Patents by Inventor John Fong

John Fong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050175925
    Abstract: A photocurable composition, including (a) a photocurable monomer, e.g. a cationically curable monomer and/or a radically curable monomer; (b) reactive particles comprising a crosslinked elastomeric core, e.g. made of polysiloxane material, and a shell of reactive groups on an outer surface of the core, wherein the reactive groups comprise epoxy groups, ethylenically unsaturated groups, or hydroxy groups; and (c) an appropriate photoinitiator, e.g. a radical photoinitiator; and a cationic photoinitiator. A method of making a 3-D object from such a composition and a 3-D object made by the method are also provided. The cured composition generally has a smooth surface. The use of the reactive particles makes the composition more stable and the particles do not readily separate out.
    Type: Application
    Filed: April 18, 2003
    Publication date: August 11, 2005
    Inventors: David Johnson, John Fong
  • Publication number: 20050078504
    Abstract: A memory circuit and method to reduce wordline coupling is disclosed. The circuit includes a plurality of memory cells arranged in rows (702, 704, and 706) and columns (750, 752). A first conductor (710, 850) is coupled to a plurality of the rows (702, 704, and 706) of memory cells. A first transistor (810) has a current path coupled between a voltage supply terminal (800) and the first conductor (850) and a control terminal coupled to receive a first control signal (PLV). A second transistor (820) has a current path coupled between the voltage supply terminal and the first conductor and a control terminal coupled to receive a second control signal (PLW).
    Type: Application
    Filed: December 3, 2004
    Publication date: April 14, 2005
    Inventors: Sung-Wei Lin, Sudhir Madan, John Fong
  • Publication number: 20050072519
    Abstract: A photocurable composition comprising cationically curable compound, an acrylate-containing compound; a hydroxyl-containing compound; a cationic photoinitiator; and a free radical photoinitiator; wherein said composition has less than 0.54 equivalents of cationically curable groups, less than 0.10 equivalents of acrylate groups and less than 0.10 equivalents of hydroxyl 0groups per 100 grams of said composition.
    Type: Application
    Filed: October 3, 2003
    Publication date: April 7, 2005
    Inventors: David Johnson, Frank Tran, John Fong, Richard Leyden, Ranjana Patel
  • Patent number: 4640932
    Abstract: A composition comprising a unique facial mask containing benzoyl peroxide as its essential active ingredient which provides a surprisingly effective, efficient and acceptable method to control and mitigate acne vulgaris in individuals susceptible thereto.
    Type: Grant
    Filed: March 18, 1985
    Date of Patent: February 3, 1987
    Assignee: Neutrogena Corporation
    Inventors: John Fong, Mitchell S. Wortzman, Richard A. Scott