Abstract: Various aspects of the present disclosure are directed to a fan quick release mechanism. In one example embodiment, the fan quick release may include: an upper coupling that attaches to a downrod hanging from a ceiling, a lower coupling that attaches to a fan/light/other electrical appliance, and a locking pin that couples the upper and lower couplings as desired. To further facilitate ease of assembly, electrical quick disconnects may be positioned within the respective upper and lower coupling assemblies—wherein coupling of the upper and lower couplings also results in the electrical quick disconnects electrically coupling as well.

Abstract: A portable toilet is provided. The toilet includes a shelter defining a rounded sidewall, the sidewall having a door, and the shelter further including a toilet assembly. The toilet further includes a roof configured for removable engagement with the shelter. The toilet has a storage configuration when the roof is inverted and at least partially housed within the shelter, and the toilet has an bottle configuration when the roof is engaged with the shelter.

Abstract: A portable toilet is provided. The toilet includes a shelter defining a rounded sidewall, the sidewall having a door, and the shelter further including a toilet assembly. The toilet further includes a roof configured for removable engagement with the shelter. The toilet has a storage configuration when the roof is inverted and at least partially housed within the shelter, and the toilet has an bottle configuration when the roof is engaged with the shelter.

Abstract: A clamping assembly for selectively retaining a stack of pages includes a bottom disk that may be positioned proximate the stack of pages. A tube is operationally coupled to the bottom disk. A top disk is operationally coupled to the tube. The top disk selectively compresses the stack of pages between the top and bottom disks. A retainer is operationally coupled to the top disk. The retainer retains the top disk on the stack of pages. A release is operationally coupled to the top disk. The release may selectively release the top disk from the stack of pages.

Abstract: Portable toilet and schematic toilet arrangements are provided. In one arrangement, the portable toilet comprises a lower toilet shelter and an upper removable conical roof. In another arrangement, the portable toilet includes a lower toilet shelter with an indented upper ledge and a ribbed ceiling. Additional portable toilet arrangements may include a plurality of rounded toilet shelters.

Abstract: A clamping assembly for selectively retaining a stack of pages includes a bottom disk that may be positioned proximate the stack of pages. A tube is operationally coupled to the bottom disk. A top disk is operationally coupled to the tube. The top disk selectively compresses the stack of pages between the top and bottom disks. A retainer is operationally coupled to the top disk. The retainer retains the top disk on the stack of pages. A release is operationally coupled to the top disk. The release may selectively release the top disk from the stack of pages.

Abstract: An isotopically-altered, silica based optical fiber is provided having lower losses, broader bandwidth, and broader Raman gain spectrum characteristics than conventional silica-based fiber. A heavier, less naturally abundant isotope of silicon or oxygen is substituted for a lighter, more naturally abundant isotope to shift the infrared absorption to a slightly longer wavelength. In one embodiment, oxygen-18 is substituted for the much more naturally abundant oxygen-16 at least in the core region of the fiber. The resulting isotopically-altered fiber has a minimum loss of 0.044 dB/km less than conventional fiber, and a bandwidth that is 17 percent broader for a loss range between 0.044-0.034 dB/km. The fiber may be easily manufactured with conventional fiber manufacturing equipment by way of a plasma chemical vapor deposition technique. When a 50 percent substitution of oxygen -18 for oxygen-16 is made in the core region of the fiber, the Raman gain spectrum is substantially broadened.

Abstract: High purity direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive direct deposit vitrified silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a dry direct deposit vitrified silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1×1017 molecules/cm3 of molecular hydrogen and low chlorine levels.

Abstract: An isotopically-altered, silica based optical fiber is provided having lower losses, broader bandwidth, and broader Raman gain spectrum characteristics than conventional silica-based fiber. A heavier, less naturally abundant isotope of silicon or oxygen is substituted for a lighter, more naturally abundant isotope to shift the infrared absorption to a slightly longer wavelength. In one embodiment, oxygen-18 is substituted for the much more naturally abundant oxygen-16 at least in the core region of the fiber. The resulting isotopically-altered fiber has a minimum loss of 0.044 dB/km less than conventional fiber, and a bandwidth that is 17 percent broader for a loss range between 0.044-0.034 dB/km. The fiber may be easily manufactured with conventional fiber manufacturing equipment by way of a plasma chemical vapor deposition technique. When a 50 percent substitution of oxygen-18 for oxygen-16 is made in the core region of the fiber, the Raman gain spectrum is substantially broadened.

Abstract: The present invention is directed to a method of making an ultra dry high purity, Cl-free, F doped fused silica glass. Silica powder or soot preforms are used to form a glass under conditions to provide a desired level of F doping while reducing the Cl and −OH concentrations to trace levels. The method includes providing a glass precursor in the from of a silica powder or soot preform. The powder is heated in a furnace. The powder is exposed to a F-species at a predetermined temperature and time sufficient to melt the powder and form a high purity fused silica glass in the bottom of said furnace.

Abstract: High purity direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive direct deposit vitrified silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a dry direct deposit vitrified silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1×1017 molecules/cm3 of molecular hydrogen and low chlorine levels.

Abstract: An isotopically-altered, silica based optical fiber is provided having lower losses, broader bandwidth, and broader Raman gain spectrum characteristics than conventional silica-based fiber. A heavier, less naturally abundant isotope of silicon or oxygen is substituted for a lighter, more naturally abundant isotope to shift the infrared absorption to a slightly longer wavelength. In one embodiment, oxygen-18 is substituted for the much more naturally abundant oxygen-16 at least in the core region of the fiber. The resulting isotopically-altered fiber has a minimum loss of 0.044 dB/km less than conventional fiber, and a bandwidth that is 17 percent broader for a loss range between 0.044-0.034 dB/km. The fiber may be easily manufactured with conventional fiber manufacturing equipment by way of a plasma chemical vapor deposition technique. When a 50 percent substitution of oxygen-18 for oxygen-16 is made in the core region of the fiber, the Raman gain spectrum is substantially broadened.

Abstract: Burners (40) for producing fused silica boules are provided. The burners employ a tube-in-tube (301-306) design with flats (56, 50) on some of the tubes (305, 301) being used to limit the cross-sectional area of certain passages (206, 202) within the burner and/or to atomize a silicon-containing, liquid source material, such as OMCTS. To avoid the possibility of flashback, the burner has separate passages for fuel (205) and oxygen (204, 206), i.e., the burner employs nozzle mixing, rather than premixing, of the fuel and oxygen. The burners are installed in burner holes (26) formed in the crown (20) of a furnace and form a seal with those holes so that ambient air cannot be entrained into the furnace through the holes. An external air cooled jacket (60) can be used to hold the temperature of the burner below a prescribed upper limit, e.g., 400° C.

Abstract: High purity direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive direct deposit vitrified silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a dry direct deposit vitrified silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1×1017 molecules/cm3 of molecular hydrogen and low chlorine levels.

Abstract: Disclosed are a new silica refractory brick, a method for making the same and a glass manufacturing furnace comprising the same. Said brick is made from quartz grains, contains calcium oxide binder, consists essentially of (i) silica and (ii) less than 1 weight percent of calcium oxide binder, and when subject to ASTM C-987 alkali vapor test at 1370° C. for 24 hours, has an erosion depth of less than 4 mm and a penetrated depth of less than 3 mm. The brick has reduced level of calcium oxide binder and improved resistance to alkalis and is particularly useful in oxygen-fuel fired glass furnaces.

Abstract: A method for preparing high-purity, bulk fused silica includes supplying silane gas, a gaseous fuel, and oxygen gas to a combustion burner. Silica particles are formed by passing the silane gas into a flame formed by the combustion reaction of the gaseous fuel with the oxygen gas while maintaining the ratio of the flow rate of the gaseous fuel to the flow rate of the silane gas no less than twelve and the ratio of the flow rate of the gaseous fuel to the flow rate of the oxygen gas no less than three. The silica particles formed are immediately deposited onto a hot bait to form a boule.

Abstract: A method and apparatus for determining an identity of at least one constituent on a soot that is deposited on a substrate is disclosed. The method includes the steps of sending a pulse of energy toward the substrate, focusing the energy to a predetermined point on the substrate to thereby generate a plasma on the substrate and to create at least one photon, detecting the photon using an analysis element, and identifying the constituent in the soot. The method may also include the step of determining the concentration of the constituent. Furthermore, the method may be used to determine the identity and concentration of at least one reactant in a flame of a burner or a reactant stream.

Abstract: High purity direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive direct deposit vitrified silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a dry direct deposit vitrified silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1×1017 molecules/cm3 of molecular hydrogen and low chlorine levels.