Abstract: Disclosed is a system for protecting security of a provisionable network, comprising: a network server, a network client communicatively coupled with the server, a pool of resources coupled with the server for employment by the client, a resource management system for managing the resources, and an intrusion detection system enabled to detect and respond to an intrusion in said network.

Abstract: A method of managing utilization of network intrusion detection systems in a dynamic data center is provided. A plurality of network intrusion detection systems are provided, each being networked so that utilization of each network intrusion detection system can be based on demand for the network intrusion detection systems in the dynamic data center. A monitoring policy and a plurality of monitoring points to be monitored on a network with any of the network intrusion detection systems are received. Further, the monitoring of the monitoring points is automatically arranged using the network intrusion detection systems and the monitoring policy.

Abstract: A present invention integrated intrusion detection method integrates intrusion detection information. In one embodiment, intrusion detection information is gathered from a plurality of different types of intrusion detection sensors. The information is processed in a manner that provides a consolidated correlation of the information. A response is assigned to the information and the response is implemented.

Abstract: A method and system for processing concurrent events in a provisional network that comprises a plurality of dynamically allocatable nodes. Specifically, the method includes receiving notification of an event associated with a node in the provisional network. The event requires processing a new lifecycle operation to update a status of the node in the provisional network. Then, it is determined whether the node is locked for processing an active lifecycle operation that is associated with a concurrent event for the node. Processing of the new lifecycle operation is suspended until the active lifecycle operation has terminated, if the node is locked. The lock is maintained on the node after the active lifecycle operation has terminated. Thereafter, the new lifecycle operation is processed when the active lifecycle operation has terminated.

Abstract: A method for providing security for a network intrusion detection system in a provisionable network, the method comprises evaluating the system security of the provisionable network and applying a system lockdown in the provisionable network in accordance with the results of the evaluation.

Abstract: Embodiments of the present invention pertain to methods and systems for handling a change in status for a resource managed by a utility data center. In one embodiment, an event that describes the change of status for the resource managed by the utility data center is received. The categorization of the event is enabled. The automatic generation of a workflow based on the categorization of the event is enabled, and the automatic notification of the utility data center that the change in status has been handled is enabled.

Abstract: A system and method for archiving and restoring data from an operations center of a utility data center are described. The system includes a number of database systems, located in the operations center, a cell manager, located in a utility controller of the utility data center and coupled to each of the database systems through a designated port in a firewall. The system also includes a media agent coupled to each of the databases and to the cell manager. The media agent is configured to receive data from the database systems for forwarding to an archival storage device.

Abstract: Methods and systems for automatically configuring remote monitoring of provisionable resources are provided. In one embodiment, information describing provisionable resources is received without requiring manual entry of the information. A list of monitored resources is automatically configured with the information so that a network operations center is enabled to remotely monitor the provisionable resources.

Abstract: A method and system for processing concurrent events in a provisional network that comprises a plurality of dynamically allocatable nodes. Specifically, the method includes receiving notification of an event associated with a node in the provisional network. The event requires processing a new lifecycle operation to update a status of the node in the provisional network. Then, it is determined whether the node is locked for processing an active lifecycle operation that is associated with a concurrent event for the node. Processing of the new lifecycle operation is suspended until the active lifecycle operation has terminated, if the node is locked. The lock is maintained on the node after the active lifecycle operation has terminated. Thereafter, the new lifecycle operation is processed when the active lifecycle operation has terminated.

Abstract: A method of managing utilization of network intrusion detection systems in a dynamic data center is provided. A plurality of network intrusion detection systems are provided, each being networked so that utilization of each network intrusion detection system can be based on demand for the network intrusion detection systems in the dynamic data center. A monitoring policy and a plurality of monitoring points to be monitored on a network with any of the network intrusion detection systems are received. Further, the monitoring of the monitoring points is automatically arranged using the network intrusion detection systems and the monitoring policy.

Abstract: A system and method for archiving and restoring data from an operations center of a utility data center are described. The system includes a number of database systems, located in the operations center, a cell manager, located in a utility controller of the utility data center and coupled to each of the database systems through a designated port in a firewall. The system also includes a media agent coupled to each of the databases and to the cell manager. The media agent is configured to receive data from the database systems for forwarding to an archival storage device.

Abstract: A present invention integrated intrusion detection method integrates intrusion detection information. In one embodiment, intrusion detection information is gathered from a plurality of different types of intrusion detection sensors. The information is processed in a manner that provides a consolidated correlation of the information. A response is assigned to the information and the response is implemented.

Abstract: A method for providing security for a network intrusion detection system in a provisionable network, the method comprises evaluating the system security of the provisionable network and applying a system lockdown in the provisionable network in accordance with the results of the evaluation.

Abstract: Disclosed is a system for protecting security of a provisionable network, comprising: a network server, a network client communicatively coupled with the server, a pool of resources coupled with the server for employment by the client, a resource management system for managing the resources, and an intrusion detection system enabled to detect and respond to an intrusion in said network.

Abstract: A copper interconnect polishing process begins by polishing (17) a bulk thickness of copper (63) using a first platen. A second platen is then used to remove (19) a thin remaining interfacial copper layer to expose a barrier film (61). Computer control (21) monitors polish times of the first and second platen and adjusts these times to improve wafer throughput. One or more platens and/or the wafer is rinsed (20) between the interfacial copper polish and the barrier polish to reduce slurry cross contamination. A third platen and slurry is then used to polish away exposed portions of the barrier (61) to complete polishing of the copper interconnect structure. A holding tank that contains anti-corrosive fluid is used to queue the wafers until subsequent scrubbing operations (25). A scrubbing operation (25) that is substantially void of light is used to reduce photovoltaic induced corrosion of copper in the drying chamber of the scubber.

Abstract: A copper interconnect polishing process begins by polishing (17) a bulk thickness of copper (63) using a first platen. A second platen is then used to remove (19) a thin remaining interfacial copper layer to expose a barrier film (61). Computer control (21) monitors polish times of the first and second platen and adjusts these times to improve wafer throughput. One or more platens and/or the wafer is rinsed (20) between the interfacial copper polish and the barrier polish to reduce slurry cross contamination. A third platen and slurry is then used to polish away exposed portions of the barrier (61) to complete polishing of the copper interconnect structure. A holding tank that contains anti-corrosive fluid is used to queue the wafers until subsequent scrubbing operations (25). A scrubbing operation (25) that is substantially void of light is used to reduce photovoltaic induced corrosion of copper in the drying chamber of the scubber.

Abstract: A copper interconnect polishing process begins by polishing (17) a bulk thickness of copper (63) using a first platen. A second platen is then used to remove (19) a thin remaining interfacial copper layer to expose a barrier film (61). Computer control (21) monitors polish times of the first and second platen and adjusts these times to improve wafer throughput. One or more platens and/or the wafer is rinsed (20) between the interfacial copper polish and the barrier polish to reduce slurry cross contamination. A third platen and slurry is then used to polish away exposed portions of the barrier (61) to complete polishing of the copper interconnect structure. A holding tank that contains anti-corrosive fluid is used to queue the wafers until subsequent scrubbing operations (25). A scrubbing operation (25) that is substantially void of light is used to reduce photovoltaic induced corrosion of copper in the drying chamber of the scubber.

Abstract: A copper interconnect polishing process begins by polishing (17) a bulk thickness of copper (63) using a first platen. A second platen is then used to remove (19) a thin remaining interfacial copper layer to expose a barrier film (61). Computer control (21) monitors polish times of the first and second platen and adjusts these times to improve wafer throughput. One or more platens and/or the wafer is rinsed (20) between the interfacial copper polish and the barrier polish to reduce slurry cross contamination. A third platen and slurry is then used to polish away exposed portions of the barrier (61) to complete polishing of the copper interconnect structure. A holding tank that contains anti-corrosive fluid is used to queue the wafers until subsequent scrubbing operations (25). A scrubbing operation (25) that is substantially void of light is used to reduce photovoltaic induced corrosion of copper in the drying chamber of the scubber.

Abstract: A copper interconnect polishing process begins by polishing (17) a bulk thickness of copper (63) using a first platen. A second platen is then used to remove (19) a thin remaining interfacial copper layer to expose a barrier film (61). Computer control (21) monitors polish times of the first and second platen and adjusts these times to improve wafer throughput. One or more platens and/or the wafer is rinsed (20) between the interfacial copper polish and the barrier polish to reduce slurry cross contamination. A third platen and slurry is then used to polish away exposed portions of the barrier (61) to complete polishing of the copper interconnect structure. A holding tank that contains anti-corrosive fluid is used to queue the wafers until subsequent scrubbing operations (25). A scrubbing operation (25) that is substantially void of light is used to reduce photovoltaic induced corrosion of copper in the drying chamber of the scrubber.

Abstract: A method of forming a semiconductor device by first providing a substrate in a processing chamber. The substrate has an insulating layer and an opening in the insulating layer. A copper barrier layer is formed on the insulating layer and in the opening by providing a plurality of refractory metal atoms and a plurality of silicon atoms in the processing chamber. The atoms are ionized by applying a first bias to the atoms to form a plasma. The substrate is then biased by a first stage bias followed by a second stage bias to accelerate the plasma to the substrate to form the copper barrier layer, where the first stage bias is less than the second stage bias. The copper-containing metal is then deposited on the copper barrier layer over the insulating layer and in the opening. The present invention further includes a semiconductor device formed by the above method.