Patents by Inventor John B. Putman

John B. Putman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12585839
    Abstract: A computing system receives one or more process parameters to be optimized during a multi-step manufacturing process. The computing system initiates a process prediction model in accordance with the one or more process parameters. The computing system simulates the multi-step manufacturing process using a plurality of sets of different setpoints until the one or more process parameters are optimized. The computing system identifies a first set of setpoints from the plurality of sets of different setpoints that optimized the one or more process parameters. The computing system causes the station controller to apply the first set of setpoints to the one or more stations.
    Type: Grant
    Filed: February 16, 2024
    Date of Patent: March 24, 2026
    Assignee: Nanotronics Imaging, Inc.
    Inventors: John B. Putman, Matthew C. Putman, Jonathan Lee, Sarah Constantin, Damas Limoge
  • Publication number: 20260050247
    Abstract: Various embodiments relate to a method for analyzing manufacturing process data. The method includes: receiving, by a processor, a sequence of sensor outputs from a plurality of sensors monitoring a manufacturing process; predicting, using a transformer model executed by the processor, future manufacturing process parameters based on the sensor outputs; generating one or more key influencers on a current system state based on an attention matrix of the transformer model; analyzing the predicted parameters to identify an out-of-specification parameter; and identifying one or more key contributors to the out-of-specification parameter based on the attention matrix of a transformer head associated therewith.
    Type: Application
    Filed: August 15, 2025
    Publication date: February 19, 2026
    Applicant: Nanotronics Imaging, Inc.
    Inventors: John B. Putman, Matthew C. Putman, Joanna Lee, Damas Limoge, Jonathan Bobrow
  • Publication number: 20250385635
    Abstract: A roofing system for renewable energy applications and a method for installing the same are disclosed herein. The roofing system includes a roofing sub-structure, a plurality of openings, a channel, and a plurality of filler panels. The plurality of openings is formed in the roofing sub-structure. The channel is formed in the roofing sub-structure. The channel is configured to receive wiring. The plurality of filler is panels attached to the roofing sub-structure via the plurality of openings. The plurality of filler panels provides standard places for the addition of solar panels to the roofing system.
    Type: Application
    Filed: June 17, 2024
    Publication date: December 18, 2025
    Applicant: Nanotronics Imaging, Inc.
    Inventors: John B. Putman, Matthew C. Putman
  • Patent number: 12449792
    Abstract: Aspects of the disclosed technology encompass the use of a deep learning controller for monitoring and improving a manufacturing process. In some aspects, a method of the disclosed technology includes steps for: receiving a plurality of control values from two or more stations, at a deep learning controller, wherein the control values are generated at the two or more stations deployed in a manufacturing process, predicting an expected value for an intermediate or final output of an article of manufacture, based on the control values, and determining if the predicted expected value for the article of manufacture is in-specification. In some aspects, the process can further include steps for generating control inputs if the predicted expected value for the article of manufacture is not in-specification. Systems and computer-readable media are also provided.
    Type: Grant
    Filed: April 8, 2024
    Date of Patent: October 21, 2025
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge
  • Publication number: 20250315017
    Abstract: A training set that includes at least two data types corresponding to operations and control of a manufacturing process is obtained. A deep learning processor is trained to predict expected characteristics of output control signals that correspond with one or more corresponding input operating instructions. A first input operating instruction is received from a first signal splitter. A first output control signal is received from a second signal splitter. The deep learning processor correlates the first input operating instruction and the first output control signal. Based on the correlating, the deep learning processor determines that the first output control signal is not within a range of expected values based on the first input operating instruction. Responsive to the determining, an indication of an anomalous activity is provided as a result of detection of the anomalous activity in the manufacturing process.
    Type: Application
    Filed: June 20, 2025
    Publication date: October 9, 2025
    Applicant: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, Joanna Lee, Damas Limoge
  • Patent number: 12368223
    Abstract: A system is disclosed herein. The system includes a splitter board. The splitter board includes a microprocessor, a converter, and a bypass relay. The converter includes analog-to-digital circuitry and digital-to-analog circuitry. The bypass relay is configurable between a first state and a second state. In the first state, the bypass relay is configured to direct an input signal to the converter. The converter converts the input signal to a converted input signal and splits the converted input signal into a first portion and a second portion. The first portion is directed to the microprocessor. The second portion is directed to an output port of the splitter board for downstream processes. In the second state, the bypass relay is configured to cause the input signal to bypass the converter. The bypass relay directs the input signal to the output port of the splitter board for the downstream processes.
    Type: Grant
    Filed: April 8, 2024
    Date of Patent: July 22, 2025
    Assignee: Nanotronics Imaging, Inc.
    Inventors: John B. Putman, Matthew C. Putman, Damas Limoge, Michael Moskie, Joanna Lee
  • Patent number: 12339631
    Abstract: A training set that includes at least two data types corresponding to operations and control of a manufacturing process is obtained. A deep learning processor is trained to predict expected characteristics of output control signals that correspond with one or more corresponding input operating instructions. A first input operating instruction is received from a first signal splitter. A first output control signal is received from a second signal splitter. The deep learning processor correlates the first input operating instruction and the first output control signal. Based on the correlating, the deep learning processor determines that the first output control signal is not within a range of expected values based on the first input operating instruction. Responsive to the determining, an indication of an anomalous activity is provided as a result of detection of the anomalous activity in the manufacturing process.
    Type: Grant
    Filed: April 8, 2024
    Date of Patent: June 24, 2025
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, Joanna Lee, Damas Limoge
  • Patent number: 12298489
    Abstract: A fluorescence microscopy inspection system includes light sources able to emit light that causes a specimen to fluoresce and light that does not cause a specimen to fluoresce. The emitted light is directed through one or more filters and objective channels towards a specimen. A ring of lights projects light at the specimen at an oblique angle through a darkfield channel. One of the filters may modify the light to match a predetermined bandgap energy associated with the specimen and another filter may filter wavelengths of light reflected from the specimen and to a camera. The camera may produce an image from the received light and specimen classification and feature analysis may be performed on the image.
    Type: Grant
    Filed: May 26, 2023
    Date of Patent: May 13, 2025
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Denis Sharoukhov
  • Publication number: 20250130538
    Abstract: A deep learning process receives desired process values associated with the one or more process stations. The deep learning processor receives desired target values for one or more key performance indicators of the manufacturing process. The deep learning processor simulates the manufacturing process to generate expected process values and expected target values for the one or more key performance indicators to optimize the one or more key performance indicators. The simulating includes generating a proposed state change of at least one processing parameter of the initial set of processing parameters. The deep learning processor determines that expected process values and the expected target values are within an acceptable limit of the desired process values and the desired target values. Based on the determining, the deep learning processes causes a change to the initial set of processing parameters based on the proposed state change.
    Type: Application
    Filed: November 25, 2024
    Publication date: April 24, 2025
    Applicant: Nanotronics Imaging, Inc.
    Inventors: John B. Putman, Sarah Constantin, Valerie Bordelanne, Damas Limoge, Joanna Lee
  • Publication number: 20250082878
    Abstract: A positive airway pressure device includes a blower, a chamber, a sensor, and a controller. The controller is configured to perform operations. The operations include determining a baseline respiratory response for a patient. The operations further include initializing the blower to deliver a therapy pressure to the patient. The operations further include receiving, from the sensor, real-time respiratory response data while delivering therapy to the patient. The operations further include analyzing the real-time respiratory response data to determine whether a sleep disruption has occurred by comparing the real-time respiratory response data to the baseline respiratory response for the patient. The operations further include, based on the analyzing, determining that a sleep disruption has occurred based on an anomaly detected in the real-time respiratory response data. The operations further include, based on the determining, initiating an action to account for the sleep disruption.
    Type: Application
    Filed: July 15, 2024
    Publication date: March 13, 2025
    Applicant: Nanotronics Health, LLC
    Inventors: John B. Putman, Matthew C. Putman, Julie A. Orlando
  • Patent number: 12243293
    Abstract: A system and method for generating a training data set for training a machine learning model to detect defects in specimens is described herein. A computing system cause presentation of an image on a device of a user. The image includes at least one defect on an example specimen. The computing system receives an annotated image from the user. The user annotated the image using an input via the device. The input includes a first indication of a location of the defect and a second indication of a class corresponding to the defect. The computing system adjusts the annotated image to standardize the input based on an error profile of the user and the class corresponding to the defect. The computing system uploads the annotated image for training the machine learning model.
    Type: Grant
    Filed: August 14, 2023
    Date of Patent: March 4, 2025
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Anuj Doshi, Jonathan Lee, John B. Putman
  • Publication number: 20250028819
    Abstract: A controller emulator, coupled to an interface that exposes the controller emulator to inputs from external sources, provides one or more control signals to a process simulator and a deep learning process. In response, the process simulator simulates response data that is provided to the deep learning processor. The deep learning processor generates expected response data and expected behavioral pattern data for the one or more control signals, as well as actual behavioral pattern data for the simulated response data. A comparison of at least one of the simulated response data to the expected response data and the actual behavioral pattern data to the expected behavioral pattern data is performed to determine whether anomalous activity is detected. As a result of detecting anomalous activity, one or more operations are performed to address the anomalous activity.
    Type: Application
    Filed: October 7, 2024
    Publication date: January 23, 2025
    Applicant: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Andrew Sundstrom, James Williams, III
  • Patent number: 12174361
    Abstract: A method and system for mapping fluid objects on a substrate using a microscope inspection system that includes a light source, imaging device, stage for moving a substrate disposed on the stage, and a control module. A computer analysis system includes an object identification module that identifies for each of the objects on the substrate, an object position on the substrate including a set of X, Y, and ? coordinates using algorithms, networks, machines and systems including artificial intelligence and image processing algorithms. At least one of the objects is fluid and has shifted from a prior position or deformed from a prior size.
    Type: Grant
    Filed: November 13, 2023
    Date of Patent: December 24, 2024
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, John Cruickshank, Julie Orlando, Adele Frankel, Brandon Scott
  • Patent number: 12153387
    Abstract: A deep learning process receives desired process values associated with the one or more process stations. The deep learning processor receives desired target values for one or more key performance indicators of the manufacturing process. The deep learning processor simulates the manufacturing process to generate expected process values and expected target values for the one or more key performance indicators to optimize the one or more key performance indicators. The simulating includes generating a proposed state change of at least one processing parameter of the initial set of processing parameters. The deep learning processor determines that expected process values and the expected target values are within an acceptable limit of the desired process values and the desired target values. Based on the determining, the deep learning processes causes a change to the initial set of processing parameters based on the proposed state change.
    Type: Grant
    Filed: August 31, 2023
    Date of Patent: November 26, 2024
    Assignee: Nanotronics Imaging, Inc.
    Inventors: John B. Putman, Sarah Constantin, Valerie Bordelanne, Damas Limoge, Jonathan Lee
  • Patent number: 12155673
    Abstract: A system including a deep learning processor obtains response data of at least two data types from a set of process stations performing operations as part of a manufacturing process. The system analyzes factory operation and control data to generate expected behavioral pattern data. Further, the system uses the response data to generate actual behavior pattern data for the process stations. Based on an analysis of the actual behavior pattern data in relation to the expected behavioral pattern data, the system determines whether anomalous activity has occurred as a result of the manufacturing process. If it is determined that anomalous activity has occurred, the system provides an indication of this anomalous activity.
    Type: Grant
    Filed: June 23, 2021
    Date of Patent: November 26, 2024
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge, Andrew Sundstrom, James Williams, III
  • Patent number: 12153411
    Abstract: Aspects of the disclosed technology encompass the use of a deep learning controller for monitoring and improving a manufacturing process. In some aspects, a method of the disclosed technology includes steps for: receiving a plurality of control values from two or more stations, at a deep learning controller, wherein the control values are generated at the two or more stations deployed in a manufacturing process, predicting an expected value for an intermediate or final output of an article of manufacture, based on the control values, and determining if the predicted expected value for the article of manufacture is in-specification. In some aspects, the process can further include steps for generating control inputs if the predicted expected value for the article of manufacture is not in-specification. Systems and computer-readable media are also provided.
    Type: Grant
    Filed: June 5, 2023
    Date of Patent: November 26, 2024
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge
  • Patent number: 12153412
    Abstract: Aspects of the disclosed technology encompass the use of a deep-learning controller for monitoring and improving a manufacturing process. In some aspects, a method of the disclosed technology includes steps for: receiving control values associated with a process station in a manufacturing process, predicting an expected value for an article of manufacture output from the process station, and determining if the deep-learning controller can control the manufacturing process based on the expected value. Systems and computer-readable media are also provided.
    Type: Grant
    Filed: July 24, 2023
    Date of Patent: November 26, 2024
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge
  • Patent number: 12120131
    Abstract: A system including a deep learning processor obtains response data of at least two data types from a set of process stations performing operations as part of a manufacturing process. The system analyzes factory operation and control data to generate expected behavioral pattern data. Further, the system uses the response data to generate actual behavior pattern data for the process stations. Based on an analysis of the actual behavior pattern data in relation to the expected behavioral pattern data, the system determines whether anomalous activity has occurred as a result of the manufacturing process. If it is determined that anomalous activity has occurred, the system provides an indication of this anomalous activity.
    Type: Grant
    Filed: June 23, 2021
    Date of Patent: October 15, 2024
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge, Andrew Sundstrom, James Williams, III
  • Patent number: 12118089
    Abstract: A simulated process is initiated. The simulated process includes generating, by an emulator, a control signal based on external inputs. The simulated process further includes processing, by a simulator, the control signal to generate simulated response data. The simulated process further includes generating, by a deep learning processor, expected behavioral pattern data based on the simulated response data. An actual process is initiated by initializing setpoints for a process station in a manufacturing system. The actual process includes generating, by the deep learning processor, actual behavioral pattern data based on actual process data from the at least one process station. The deep learning processor compares the expected behavioral pattern to the actual behavioral pattern. Based on the comparing, the deep learning processor determines that anomalous activity is present in the manufacturing system. Based on the anomalous activity being present, the deep learning processor initiates an alert protocol.
    Type: Grant
    Filed: March 29, 2024
    Date of Patent: October 15, 2024
    Assignee: Nanotronics Imagiing, Inc.
    Inventors: John B. Putman, Joanna Lee, Matthew C. Putman
  • Patent number: 12117814
    Abstract: Aspects of the disclosed technology encompass the use of a deep-learning controller for monitoring and improving a manufacturing process. In some aspects, a method of the disclosed technology includes steps for: receiving control values associated with a process station in a manufacturing process, predicting an expected value for an article of manufacture output from the process station, and determining if the deep-learning controller can control the manufacturing process based on the expected value. Systems and computer-readable media are also provided.
    Type: Grant
    Filed: July 24, 2023
    Date of Patent: October 15, 2024
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge