Patents by Inventor John T. Strom

John T. Strom has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Probe card analysis system and method
    Patent number: 9638782
    Abstract: A system and method for evaluating wafer test probe cards under real-world wafer test cell condition integrates wafer test cell components into the probe card inspection and analysis process. Disclosed embodiments may utilize existing and/or modified wafer test cell components such as, a head plate, a test head, a signal delivery system, and a manipulator to emulate wafer test cell dynamics during the probe card inspection and analysis process.
    Type: Grant
    Filed: June 18, 2013
    Date of Patent: May 2, 2017
    Assignee: Rudolph Technologies, Inc.
    Inventors: Eric Endres, John T. Strom, Christian Kuwasaki, Christopher McLaughlin
  • PROBE CARD ANALYSIS SYSTEM AND METHOD
    Publication number: 20140021970
    Abstract: A system and method for evaluating wafer test probe cards under real-world wafer test cell condition integrates wafer test cell components into the probe card inspection and analysis process. Disclosed embodiments may utilize existing and/or modified wafer test cell components such as, a head plate, a test head, a signal delivery system, and a manipulator to emulate wafer test cell dynamics during the probe card inspection and analysis process.
    Type: Application
    Filed: June 18, 2013
    Publication date: January 23, 2014
    Inventors: Eric Endres, John T. Strom, Christian Kuwasaki, Christopher McLaughlin
  • Probe card analysis system and method
    Patent number: 8466703
    Abstract: A system and method for evaluating wafer test probe cards under real-world wafer test cell condition integrates wafer test cell components into the probe card inspection and analysis process. Disclosed embodiments may utilize existing and/or modified wafer test cell components such as, a head plate, a test head, a signal delivery system, and a manipulator to emulate wafer test cell dynamics during the probe card inspection and analysis process.
    Type: Grant
    Filed: August 24, 2010
    Date of Patent: June 18, 2013
    Assignee: Rudolph Technologies, Inc.
    Inventors: Eric Endres, John T. Strom, Christian Kuwasaki, Christopher McLaughlin
  • Probe mark inspection
    Patent number: 8358831
    Abstract: Probe mark inspection involves a recipe based on unique image characteristics or combinations of unique image characteristics. Result images are correlated with a reference created to determine which image characteristic or combination of image characteristics provides an improved contrast.
    Type: Grant
    Filed: September 10, 2009
    Date of Patent: January 22, 2013
    Assignee: Rudolph Technologies, Inc.
    Inventors: Rodney Doe, John T. Strom
  • APPARATUS FOR OBTAINING PLANARITY MEASUREMENTS WITH RESPECT TO A PROBE CARD ANALYSIS SYSTEM
    Publication number: 20120150475
    Abstract: A system and method of mitigating the effects of component deflections in a probe card analyzer system may implement three-dimensional comparative optical metrology techniques to model deflection characteristics. An exemplary system and method combine non-bussed electrical planarity measurements with fast optical planarity measurements to produce “effectively loaded” planarity measurements.
    Type: Application
    Filed: June 14, 2011
    Publication date: June 14, 2012
    Applicant: Rudolph Technologies, Inc.
    Inventors: John T. Strom, Raymond Kraft
  • Method of applying the analysis of scrub mark morphology and location to the evaluation and correction of semiconductor testing, analysis, and manufacture
    Patent number: 8198906
    Abstract: By examining scrub mark properties (such as position and size) directly, the performance of a wafer probing process may be evaluated. Scrub mark images are captured, image data measured, and detailed information about the process is extracted through analysis. The information may then be used to troubleshoot, improve, and monitor the probing process.
    Type: Grant
    Filed: July 1, 2010
    Date of Patent: June 12, 2012
    Assignee: Rudolph Technologies, Inc.
    Inventor: John T. Strom
  • System and method of measuring probe float
    Patent number: 8089292
    Abstract: A system and method allow accurate calculation of probe float through optical free-hanging and electrical planarity measurement techniques. In accordance with an examplary embodiment, probe float may be determined by acquiring a free-hanging planarity measurement, obtaining a first electrical contact planarity measurement, and calculating probe float using results of the acquiring and the obtaining operations.
    Type: Grant
    Filed: December 15, 2009
    Date of Patent: January 3, 2012
    Assignee: Rudolph Technologies, Inc.
    Inventors: John T. Strom, Raymond H. Kraft
  • Apparatus for obtaining planarity measurements with respect to a probe card analysis system
    Patent number: 7960981
    Abstract: A system and method of mitigating the effects of component deflections in a probe card analyzer system may implement three-dimensional comparative optical metrology techniques to model deflection characteristics. An exemplary system and method combine non-bussed electrical planarity measurements with fast optical planarity measurements to produce “effectively loaded” planarity measurements.
    Type: Grant
    Filed: August 25, 2009
    Date of Patent: June 14, 2011
    Assignee: Rudolph Technologies, Inc.
    Inventors: John T. Strom, Raymond H. Kraft
  • PROBE CARD ANALYSIS SYSTEM AND METHOD
    Publication number: 20110089965
    Abstract: A system and method for evaluating wafer test probe cards under real-world wafer test cell condition integrates wafer test cell components into the probe card inspection and analysis process. Disclosed embodiments may utilize existing and/or modified wafer test cell components such as, a head plate, a test head, a signal delivery system, and a manipulator to emulate wafer test cell dynamics during the probe card inspection and analysis process.
    Type: Application
    Filed: August 24, 2010
    Publication date: April 21, 2011
    Applicant: Rudolph Technologies, Inc.
    Inventors: Eric Endres, John T. Strom, Christian Kuwasaki, Christopher McLaughlin
  • SYSTEM AND METHOD OF MEASURING PROBE FLOAT
    Publication number: 20100321056
    Abstract: A system and method allow accurate calculation of probe float through optical free-hanging and electrical planarity measurement techniques. In accordance with an examplary embodiment, probe float may be determined by acquiring a free-hanging planarity measurement, obtaining a first electrical contact planarity measurement, and calculating probe float using results of the acquiring and the obtaining operations.
    Type: Application
    Filed: December 15, 2009
    Publication date: December 23, 2010
    Applicant: Rudolph Technologies, Inc.
    Inventors: John T. Strom, Raymond H. Kraft
  • METHOD OF APPLYING THE ANALYSIS OF SCRUB MARK MORPHOLOGY AND LOCATION TO THE EVALUATION AND CORRECTION OF SEMICONDUCTOR TESTING, ANALYSIS, AND MANUFACTURE
    Publication number: 20100305897
    Abstract: By examining scrub mark properties (such as position and size) directly, the performance of a wafer probing process may be evaluated. Scrub mark images are captured, image data measured, and detailed information about the process is extracted through analysis. The information may then be used to troubleshoot, improve, and monitor the probing process.
    Type: Application
    Filed: July 1, 2010
    Publication date: December 2, 2010
    Applicant: Rudolph Technologies, Inc.
    Inventor: John T. Strom
  • Method of applying the analysis of scrub mark morphology and location to the evaluation and correction of semiconductor testing, analysis and manufacture
    Patent number: 7750622
    Abstract: By examining scrub mark properties (such as position and size) directly, the performance of a wafer probing process may be evaluated. Scrub mark images are captured, image data measured, and detailed information about the process is extracted through analysis. The information may then be used to troubleshoot, improve, and monitor the probing process.
    Type: Grant
    Filed: June 29, 2006
    Date of Patent: July 6, 2010
    Assignee: Rudolph Technologies, Inc.
    Inventor: John T. Strom
  • APPARATUS FOR OBTAINING PLANARITY MEASUREMENTS WITH RESPECT TO A PROBE CARD ANALYSIS SYSTEM
    Publication number: 20100073019
    Abstract: A system and method of mitigating the effects of component deflections in a probe card analyzer system may implement three-dimensional comparative optical metrology techniques to model deflection characteristics. An exemplary system and method combine non-bussed electrical planarity measurements with fast optical planarity measurements to produce “effectively loaded” planarity measurements.
    Type: Application
    Filed: August 25, 2009
    Publication date: March 25, 2010
    Applicant: Rudolph Technologies, Inc.
    Inventors: John T. Strom, Raymond Kraft
  • PROBE MARK INSPECTION
    Publication number: 20100061620
    Abstract: Probe mark inspection involves a recipe based on unique image characteristics or combinations of unique image characteristics. Result images are correlated with a reference created to determine which image characteristic or combination of image characteristics provides an improved contrast.
    Type: Application
    Filed: September 10, 2009
    Publication date: March 11, 2010
    Applicant: Rudolph Technologies, Inc
    Inventors: Rodney Doe, John T. Strom
  • Dual-axis scanning system and method
    Patent number: 7634129
    Abstract: An image acquisition system and method may employ a non-orthogonal optical axis. The optical axis may be established in such a manner as to position a focal plane of an imaging device in a selected orientation relative to the object space. Such selective positioning and orientation of the focal plane allows the integration of two coordinate axes and enables dual-axis scanning of the object space. In some embodiments, the focal plane may extend throughout the entire depth dimension of the object space.
    Type: Grant
    Filed: December 18, 2002
    Date of Patent: December 15, 2009
    Assignee: Rudolph Technologies, Inc.
    Inventor: John T. Strom
  • Stereoscopic three-dimensional metrology system and method
    Patent number: 7634128
    Abstract: A stereoscopic three-dimensional optical metrology system and method accurately measure the location of physical features on a test article in a manner that is fast and robust to surface contour discontinuities. Disclosed embodiments may image a test article from two or more perspectives through a substantially transparent fiducial plate bearing a fiducial marking; camera viewing angles and apparent relative distances between a feature on a test article and one or more fiducials may enable accurate calculation of feature position.
    Type: Grant
    Filed: May 21, 2007
    Date of Patent: December 15, 2009
    Assignee: Rudolph Technologies, Inc.
    Inventors: Donald B. Snow, John T. Strom, Raymond H. Kraft
  • System and method of measuring probe float
    Patent number: 7633306
    Abstract: A system and method allow accurate calculation of probe float through optical free-hanging and electrical planarity measurement techniques. In accordance with an examplary embodiment, probe float may be determined by acquiring a free-hanging planarity measurement, obtaining a first electrical contact planarity measurement, and calculating probe float using results of the acquiring and the obtaining operations.
    Type: Grant
    Filed: March 15, 2004
    Date of Patent: December 15, 2009
    Assignee: Rudolph Technologies, Inc.
    Inventors: John T. Strom, Raymond H. Kraft
  • Apparatus for obtaining planarity measurements with respect to a probe card analysis system
    Patent number: 7579853
    Abstract: A system and method of mitigating the effects of component deflections in a probe card analyzer system may implement three-dimensional comparative optical metrology techniques to model deflection characteristics. An exemplary system and method combine non-bussed electrical planarity measurements with fast optical planarity measurements to produce “effectively loaded” planarity measurements.
    Type: Grant
    Filed: June 10, 2008
    Date of Patent: August 25, 2009
    Assignee: Rudolph Technologies, Inc.
    Inventor: John T Strom
  • SYSTEM AND METHOD OF MITIGATING EFFECTS OF COMPONENT DEFLECTION IN A PROBE CARD ANALYZER
    Publication number: 20080238464
    Abstract: A system and method of mitigating the effects of component deflections in a probe card analyzer system may implement three-dimensional comparative optical metrology techniques to model deflection characteristics. An exemplary system and method combine non-bussed electrical planarity measurements with fast optical planarity measurements to produce “effectively loaded” planarity measurements.
    Type: Application
    Filed: June 10, 2008
    Publication date: October 2, 2008
    Applicant: Rudolph Technologies, Inc.
    Inventor: JOHN T. STROM
  • System and method of mitigating effects of component deflection in a probe card analyzer
    Patent number: 7385409
    Abstract: A system and method of mitigating the effects of component deflections in a probe card analyzer system may implement three-dimensional comparative optical metrology techniques to model deflection characteristics. An exemplary system and method combine non-bussed electrical planarity measurements with fast optical planarity measurements to produce “effectively loaded” planarity measurements.
    Type: Grant
    Filed: December 12, 2006
    Date of Patent: June 10, 2008
    Assignee: Rudolph Technologies, Inc.
    Inventor: John T. Strom