Patents by Inventor Johannes Onvlee

Johannes Onvlee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190113853
    Abstract: A substrate support for supporting a substrate. The substrate support comprises a main body, a clamping device and a dither device. The main body comprises a support surface for supporting the substrate. The clamping device is arranged to provide the clamping force to clamp the substrate on the support surface. The dither device is configured to dither the clamping force. The dither device may be configured to dither the clamping force while the substrate W is being loaded onto the support surface.
    Type: Application
    Filed: March 21, 2017
    Publication date: April 18, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johannes ONVLEE, Antonius Franciscus Johannes DE GROOT, Wim SYMENS, David Ferdinand VLES
  • Patent number: 10031428
    Abstract: A system is disclosed for reducing overlay errors by controlling gas flow around a patterning device of a lithographic apparatus. The lithographic apparatus includes an illumination system configured to condition a radiation beam. The lithographic apparatus further includes a movable stage comprising a support structure that may be configured to support a patterning device. The patterning device may be configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam. In addition, the lithographic apparatus comprises a plate (410) positioned between the movable stage (401) and the projection system (208). The plate includes an opening (411) that comprises a first sidewall (411a) and a second sidewall (411b). The plate may be configured to provide a gas flow pattern (424) in a region between the movable stage and the projection system that is substantially perpendicular to an optical axis of the illumination system.
    Type: Grant
    Filed: February 20, 2014
    Date of Patent: July 24, 2018
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Koen Cuypers, Marcelo Henrique De Andrade Oliveira, Marinus Jan Remie, Chattarbir Singh, Laurentius Johannes Adrianus Van Bokhoven, Henricus Anita Jozef Wilhemus Van De Ven, José Nilton Fonseca Junior, Frank Johannes Jacobus Van Boxtel, Daniel Nathan Burbank, Erik Roelof Loopstra, Johannes Onvlee, Mark Josef Schuster, Robertus Nicodemus Jacobus Van Ballegoij, Christopher Charles Ward, Jan Steven Christiaan Westerlaken
  • Patent number: 9977351
    Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.
    Type: Grant
    Filed: July 13, 2017
    Date of Patent: May 22, 2018
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Earl William Ebert, Johannes Onvlee, Samir A. Nayfeh, Mark Josef Schuster, Peter A. Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame
  • Publication number: 20180095369
    Abstract: A lithographic apparatus including a support to support a patterning device, a substrate table to hold a substrate, and a projection system to project a radiation beam patterned by the patterning device onto a target portion of the substrate. A transparent layer is provided to protect the pattering device. The apparatus further includes a transparent layer deformation-determining device to determine a deformation profile of the transparent layer, the deformation profile of the transparent layer expressing a deformation of the transparent layer during a scanning movement of the lithographic apparatus, and a compensator device which is configured to control the projection system, the substrate table and/or the support in response to the deformation profile of the transparent layer to compensate for the deformation of the transparent layer during the scanning movement of the apparatus.
    Type: Application
    Filed: March 24, 2016
    Publication date: April 5, 2018
    Applicant: ASML Netherlands B.V.
    Inventors: Kevin VAN DE RUIT, Bart Dinand PAARHUIS, Jean-Philippe Xavier VAN DAMME, Johannes ONVLEE, Cornelis Melchior BROUWER, Pieter Jacob KRAMER
  • Patent number: 9857694
    Abstract: A system and method are provided for determining deformation of a patterning device and/or shift position of the patterning device relative. The system includes a first sensing sub-system that measures respective positions of a plurality of reference marks on the patterning device, and a second sensing sub-system that measures positions of the edge of the patterning device relative to the support. The system further includes a controller to determine an absolute position of the patterned portion and change in the absolute position based on measured respective positions of marks on the patterning device, determine a change in a relative position of the edge of the patterned device based on the measured edge positions, and estimate a change in a position of the patterning device relative to the support and a change in a pattern distortion of the patterned portion of the patterning device over a time period.
    Type: Grant
    Filed: March 5, 2015
    Date of Patent: January 2, 2018
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Bearrach Moest, Peter A. Delmastro, Johannes Onvlee, Adrianus Martinus Van Der Wielen, Christopher Charles Ward
  • Publication number: 20170363973
    Abstract: An apparatus, system, and method cool a patterning device by supplying a non-uniform gas flow. The apparatus and system include a gas supply structure that supplies a gas flow across the first surface of the patterning device. The gas supply structure includes a gas supply nozzle specially configured to create a non-uniform gas flow distribution. A greater volume or velocity of the gas flow is directed to desired portion of the patterning device.
    Type: Application
    Filed: December 2, 2015
    Publication date: December 21, 2017
    Applicants: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Thomas VENTURINO, Geoffrey Alan SCHULTZ, Daniel Nicholas GALBURT, Daniel Nathan BURBANK, Santiago E. DELPUERTO, Herman VOGEL, Johannes ONVLEE, Laurentius Johannes Adrianus VAN BOKHOVEN, Christopher Charles WARD
  • Publication number: 20170307986
    Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.
    Type: Application
    Filed: July 13, 2017
    Publication date: October 26, 2017
    Applicants: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Earl William EBERT, Johannes ONVLEE, Samir A. NAYFEH, Mark Josef SCHUSTER, Peter A. DELMASTRO, Christopher Charles WARD, Frank Johannes Jacobus VAN BOXTEL, Abdullah ALIKHAN, Daniel Nathan BURBANK, Daniel Nicholas GALBURT, Justin Matthew VERDIRAME
  • Patent number: 9766557
    Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.
    Type: Grant
    Filed: February 21, 2017
    Date of Patent: September 19, 2017
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Earl William Ebert, Johannes Onvlee, Samir A. Nayfeh, Mark Josef Schuster, Peter A. Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame
  • Patent number: 9696633
    Abstract: A substrate handling apparatus for handling a substrate is disclosed. The substrate handling apparatus includes a substrate feeding device to feed the substrate towards an exposure area, a substrate receiving device to receive the substrate from the exposure area, and a substrate stabilization device to maintain, at least in the exposure area, the substrate substantially flat at an exposure height and/or tilt, the substrate stabilization device configured for contactless stabilization of the flexible substrate.
    Type: Grant
    Filed: March 14, 2011
    Date of Patent: July 4, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Johannes Onvlee, Robert-Han Munnig Schmidt
  • Publication number: 20170160652
    Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.
    Type: Application
    Filed: February 21, 2017
    Publication date: June 8, 2017
    Applicants: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Earl William EBERT, Johannes ONVLEE, Samir A. NAYFEH, Mark Josef SCHUSTER, Peter A. DELMASTRO, Christopher Charles WARD, Frank Johannes Jacobus VAN BOXTEL, Abdullah ALIKHAN, Daniel Nathan BURBANK, Daniel Nicholas GALBURT, Justin Matthew VERDIRAME
  • Patent number: 9645502
    Abstract: In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator includes a deflector to displace the plurality of beams with respect to an exposure area.
    Type: Grant
    Filed: March 7, 2012
    Date of Patent: May 9, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Pieter Willem Herman De Jager, Vadim Yevgenyevich Banine, Johannes Onvlee, Lucas Henricus Johannes Stevens, Sander Frederik Wuister, Nikolay Nikolaevich Iosad
  • Patent number: 9632434
    Abstract: A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a patterning device support configured to support a patterning device and a reticle cooling system configured to provide substantially uniform temperature distribution across the patterning device. The reticle cooling system includes a first and second array of gas inlets configured to provide a first and second gas flow along a first and second direction across a surface of the patterning device, respectively, where first and second directions are opposite to each other. The reticle cooling system further includes a switching control system configured to control operation of the first and second arrays of gas inlets.
    Type: Grant
    Filed: April 29, 2015
    Date of Patent: April 25, 2017
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Earl William Ebert, Jr., Johannes Onvlee, Samir A. Nayfeh, Mark Josef Schuster, Peter A. Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame, Thomas Venturino
  • Patent number: 9632433
    Abstract: A patterning device support (1100) for controlling a temperature of a patterning device (1102) can include a movable component (1104). The movable component can include a gas inlet (1108) for supplying a gas flow across a surface of the patterning device and a gas outlet (1110) for extracting the gas flow. The patterning device support can also include a gas flow generator (1118) coupled to a duct (1114, 1116) for recirculating the gas flow from the gas outlet to the gas inlet.
    Type: Grant
    Filed: October 21, 2013
    Date of Patent: April 25, 2017
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Earl William Ebert, Jr., Johannes Onvlee, Samir A. Nayfeh, Mark Josef Schuster, Peter A. Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame
  • Publication number: 20170068171
    Abstract: A system and method are provided for determining deformation of a patterning device and/or shift position of the patterning device relative. The system includes a first sensing sub-system that measures respective positions of a plurality of reference marks on the patterning device, and a second sensing sub-system that measures positions of the edge of the patterning device relative to the support. The system further includes a controller to determine an absolute position of the patterned portion and change in the absolute position based on measured respective positions of marks on the patterning device, determine a change in a relative position of the edge of the patterned device based on the measured edge positions, and estimate a change in a position of the patterning device relative to the support and a change in a pattern distortion of the patterned portion of the patterning device over a time period.
    Type: Application
    Filed: March 5, 2015
    Publication date: March 9, 2017
    Applicants: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Bearrach MOEST, Peter A. DELMASTRO, Johannes ONVLEE, Adrianus Martinus VAN DER WIELEN, Christopher Charles WARD
  • Patent number: 9372412
    Abstract: A lithographic apparatus having an optical column capable of creating a pattern on a target portion of a substrate is disclosed. The optical column may have a self-emissive contrast device configured to emit a beam, and a projection system configured to project the beam onto the target portion. The apparatus may also have an actuator to move the optical column or a part thereof with respect to the substrate. The apparatus may be constructed to reduce the optical effect of density variation in a medium around the moving part of the optical column on the beam.
    Type: Grant
    Filed: August 28, 2015
    Date of Patent: June 21, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Erwin John Van Zwet, Pieter Willem Herman De Jager, Johannes Onvlee, Erik Christiaan Fritz
  • Patent number: 9335638
    Abstract: In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator may be moveable with respect the exposure area and/or the projection system may have an array of lenses to receive the plurality of beams, the array of lenses moveable with respect to the exposure area.
    Type: Grant
    Filed: August 22, 2013
    Date of Patent: May 10, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Pieter Willem Herman De Jager, Vadim Yevgenyevich Banine, Jozef Petrus Henricus Benschop, Cheng-Qun Gui, Johannes Onvlee, Erwin John Van Zwet
  • Patent number: 9316926
    Abstract: A system to control the focus of a mask-less lithographic apparatus, the apparatus including a projection system to project an image of a programmable patterning device onto a substrate. A first actuator system is configured to move at least one of the lenses of the projection system in a direction perpendicular to the optical axis of the projection system. A radiation beam expander is configured to project an image of the programmable patterning device onto the at least one lens. A second actuator system is configured to move the radiation beam expander in a direction parallel to the optical axis of the projection system in order to control the focus of the image projected onto the substrate.
    Type: Grant
    Filed: November 15, 2011
    Date of Patent: April 19, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Erwin John Van Zwet, Pieter Willem Herman De Jager, Johannes Onvlee, Hendrik De Man
  • Patent number: 9235140
    Abstract: A lithographic apparatus having an optical column capable of projecting a beam on a target portion on a substrate held by the substrate support. The optical column may have a self-emissive contrast device to emit the beam. The optical column may include a projection system to project the beam onto the target portion. The target portion has a height in a scanning direction of the substrate and a tangential width mainly perpendicular to the scanning direction, wherein a scanning speed of the substrate in the scanning direction divided by the height substantially corresponds with a rotating speed of the optical column or a part thereof divided by the tangential width of the target portion.
    Type: Grant
    Filed: February 18, 2011
    Date of Patent: January 12, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Erwin John Van Zwet, Pieter Willem Herman De Jager, Johannes Onvlee, Erik Christiaan Fritz
  • Publication number: 20150370177
    Abstract: A lithographic apparatus having an optical column capable of creating a pattern on a target portion of a substrate is disclosed. The optical column may have a self-emissive contrast device configured to emit a beam, and a projection system configured to project the beam onto the target portion. The apparatus may also have an actuator to move the optical column or a part thereof with respect to the substrate. The apparatus may be constructed to reduce the optical effect of density variation in a medium around the moving part of the optical column on the beam.
    Type: Application
    Filed: August 28, 2015
    Publication date: December 24, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Erwin John VAN ZWET, Pieter Willem Herman DE JAGER, Johannes ONVLEE, Erik Christiaan FRITZ
  • Publication number: 20150355557
    Abstract: A system is disclosed for reducing overlay errors by controlling gas flow around a patterning device of a lithographic apparatus. The lithographic apparatus includes an illumination system configured to condition a radiation beam. The lithographic apparatus further includes a movable stage comprising a support structure that may be configured to support a patterning device. The patterning device may be configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam. In addition, the lithographic apparatus comprises a plate (410) positioned between the movable stage (401) and the projection system (208). The plate includes an opening (411) that comprises a first sidewall (411a) and a second sidewall (411b). The plate may be configured to provide a gas flow pattern (424) in a region between the movable stage and the projection system that is substantially perpendicular to an optical axis of the illumination system.
    Type: Application
    Filed: February 20, 2014
    Publication date: December 10, 2015
    Applicants: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Koen CUYPERS, Marcelo Henrique DE ANDRADE OLIVEIRA, Marinus Jan REMIE, Chattarbir SINGH, Laurentius Johannes Adrianus VAN BOKHOVEN, Henricus Anita Jozef Wilhemus VAN DE VEN, José Nilton FONSECA JUNIOR, Frank Johannes Jacobus VAN BOXTEL, Daniel Nathan BURBANK, Erik Roelof LOOPSTRA, Johannes ONVLEE, Mark Josef SCHUSTER, Robertus Nicodemus Jacobus VAN BALLEGOIJ, Christopher Charles WARD, Jan Steven Christiaan WESTERLAKEN