Patents by Inventor Jong-man Kim

Jong-man Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120113211
    Abstract: Apparatus and method for configuring a screen for a video call using a facial expression by recognizing a face from an image, calculating facial expression information for an expression of the recognized face, and determining whether there is a change in expression of the recognized face by comparing the calculated facial expression information with reference expression information preset to determine a change in expression of the face. If there is a change in expression of the recognized face, the apparatus and method selects a video image corresponding to the changed expression in the video call screen, and reconfigures the video call screen using the selected video image, making it possible for a user to conveniently select an image of the interested person without taking extensive action, and preventing a wrong image from being selected due to the unintended user facial movement.
    Type: Application
    Filed: November 10, 2011
    Publication date: May 10, 2012
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Ji-Young YI, Sung-Dae Cho, Kee-Hyon Park, Jong-Man Kim, Jin-Ho Kim, Chul-Hwan Lee, Dong-Hoon Jang
  • Publication number: 20120105186
    Abstract: Disclosed herein is a transformer having a heat radiation function. The transformer includes a pair of cores having an E-shape and facing and contacting each other to form central pillars and outer peripheral parts, a transforming coil part wound on the central pillars of the pair of cores and dropping voltage, and a heat radiation pipe formed to have a cylindrical shape and positioned inward from the transforming coil part to radiate heat generated from the transforming coil part, thereby well discharging heat generated from the coil.
    Type: Application
    Filed: December 29, 2010
    Publication date: May 3, 2012
    Applicant: SAMSUNG ELECTRO-MECHANICS CO.,LTD.
    Inventors: Jong Man Kim, Kyu Bum Han, Seog Moon Choi
  • Publication number: 20120106827
    Abstract: A wafer inspection method comprises: performing an exposure process on a wafer partitioned into fields, wherein the exposure process is performed on a first plurality of the fields in a first scan direction and wherein the exposure process is performed on a second plurality of the fields in a second scan direction; storing scan direction information for the first plurality of fields and the second plurality of fields corresponding to whether the exposure process is performed in the first scan direction or in the second scan direction; obtaining image information on the surface of the wafer subjected to the exposure process; determining whether a repetitive defect pattern is present in the image information; and determining whether the repetitive defect pattern is dependent on scan direction by identifying a correlation between the presence of repetitive defect patterns on the wafer and the scan direction information.
    Type: Application
    Filed: July 20, 2011
    Publication date: May 3, 2012
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Heon Park, U-Lam Lee, Cheong-Soo Kim, Jong-Man Kim
  • Publication number: 20120049788
    Abstract: Disclosed herein is a charge module for charging a high-capacity battery. The charge module according to the exemplary embodiment of the present invention includes: a heat sink; a fan cover covering the top of the heat sink; a fan mounted on the upper center of the fan cover; and a heat pipe inserted into the side wall of the heat sink to dissipate heat from the side wall of the heat sink through the circulation of refrigerants.
    Type: Application
    Filed: February 1, 2011
    Publication date: March 1, 2012
    Inventors: Jong Man KIM, Seog Moon CHOI, Kyu Bum HAN
  • Publication number: 20120028422
    Abstract: A thin film transistor (“TFT”) includes a poly silicon layer formed on a flexible substrate and including a source region, a drain region, and a channel region, and a gate stack formed on the channel region of the poly silicon layer, wherein the gate stack includes first and second gate stacks, and a region of the poly silicon layer between the first and second gate stacks is an off-set region. A method of manufacturing the TFT is also provided.
    Type: Application
    Filed: October 6, 2011
    Publication date: February 2, 2012
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Jang-yeon KWON, Sang-yoon LEE, Jong-man KIM, Kyung-bae PARK, Ji-sim JUNG
  • Patent number: 8106397
    Abstract: A thin film transistor (“TFT”) includes a poly silicon layer formed on a flexible substrate and including a source region, a drain region, and a channel region, and a gate stack formed on the channel region of the poly silicon layer, wherein the gate stack includes first and second gate stacks, and a region of the poly silicon layer between the first and second gate stacks is an off-set region. A method of manufacturing the TFT is also provided.
    Type: Grant
    Filed: June 1, 2007
    Date of Patent: January 31, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jang-yeon Kwon, Sang-yoon Lee, Jong-man Kim, Kyung-bae Park, Ji-sim Jung
  • Publication number: 20120015244
    Abstract: An electrode assembly comprises a first electrode including a first electrode current collector and a first electrode active material layer, a second electrode including a second electrode current collector and a second electrode active material layer, a separator disposed between the first electrode and the second electrode, and an electrode absorbing member in contact with the first electrode.
    Type: Application
    Filed: December 17, 2010
    Publication date: January 19, 2012
    Applicant: Samsung SDI Co., Ltd.
    Inventors: Jake Kim, Nam-Soon Choi, Jong-Man Kim, Sung-Soo Kim, Kyeong-Beom Cheong
  • Patent number: 8080840
    Abstract: Disclosed are an image sensor and a method for manufacturing the same. The image sensor can include a readout circuitry on a first substrate; an interlayer dielectric layer including at least one metal and contact plug electrically connected to the readout circuitry; and an image sensing device formed on a second substrate, bonded to the interlayer dielectric layer, and provided with a first conductive type conduction layer and a second conductive type conduction layer. An uppermost contact plug in the interlayer dielectric layer has a wall structure extending from an uppermost metal in the interlayer dielectric layer. The top surface of the uppermost contact plug makes contact with the image sensing device and is connected to an image sensing device and an uppermost metal of an adjacent pixel.
    Type: Grant
    Filed: September 21, 2009
    Date of Patent: December 20, 2011
    Assignee: Dongbu Hitek Co., Ltd.
    Inventor: Jong Man Kim
  • Patent number: 8058094
    Abstract: A transistor includes; at least two polycrystalline silicon layers disposed substantially parallel to each other, each polycrystalline silicon layer including a channel region and at least two high conductivity regions disposed at opposing sides of the channel region; a gate which corresponds to the channel region of the two polycrystalline silicon layers and which crosses the two polycrystalline silicon layers, and a gate insulating layer interposed between the gate and the two polycrystalline silicon layers, wherein low conductivity regions are disposed adjacent to one edge of the gate and are formed between the channel region and one high conductivity region of each polycrystalline silicon layer.
    Type: Grant
    Filed: February 17, 2010
    Date of Patent: November 15, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Takashi Noguchi, Jong-man Kim, Jang-yeon Kwon, Kyung-bae Park, Ji-sim Jung, Hyuck Lim
  • Publication number: 20110216050
    Abstract: A method and apparatus are provided for enhancing the readability of a character. The method includes determining ambient light of a mobile terminal and controlling background color and character color of a character image according to the determined ambient light. The method may further include performing an additional control according to the types of displays when controlling the background color and character color. Through this, it is possible to display a character image with enhanced visibility, while minimizing current consumption.
    Type: Application
    Filed: March 3, 2011
    Publication date: September 8, 2011
    Applicant: Samsung Electronics Co., Ltd
    Inventors: Jong-Man KIM, Kee-Hyon Park, Ji-Young Yi, Byung-seok Min, Dong-Hoon Jang, Sung-Dae Cho, Hyun-Hee Park, Dong-Wook Kwon, Jin-Ho Kim
  • Patent number: 7978201
    Abstract: A method for compensating an image produced by image means for implementing image information takes account of ambient illumination. Luminance of external background illumination around the image means is measured. The measured luminance of the background illumination is compared with preset tristimulus values and a reflectance factor of the image means, a comparison result is computed, and a control signal is generated to compensate luminance and chroma of an image. Luminance and chroma of the image means are compensated in response to the control signal.
    Type: Grant
    Filed: September 12, 2006
    Date of Patent: July 12, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sung-Dae Cho, Seok-Jin Won, Jung-Hoon Park, Young-Min Jeong, Jae-Won Moon, Yun-Je Oh, Young-Ho Ha, Jong-Man Kim, Cheol-Hee Lee, Chang-Hwan Son
  • Publication number: 20110042042
    Abstract: Disclosed herein is a radiating package module for an exothermic element. The radiating package module includes a heat conducting plate which has a groove of an internal thread shape, with the exothermic element being mounted on a surface of the heat conducting plate. A heat pipe is inserted into the groove in a screw-type coupling manner and has a coupling part of an external thread shape. An adhesive is applied between the groove and the coupling part. A cooling unit is coupled to an end of the heat pipe. The radiating package module maintains the reliability with which the radiating package radiates heat and improves structural reliability.
    Type: Application
    Filed: October 17, 2009
    Publication date: February 24, 2011
    Inventors: Jong Man KIM, Seog Moon Choi, Sang Hyun Shin, Jin Su Kim
  • Patent number: 7894860
    Abstract: A method and an apparatus for displaying a plurality of different images in a mobile terminal in an external display device and a display unit in various modes. The mobile terminal operates according to a Different Image In and Out (DIIO) mode when the external display device is connected to the mobile terminal. When the external display device is not connected to the mobile terminal, the mobile terminal displays the plurality of different images in the display unit of the mobile terminal by operating according to a Picture-In-Picture (PIP) mode or an Overlay mode, so as to take into consideration size limitations of the display unit of the mobile terminal.
    Type: Grant
    Filed: August 30, 2007
    Date of Patent: February 22, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jae-Won Moon, Yun-Je Oh, Sung-Dae Cho, Sang-Wook Oh, Seok-Jin Won, Young-Min Jeong, Jong-Man Kim, Hee-Won Jung, Jong-Hee Kim
  • Patent number: 7883913
    Abstract: A manufacturing method of an image sensor of vertical type is provided that includes: forming an insulation layer with a metal wiring and a contact plug therein on a first substrate; bonding a second substrate having an image sensing unit over the insulation layer; forming a trench in the second substrate to divide the image sensing unit for each pixel; forming a PTI by gap-filling the trench with insulating material; forming a first material layer over the PTI, the image sensing unit, and the insulation layer; and forming a second material layer over the first material layer and performing a deuterium annealing process thereon. The crystal defects of the substrate generated when performing the trench etching on the donor substrate to define unit pixels are cured by performing the deuterium annealing process, making it possible to improve the sensitivity and illumination characteristics of the image sensor of vertical type.
    Type: Grant
    Filed: December 15, 2009
    Date of Patent: February 8, 2011
    Assignee: Dongbu HiTek Co., Ltd.
    Inventor: Jong Man Kim
  • Patent number: 7875917
    Abstract: An image sensor and a method for manufacturing the same are provided. In the image sensor, a semiconductor substrate has a pixel region and a peripheral region defined by a first device isolation layer. First and second photodiode patterns are formed on the pixel region and are connected to lower metal lines to first and second readout circuitries. The first photodiode pattern performs as an active photodiode and the second photodiode pattern functions as a dummy pixel. The dummy pixel can measure leakage current.
    Type: Grant
    Filed: December 2, 2008
    Date of Patent: January 25, 2011
    Assignee: Dongbu HiTek Co., Ltd.
    Inventor: Jong Man Kim
  • Patent number: 7875490
    Abstract: An image sensor includes a semiconductor substrate including circuitry, an interlayer dielectric including metal lines arranged on the semiconductor substrate, crystalline photodiode patterns arranged on the interlayer dielectric such that the photodiode patterns are connected to the metal lines, hard mask patterns arranged on the respective photodiode patterns, a device-isolation trench interposed between the adjacent photodiode patterns, to isolate the photodiode patterns from each other, a barrier film implanted with impurity ions, arranged into the inner wall of the device-isolation trench, and a device-isolation insulating layer arranged over the interlayer dielectric including the photodiode pattern and the device-isolation trench.
    Type: Grant
    Filed: December 27, 2008
    Date of Patent: January 25, 2011
    Assignee: Dongbu HiTek Co., Ltd.
    Inventor: Jong-Man Kim
  • Patent number: 7871872
    Abstract: Provided is a method of manufacturing a thin film transistor, the method comprising: forming an amorphous silicon layer on a substrate; forming a polysilicon layer by crystallizing the amorphous silicon layer; forming a mask structure that masks a portion of the polysilicon; forming a source and a drain region and a channel region interposed between the source and the drain regions in the polysilicon layer; injecting impurities having a first concentration using an ion beam implantation into one end and the other end of the polysilicon layer which are not covered by the mask structure. The ends of the polysilicon layer with the mask thereon is then subjected to ion bombardment to increase the level of impurities in the source and drain regions while at the same time shrinking the size of the masked regions.
    Type: Grant
    Filed: October 22, 2007
    Date of Patent: January 18, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jong-man Kim, Kyung-bae Park, Jang-yeon Kwon, Ji-sim Jung
  • Patent number: 7851280
    Abstract: An organic electroluminescent display (“OELD”) includes an organic light-emitting diode (“OLED”), a circuit region, and an interlayer dielectric (“ILD”) layer. The OLED is disposed in each of a plurality of pixels arranged on a substrate. The circuit region includes two or more thin film transistors (“TFTs”) and a storage capacitor. The ILD layer has two or more insulating layers and includes a first region disposed between both electrodes of the storage capacitor and a second region covering the TFTs. At least one of the insulating layers has a window exposing the insulating layer directly beneath the at least one insulating layer so that that the ILD layer is thinner in the first region than in the second region. Accordingly, it is possible to reduce an occupation area of the storage capacitor while maintaining the necessary capacitance of the storage capacitor and expanding the area of the luminescent region.
    Type: Grant
    Filed: March 24, 2010
    Date of Patent: December 14, 2010
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Ji-sim Jung, Jany-yeon Kwon, Jong-man Kim, Kyung-bae Park, Takashi Noguchi
  • Publication number: 20100301324
    Abstract: An organic electro-luminescent display and a method of fabricating the same include an organic light emitting diode, a driving transistor which drives the organic light emitting diode, and a switching transistor which controls an operation of the driving transistor, wherein active layers of the switching and driving transistors are crystallized using silicides having different densities such that the active layer of the driving transistor has a larger grain size than the active layer of the switching layer.
    Type: Application
    Filed: August 13, 2010
    Publication date: December 2, 2010
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Ji-sim JUNG, Jong-man KIM, Jang-yeon KWON, Kyung-bae PARK
  • Patent number: 7799625
    Abstract: An organic electro-luminescent display and a method of fabricating the same include an organic light emitting diode, a driving transistor which drives the organic light emitting diode, and a switching transistor which controls an operation of the driving transistor, wherein active layers of the switching and driving transistors are crystallized using silicides having different densities such that the active layer of the driving transistor has a larger grain size than the active layer of the switching layer.
    Type: Grant
    Filed: September 17, 2007
    Date of Patent: September 21, 2010
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Ji-sim Jung, Jong-man Kim, Jang-yeon Kwon, Kyung-bae Park