Patents by Inventor Jong-Sung Lim

Jong-Sung Lim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6776922
    Abstract: A refrigerant composition that can be a substitute for chlorodifluoromethane (HCFC-22) comprises: (a) a first constituent of difluoromethane, (b) a second constituent of 1,1,1-trifluoroethane, (c) a third constituent of 1,1-difluoroethane, and (d) a fourth constituent selected from the group consisting of 1,1,1,2,3,3,3-heptafluoropropane, isobutane, 1,1,1,2,3,3-hexafluropropane and butane.
    Type: Grant
    Filed: July 24, 2002
    Date of Patent: August 17, 2004
    Assignee: Korea Institute of Science and Technology
    Inventors: Byung-Gwon Lee, Jong-Sung Lim, Sang Deuk Lee, Chang-Nyeon Kim
  • Publication number: 20040072985
    Abstract: In polymerizing biodegradable polymer material, a compressed gas is used as a reaction solvent for a solution-polymerization, in order to prepare biodegradable polyester homopolymer and copolymer with a high molecular weight in a fine powder form with a particle size of 0.01˜1000 &mgr;m.
    Type: Application
    Filed: October 8, 2003
    Publication date: April 15, 2004
    Applicant: Korea Institute of Science and Technology
    Inventors: Youn-Woo Lee, Soo Hyun Kim, Young Ha Kim, Jong-Sung Lim, Jong Min Park, Ji Won Pack
  • Patent number: 6716947
    Abstract: Disclosed is a method for preparing dimethyl dipropargylmalonate polymer containing exclusively six-membered ring structure by using supercritical or sub-critical carbon dioxide as a solvent with a transition metal chloride catalyst.
    Type: Grant
    Filed: October 15, 2002
    Date of Patent: April 6, 2004
    Assignee: Korea Institute of Science and Technology
    Inventors: Youn-Woo Lee, Hyun-Nam Cho, Jong Sung Lim, Young-Jae Hur
  • Patent number: 6692653
    Abstract: The present invention relates to a refrigerant composition of four-constituent system, comprising: (a) a first constituent of difluoromethane, (b) a second constituent of 1,1,1,2,3,3,3-heptafluoropropane, (c) a third constituent selected from the group consisting of 1,1,1,2-tetrafluoroethane and 1,1-difluoroethane and (d) a for the constituent selected from the group consisting of isobutane, 1,1,1,2,3,3,-hexafluoropropane and butane, useful as a substitute for chlorodifluoromethane (HCFC-22).
    Type: Grant
    Filed: February 13, 2002
    Date of Patent: February 17, 2004
    Assignee: Korea Institute of Science and Technology
    Inventors: Byung-Gwon Lee, Jong-Sung Lim, Hong-Gon Kim, Chang-Nyeon Kim
  • Publication number: 20040016903
    Abstract: A refrigerant composition that can be a substitute for chlorodifluoromethane (HCFC-22) comprises: (a) a first constituent of difluoromethane, (b) a second constituent of 1,1,1-trifluoroethane, (c) a third constituent of 1,1-difluoroethane, and (d) a fourth constituent selected from the group consisting of 1,1,1,2,3,3,3-heptafluoropropane, isobutane, 1,1,1,2,3,3-hexafluropropane and butane.
    Type: Application
    Filed: July 24, 2002
    Publication date: January 29, 2004
    Applicant: Korea Institute of Science and Technology
    Inventors: Byung-Gwon Lee, Jong-Sung Lim, Sang Deuk Lee, Chang-Nyeon Kim
  • Publication number: 20040016902
    Abstract: A refrigerant composition that can be a substitute for chlorodifluoromethane (HCFC-22) comprises: (a) a first constituent of difluoromethane, (b) a second constituent of 1,1,1-trifluoroethane, (c) a third constituent of 1,1,1,2,3,3,3-heptafluoropropane and (d) a fourth constituent selected from the group consisting of isobutane, 1,1,1,2,3,3-hexafluropropane and butane; or comprises: (a) a first constituent of difluoromethane, (b) a second constituent of 1,1,1,2-tetrafluoroethane, (c) a third constituent of 1,1,-difluoroethane, and (d) a fourth constituent selected from the group consisting of 1,1,1,2,3,3,3-heptafluoropropane, 1,1,1,2,3,3-hexafluropropane and butane.
    Type: Application
    Filed: July 24, 2002
    Publication date: January 29, 2004
    Applicant: Korea Institute of Science and Technology
    Inventors: Byung-Gwon Lee, Jong-Sung Lim, Hoon Sik Kim, Chang-Nyeon Kim
  • Publication number: 20030197149
    Abstract: A refrigerant composition that can be a substitute for chlorodifluoromethane (HCFC-22) comprises: (a) a first constituent of difluoromethane, (b) a second constituent of 1,1,1-trifluoroethane, (c) a third constituent of 1,1,1,2-tetrafluoroethane, and (d) a fourth constituent selected from the group consisting of 1,1-difluoroethane, 1,1,1,2,3,3,3-heptafluoropropane, 1,1,1,2,3,3-hexafluropropane and butane.
    Type: Application
    Filed: April 19, 2002
    Publication date: October 23, 2003
    Inventors: Byung-Gwon Lee, Jong-Sung Lim, Byoung Sung Ahn, Kun You Park, Chang-Nyeon Kim
  • Patent number: 6592773
    Abstract: A novel refrigerant composition useful as a substitute for HCFC-22, comprising a first constituent of difluoromethane (CH2F2, HFC-32); a second constituent of pentafluoroethane (CHF2CF3, HFC-125); a third constituent of 1,1,1-trifluoroethane (CH3CF3, HFC-143a); a fourth constituent selected from the group consisting of cyclopropane (C3H6, RC-270), 1,1,1,2,3,3,3-heptafluoropropane (CF3CHFCF3, HFC-227ea), 1,1,1,2,2-pentafluoropropane (CH3CF2CF3, HFC-245cb), isobutane (CH(CH3)2CH3, R-600a), octafluorocyclobutane (C4F8, RC-318), 1,1,1,2,3,3-hexafluoropropane (CHF2CHFCF3, HFC-236ea), butane (C4H10, R-600), bis(difluoromethyl)ether (CHF2OCHF2, HFE-134) and pentafluoroethylmethylether (CF3CF2OCH3, HFE-245).
    Type: Grant
    Filed: January 8, 2003
    Date of Patent: July 15, 2003
    Assignee: Korea Institute of Science and Technology
    Inventors: Byung Gwon Lee, Jong Sung Lim, Kun You Park, Moon Jo Chung, Seong Joon Cho
  • Publication number: 20030111635
    Abstract: A novel refrigerant composition useful as a substitute for HCFC-22, comprising a first constituent of difluoromethane (CH2F2, HFC-32); a second constituent of pentafluoroethane (CHF2CF3, HFC-125); a third constituent of 1,1,1-trifluoroethane (CH3CF3, HFC-143a); a fourth constituent selected from the group consisting of cyclopropane (C3H6, RC-270), 1,1,1,2,3,3,3-heptafluoropropane (CF3CHFCF3, HFC-227ea), 1,1,1,2,2-pentafluoropropane (CH3CF2CF3, HFC-245cb), isobutane (CH(CH3)2CH3, R-600a), octafluorocyclobutane (C4F8, RC-318), 1,1,1,2,3,3-hexafluoropropane (CHF2CHFCF3, HFC-236ea), butane (C4H10, R-600), bis(difluoromethyl)ether (CHF2OCHF2, HFE-134) and pentafluoroethylmethylether (CF3CF2OCH3, HFE-245).
    Type: Application
    Filed: January 8, 2003
    Publication date: June 19, 2003
    Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Byung Gwon Lee, Jong Sung Lim, Kun You Park, Moon Jo Chung, Seong Joon Cho
  • Publication number: 20030099565
    Abstract: In a method for removing a wax material from a molded part, to remove a major binder, waxes, from a molded part fabricated by a powder injection molding method or a compression molding method, a supercritical mixed fluid of carbon dioxide and propane is used as a dewaxing solvent.
    Type: Application
    Filed: October 9, 2002
    Publication date: May 29, 2003
    Applicant: Korea Institute of Science and Technology
    Inventors: Jong-Sung Lim, Youn-Woo Lee, Jae-Duck Kim, Yong-Ho Kim
  • Patent number: 6524495
    Abstract: A novel refrigerant composition useful as a substitute for HCFC-22, comprising a first constituent of difluoromethane (CH2F2, HFC-32); a second constituent of pentafluoroethane (CHF2CF3, HFC-125); a third constituent of 1,1,1-trifluoroethane (CH3CF3, HFC-143a); a fourth constituent selected from the group consisting of cyclopropane (C3H6, RC-270), 1,1,1,2,3,3,3-heptafluoropropane (CF3CHFCF3, HFC-227ea), 1,1,1,2,2-pentafluoropropane (CH3CF2CF3, HFC-245cb), isobutane (CH(CH3)2CH3, R-600a), octafluorocyclobutane (C4F8, RC-318), 1,1,1,2,3,3-hexafluoropropane (CHF2CHFCF3, HFC-236ea), butane (C4H10, R-600), bis(difluoromethyl)ether (CHF2OCHF2, HFE-134) and pentafluoroethylmethylether (CF3CF2OCH3, HFE-245).
    Type: Grant
    Filed: November 9, 2000
    Date of Patent: February 25, 2003
    Assignee: Korea Institute of Science and Technology
    Inventors: Byung Gwon Lee, Jong Sung Lim, Kun You Park, Moon Jo Chung, Seong Joon Cho
  • Patent number: 6508950
    Abstract: The present invention relates to novel refrigerant mixtures as a substitute for chlorodifluoromethane (CHClF2, HCFC-22). More specifically, the invention is directed to refrigerant mixtures that comprise: difluoromethane (CH2F2, HFC-32) as the first component; pentafluoroethane (CHF2CF3, HFC-125) as the second component; 1,1,1,2-tetrafluoroethane (CH2FCF3, HFC-134a) as the third component; any one of cyclopropane (C3H6, RC-270), 1,1-difluoroethane (CH3CHF2, HFC-152a), 1,1,1,2,3,3,3-heptafluoropropane (CF3CHFCF3, HFC-227ea), 1,1,1,2,2-pentafluoropropane (CH3CF2CF3, HFC-245cb), octafluorocyclobutane (C4F8, RC-318), 1,1,1,2,3,3-hexafluoropropane (CHF2CHFCF3, HFC-236ea), bis(difluoromethyl)ether (CHF2OCHF2, HFE-134), pentafluoroethylmethylether (CF3CF2OCH3, HFE-245), n-pentane (C5H12, R-601) and isopentane ((CH3)2CHCH2CH3, R-601a) as the fourth component.
    Type: Grant
    Filed: October 20, 2000
    Date of Patent: January 21, 2003
    Assignee: Korea Institute of Science and Technology
    Inventors: Jong-Sung Lim, Byung-Gwon Lee, Jae-Duck Kim, Sang-Deuk Lee, Hoon-Sik Kim
  • Publication number: 20030001132
    Abstract: The present invention relates to a refrigerant composition of four-constituent system, comprising: (a) a first constituent of difluoromethane, (b) a second constituent of 1,1,1,2,3,3,3-heptafluoropropane, (c) a third constituent selected from the group consisting of 1,1,1,2-tetrafluoroethane and 1,1-difluoroethane and (d) a for the constituent selected from the group consisting of isobutane, 1,1,1,2,3,3,-hexafluoropropane and butane, useful as a substitute for chlorodifluoromethane (HCFC-22).
    Type: Application
    Filed: February 13, 2002
    Publication date: January 2, 2003
    Applicant: Korea Institute of Science and Technology
    Inventors: Byung-Gwon Lee, Jong-Sung Lim, Hong-Gon Kim, Chang-Nyeon Kim
  • Patent number: 6231780
    Abstract: A refrigerant composition useful as a substitute for chlorodifluoromethane (CHCIF2, HCFC-22). The refrigerant mixture has a first constituent of difluoromethane (CH2F2, HFC-32); a second constituent selected from perfluoropropane (C3F8, PFC-218), cyclopropane (C3H6, RC-270) and butane (C4H10, R-600); and a third constituent selected from 1,1-difluoroethane (CH3CHF2, HFC-152a), 1,1,1,2,2-pentafluoropropane (CH3CF2CF3, HFC-245cb) and bis(difluoromethyl)ether (CHF2OCHF2, HFE-134).
    Type: Grant
    Filed: October 1, 1999
    Date of Patent: May 15, 2001
    Assignee: Korea Institute of Science and Technology
    Inventors: Byung Gwon Lee, Jong Sung Lim, Kun You Park, Byoung Sung Ahn, Sang Deuk Lee
  • Patent number: 6231781
    Abstract: A refrigerant composition useful as a substitute for chlorodifluoromethane (CHClF2, HCFC-22). The refrigerant composition has a first constituent of difluoromethane (CH2F2, HFC-32); a second constituent of 1,1,1-trifluoroethane (CH3CF3; namely, HFC-143a); and a third constituent selected from cyclopropane (C3H6, RC-270), 1,1,1,2,3,3,3-heptafluoropropane (CF3CHFCF3, HFC-227ea), 1,1,1,2,2-pentafluoropropane (CH3CF2CF3, HFC-245cb), 1,1,1,2,3,3-hexafluoropropane (CHF2CHFCF3, HFC-236ea), butane (C4H10, R-600), bis(difluoromethyl)ether (CHF2OCHF2, HFE-134) and pentafluoroethylmethylether (CF3CF2OCH3, HFE-245).
    Type: Grant
    Filed: October 1, 1999
    Date of Patent: May 15, 2001
    Assignee: Korea Institute of Science and Technology
    Inventors: Byung Gwon Lee, Jong Sung Lim, Young Soo Kwon, Honggon Kim, Dong Joo Mun