Abstract: A balcony system for use with a building opening of a building structure is provided. The balcony system includes a balcony unit adapted to project from the building opening, a counterforce unit adapted to compensate for forces applied to the balcony unit, and a first connecting element connecting the balcony unit and the counterforce unit. The counterforce unit comprises a base unit, a top unit on the base unit, and a second connecting element. The base unit is configured for stationary installation with respect to the building structure, such as for stationary installation on a floor of the building structure. The first connecting element connects the balcony unit and the top unit. The second connecting element connects the top unit and the base unit. The top unit is movable relative to the base unit.

Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.

Abstract: A balcony system for use with a building opening of a building structure is provided. The balcony system includes a balcony unit adapted to project from the building opening, a counterforce unit adapted to compensate for forces applied to the balcony unit, and a first connecting element connecting the balcony unit and the counterforce unit. The counterforce unit comprises a base unit, a top unit on the base unit, and a second connecting element. The base unit is configured for stationary installation with respect to the building structure, such as for stationary installation on a floor of the building structure. The first connecting element connects the balcony unit and the top unit. The second connecting element connects the top unit and the base unit. The top unit is movable relative to the base unit.

Abstract: A method of operating a capacitive measurement system for compensation of temperature influence is described. The capacitive measurement system includes at least one capacitive sensor member in an installed state and a capacitive measurement circuit for determining a complex impedance of an unknown capacitance from a complex sense current through the at least one capacitive sensor member. In the method, a calibration measurement is carried out to obtain temperature characteristics of both the real part and the imaginary part of determined impedances. In following impedance measurements of the unknown capacitance at a current temperature, the real part and the imaginary part of the measured impedance is determined, and based on the real part determined at the current temperature and the determined temperature characteristics of both the real part and the imaginary part, the imaginary part of the impedance determined at the current temperature is corrected.

Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.

Abstract: A downhole adjustable drilling inclination tool including an outer housing, an inner housing, a compression spring, a piston assembly, and a tilt housing. The piston assembly is fluidly controlled to move axially along the outer diameter of a bottom end portion of the inner housing so that a rotatable control ring moves about a guide pin to hold a neutral, straight, or bent position of the piston assembly corresponding to an amount of compression of the compression spring. The tilt housing partially disposed within the outer housing includes a bolt plate pin channel configured to receive a bolt plate pin of the piston assembly that travels to tilt the tilt housing by a tilting mechanism that connects the tilt housing to the outer housing and position the tilt housing in a neutral, straight, or bent position corresponding to the neutral, straight, or bent position of the piston assembly.

Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.

Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.

Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.

Abstract: An online system receives comments provided by users and analyzes them. The users may be associated with an organization, for example, employees of an enterprise may provide comments related to the enterprise. The online system classifies the comments to determine whether the comments are prescriptive or non-prescriptive. The online system may generate reports based on the classification of the comments. The online system may use a machine learning model for classifying the comments. The features used for the machine learning model include an indication of whether the input comment is associated with a question, n-grams from the comment, location of verbs in sentences, and so on.

Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.

Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.

Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.

Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.

Abstract: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further includes a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid.

Abstract: A fluid handling structure, lithographic apparatus and device manufacturing method are disclosed. According to a disclosed embodiment, the fluid handling structure is configured to confine an immersion fluid in a space between a final element of a projection system and a facing surface during movement of the facing surface relative to the structure, wherein the structure has at least one heater to heat a portion of the facing surface adjacent to the heater, the at least one heater having a fluid heater to heat fluid flow from the structure onto the facing surface, the heater thereby heating the portion.

Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.

Abstract: A downhole adjustable drilling inclination tool including an outer housing, an inner housing, a compression spring, a piston assembly, and a tilt housing. The piston assembly is fluidly controlled to move axially along the outer diameter of a bottom end portion of the inner housing so that a rotatable control ring moves about a guide pin to hold a neutral, straight, or bent position of the piston assembly corresponding to an amount of compression of the compression spring. The tilt housing partially disposed within the outer housing includes a bolt plate pin channel configured to receive a bolt plate pin of the piston assembly that travels to tilt the tilt housing by a tilting mechanism that connects the tilt housing to the outer housing and position the tilt housing in a neutral, straight, or bent position corresponding to the neutral, straight, or bent position of the piston assembly.