Abstract: An optical assembly includes a substrate; an optical subassembly that is disposed on a region of a surface of the substrate; a housing that is disposed on another region of the surface of the substrate; a first optical element that is disposed on a first support component of the housing; and a second optical element that is disposed on a second support component of the housing. The optical subassembly includes an integrated circuit (IC) driver chip; a redistribution layer (RDL) structure that is disposed on a surface of the IC driver chip, wherein the RDL structure includes a cavity; and a vertical cavity surface emitting laser (VCSEL) device disposed on a region of the surface of the RDL structure that is within the cavity of the RDL structure.

Abstract: In some implementations, an emitter module may include an emitter layer including a first emitter array configured to produce a first beam that provides flood illumination, and a second emitter array configured to produce a second beam that provides spot illumination. The emitter module may include a first optics layer, positioned in front of the emitter layer, that includes a first collimating lens positioned in front of the first emitter array, and a second collimating lens positioned in front of the second emitter array. The emitter module may include a second optics layer, positioned in front of the first optics layer, that includes an optical diffuser positioned in front of the first collimating lens, and a beamsplitter grating positioned in front of the second collimating lens.

Abstract: A VCSEL array may include a semiconductor substrate and a plurality of emitters on the substrate that conforms to an emitter pattern. The emitter pattern may be oriented at a non-zero angle to an edge of the substrate and may comprise two or more unit cells arranged to form the emitter pattern. Each unit cell, of the two or more unit cells, may include a same number of emitters, and the two or more unit cells may be arranged to cause a measurement of misalignment associated with two adjacent unit cells, of the two or more unit cells, to satisfy a misalignment threshold.

Abstract: A diffractive optical element may include sub-wavelength period stack-and-gap structured layers providing transmissive phase delay at a wavelength. The sub-wavelength period stack-and-gap structured layers may include a set of thin anti-reflection layers that are index matched to an environment or a substrate over a range of fill factors of the sub-wavelength period.

Abstract: A diffractive optical element may include sub-wavelength period stack-and-gap structured layers providing transmissive phase delay at a wavelength. The sub-wavelength period stack-and-gap structured layers may include a set of thin anti-reflection layers that are index matched to an environment or a substrate over a range of fill factors of the sub-wavelength period.

Abstract: A transmissive optical element may include a substrate. The transmissive optical element may include a first anti-reflectance structure for a particular wavelength range formed on the substrate. The transmissive optical element may include a second anti-reflectance structure for the particular wavelength range formed on the first anti-reflectance structure. The transmissive optical element may include a third anti-reflectance structure for the particular wavelength range formed on the second anti-reflectance structure. The transmissive optical element may include at least one layer disposed between the first anti-reflectance structure and the second anti-reflectance structure or between the second anti-reflectance structure and the third anti-reflectance structure.

Abstract: An optical element may include a substrate. The optical element may include a first anti-reflectance structure for a particular wavelength range formed on the substrate. The optical element may include at least one layer disposed on a portion of the first anti-reflectance structure. The optical element may include a second anti-reflectance structure for the particular wavelength range formed on the at least one layer. A depth between a first surface of the first anti-reflectance structure and a second surface of the second anti-reflectance structure, a first index of refraction of the first anti-reflectance structure, a second index of refraction of the second anti-reflectance structure, and a third index of refraction of the at least one layer may be selected to form a diffractive optical element associated with a particular phase delay for the particular wavelength.

Abstract: A diffraction grating may include a substrate. The diffraction grating may include an etch stop layer to prevent etching of the substrate. The etch stop layer may be deposited on the substrate. The diffraction grating may include a marker layer to indicate an etch end-point associated with etching of a dielectric layer. The marker layer may be deposited on a portion of the etch stop layer. The diffraction grating may include the dielectric layer to form a grating layer after being etched. The dielectric layer may be deposited on at least the marker layer.

Abstract: A transmissive optical element may include a substrate. The transmissive optical element may include a first anti-reflectance structure for a particular wavelength range formed on the substrate. The transmissive optical element may include a second anti-reflectance structure for the particular wavelength range formed on the first anti-reflectance structure. The transmissive optical element may include a third anti-reflectance structure for the particular wavelength range formed on the second anti-reflectance structure. The transmissive optical element may include at least one layer disposed between the first anti-reflectance structure and the second anti-reflectance structure or between the second anti-reflectance structure and the third anti-reflectance structure.

Abstract: A reflective diffraction grating and a fabrication method are provided. The reflective diffraction grating includes a substrate, a UV-absorbing layer, a grating layer having a binary surface-relief pattern formed therein, and a conforming reflective layer. Advantageously, the UV-absorbing layer absorbs light at a UV recording wavelength to minimize reflection thereof by the substrate during holographic patterning at the UV recording wavelength.

Abstract: A sub-wavelength grating is placed inside a liquid crystal variable optical retarder to reduce polarization dependence of the optical retardation generated by the variable optical retarder. A small thickness of the sub-wavelength grating, as compared to a conventional waveplate, reduces the driving voltage penalty due to the in-cell placement of the sub-wavelength grating.

Abstract: An optical element may include a substrate. The optical element may include a first anti-reflectance structure for a particular wavelength range formed on the substrate. The optical element may include at least one layer disposed on a portion of the first anti-reflectance structure. The optical element may include a second anti-reflectance structure for the particular wavelength range formed on the at least one layer. A depth between a first surface of the first anti-reflectance structure and a second surface of the second anti-reflectance structure, a first index of refraction of the first anti-reflectance structure, a second index of refraction of the second anti-reflectance structure, and a third index of refraction of the at least one layer may be selected to form a diffractive optical element associated with a particular phase delay for the particular wavelength.

Abstract: A zoned waveplate has a series of transversely stacked birefringent zones alternating with non-birefringent zones. The birefringent and non-birefringent zones are integrally formed upon an AR-coated face of a single substrate by patterning the AR coated face of the substrate with zero-order sub-wavelength form-birefringent gratings configured to have a target retardance. The layer structure of the AR coating is designed to provide the target birefringence in the patterned zones and the reflection suppression.

Abstract: A sub-wavelength thin-film metal grating is placed inside a liquid crystal variable optical retarder at a selected distance from a reflective electrode to form a reflective half wave plate, thereby reducing polarization dependence of the optical retardation generated by the variable optical retarder. The approach enables to form within the device the reflective half wave plate that is suitably thin without modifying the reflective electrode of the device.

Abstract: A zoned waveplate has a series of transversely stacked birefringent zones alternating with non-birefringent zones. The birefringent and non-birefringent zones are integrally formed upon an AR-coated face of a single substrate by patterning the AR coated face of the substrate with zero-order sub-wavelength form-birefringent gratings configured to have a target retardance. The layer structure of the AR coating is designed to provide the target birefringence in the patterned zones and the reflection suppression.

Abstract: A diffractive MEMS device has an in-plane binary reflective diffraction pattern formed in an outer surface of a tillable platform. The binary reflective diffraction pattern includes rectangular or trapezoidal ridges and valleys, or grooves, of a same depth. The binary reflective diffractive pattern has a high diffraction efficiency even though the surfaces of the “grooves” or “ridges” are not perpendicular to the incoming optical beam. The diffractive pattern is supported by a pair of torsional hinges and is tiltable by an electrostatic actuator. The electrostatic actuator can include at least one side electrode for linearization of dependence of tilt angle on the voltage applied to the actuator.

Abstract: A diffraction grating may include a substrate. The diffraction grating may include an etch stop layer to prevent etching of the substrate. The etch stop layer may be deposited on the substrate. The diffraction grating may include a marker layer to indicate an etch end-point associated with etching of a dielectric layer. The marker layer may be deposited on a portion of the etch stop layer. The diffraction grating may include the dielectric layer to form a grating layer after being etched. The dielectric layer may be deposited on at least the marker layer.

Abstract: A diffraction grating may include a substrate. The diffraction grating may include an etch stop layer to prevent etching of the substrate. The etch stop layer may be deposited on the substrate. The diffraction grating may include a marker layer to indicate an etch end-point associated with etching of a dielectric layer. The marker layer may be deposited on a portion of the etch stop layer. The diffraction grating may include the dielectric layer to form a grating layer after being etched. The dielectric layer may be deposited on at least the marker layer.

Abstract: A diffractive optical element may include sub-wavelength period stack-and-gap structured layers providing transmissive phase delay at a wavelength. The sub-wavelength period stack-and-gap structured layers may include a set of thin anti-reflection layers that are index matched to an environment or a substrate over a range of fill factors of the sub-wavelength period.

Abstract: An optical element may include a substrate. The optical element may include a first anti-reflectance structure for a particular wavelength range formed on the substrate. The optical element may include at least one layer disposed on a portion of the first anti-reflectance structure. The optical element may include a second anti-reflectance structure for the particular wavelength range formed on the at least one layer. A depth between a first surface of the first anti-reflectance structure and a second surface of the second anti-reflectance structure, a first index of refraction of the first anti-reflectance structure, a second index of refraction of the second anti-reflectance structure, and a third index of refraction of the at least one layer may be selected to form a diffractive optical element associated with a particular phase delay for the particular wavelength.