Abstract: A radiation-hardened transistor is formed in a p-type body. An active region is disposed within the p-type body and has a perimeter defined by a shallow-trench isolation region filled with a dielectric material. Spaced-apart source and drain regions are disposed in the active region, forming a channel therebetween. A polysilicon gate is disposed above, aligned with, and insulated from the channel region. A p-type isolation ring is disposed in the p-type body separating outer edges of at least one of the source and drain regions from the perimeter of the active region. A body contact is disposed in the p-type isolation ring.

Abstract: A system for operating alarm features of a trailer towed by a tractor in the event of unintended decoupling of the trailer from the tractor. The system may include a breakaway switch or its functional equivalent, a flasher, and a source of emergency power such as a battery. The output of the system may operate only lights though the flasher, or optionally, also at least one electric brake of the trailer. Where braking is provided, the supply of electrical power is uninterrupted as by the flasher. Importantly, an anti-feedback feature prevents unintended operation of the lights and brake due to back-feeding from the electrical system of the tractor under ordinary operating conditions.

Abstract: A layout arrangement for a resistive random access memory cell includes an active area, a polysilicon row address line over the active region, a metal column address line running orthogonal to the row address line and having an active region contact portion extending over the active region and having a contact to the active region. A metal output line runs parallel to the column address line over the active region. A first cell contact region intersects with the output line and has a contact to the active region. A first metal cell contact region forms an intersection with the first cell contact region. A first resistive random access memory device is formed at the intersection of the first cell contact region and the output line. A second resistive random access memory device is formed at the intersection of the first cell contact region and the first cell contact region.

Abstract: A high-voltage transistor includes an active region including a diffused region of a first conductivity type defined by inner edges of a border of shallow trench isolation. A gate having side edges and end edges is disposed over the active region. Spaced apart source and drain regions of a second conductivity type opposite the first conductivity type are disposed in the active region outwardly with respect to the side edges of the gate. Lightly-doped regions of the second conductivity type more lightly-doped than the source and drain regions surround the source and drain regions and extend inwardly between the source and drain regions towards the gate to define a channel, and outwardly towards all of the inner edges of the shallow trench isolation. Outer edges of the lightly-doped region from at least the drain region are spaced apart from the inner edges of the shallow trench isolation.

Abstract: A method for fast data erasing an FPGA including a programmable logic core controlled by a plurality of SONOS configuration memory cells, each SONOS configuration memory cell including a p-channel SONOS memory transistor in series with an n-channel SONOS memory transistor, which includes detecting tampering with the FPGA, disconnecting power from the programmable logic core, and simultaneously programming the n-channel device and erasing the p-channel device in all cells.

Abstract: A resistive random access memory cell formed in an integrated circuit includes first and second resistive random access memory devices, each including an anode and a cathode. The anode of the second resistive random access memory device is connected to the anode of the first resistive random access memory device. A programming transistor has a first source/drain terminal connected to a programming potential node, a second source/drain terminal connected to the anodes of the first and second resistive random access memory devices, and a gate connected to a program-enable node.

Abstract: A radiation-hardened transistor is formed in a p-type body. An active region is disposed within the p-type body and has a perimeter defined by a shallow-trench isolation region filled with a dielectric material. Spaced-apart source and drain regions are disposed in the active region, forming a channel therebetween. A polysilicon gate is disposed above, aligned with, and insulated from the channel region. A p-type isolation ring is disposed in the p-type body separating outer edges of at least one of the source and drain regions from the perimeter of the active region. A body contact is disposed in the p-type isolation ring.

Abstract: A method for automatically refreshing a non-volatile memory array in the background without memory interruption includes selecting an unrefreshed segment of the memory, reading data from each row in the selected segment during memory dead time and storing the data read from each row in a local temporary storage memory until an entire segment is read out, remapping all memory addresses in the selected segment to the temporary storage memory, isolating column lines in the selected segment from global column lines, erasing the data in the selected segment without disturbing the column lines, rewriting memory data in each row of the selected segment, remapping all memory addresses in the selected segment to the memory, and repeating the process until all segments have been refreshed.

Abstract: A non-volatile memory cell includes a p-channel non-volatile transistor having a source and a drain defining a channel and a gate overlying the channel and an n-channel non-volatile transistor having a source and a drain defining a channel and a gate overlying the channel. In at least one of the p-channel non-volatile transistor and the n-channel non-volatile transistor, a lightly-doped drain region extends from the drain into the channel.

Abstract: A resistive random access memory device formed on a semiconductor substrate comprises an interlayer dielectric having a via formed therethrough. A chemical-mechanical-polishing stop layer is formed over the interlayer dielectric. A barrier metal liner lines walls of the via. A conductive plug is formed in the via. A first barrier metal layer is formed over the chemical-mechanical-polishing stop layer and in electrical contact with the conductive plug. A dielectric layer is formed over the first barrier metal layer. An ion source layer is formed over the dielectric layer. A dielectric barrier layer is formed over the ion source layer, and includes a via formed therethrough communicating with the ion source layer. A second barrier metal layer is formed over the dielectric barrier layer and in electrical contact with the ion source layer. A metal interconnect layer is formed over the barrier metal layer.

Abstract: A non-volatile programmable memory cell suitable for use in a programmable logic array includes a non-volatile MOS transistor of a first conductivity type in series with a volatile MOS transistor of a second conductivity type. The non-volatile MOS transistor may be a floating gate transistor, such as a flash transistor, or may be another type of non-volatile transistor such as a floating charge-trapping SONOS, MONOS transistor, or a nano-crystal transistor. A volatile MOS transistor, an inverter, or a buffer may be driven by coupling its gate or input to the common connection between the non-volatile MOS transistor and the volatile MOS transistor.

Abstract: A resistive random access memory cell formed in an integrated circuit includes a first resistive random access memory device including an anode and a cathode, a second resistive random access memory device including an anode and a cathode, the cathode of the second resistive random access memory device connected to the anode of the first resistive random access memory device, a programming transistor having a first source/drain terminal connected to a programming potential node, a second source/drain terminal connected to the anode of the first resistive random access memory device and the cathode of the second resistive random access memory device, and a gate connected to a program-enable nod, and at least one switch transistor having a gate connected to the anode of the first resistive random access memory device and the cathode of the second resistive random access memory device.

Abstract: A method for performing auto-refresh of a SONOS memory in a field programmable gate array in a system, includes sensing an auto-refresh condition, selecting a memory segment that has not yet been refreshed, storing the contents of memory segment, erasing the memory cells in the memory segment, and reprogramming the memory cells in the memory segment, until all of the memory segments have been reprogrammed

Abstract: A non-volatile programmable memory cell suitable for use in a programmable logic array includes a non-volatile MOS transistor of a first conductivity type in series with a volatile MOS transistor of a second conductivity type. The non-volatile MOS transistor may be a floating gate transistor, such as a flash transistor, or may be another type of non-volatile transistor such as a floating charge-trapping SONOS, MONOS transistor, or a nano-crystal transistor. A volatile MOS transistor, an inverter, or a buffer may be driven by coupling its gate or input to the common connection between the non-volatile MOS transistor and the volatile MOS transistor.

Abstract: A radiation-hardened transistor is formed in a p-type body. An active region is disposed within the p-type body and has a perimeter defined by a shallow-trench isolation region filled with a dielectric material. Spaced-apart source and drain regions are disposed in the active region, forming a channel therebetween. A polysilicon gate is disposed above, aligned with, and insulated from the channel region. A p-type isolation ring is disposed in the p-type body separating outer edges of at least one of the source and drain regions from the perimeter of the active region.

Abstract: A sense amplifier arrangement includes a first sense amplifier having a first input and a second input. A second sense amplifier has a first input and a second input. A switching circuit is configured to selectively couple the first input of the first sense amplifier to a first bit line in the array and the second input of the first sense amplifier to a first bit line in the array to selectively couple the first input of the first sense amplifier to the first bit line in the array, the first input of the second sense amplifier to the second bit line in the array, and the second inputs of the first and second sense amplifiers to a reference voltage.

Abstract: A system for operating alarm features of a trailer towed by a tractor in the event of unintended decoupling of the trailer from the tractor. The system may include a breakaway switch or its functional equivalent, a flasher, and a source of emergency power such as a battery. The output of the system may operate only lights though the flasher, or optionally, also at least one electric brake of the trailer. Where braking is provided, the supply of electrical power is uninterrupted as by the flasher. Importantly, an anti-feedback feature prevents unintended operation of the lights and brake due to back-feeding from the electrical system of the tractor under ordinary operating conditions.

Abstract: A sense amplifier arrangement includes a first sense amplifier having a first input and a second input. A second sense amplifier has a first input and a second input. A switching circuit is configured to selectively couple the first input of the first sense amplifier to a first bit line in the array and the second input of the first sense amplifier to a first bit line in the array to selectively couple the first input of the first sense amplifier to the first bit line in the array, the first input of the second sense amplifier to the second bit line in the array, and the second inputs of the first and second sense amplifiers to a reference voltage.

Abstract: A resistive random access memory device formed on a semiconductor substrate comprises an interlayer dielectric having a via formed therethrough. A chemical-mechanical-polishing stop layer is formed over the interlayer dielectric. A barrier metal liner lines walls of the via. A conductive plug is formed in the via. A first barrier metal layer is formed over the chemical-mechanical-polishing stop layer and in electrical contact with the conductive plug. A dielectric layer is formed over the first barrier metal layer. An ion source layer is formed over the dielectric layer. A dielectric barrier layer is formed over the ion source layer, and includes a via formed therethrough communicating with the ion source layer. A second barrier metal layer is formed over the dielectric barrier layer and in electrical contact with the ion source layer. A metal interconnect layer is formed over the barrier metal layer.

Abstract: A resistive random access memory cell is formed on a semiconductor substrate. First and second diffused regions are disposed in the semiconductor substrate. A polysilicon gate is disposed above the first and second diffused regions. A first contact connects the first diffused region with a region of a first metal layer. A first interlayer dielectric layer is formed over the first metal layer and includes first and second vias, each including conductive plugs connected to the region of the first metal layer. First and second resistive random access memory devices formed over the first interlayer dielectric layer have first and second terminals, and include a dielectric layer and an ion source layer. The first terminals of the first and second resistive random access memory devices are coupled to the first metal layer by the first and second conductive plugs.