Patents by Inventor Jong-Kai Lin

Jong-Kai Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5520785
    Abstract: A method for enhancing aluminum nitride includes, in one version, annealing sputtered aluminum nitride in a reducing atmosphere (11), and subsequently annealing the sputtered aluminum nitride in an inert atmosphere (12). A superior aluminum nitride thin film (13) results. The films can withstand exposure to boiling water for times up to twenty minutes and maintain a refractive index, N.sub.f, greater than 2.0, and a preferred crystalline orientation ratio, I(002)/I(102), in excess of 1000.
    Type: Grant
    Filed: July 25, 1994
    Date of Patent: May 28, 1996
    Assignee: Motorola, Inc.
    Inventors: Keenan L. Evans, Hang M. Liaw, Jong-Kai Lin