Abstract: Disclosed is a stage apparatus comprising: an object support configured to support an object; a positioning device configured to position the object support; a first connection arrangement configured to connect the object support to the positioning device, the first connection arrangement comprising at least one damped connection; and a second connection arrangement configured to connect the object support to the positioning device, the second connection arrangement comprising at least one substantially rigid connection.

Abstract: The invention relates to an actuator device for use in a positioning system, wherein the actuator device is linearly movable within a plane with respect to a supporting structure of the positioning system as well as such a positioning system implementing such an actuator device. In an example of the actuator device according to the invention, it comprises a carrier having a longitudinal and a transversal dimension; and multiple groups of coil assemblies mounted in the carrier, each group of coil assemblies being structured to orientate the carrier in at least one degree of freedom. The single design actuator device according to the invention has limited constructional dimensions and allows high accuracy as to motion and position in multiple degrees of freedom.

Abstract: An electron beam apparatus is provided. The apparatus comprises an e-beam source configured to generate an electron beam, a first part configured to support a substrate, the first part comprising an object table for supporting the substrate, the first part further comprising a short stroke actuator system for actuating the object table relative to the e-beam source, the short stroke actuator system comprising a short stroke forcer. The apparatus further comprises a second part configured to movably support the first part and a long stroke actuator system configured to actuate movement of the first part with respect to the second part, the long stroke actuator system comprising a long stroke forcer, wherein the short stroke forcer and/or the long stroke forcer is configured to be switched off while the electron beam is projected onto the substrate.

Abstract: A transfer head for an electronic component transfer apparatus and a method therefor. The transfer head includes a first vacuum pipet laterally spaced from a second vacuum pipet with a first pitch therebetween. The first pitch is variable between a first pitch position and a second pitch position.

Abstract: The present invention relates to digital pathology. In order to provide an improved handling of probes in digital pathology, a slide-holder (10) for digital pathology is provided that comprises a tray basis (12), a plurality of mounting means (14) and a plurality of slide-holder registration points (16). The tray basis is configured to carry a plurality of slides (20) to be imaged by a digital pathology system, for which the tray basis provides a plurality of slide-receiving positions. The plurality of mounting means are arranged on the tray basis to mount the plurality of slides on the tray basis in a plurality of slide-receiving positions to image each slide in a separate imaging position. The slide-holder registration points comprise a plurality of interacting portions (22) that provide a mechanical registration of the tray basis with a digital pathology system for each of the imaging positions.

Abstract: A method of aligning a substrate within an apparatus. The method includes determining a substrate grid based on measurements of a plurality of targets, each at different locations on a substrate. The determining includes repetitions of updating the substrate grid after each measurement of a target, and using the updated grid to align a measurement of a subsequent target.

Abstract: An electron beam apparatus includes an electron optics system to generate an electron beam, an object table to hold the specimen at a target position so that a target portion of the specimen is irradiated by the electron beam, and a positioning device to displace the object table relative to the electron beam. The positioning device includes a stage actuator and a balance mass. The stage actuator exerts a force onto the object table to cause an acceleration of the object table. The force onto the object table results in a reaction force onto the balance mass. The balance mass moves in response to the reaction force. The positioning device enables the balance mass to move in a first direction in response to a component of the reaction force in the first direction.

Abstract: A method of aligning a substrate within an apparatus. The method includes determining a substrate grid based on measurements of a plurality of targets, each at different locations on a substrate. The determining includes repetitions of updating the substrate grid after each measurement of a target, and using the updated grid to align a measurement of a subsequent target.

Abstract: Systems directed to a stage apparatus in an electron beam inspection tool to inspect a sample are disclosed. The stage apparatus comprises a short stroke stage; a long stroke stage; a first sensor configured to measure a position of the short stroke stage with respect to a measurement reference; one or more roller bearings configured to support the long stroke stage; and a controller having circuitry and configured to control a motion of the long stroke stage and a motion of the short stroke stage for following movement of the reference at least partly based on measurement from the first sensor, wherein the controller is operable such that control of the long stroke stage is decoupled from the movement of the reference in at least a part of operation of the stage apparatus for reducing debris generation of the one or more roller bearings.

Abstract: A positioning device configured to displace an object is disclosed. The positioning device comprises a stage to support the object, an actuator to move the stage with respect to a reference in a direction of movement, a balance mass arranged between the actuator and the reference to reduce transfer of reaction forces from the actuator to the reference, a support device arranged between the reference and the balance mass to support the balance mass, and a gravity compensator acting between the reference and the balance mass to exert a lifting force on the balance mass to reduce a gravitational support force to be provided by the support device to support the balance mass.

Abstract: An electron beam apparatus is provided. The apparatus comprises an e-beam source configured to generate an electron beam, a first part configured to support a substrate, the first part comprising an object table for supporting the substrate, the first part further comprising a short stroke actuator system for actuating the object table relative to the e-beam source, the short stroke actuator system comprising a short stroke forcer. The apparatus further comprises a second part configured to movably support the first part and a long stroke actuator system configured to actuate movement of the first part with respect to the second part, the long stroke actuator system comprising a long stroke forcer, wherein the short stroke forcer and/or the long stroke forcer is configured to be switched off while the electron beam is projected onto the substrate.

Abstract: A transfer head for an electronic component transfer apparatus and a method therefor. The transfer head includes a first vacuum pipet laterally spaced from a second vacuum pipet with a first pitch therebetween. The first pitch is variable between a first pitch position and a second pitch position.

Abstract: The current invention relates to a patient support table, comprising a frame that is mounted to the floor, an upright column with a table top support system and mounted to the frame and supporting a table top that is movable longitudinally with respect to the column and to accommodate a person. The patient table further comprises a tilt actuator and a control device to control the at least one tilt actuator, and comprising an inclinometer, a data storage and a processing unit that in use compares data from the inclinometer with data from the data storage. The control device comprises a force sensor to determine a load supported by the table top and/or a position sensor to determine the longitudinal position of the table top with respect to a reference, wherein the control device in use calculates a set point for the at least one tilt actuator and actuates the tilt actuator to move or maintain the table top to the set tilted position.

Abstract: An electron beam apparatus includes an electron optics system to generate an electron beam, an object table to hold the specimen at a target position so that a target portion of the specimen is irradiated by the electron beam, and a positioning device to displace the object table relative to the electron beam. The positioning device includes a stage actuator and a balance mass. The stage actuator exerts a force onto the object table to cause an acceleration of the object table. The force onto the object table results in a reaction force onto the balance mass. The balance mass moves in response to the reaction force. The positioning device enables the balance mass to move in a first direction in response to a component of the reaction force in the first direction.

Abstract: A positioning device configured to displace an object is disclosed. The positioning device comprises a stage to support the object, an actuator to move the stage with respect to a reference in a direction of movement, a balance mass arranged between the actuator and the reference to reduce transfer of reaction forces from the actuator to the reference, a support device arranged between the reference and the balance mass to support the balance mass, and a gravity compensator acting between the reference and the balance mass to exert a lifting force on the balance mass to reduce a gravitational support force to be provided by the support device to support the balance mass.

Abstract: Disclosed is a stage apparatus comprising: an object support configured to support an object; a positioning device configured to position the object support; a first connection arrangement configured to connect the object support to the positioning device, the first connection arrangement comprising at least one damped connection; and a second connection arrangement configured to connect the object support to the positioning device, the second connection arrangement comprising at least one substantially rigid connection.

Abstract: Disclosed is a method of optimizing within an inspection apparatus, the position and/or size (and therefore focus) of a measurement illumination spot relative to a target on a substrate. The method comprises detecting scattered radiation from at least the target resultant from illuminating the target, for different sizes and/or positions of said illumination spot relative to the target; and optimizing said position and/or size of the measurement illumination spot relative to the target based on a characteristic of the detected scattered radiation for the different sizes and/or positions of said illumination spot relative to the target.

Abstract: The present invention relates to digital pathology. In order to provide an improved handling of probes in digital pathology, a slide-holder (10) for digital pathology is provided that comprises a tray basis (12), a plurality of mounting means (14) and a plurality of slide-holder registration points (16). The tray basis is configured to carry a plurality of slides (20) to be imaged by a digital pathology system, for which the tray basis provides a plurality of slide-receiving positions. The plurality of mounting means are arranged on the tray basis to mount the plurality of slides on the tray basis in a plurality of slide-receiving positions to image each slide in a separate imaging position. The slide-holder registration points comprise a plurality of interacting portions (22) that provide a mechanical registration of the tray basis with a digital pathology system for each of the imaging positions.

Abstract: Disclosed is a method of optimizing within an inspection apparatus, the position and/or size (and therefore focus) of a measurement illumination spot relative to a target on a substrate. The method comprises detecting scattered radiation from at least the target resultant from illuminating the target, for different sizes and/or positions of said illumination spot relative to the target; and optimizing said position and/or size of the measurement illumination spot relative to the target based on a characteristic of the detected scattered radiation for the different sizes and/or positions of said illumination spot relative to the target.

Abstract: A component for a lithography tool, the component including a member having a primary surface; a conduit defined within the member and configured to receive a fluid under pressure; a compressible region within the member and located between the conduit and the primary surface; and a deformable region between the compressible region and the conduit, wherein the compressible region and the deformable region are configured to accommodate local deformation of the member resulting from the pressure of the fluid.