Abstract: Systems and methodology for orienting the tip/tilt and vertical height of samples, preferably automated, as applied in ellipsometer and the like systems.

Abstract: A rotating compensator spectroscopic ellipsometer or polarimeter system having a source of a polychromatic beam of electromagnetic radiation, a polarizer, a stage for supporting a material system, an analyzer, a dispersive optics and a detector system which comprises a multiplicity of detector elements, the system being functionally present in an environmental control chamber and therefore suitable for application in wide spectral range, (for example, 130-1700 nm). Preferred compensator design involves a substantially achromatic multiple element compensator systems wherein multiple total internal reflections enter retardance into an entered beam of electromagnetic radiation, and the elements thereof are oriented to minimize changes in the net retardance vs. the input beam angle resulting from changes in the position and/or rotation of the system of elements.

Abstract: A spectroscopic system for adjusting spacing between an adjacent source/detector as a unit, and a sample, and a reflecting means for directing an incident beam which reflects from said sample back onto said sample and then into the detector along a locus which is in a plane of incidence that is offset from that of the incident beam, or directly from the reflecting means into the detector, including means for reducing reflections of a beam of electromagnetic from the back of a sample, including methodology of use.

Abstract: A rotating compensator spectroscopic ellipsometer or polarimeter system having a source of a polychromatic beam of electromagnetic radiation, a polarizer, a stage for supporting a material system, an analyzer, a dispersive optics and a detector system which comprises a multiplicity of detector elements, the system being functionally present in an environmental control chamber and therefore suitable for application in wide spectral range, (for example, 130-1700 nm). Preferred compensator design involves a substantially achromatic multiple element compensator systems wherein multiple total internal reflections enter retardance into an entered beam of electromagnetic radiation, and the elements thereof are oriented to minimize changes in the net retardance vs. the input beam angle resulting from changes in the position and/or rotation of the system of elements.

Abstract: Disclosed are system for and method of analyzing the substantially the exact same point on a sample system with at least two wavelengths, or at least two ranges of wavelengths for which the focal lengths do not vary more than within an acceptable amount.

Abstract: System for and Method of analyzing a sample at substantially the exact same small spot thereon with a plurality of wavelengths using a lens system which provides the same focal length at at least two wavelengths at various positions thereof with respect to a sample, including analyzing data obtained at those wavelengths.

Abstract: Systems and methodology for orienting the tip/tilt and vertical height of samples, preferably automated, as applied in ellipsometer and the like systems.

Abstract: A system and method of preventing substrate backside reflected components in a beam of electromagnetic radiation caused to reflect from the surface of a sample in an ellipsometer or polarimeter system, involving placing a mask adjacent to the surface of the sample which allows electromagnetic radiation to access the sample over only a limited area, wherein the mask can include detector elements for collecting electromagnetic radiation reflected from the sample backside.

Abstract: A spectrophotometer, reflectometer, ellipsometer polarimeter or the like system having a detector means for independently intercepting electromagnetic radiation reflected from a sample frontside or backside, and methodology for pursuing less correlated determination of refractive index and thickness values.

Abstract: Simultaneous use of wavelengths in at least two ranges selected from RADIO, MICRO, FIR, IR, NIR-VIS-NUV, UV, DUV, VUV EUV, XRAY in a regression procedure to evaluate parameters in mathematical dispersion structures to model dielectric functions.

Abstract: A system for determination of optical constants of liquids, including provision for reducing stress induced effects while obtaining data.

Abstract: Disclosed are system for and method of analyzing substantially the exact same spot size on a sample system with at least two wavelengths for which the focal lengths do not vary more than within an acceptable amount.

Abstract: A spectroscopic ellipsometer or polarimeter system having a source of a polychromatic beam of electromagnetic radiation, a polarizer, a stage for supporting a material system, an analyzer, a dispersive optics and a detector system which comprises a multiplicity of detector elements, there being apertures before the stage for supporting a material system, and thereafter, the system further having at least one multi-element lens and optionally being present in an environmental control chamber.

Abstract: Disclosed are improvements in ellipsometer and the like systems capable of operating in the Vacuum-Ultra-Violet (VUV) to Near Infrared (NIR) wavelength range, and methodology of use.

Abstract: Systems and methods for providing and enhancing electromagnetic radiation beam radial energy homogeneity and intensity vs. wavelength content, for reliably directing electromagnetic radiation emitted by a source thereof in a common direction, for achromatically reducing spot size on a sample (eg. liquid cavity containing lenses and low aberration 1:1 imaging systems modified to perform as spatial filters), and for directing different wavelengths into different detectors, in ellipsometer, polarizer or the like systems.

Abstract: A system for sequentially providing electromagnetic radiation to a spot on a sample at different angles of incidence, and after reflection therefrom into a detector. The system includes a plurality of spherical mirrors, and a refractive element for correcting aberration.

Abstract: Spectroscopic ellipsometer systems which include polarizer and analyzer elements which remain fixed in position during data acquisition while at least one continuously rotating or step-wise rotatable compensator imposes a continuously variable or plurality of sequentially discrete polarization states on a beam of electromagnetic radiation, including a system of mirrors and refractive elements for correcting aberation while directing a beam of electromagnetic radiation to a spot on a sample at a multiple different angles-of-incidence.

Abstract: Disclosed is application of oblique angle of incidence, reflection and/or transmission mode spectroscopic ellipsometry PSI and/or DELTA, (including combinations thereof and/or mathematical equivalents), vs. wavelength data over an intermediate wavelength band range around a pass or reject band, to monitor and/or control fabrication of multiple layer high/low refractive index band-pass, band-reject and varied attenuation vs. wavelength thin film interference filters, either alone or in combination with transmissive non-ellipsometric electromagnetic beam turning point vs. layer data obtained at an essentially normal angle of incidence.

Abstract: Improved methodology for monitoring deposition or removal of material to or from a process and/or wittness substrate which demonstrates a negative e1 at some wavelength. The method involves detection of changes in P-polarized electromagnetism ellipsometric DELTA at SPR Resonance Angle-of-Incidence (AOI) to monitor deposition of and/or removal of minute amounts of materials onto, or from, said process and/or witness substrate. The methodology can optionally monitor ellipsometric PSI, and involves simultaneously or sequentially applying non-P-polarized electromagnetism at the same angle of incidence, or electromagnetic radiation of any polarization at a different angle-of-incidence and wavelength to the process or wittness substrate and application of conventional ellipsometric analysis.

Abstract: A substantially self-contained “on-board” material system investigation system functionally mounted on a three dimensional locational system to enable positioning at desired locations on, and distances from, the surface of a large sample, including the capability to easily and conveniently change the angle-of-incidence of a beam of electromagnetic radiation onto a sample surface.