Patents by Inventor Johannes Jacobus Matheus Baselmans

Johannes Jacobus Matheus Baselmans has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20170160647
    Abstract: A measurement method including using multiple radiation poles to illuminate a diffraction grating on a mask at a mask side of a projection system of a lithographic apparatus, coupling at least two different resulting diffraction orders per illumination pole through the projection system, using the projection system to project the diffraction orders onto a grating on a wafer such that a pair of combination diffraction orders is formed by diffraction of the diffraction orders, coupling the combination diffraction orders back through the projection system to detectors configured to measure the intensity of the combination diffraction orders, and using the measured intensity of the combination diffraction orders to measure the position of the wafer grating.
    Type: Application
    Filed: June 11, 2015
    Publication date: June 8, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Johannes Jacobus Matheus BASELMANS, Wilhelmus Petrus DE BOEIJ
  • Publication number: 20170160650
    Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
    Type: Application
    Filed: January 30, 2017
    Publication date: June 8, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Erik Roelof LOOPSTRA, Johannes Jacobus Matheus BASELMANS, Marcel Mathijs Theodore Marie DIERICHS, Johannes Christiaan Maria JASPER, Matthew LIPSON, Hendricus Johannes Maria MEIJER, Uwe MICKAN, Johannes Catharinus Hubertus MULKENS, Tammo UITTERDIJK
  • Publication number: 20170153557
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Application
    Filed: February 13, 2017
    Publication date: June 1, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Aleksey Yurievich KOLESNYCHENKO, Johannes Jacobus Matheus BASELMANS, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Hans JANSEN, Jeroen Johannes Sophia Maria MERTENS, Johannes Catharinus Hubertus MULKENS, Felix Godfried Peter PEETERS, Bob STREEFKERK, Franciscus Johannes Herman Maria TEUNISSEN, Helmar VAN SANTEN
  • Publication number: 20170131642
    Abstract: A method of modifying a lithographic apparatus comprising an illumination system for providing a radiation beam, a support structure for supporting a patterning device to impart the radiation beam with a pattern in its cross-section, a first lens for projecting the radiation beam at the patterning device with a first magnification, a substrate table for holding a substrate, and a first projection system for projecting the patterned radiation beam at a target portion of the substrate with a second magnification. The first lens and the first projection system together provide a third magnification. The method comprises reducing by a first factor the first magnification to provide a second lens for projecting the radiation beam with a fourth magnification; and increasing by the first factor the second magnification to provide a second projection system for projecting the patterned radiation beam at the target portion of the substrate with a fifth magnification.
    Type: Application
    Filed: May 13, 2015
    Publication date: May 11, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Johannes Jacobus Matheus BASELMANS, Hans BUTLER, Christiaan Alexander HOOGENDAM, Sander KERSSEMAKERS, Bart SMEETS, Robertus Nicodemus Jacobus VAN BALLEGOIJ, Hubertus Petrus Leonardus Henrica VAN BUSSEL
  • Patent number: 9606448
    Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
    Type: Grant
    Filed: May 28, 2013
    Date of Patent: March 28, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Erik Roelof Loopstra, Johannes Jacobus Matheus Baselmans, Marcel Mathijs Theodore Marie Dierichs, Johannes Christiaan Maria Jasper, Matthew Lipson, Hendricus Johannes Maria Meijer, Uwe Mickan, Johannes Catharinus Hubertus Mulkens, Tammo Uitterdijk
  • Patent number: 9568840
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Grant
    Filed: December 1, 2015
    Date of Patent: February 14, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Aleksey Yurievich Kolesnychenko, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
  • Patent number: 9529269
    Abstract: A field manipulator to provide high resolution control of position in the XY plane and/or focus control. The field manipulator includes a plate located between the patterning device and the substrate. Control of the XY position is provided by tilting of the plate, while control of the focus position may be provided by localized deformation of the plate. Both adjustments may be performed by one or more actuators that act upon one or more edges of the plate. In an embodiment, two substantially parallel plates are provided and focus control can be provided by changing the spacing between them. A liquid may be provided between the plates which may be temperature controlled to adjust the focus by changing the refractive index of the liquid.
    Type: Grant
    Filed: May 7, 2013
    Date of Patent: December 27, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Johannes Jacobus Matheus Baselmans, Erik Roelof Loopstra
  • Patent number: 9477160
    Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
    Type: Grant
    Filed: February 17, 2015
    Date of Patent: October 25, 2016
    Assignee: ASML NETHERLAND B.V.
    Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Henrikus Herman Marie Cox, Antonius Theodorus Anna Maria Derksen, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Joeri Lof, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Johannes Catharinus Hubertus Mulkens, Gerardus Petrus Matthijs Van Nunen, Klaus Simon, Bernardus Antonius Slaghekke, Alexander Straaijer, Jan-Gerard Cornelis Van Der Toorn, Martijn Houkes
  • Publication number: 20160299440
    Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
    Type: Application
    Filed: June 16, 2016
    Publication date: October 13, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bob STREEFKERK, Johannes Jacobus Matheus BASELMANS, Henrikus Herman Marie COX, Antonius Theodorus Anna Maria DERKSEN, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Joeri LOF, Erik Roelof LOOPSTRA, Jeroen Johannes Sophia Maria MERTENS, Frits VAN DER MEULEN, Johannes Catharinus Hubertus MULKENS, Gerardus Petrus Matthijs VAN NUNEN, Klaus SIMON, Bernardus Antonius SLAGHEKKE, Alexander STRAAIJER, Jan-Gerard Cornelis VAN DER TOORN, Martijn HOUKES
  • Publication number: 20160274462
    Abstract: A method of correcting an optical image formed by an optical system, the method including obtaining a map indicative of a polarization dependent property of the optical system across a pupil plane of the optical system for each spatial position in an image plane of the optical system, combining the map indicative of the polarization dependent property of the optical system with a radiation map of the intensity and polarization of an input radiation beam to form an image map, and using the image map to correct an optical image formed by directing the input radiation beam through the optical system.
    Type: Application
    Filed: October 2, 2014
    Publication date: September 22, 2016
    Applicant: ASML Netherlands B.V.
    Inventors: Jaqueline BORGES NICOLAU, Hannah NOBLE, Johannes Jacobus Matheus BASELMANS, Bart SMEETS, Paulus Jacobus Maria VAN ADRICHEM
  • Patent number: 9442388
    Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate, Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
    Type: Grant
    Filed: August 11, 2014
    Date of Patent: September 13, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Erik Roelof Loopstra, Johannes Jacobus Matheus Baselmans, Marcel Mathijs Theodore Marie Dierichs, Johannes Christiaan Maria Jasper, Matthew Lipson, Hendricus Johannes Maria Meijer, Uwe Mickan, Johannes Catharinus Hubertus Mulkens, Tammo Uitterdijk
  • Patent number: 9423701
    Abstract: A lithographic method of determining a sensitivity of a property of a pattern feature to change in optical aberrations of a lithographic apparatus used to provide that pattern feature. The method includes controlling a configuration of the lithographic apparatus to establish a first aberration state, forming a first image of the pattern feature with that lithographic apparatus when the lithographic apparatus is in that first aberration state, measuring a property of the image, controlling a configuration of the lithographic apparatus to establish a second, different, aberration state, forming an image of the same pattern feature with that lithographic apparatus when the lithographic apparatus is in that second aberration state, measuring a same property of the image, and using the measurements to determine the sensitivity of the property of the pattern feature to changes in the aberration state.
    Type: Grant
    Filed: April 3, 2012
    Date of Patent: August 23, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Shaoxian Zhang, Johannes Jacobus Matheus Baselmans, Johannes Christiaan Maria Jasper
  • Publication number: 20160116848
    Abstract: A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.
    Type: Application
    Filed: January 6, 2016
    Publication date: April 28, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Heine Melle MULDER, Johannes Jacobus Matheus BASELMANS, Adrianus Franciscus Petrus ENGELEN, Markus Franciscus Antonius EURLINGS, Hendrikus Robertus Marie VAN GREEVENBROEK, Paul VAN DER VEEN, Patricius Aloysius Jacobus TINNEMANS, Wilfred Edward ENDENDIJK
  • Patent number: 9304411
    Abstract: A method of patterning substrates using a lithographic apparatus. The method comprising providing a beam of radiation using an illumination system, using a patterning device to impart the radiation beam with a pattern in its cross-section, and using a projection system to project the patterned radiation beam onto target portions of a lot of substrates, wherein the method further comprises performing a radiation beam aberration measurement after projecting the patterned radiation beam onto a subset of the lot of substrates, performing an adjustment of the projection system using the results of the radiation beam aberration measurement, then projecting the patterned radiation beam onto a further subset of the lot of substrates.
    Type: Grant
    Filed: February 14, 2013
    Date of Patent: April 5, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Jacobus Matheus Baselmans, Johannes Christiaan Maria Jasper
  • Publication number: 20160085161
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Application
    Filed: December 1, 2015
    Publication date: March 24, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Aleksey Yurievich KOLESNYCHENKO, Johannes Jacobus Matheus BASELMANS, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Hans JANSEN, Jeroen Johannes Sophia Maria MERTENS, Johannes Catharinus Hubertus MULKENS, Felix Godfried Peter PEETERS, Bob STREEFKERK, Franciscus Johannes Herman Maria TEUNISSEN, Helmar VAN SANTEN
  • Patent number: 9285685
    Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
    Type: Grant
    Filed: April 24, 2014
    Date of Patent: March 15, 2016
    Assignees: ASML NETHERLANDS B.V., CARL ZEISS SMT GmbH
    Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Adrianus Franciscus Petrus Engelen, Jozef Maria Finders, Paul Gräupner, Johannes Catharinus Hubertus Mulkens, Jan Bernard Plechelmus Van Schoot
  • Publication number: 20160062243
    Abstract: A method of patterning substrates using a lithographic apparatus. The method comprising providing a beam of radiation using an illumination system, using a patterning device to impart the radiation beam with a pattern in its cross-section, and using a projection system to project the patterned radiation beam onto target portions of a lot of substrates, wherein the method further comprises performing a radiation beam aberration measurement after projecting the patterned radiation beam onto a subset of the lot of substrates, performing an adjustment of the projection system using the results of the radiation beam aberration measurement, then projecting the patterned radiation beam onto a further subset of the lot of substrates.
    Type: Application
    Filed: November 6, 2015
    Publication date: March 3, 2016
    Applicant: ASML Netherlands B.V.
    Inventors: Johannes Jacobus Matheus Baselmans, Johannes Christiaan Maria Jasper
  • Patent number: 9261402
    Abstract: A method and apparatus are provided for determining apodization properties of a projection system in a lithographic apparatus. The method comprises allowing light from a given point in an illumination field to pass through the projection system along at least three different optical paths, and then determining the difference in the intensity of light received in a projection field from the two different optical paths, and calculating apodization properties of the projection system from the intensity difference. It is not necessary to know the intensity distribution in the illumination field. To provide the different optical paths a pinhole reticle provided with wedges of different orientations is used.
    Type: Grant
    Filed: March 22, 2013
    Date of Patent: February 16, 2016
    Assignee: ASML Netherlands B.V.
    Inventor: Johannes Jacobus Matheus Baselmans
  • Patent number: 9250536
    Abstract: A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.
    Type: Grant
    Filed: March 21, 2008
    Date of Patent: February 2, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Heine Melle Mulder, Johannes Jacobus Matheus Baselmans, Adrianus Franciscus Petrus Engelen, Markus Franciscus Antonius Eurlings, Hendrikus Robertus Marie Greevenbroek, Patricius Aloysius Jacobus Tinnemans, Paul Van Der Veen, Wilfred Edward Endendijk
  • Publication number: 20160004171
    Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
    Type: Application
    Filed: August 28, 2015
    Publication date: January 7, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bob STREEFKERK, Johannes Jacobus Matheus BASELMANS, Richard Joseph BRULS, Marcel Mathijs Theodore Marie DIERICHS, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Hans JANSEN, Erik Roelof LOOPSTRA, Jeroen Johannes Sophia Maria MERTENS, Johannes Catharinus Hubertus MULKENS, Ronald Walther Jeanne SEVERIJNS, Sergei SHULEPOV, Herman BOOM, Timotheus Franciscus SENGERS