Patents by Inventor Johannes Onvlee

Johannes Onvlee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7068351
    Abstract: A method of controlling a track apparatus in a lithocell apparatus arrangement, is presented herein. The lithocell includes a lithographic exposure apparatus configured to expose substrates and a track apparatus configured to prepare substrates before exposure and develop substrates after exposure. The method includes predicting times at which the lithographic exposure apparatus will be available to accept a prepared substrate for exposure from the track apparatus, and adjusting a rate at which the track apparatus prepares substrates so that a substrate is prepared in time for acceptance by the lithographic exposure apparatus. By adjusting the track rate so that substrates are ready just as the lithographic exposure apparatus needs them, the use of the buffer in the track can be largely avoided or even eliminated entirely.
    Type: Grant
    Filed: February 20, 2004
    Date of Patent: June 27, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Norbertus Josephus Martinus Van Den Nieuwelaar, Johannes Onvlee, Roel Boumen
  • Publication number: 20060072108
    Abstract: To enable differentiation between a particle and a ghost particle, a detector system resolves radiation from a ghost particle from radiation from an actual particle. The detector system outputs at least two detector signals corresponding to intensities of radiation being incident on different parts of the detector system or the detector system outputs at least two detector signals corresponding to intensities of radiation with different wavelengths being incident on the detector system. If radiation is received from a ghost particle, not each of the at least two detector signals has a level above a predetermined threshold level, whereas radiation received from a particle results in the signals having substantially a same level above a threshold level.
    Type: Application
    Filed: October 4, 2005
    Publication date: April 6, 2006
    Applicant: ASML Nethderlands B.V.
    Inventors: Johannes Onvlee, Raimond Visser, Peter Greve, Johannes Franssen, Erwin Verhagen
  • Publication number: 20060072107
    Abstract: To enable differentiation between a particle and a ghost particle, a detector system is presented. The detector system is configured to output at least two detector signals corresponding to an intensity of radiation being incident on the detector system. If radiation is received from a ghost particle, not all of the at least two detector signals has a level above a predetermined threshold level, whereas radiation received from a contaminating particle results in all signals having a level above a threshold level. Thus, it may be determined with a high accuracy whether a particle or a ghost particle is redirecting radiation towards the detector system.
    Type: Application
    Filed: October 5, 2004
    Publication date: April 6, 2006
    Applicant: ASML Netherlands B.V.
    Inventors: Johannes Onvlee, Peter Greve, Johannes Hendrikus Franssen
  • Publication number: 20050278049
    Abstract: A method of planning tasks to be performed in a machine derives a precedence graph by linking subsidiary tasks to a sequence of key tasks to create a scheduling problem that can be solved by an automated scheduler. In the event of a trigger, such as an order for new work or a machine exception, work can be retimed, rescheduled or replanned.
    Type: Application
    Filed: May 25, 2004
    Publication date: December 15, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Norbertus Van Den Nieuwelaar, Johannes Onvlee, Roel Boumen, Henricus Van Lierop, Robert Dumont, Jacobus Rooda
  • Publication number: 20050185952
    Abstract: A method of controlling a track apparatus in a lithocell apparatus arrangement, is presented herein. The lithocell includes a lithographic exposure apparatus configured to expose substrates and a track apparatus configured to prepare substrates before exposure and develop substrates after exposure. The method comprises predicting times at which the lithographic exposure apparatus will be available to accept a prepared substrate for exposure from the track apparatus, and adjusting a rate at which the track apparatus prepares substrates so that a substrate is prepared in time for acceptance by the lithographic exposure apparatus. By adjusting the track rate so that substrates are ready just as the lithographic exposure apparatus needs them, the use of the buffer in the track can be largely avoided or even eliminated entirely.
    Type: Application
    Filed: February 20, 2004
    Publication date: August 25, 2005
    Applicant: ASML Netherlands B.V.
    Inventors: Norbertus Van Den Nieuwelaar, Johannes Onvlee, Roel Boumen
  • Publication number: 20050137734
    Abstract: A method of generating a schedule for operation of a machine forming at least a part of a lithographic apparatus or a lithographic processing cell is disclosed. In the method, a plurality of weight factors are received for respective ones of a plurality of qualities affecting the outcome of a lithographic process. An optimum schedule of tasks to be performed to complete said lithographic process is generated, the optimum schedule being one whose outcome has a maximum value of total quality, where total quality is the sum of the products of the values of each of said qualities and the respective weight factors.
    Type: Application
    Filed: May 17, 2004
    Publication date: June 23, 2005
    Applicant: ASML Netherlands B.V.
    Inventors: Norbertus Josephus Martinus Nieuwelaar, Johannes Onvlee, Henricus Petrus Van Lierop, Niels Cornelis Wilhelmus Braspenning, Jacobus Rooda
  • Publication number: 20050102723
    Abstract: Scheduling of tasks in a lithographic apparatus, track unit or lithocell is performed by maintaining a register of the state of the machine and a database of tasks performable by the machine, generating possible sequences of tasks based on pre- and post-conditions on the system state (rather than a precedence relation) and selecting a sequence from the generated sequences that meets a given beginning state of the machine and a desired end state. Embodiments of the invention also allow for automated recovery from exceptions.
    Type: Application
    Filed: September 30, 2004
    Publication date: May 12, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Norbertus Josephus Van Den Nieuwelaar, Willem Herman Gertruda Koenen, Johannes Onvlee, Henricus Petrus Van Lierop, Robert Dumont, Jacobus Rooda, Michiel Stoets
  • Publication number: 20050007671
    Abstract: Each pixel of a spatial light modulator comprises a movable mirror, a light sensitive element and control circuitry to drive an actuator set the movable mirror to a state determined by a signal received by the light sensitive element.
    Type: Application
    Filed: June 16, 2004
    Publication date: January 13, 2005
    Inventor: Johannes Onvlee
  • Publication number: 20040218168
    Abstract: The invention relates to a lithographic projection assembly, comprising at least two load locks for transferring substrates between a first environment and a second environment, the second environment having a lower pressure than the first environment; a substrate handler comprising a handler chamber in which the second environment prevails; a lithographic projection apparatus comprising a projection chamber.
    Type: Application
    Filed: March 11, 2004
    Publication date: November 4, 2004
    Applicant: ASML Netherlands B.V.
    Inventors: Pieter Johannes Marius Van Groos, Pieter Renaat Maria Hennus, Jan Frederik Hoogkamp, Albert Jan Hendrik Klomp, Johannes Onvlee, Raimond Visser
  • Patent number: 5452408
    Abstract: A method of selectively assigning to a picture element to be imaged with a color reproduction system a pertinent (permanent) indication relating to the distinguishing of color with respect to picture element, wherein, on the basis of the associated parameter values related to color saturation and intensity, a choice is first made for that picture element from a permanent indication of colorlessness a permanent indication of color behavior, and a provisional indication concerning an undefined color behavior. In the case of a picture element having a provisional indication, this indication is then converted to a permanent indication on the basis of the results of an analysis of the distribution of parameter values in the color space with respect to picture elements occurring within an environment of the associated picture element. According to this method, pastel hues can be reproduced in a logical and perceptually acceptable manner despite the presence of scanner noise.
    Type: Grant
    Filed: October 7, 1993
    Date of Patent: September 19, 1995
    Assignee: OCE'-Nederland, B.V.
    Inventors: Jacob A. Westdijk, Jacobus H. M. Schonenberg, Monique G. M. Sommer, Johannes Onvlee