated glass shards, and (d) removing the carbon powders from the glass shards.

Abstract: A method and system for exchanging information over a communications network are described. According to one embodiment, an exemplary method of the invention includes connecting two or more clients to a proxy over the communications network, activating a shared session between the clients, and enabling co-navigation of one or more web documents with dynamic content by the clients during the shared session.

Abstract: A method and apparatus for detection of a particular material, such as photo-resist material, on a sample surface. A narrow beam of light is projected onto the sample surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a logic circuit which determines the proper disposition of the sample. The logic circuit controls a sample-handling robotic device which sequentially transfers samples to and from a stage for testing and subsequent disposition. The method is particularly useful for detecting photo-resist material on the surface of a semiconductor wafer.

Abstract: A method and apparatus for detection of a particular material, such as photo-resist material, on a sample surface. A narrow beam of light is projected onto the sample surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a logic circuit which determines the proper disposition of the sample. The logic circuit controls a sample-handling robotic device which sequentially transfers samples to and from a stage for testing and subsequent disposition. The method is particularly useful for detecting photo-resist material on the surface of a semiconductor wafer.

Abstract: A method and apparatus for detection of a particular material, such as photoresist material, on a sample surface. A narrow beam of light is projected onto the sample surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a logic circuit which determines the proper disposition of the sample. The logic circuit controls a sample-handling robotic device which sequentially transfers samples to and from a stage for testing and subsequent disposition. The method is particularly useful for detecting photo-resist material on the surface of a semiconductor wafer.

Abstract: A method and apparatus for endpoint detection for the stripping of a particular material, such as photo-resist material, from a substrate surface. A beam of light is projected onto the substrate surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a control mechanism which determines the proper disposition of the substrate. The control mechanism controls the cessation of the stripping process and may control a substrate-handling device which sequentially transfers substrates to and from a stripping chamber.

Abstract: A three dimension computer model full size grading system is used for processing a shoe model by a triangular geometry mode and includes the following steps: (a) a leading processing work: receiving triangular data for performing division of a common member and selecting characteristic lines, filling a grading table and a geometric relation table by a user, and storing the grading table and the geometric relation table in a data base; (b) a main processing work: inputting gauges of each engineering diagram, selecting each grading item, reading numbers and dimensions of each size stored in the grading table, reading data of each file and data of stick points of the common member stored in the geometric relation table, serially performing a grading operation processing on each geometric file of each size, building constraints in the whole group of triangular geometry to satisfy each grading specification in a local variation manner, and storing results of operation in the data base to respectively mate with pos

Abstract: A method and apparatus for endpoint detection for the stripping of a particular material, such as photo-resist material, from a substrate surface. A beam of light is projected onto the substrate surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a control mechanism which determines the proper disposition of the substrate. The control mechanism controls the cessation of the stripping process and may control a substrate-handling device which sequentially transfers substrates to and from a stripping chamber.

Abstract: A method and apparatus for detection of a particular material, such as photo-resist material, on a sample surface. A narrow beam of light is projected onto the sample surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a logic circuit which determines the proper disposition of the sample. The logic circuit controls a sample-handling robotic device which sequentially transfers samples to and from a stage for testing and subsequent disposition. The method is particularly useful for detecting photo-resist material on the surface of a semiconductor wafer.

Abstract: A method and apparatus for detection of a particular material, such as photo-resist material, on a sample surface. A narrow beam of light is projected onto the sample surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a logic circuit which determines the proper disposition of the sample. The logic circuit controls a sample-handling robotic device which sequentially transfers samples to and from a stage for testing and subsequent disposition. The method is particularly useful for detecting photo-resist material on the surface of a semiconductor wafer.

Abstract: A method and apparatus for endpoint detection for the stripping of a particular material, such as photo-resist material, from a substrate surface. A beam of light is projected onto the substrate surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a control mechanism which determines the proper disposition of the substrate. The control mechanism controls the cessation of the stripping process and may control a substrate-handling device which sequentially transfers substrates to and from a stripping chamber.

Abstract: A method and apparatus for detection of a particular material, such as photo-resist material, on a sample surface. A narrow beam of light is projected onto the sample surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a logic circuit which determines the proper disposition of the sample. The logic circuit controls a sample-handling robotic device which sequentially transfers samples to and from a stage for testing and subsequent disposition. The method is particularly useful for detecting photo-resist material on the surface of a semiconductor wafer.

Abstract: A method and apparatus for endpoint detection for the stripping of a particular material, such as photo-resist material, from a substrate surface. A beam of light is projected onto the substrate surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a control mechanism which determines the proper disposition of the substrate. The control mechanism controls the cessation of the stripping process and may control a substrate-handling device which sequentially transfers substrates to and from a stripping chamber.

Abstract: A method and apparatus for detection of a particular material, such as photo-resist material, on a sample surface. A narrow beam of light is projected onto the sample surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a logic circuit which determines the proper disposition of the sample. The logic circuit controls a sample-handling robotic device which sequentially transfers samples to and from a stage for testing and subsequent disposition. The method is particularly useful for detecting photo-resist material on the surface of a semiconductor wafer.

Abstract: A method and apparatus for endpoint detection for the stripping of a particular material, such as photo-resist material, from a substrate surface. A beam of light is projected onto the substrate surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a control mechanism which determines the proper disposition of the substrate. The control mechanism controls the cessation of the stripping process and may control a substrate-handling device which sequentially transfers substrates to and from a stripping chamber.

Abstract: A touch-pad digital computer pointing-device, for controlling a position of a cursor appearing on a display screen of a digital computer, senses and resolves respective locations within an active area at which concurrent multi-finger contacts occur. Multi-finger contacts with the active area activate or deactivate a drag-lock operating mode, computer power conservation, and other touch-pad operating characteristics such as the touch-pad's sensitivity to finger contact. The touch-pad also senses a velocity and direction for finger contact with the active area for use in transmitting data to the computer which effects continuous cursor movement across the computer's display screen in a direction fixed by the initial direction of contact movement across the active area. While there is no finger contact with the active area, the touch-pad monitors the active area and adjusts its operation to compensate for changes in the surrounding environment such as changes in temperature, humidity and atmospheric pressure.

Abstract: A coin detection device includes one or more optical sensors positioned along a coin path and capable of detecting movement of a coin thereby, a coil energizable to generate an electromagnetic field in the region of the coin path, a processor connected to the optical sensor or sensors so as to receive signals therefrom and connected to a detector which is capable of detecting the coin as it enters and leaves the region of the coil, the processor is operable to establish an optical size time based upon signals received from the optical sensor or sensors and a magnetic size time based upon signals received from the detector and to further establish a ratio of the magnetic size time to the optical size time, or magnetic to optical size ratio, the established ratio is then evaluated to determine if the tested coin is a valid coin.

Abstract: A binding mechanism for holding yarns of circular knitting machines during yarn changeover and when yarns are moved to inactive positions includes an elastomeric member having deformable when engaged with a flat surface and having pliable surfaces for simultaneously receiving and individually gripping multiple yarns, the member being of silicone rubber having a durometer hardness range of 45-70.