Abstract: Provided is a stripper composition and a method for forming a pattern using the same. The stripper composition includes, in set content ranges, an amine compound, a glycol compound, an aprotic polar solvent excluding N-methyl-2-pyrrolidone and N-methylformamide, and a first corrosion inhibitor represented by Formula 1. The stripper composition according to an embodiment may be used in a process of removing a photoresist pattern formed on a lower film, and may supply characteristics of an excellent stripping power for photoresist and prevention or reduction of damage of the lower film.

Abstract: A display device includes conductive layers including wires and conductive patterns in a display area and a pad area, a via layer on the conductive layers, a first electrode and a second electrode on the via layer in the display area and spaced apart from each other, a first insulating layer on the first electrode and the second electrode, light emitting elements on the first electrode and the second electrode spaced apart from each other on the first insulating layer, and a first connection electrode on the first electrode and electrically contacting the light emitting elements, and a second connection electrode on the second electrode and electrically contacting the light emitting elements, each of the conductive layers includes a first metal layer and a second metal layer on the first metal layer, and the second metal layer contains copper and has a grain size of about 155 nm or less.

Abstract: A photoresist stripper composition according to one or more embodiments includes an amine compound, a cyclic alcohol, a protic polar organic solvent, an aprotic polar organic solvent, and a polyhydric alcohol having 4 to 6 carbon atoms. The amine compound in the photoresist stripper composition may have a molecular weight of about 80 g/mol or less, and a HSPo value according to Equation 1 of about 27 to about 32. The photoresist stripper composition according to one or more embodiments may be utilized in a process of removing a photoresist pattern formed on a lower film, and may supply an excellent or suitable strip ability for photoresist and characteristics of preventing or reducing damage of the lower film.

Abstract: A method of fabricating a conductive pattern includes forming a conductive metal material layer and a conductive capping material layer on a substrate, forming a photoresist pattern as an etching mask on the conductive capping material layer, forming a first conductive capping pattern by etching the conductive capping material layer with a first etchant, forming a conductive metal layer and a second conductive capping pattern by etching the conductive metal material layer and the first conductive capping pattern with a second etchant, and forming a conductive capping layer by etching the second conductive capping pattern with a third etchant. The second conductive capping pattern includes a first region overlapping the conductive metal layer and a second region not overlapping the conductive metal layer, and the forming of the conductive capping layer includes etching the second region of the second conductive capping pattern to form the conductive capping layer.

Abstract: A display device includes first and second emitting layers of first and second organic layers, on first and second pixel electrodes, in first and second emission areas, respectively, a first bank layer defining the first and second emission areas, a second bank layer on the first bank layer and defining protruding tips, a first pattern of the first organic layer which is on the second bank layer, an inorganic layer on the first emitting layer and the first pattern, a metal pattern on the inorganic layer to surround the second emission area, and a second pattern of the second organic layer which is on the metal pattern to surround the second emission area. The second pattern and the metal pattern form an undercut structure.

Abstract: A display panel includes a pixel defining layer including first and second light-emitting openings, a conductive partition disposed on the pixel defining layer and including first and second partition openings and respectively corresponding to the first and second light-emitting openings, a first light-emitting element disposed in the first partition opening, a second light-emitting element disposed in the second partition opening, and a conductive pattern disposed on the conductive partition. The first light-emitting element includes a first anode, a first organic layer, and a first cathode contacting the conductive partition, and the second light-emitting element includes a second anode, a second organic layer, and a second cathode contacting the conductive partition. A conductive pattern opening corresponding to the second light-emitting opening is included in the conductive pattern.

Abstract: A display device is disclosed that includes a substrate, a thin film transistor, a power line, a pixel electrode, an emission layer, a common electrode, and dummy electrodes. The thin film transistor is disposed on the substrate. The power line is disposed on the substrate and includes a first conductive layer and a second conductive layer having a protrusion part spaced apart from an upper surface of a first conductive layer. The pixel electrode is disposed on the substrate and is electrically connected to a thin film transistor. The emission layer is disposed on the pixel electrode. The common electrode is disposed on the emission layer and contacts the power line. The dummy electrodes are disposed on the same layer as the power line and include the same material as the pixel electrode.

Abstract: A display device includes a display area and a pad area on a side of the display area, a plurality of conductive layers on a first substrate in the display area and the pad area and comprising a wiring and a conductive pattern, a via layer on the plurality of conductive layers, a plurality of electrodes on the via layer in the display area and spaced apart from each other, and a light emitting element on at least one of the plurality of electrodes. At least one of the conductive layers includes a first metal layer, a second metal layer on the first metal layer, and a third metal layer on the second metal layer. The second metal layer includes copper (Cu), the third metal layer includes a copper alloy, and a grain size of the third metal layer is smaller than a grain size of the second metal layer.

Abstract: Embodiments provide an etchant composition that includes about 5.0 to about 20.0 wt % of a persulfate, about 0.01 to about 15.0 wt % of a sulfonic acid, about 0.01 to about 2.0 wt % of a fluorine compound, about 0.01 to about 5.0 wt % of a 4-nitrogen cyclic compound, about 0.01 to about 1.0 wt % of an amino acid including a hydrophobic group having at least two carbon atoms, and water A weight ratio of the amino acid to the 4-nitrogen cyclic compound is in a range of about 1:16 to about 1:60.

Abstract: A method of manufacturing a display device in a chamber in which a material including yttrium is coated on an inner surface includes: forming a first layer pattern by dry etching on a substrate; depositing a second layer material on the first layer pattern; forming a photoresist pattern on the second layer material; completing a second layer pattern by using the photoresist pattern as an etch mask; and performing an additional acid etching process by using an etching solution including at least one of hydrochloric acid, sulfuric acid, or nitric acid before the forming of the photoresist pattern on the second layer material after the dry etching to form the first layer pattern.

Abstract: A display device comprises a via layer disposed on a substrate, a first electrode and a second electrode disposed on the via layer and spaced apart from each other, a first insulating layer disposed on the first electrode and the second electrode, light emitting elements disposed on the first insulating layer and disposed on the first electrode and the second electrode, a bank layer disposed on the first insulating layer and comprising a first opening in which the light emitting elements are disposed and a second opening spaced apart from the first opening, a second insulating layer disposed on the light emitting elements, and a first contact electrode and a second contact electrode disposed on the bank layer, the light emitting elements, and the second insulating layer while being spaced apart from each other.

Abstract: A display device includes a data conductive layer disposed on a substrate, a passivation layer disposed on the data conductive layer, a via layer disposed on the passivation layer, and a pixel electrode disposed on the via layer. The data conductive layer includes a data base layer, a data main metal layer disposed on the data base layer, a first data capping layer disposed on the data main metal layer, a second data capping layer disposed on the first data capping layer, and a third data capping layer disposed on the second data capping layer. The passivation layer and the via layer include a pad opening which exposes a portion of the data conductive layer in the pad area. The third data capping layer has a higher etch rate than the first and second data capping layers for a same etchant.

Abstract: A method of fabricating a conductive pattern includes forming a conductive metal material layer and a conductive capping material layer on a substrate, forming a photoresist pattern as an etching mask on the conductive capping material layer, forming a first conductive capping pattern by etching the conductive capping material layer with a first etchant, forming a conductive metal layer and a second conductive capping pattern by etching the conductive metal material layer and the first conductive capping pattern with a second etchant, and forming a conductive capping layer by etching the second conductive capping pattern with a third etchant. The second conductive capping pattern includes a first region overlapping the conductive metal layer and a second region not overlapping the conductive metal layer, and the forming of the conductive capping layer includes etching the second region of the second conductive capping pattern to form the conductive capping layer.

Abstract: An input sensor of a display device includes: a sensing electrode on a base insulating layer and overlapping a sensing region; and a signal line electrically connected to the sensing electrode and overlapping the non-sensing region, and including: a first conductive layer on the base insulating layer and having a first reflectance, a first conductivity, and a first thickness; a second conductive layer having a second reflectance lower than the first reflectance, a second conductivity lower than the first conductivity, and a second thickness smaller than the first thickness, wherein the second conductive layer is on and in contact with the first conductive layer; and a third conductive layer between the base insulating layer and the first conductive layer, in contact with each of the base insulating layer and the first conductive layer, wherein the third conductive layer contains a material different from that of the second conductive layer.

Abstract: A method of manufacturing a display device in a chamber in which a material including yttrium is coated on an inner surface includes: forming a first layer pattern by dry etching on a substrate; depositing a second layer material on the first layer pattern; forming a photoresist pattern on the second layer material; completing a second layer pattern by using the photoresist pattern as an etch mask; and performing an additional acid etching process by using an etching solution including at least one of hydrochloric acid, sulfuric acid, or nitric acid before the forming of the photoresist pattern on the second layer material after the dry etching to form the first layer pattern.

Abstract: A method of fabricating a conductive pattern includes forming a conductive metal material layer and a conductive capping material layer on a substrate, forming a photoresist pattern as an etching mask on the conductive capping material layer, forming a first conductive capping pattern by etching the conductive capping material layer with a first etchant, forming a conductive metal layer and a second conductive capping pattern by etching the conductive metal material layer and the first conductive capping pattern with a second etchant, and forming a conductive capping layer by etching the second conductive capping pattern with a third etchant. The second conductive capping pattern includes a first region overlapping the conductive metal layer and a second region not overlapping the conductive metal layer, and the forming of the conductive capping layer includes etching the second region of the second conductive capping pattern to form the conductive capping layer.

Abstract: A display device includes conductive layers including wires and conductive patterns in a display area and a pad area, a via layer on the conductive layers, a first electrode and a second electrode on the via layer in the display area and spaced apart from each other, a first insulating layer on the first electrode and the second electrode, light emitting elements on the first electrode and the second electrode spaced apart from each other on the first insulating layer, and a first connection electrode on the first electrode and electrically contacting the light emitting elements, and a second connection electrode on the second electrode and electrically contacting the light emitting elements, each of the conductive layers includes a first metal layer and a second metal layer on the first metal layer, and the second metal layer contains copper and has a grain size of about 155 nm or less.

Abstract: A deposition apparatus includes a chamber, a deposition source disposed in the chamber, a mask assembly, and a base substrate disposed on the mask assembly. The mask assembly includes a frame including frame openings, a mask disposed on the frame and including deposition holes, and a welding stick disposed on the mask. A welding groove is disposed along an edge of the frame and has a depth in the thickness direction of the frame. The welding stick overlaps the welding groove.

Abstract: A display device includes a data conductive layer disposed on a substrate, a passivation layer disposed on the data conductive layer, a via layer disposed on the passivation layer, and a pixel electrode disposed on the via layer. The data conductive layer includes a data base layer, a data main metal layer disposed on the data base layer, a first data capping layer disposed on the data main metal layer, a second data capping layer disposed on the first data capping layer, and a third data capping layer disposed on the second data capping layer. The passivation layer and the via layer include a pad opening which exposes a portion of the data conductive layer in the pad area. The third data capping layer has a higher etch rate than the first and second data capping layers for a same etchant.

Abstract: An input sensor of a display device includes: a sensing electrode on a base insulating layer and overlapping a sensing region; and a signal line electrically connected to the sensing electrode and overlapping the non-sensing region, and including: a first conductive layer on the base insulating layer and having a first reflectance, a first conductivity, and a first thickness; a second conductive layer having a second reflectance lower than the first reflectance, a second conductivity lower than the first conductivity, and a second thickness smaller than the first thickness, wherein the second conductive layer is on and in contact with the first conductive layer; and a third conductive layer between the base insulating layer and the first conductive layer, in contact with each of the base insulating layer and the first conductive layer, wherein the third conductive layer contains a material different from that of the second conductive layer.