Patents by Inventor John B. Putman

John B. Putman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11086988
    Abstract: A controller emulator, coupled to an interface that exposes the controller emulator to inputs from external sources, provides one or more control signals to a process simulator and a deep learning process. In response, the process simulator simulates response data that is provided to the deep learning processor. The deep learning processor generates expected response data and expected behavioral pattern data for the one or more control signals, as well as actual behavioral pattern data for the simulated response data. A comparison of at least one of the simulated response data to the expected response data and the actual behavioral pattern data to the expected behavioral pattern data is performed to determine whether anomalous activity is detected. As a result of detecting anomalous activity, one or more operations are performed to address the anomalous activity.
    Type: Grant
    Filed: June 12, 2020
    Date of Patent: August 10, 2021
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Andrew Sundstrom, James Williams, III
  • Publication number: 20210224966
    Abstract: Systems, methods, and computer-readable media for feedback on and improving the accuracy of super-resolution imaging. In some embodiments, a low resolution image of a specimen can be obtained using a low resolution objective of a microscopy inspection system. A super-resolution image of at least a portion of the specimen can be generated from the low resolution image of the specimen using a super-resolution image simulation. Subsequently, an accuracy assessment of the super-resolution image can be identified based on one or more degrees of equivalence between the super-resolution image and one or more actually scanned high resolution images of at least a portion of one or more related specimens identified using a simulated image classifier. Based on the accuracy assessment of the super-resolution image, it can be determined whether to further process the super-resolution image. The super-resolution image can be further processed if it is determined to further process the super-resolution image.
    Type: Application
    Filed: April 5, 2021
    Publication date: July 22, 2021
    Applicant: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Joseph Succar
  • Patent number: 11063965
    Abstract: A system including a deep learning processor obtains response data of at least two data types from a set of process stations performing operations as part of a manufacturing process. The system analyzes factory operation and control data to generate expected behavioral pattern data. Further, the system uses the response data to generate actual behavior pattern data for the process stations. Based on an analysis of the actual behavior pattern data in relation to the expected behavioral pattern data, the system determines whether anomalous activity has occurred as a result of the manufacturing process. If it is determined that anomalous activity has occurred, the system provides an indication of this anomalous activity.
    Type: Grant
    Filed: February 4, 2020
    Date of Patent: July 13, 2021
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge, Andrew Sundstrom, James Williams, III
  • Publication number: 20210208377
    Abstract: A process is provided for imaging a surface of a specimen with an imaging system that employs a BD objective having a darkfield channel and a bright field channel, the BD objective having a circumference. The specimen is obliquely illuminated through the darkfield channel with a first arced illuminating light that obliquely illuminates the specimen through a first arc of the circumference. The first arced illuminating light reflecting off of the surface of the specimen is recorded as a first image of the specimen from the first arced illuminating light reflecting off the surface of the specimen, and a processor generates a 3D topography of the specimen by processing the first image through a topographical imaging technique. Imaging apparatus is also provided as are further process steps for other embodiments.
    Type: Application
    Filed: March 22, 2021
    Publication date: July 8, 2021
    Applicant: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, Julie A. Orlando, Jospeh G. Bulman
  • Publication number: 20210194897
    Abstract: A system including a deep learning processor obtains response data of at least two data types from a set of process stations performing operations as part of a manufacturing process. The system analyzes factory operation and control data to generate expected behavioral pattern data. Further, the system uses the response data to generate actual behavior pattern data for the process stations. Based on an analysis of the actual behavior pattern data in relation to the expected behavioral pattern data, the system determines whether anomalous activity has occurred as a result of the manufacturing process. If it is determined that anomalous activity has occurred, the system provides an indication of this anomalous activity.
    Type: Application
    Filed: February 4, 2020
    Publication date: June 24, 2021
    Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge, Andrew Sundstrom, James Williams, III
  • Publication number: 20210181121
    Abstract: The disclosed technology relates to an inspection apparatus that includes a stage configured to retain a specimen for inspection, an imaging device having a field of view encompassing at least a portion of the stage to view a specimen retained on the stage, and a plurality of lights disposed on a moveable platform. The inspection apparatus can further include a control module coupled to the imaging device, each of the lights and the moveable platform. The control module is configured to perform operations including: receiving image data from the imaging device, where the image data indicates an illumination landscape of light incident on the specimen; and automatically modifying, based on the image data, an elevation of the moveable platform or an intensity of one or more of the lights to adjust the illumination landscape. Methods and machine-readable media are also contemplated.
    Type: Application
    Filed: February 8, 2021
    Publication date: June 17, 2021
    Applicant: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, John Moffitt, Michael Moskie, Jeffrey Andersen, Scott Pozzi-Loyola, Julie Orlando
  • Publication number: 20210166355
    Abstract: An inspection apparatus includes a specimen stage, one or more imaging devices and a set of lights, all controllable by a control system. By translating or rotating the one or more imaging devices or specimen stage, the inspection apparatus can capture a first image of the specimen that includes a first imaging artifact to a first side of a reference point and then capture a second image of the specimen that includes a second imaging artifact to a second side of the reference point. The first and second imaging artifacts can be cropped from the first image and the second image respectively, and the first image and the second image can be digitally stitched together to generate a composite image of the specimen that lacks the first and second imaging artifacts.
    Type: Application
    Filed: February 8, 2021
    Publication date: June 3, 2021
    Applicant: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, John Moffitt, Michael Moskie, Jeffrey Andresen, Scott Pozzi-Loyola, Julie Orlando
  • Publication number: 20210141463
    Abstract: An apparatus for manipulating an object includes first and second gesture controllers, each operatively connected to the object and structured and programmed such that, in a first-action active state, each can causes a first action to be carried out on the object by an appropriate first-action gesture made in the gesture controller. Only one of the first and second gesture controllers at any given time is capable of being in the first-action active state, and the first-action active state is transferable between the first and second gesture controllers upon the detecting of a first-action transfer gesture by one of said first gesture controller and said second gesture controller. Specific gesture control apparatus and methods for manipulating an object are also disclosed.
    Type: Application
    Filed: January 22, 2021
    Publication date: May 13, 2021
    Applicant: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, Paul Roossin
  • Publication number: 20210103654
    Abstract: A system including a deep learning processor receives one or more control signals from one or more of a factory's process, equipment and control (P/E/C) systems during a manufacturing process. The processor generates expected response data and expected behavioral pattern data for the control signals. The processor receives production response data from the one or more of the factory's P/E/C systems and generates production behavioral pattern data for the production response data. The process compares at least one of: the production response data to the expected response data, and the production behavioral pattern data to the expected behavioral pattern data to detect anomalous activity. As a result of detecting anomalous activity, the processor performs one or more operations to provide notice or cause one or more of the factory's P/E/C systems to address the anomalous activity.
    Type: Application
    Filed: June 18, 2020
    Publication date: April 8, 2021
    Applicant: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Domos Limoge, Andrew Sundstrom, James Williams, III
  • Patent number: 10970831
    Abstract: Systems, methods, and computer-readable media for feedback on and improving the accuracy of super-resolution imaging. In some embodiments, a low resolution image of a specimen can be obtained using a low resolution objective of a microscopy inspection system. A super-resolution image of at least a portion of the specimen can be generated from the low resolution image of the specimen using a super-resolution image simulation. Subsequently, an accuracy assessment of the super-resolution image can be identified based on one or more degrees of equivalence between the super-resolution image and one or more actually scanned high resolution images of at least a portion of one or more related specimens identified using a simulated image classifier. Based on the accuracy assessment of the super-resolution image, it can be determined whether to further process the super-resolution image. The super-resolution image can be further processed if it is determined to further process the super-resolution image.
    Type: Grant
    Filed: September 23, 2020
    Date of Patent: April 6, 2021
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Joseph Succar
  • Patent number: 10955651
    Abstract: A process is provided for imaging a surface of a specimen with an imaging system that employs a BD objective having a darkfield channel and a bright field channel, the BD objective having a circumference. The specimen is obliquely illuminated through the darkfield channel with a first arced illuminating light that obliquely illuminates the specimen through a first arc of the circumference. The first arced illuminating light reflecting off of the surface of the specimen is recorded as a first image of the specimen from the first arced illuminating light reflecting off the surface of the specimen, and a processor generates a 3D topography of the specimen by processing the first image through a topographical imaging technique. Imaging apparatus is also provided as are further process steps for other embodiments.
    Type: Grant
    Filed: September 5, 2019
    Date of Patent: March 23, 2021
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, Julie A. Orlando, Jospeh G. Bulman
  • Publication number: 20210069990
    Abstract: A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a product. The monitoring platform is configured to monitor progression of the product throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the product.
    Type: Application
    Filed: September 9, 2020
    Publication date: March 11, 2021
    Applicant: Nanotronics Imaging, Inc.
    Inventors: Fabian Hough, John B. Putman, Matthew C. Putman, Vadim Pinskiy, Damas Limoge, Aswin Raghav Nirmaleswaran, Sadegh Nouri Gooshki
  • Publication number: 20210042884
    Abstract: An inspection apparatus includes a specimen stage, one or more imaging devices and a set of lights, all controllable by a control system. By translating or rotating the one or more imaging devices or specimen stage, the inspection apparatus can capture a first image of the specimen that includes a first imaging artifact to a first side of a reference point and then capture a second image of the specimen that includes a second imaging artifact to a second side of the reference point. The first and second imaging artifacts can be cropped from the first image and the second image respectively, and the first image and the second image can be digitally stitched together to generate a composite image of the specimen that lacks the first and second imaging artifacts.
    Type: Application
    Filed: December 6, 2019
    Publication date: February 11, 2021
    Inventors: Matthew C. Putman, John B. Putman, John Moffitt, Michael Moskie, Jeffrey Andresen, Scott Pozzi-Loyola, Julie Orlando
  • Patent number: 10915992
    Abstract: An inspection apparatus includes a specimen stage, one or more imaging devices and a set of lights, all controllable by a control system. By translating or rotating the one or more imaging devices or specimen stage, the inspection apparatus can capture a first image of the specimen that includes a first imaging artifact to a first side of a reference point and then capture a second image of the specimen that includes a second imaging artifact to a second side of the reference point. The first and second imaging artifacts can be cropped from the first image and the second image respectively, and the first image and the second image can be digitally stitched together to generate a composite image of the specimen that lacks the first and second imaging artifacts.
    Type: Grant
    Filed: December 6, 2019
    Date of Patent: February 9, 2021
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, John Moffitt, Michael Moskie, Jeffrey Andresen, Scott Pozzi-Loyola, Julie Orlando
  • Patent number: 10914686
    Abstract: The disclosed technology relates to an inspection apparatus that includes a stage configured to retain a specimen for inspection, an imaging device having a field of view encompassing at least a portion of the stage to view a specimen retained on the stage, and a plurality of lights disposed on a moveable platform. The inspection apparatus can further include a control module coupled to the imaging device, each of the lights and the moveable platform. The control module is configured to perform operations including: receiving image data from the imaging device, where the image data indicates an illumination landscape of light incident on the speciment; and automatically modifying, based on the image data, an elevation of the moveable platform or an intensity of one or more of the lights to adjust the illumination landscape. Methods and machine-readable media are also contemplated.
    Type: Grant
    Filed: January 9, 2020
    Date of Patent: February 9, 2021
    Assignee: NANOTRONICS IMAGING, INC.
    Inventors: Matthew C. Putman, John B. Putman, John Moffitt, Michael Moskie, Jeffrey Andresen, Scott Pozzi-Loyola, Julie Orlando
  • Publication number: 20210026125
    Abstract: A method and system for mapping fluid objects on a. substrate using a microscope inspection system that includes a light source, imaging device, stage for moving a substrate disposed on the stage, and a control module. A computer analysis system includes an object identification module that identifies for each of the objects on the substrate, an object position on the substrate including a set of X, Y, and ? coordinates using algorithms, networks, machines and systems including artificial intelligence and image processing algorithms. At least one of the objects is fluid and has shifted from a prior position or deformed from a prior size.
    Type: Application
    Filed: October 8, 2020
    Publication date: January 28, 2021
    Applicant: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, John Cruickshank, Julie Orlando, Adele Frankel, Brandon Scott
  • Patent number: 10901521
    Abstract: An apparatus for manipulating an object includes first and second gesture controllers, each operatively connected to the object and structured and programmed such that, in a first-action active state, each can causes a first action to be carried out on the object by an appropriate first-action gesture made in the gesture controller. Only one of the first and second gesture controllers at any given time is capable of being in the first-action active state, and the first-action active state is transferable between the first and second gesture controllers upon the detecting of a first-action transfer gesture by one of said first gesture controller and said second gesture controller. Specific gesture control apparatus and methods for manipulating an object are also disclosed.
    Type: Grant
    Filed: June 18, 2020
    Date of Patent: January 26, 2021
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, Paul Roossin
  • Publication number: 20210012473
    Abstract: Systems, methods, and computer-readable media for feedback on and improving the accuracy of super-resolution imaging. In some embodiments, a low resolution image of a specimen can be obtained using a low resolution objective of a microscopy inspection system. A super-resolution image of at least a portion of the specimen can be generated from the low resolution image of the specimen using a super-resolution image simulation. Subsequently, an accuracy assessment of the super-resolution image can be identified based on one or more degrees of equivalence between the super-resolution image and one or more actually scanned high resolution images of at least a portion of one or more related specimens identified using a simulated image classifier. Based on the accuracy assessment of the super-resolution image, it can be determined whether to further process the super-resolution image. The super-resolution image can be further processed if it is determined to further process the super-resolution image.
    Type: Application
    Filed: September 23, 2020
    Publication date: January 14, 2021
    Applicant: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Joseph Succar
  • Publication number: 20210011271
    Abstract: An automatic focus system for an optical microscope that facilitates faster focusing by using at least two offset focusing cameras. Each offset focusing camera can be positioned on a different side of an image forming conjugate plane so that their sharpness curves intersect at the image forming conjugate plane. Focus of a specimen can be adjusted by using sharpness values determined from images taken by the offset focusing cameras.
    Type: Application
    Filed: May 29, 2020
    Publication date: January 14, 2021
    Inventors: John B. Putman, Matthew C. Putman, Vadim Pinskiy, Denis Y. Sharoukhov
  • Publication number: 20200401120
    Abstract: Aspects of the disclosed technology encompass the use of a deep-learning controller for monitoring and improving a manufacturing process. In some aspects, a method of the disclosed technology includes steps for: receiving control values associated with a process station in a manufacturing process, predicting an expected value for an article of manufacture output from the process station, and determining if the deep-learning controller can control the manufacturing process based on the expected value. Systems and computer-readable media are also provided.
    Type: Application
    Filed: October 24, 2019
    Publication date: December 24, 2020
    Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge