Patents by Inventor Jong Keun Park

Jong Keun Park has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240125848
    Abstract: A leakage current detection circuit includes: a mirror circuit configured to copy a leakage current flowing through a node and generate a copy current in a copy node; an oscillation circuit including a charge storage unit, the oscillation circuit being connected to the copy node, charged with the copy current, and configured to generate an oscillation signal by charging and discharging the charge storage unit; and a calculation circuit configured to calculate an amount of the leakage current based on the oscillation signal.
    Type: Application
    Filed: March 1, 2023
    Publication date: April 18, 2024
    Applicant: SK hynix Inc.
    Inventors: Jong Seok JUNG, Chan Keun KWON, Kyeong Hwan PARK, Young Kwan LEE, Suk Hwan CHOI
  • Patent number: 11952652
    Abstract: Provided is a method of manufacturing a zinc-plated steel sheet. The method includes: coating a metal on the steel sheet on a steel sheet; annealing the metal coated steel sheet; and zinc plating the annealed steel sheet by dipping in a molten zinc plating bath. Further provided is a method of manufacturing a hot-press part including: coating a metal on the steel sheet on a steel sheet; annealing the metal coated steel sheet; zinc plating the annealed steel sheet by dipping in a molten zinc plating bath; heating the zinc-plated steel sheet; and press forming the heated steel sheet.
    Type: Grant
    Filed: March 7, 2018
    Date of Patent: April 9, 2024
    Assignee: POSCO CO., LTD
    Inventors: Il-Ryoung Sohn, Jong-Sang Kim, Joong-Chul Park, Yeol-Rae Cho, Jin-Keun Oh, Han-Gu Cho, Bong-Hoon Chung, Jong-Seog Lee
  • Patent number: 11945744
    Abstract: Disclosed are a method and apparatus for reusing wastewater. The method for reusing wastewater disclosed herein includes: generating a mixed wastewater by mixing multiple types of wastewater (S20); performing a first purification by passing the mixed wastewater through a flocculation-sedimentation unit (S40); performing a second purification by passing an effluent of the flocculation-sedimentation unit through a membrane bioreactor (MBR) (S60); performing a third purification by passing an effluent of the MBR through a reverse-osmosis membrane unit (S80); and reusing an effluent of the reverse-osmosis membrane unit as cooling water or industrial water (S100).
    Type: Grant
    Filed: April 14, 2023
    Date of Patent: April 2, 2024
    Assignees: SAMSUNG ENGINEERING CO., LTD., SAMSUNG ELECTRONICS CO., LTD
    Inventors: Seok Hwan Hong, Dae Soo Park, Seung Joon Chung, Yong Xun Jin, Jae Hyung Park, Jae Hoon Choi, Jae Dong Hwang, Jong Keun Yi, Su Hyoung Cho, Kyu Won Hwang, June Yurl Hur, Je Hun Kim, Ji Won Chun
  • Patent number: 11950502
    Abstract: Provided is a novel compound capable of improving the luminous efficiency, stability and life span of a device, an organic electric element using the same, and an electronic device thereof.
    Type: Grant
    Filed: April 17, 2021
    Date of Patent: April 2, 2024
    Assignee: DUK SAN NEOLUX CO., LTD.
    Inventors: Hyoung Keun Park, Yun Suk Lee, Ki Ho So, Jong Gwang Park, Yeon Seok Jeong, Jung Hwan Park, Sun Hee Lee, Hak Young Lee
  • Publication number: 20240076768
    Abstract: There is disclosed a fine grained pure titanium having an equiaxed microstructure (a microstructure with an aspect ratio (i.e., the length of a major axis/the length of a minor axis fraction ratio) is less than 3) of 90% or more and an average grain size of 15 ?m or less, and a manufacturing method for the same.
    Type: Application
    Filed: March 7, 2022
    Publication date: March 7, 2024
    Inventors: Chan-hee PARK, Jong-taek YEOM, Jae-keun HONG
  • Publication number: 20240019779
    Abstract: A compound represented by Formula (1): wherein X is a group having a valency of r; each R1 is independently an organic group comprising an acid-labile group; m is an integer greater than or equal to 1; k is an integer from 1 to 5; and r is an integer from 2 to 10, wherein the compound is non-polymeric, and wherein Ar1, L1, L2, R2, and R3 are as defined herein.
    Type: Application
    Filed: May 20, 2022
    Publication date: January 18, 2024
    Inventors: Li Cui, Emad Aqad, Yinjie Cen, Conner A. Hoelzel, James F. Cameron, Jong Keun Park, Suzanne M. Coley, Choong-Bong Lee
  • Publication number: 20230314934
    Abstract: A photoactive compound of formula (1a) or (1b): wherein R1 is substituted or unsubstituted C1-30 alkyl, substituted or unsubstituted C3-30 cycloalkyl, substituted or unsubstituted C3-30 heterocycloalkyl, substituted or unsubstituted C6-30 aryl, or substituted or unsubstituted C3-30 heteroaryl comprising an aromatic ring heteroatom chosen from nitrogen, oxygen, or a combination thereof; R2 and R3 are as provided herein; R4 is substituted or unsubstituted C1-30 alkyl, substituted or unsubstituted C3-30 cycloalkyl, substituted or unsubstituted C3-30 heterocycloalkyl, substituted or unsubstituted C6-30 aryl, or substituted or unsubstituted C3-30 heteroaryl; and M+ is an organic cation.
    Type: Application
    Filed: March 31, 2022
    Publication date: October 5, 2023
    Inventors: Emad Aqad, Jong Keun Park, Yinjie Cen, Choong-Bong Lee
  • Publication number: 20230213862
    Abstract: A photoresist composition, comprising: a first polymer comprising: a first repeating unit comprising a hydroxyaryl group; a second repeating unit comprising a first acid-labile group; and a third repeating unit comprising a first base-soluble group having a pKa of 12 or less, and not comprising a hydroxyaryl group; wherein the first, second, and third repeating units of the first polymer are different from each other, and the first polymer is free of lactone groups; a second polymer comprising: a first repeating unit comprising a second acid-labile group, a second repeating unit comprising a lactone group, and a third repeating unit comprising a second base-soluble group having a pKa of 12 or less; wherein the first, second, and third repeating units of the second polymer are structurally different from each other; and a solvent, wherein the first polymer and the second polymer are different from each other.
    Type: Application
    Filed: December 20, 2022
    Publication date: July 6, 2023
    Inventors: Li Cui, Suzanne M. Coley, Emad Aqad, Yinjie Cen, Jong Keun Park, Choong-Bong Lee, James F. Cameron
  • Publication number: 20230103685
    Abstract: A compound comprising an aromatic group or a heteroaromatic group, wherein the aromatic group or the heteroaromatic group comprises a first substituent group comprising an ethylenically unsaturated double bond, a second substituent group that is an iodine atom, and a third substituent group comprising an acid-labile group, wherein the first substituent group, the second substituent group, and the third substituent group are each bonded to a different carbon atom of the aromatic group or the heteroaromatic group.
    Type: Application
    Filed: September 30, 2021
    Publication date: April 6, 2023
    Inventors: Emad Aqad, Jong Keun Park, Bhooshan C. Popere, Li Cui, Yinjie Cen, Choong-Bong Lee
  • Publication number: 20230104130
    Abstract: A photoresist composition comprising a polymer, a photoacid generator, an additive comprising a tertiary carbon atom as a ring-forming atom of a lactone ring, and a solvent.
    Type: Application
    Filed: September 30, 2021
    Publication date: April 6, 2023
    Inventors: Cong Liu, Jong Keun Park, James F. Cameron, Sheng Liu, Tsutomu Asazuma, Mingqi Li
  • Patent number: 11121190
    Abstract: Provided is an optoelectronic device comprising an optoelectronic element and circuitry connected to the optoelectronic element, wherein the optoelectronic element comprises plural quantum dots or plural nanorods, and wherein the circuitry is configured to be capable of switching the optoelectronic element between a configuration in which the circuitry provides an effective forward bias voltage that causes the optoelectronic element to emit light and a configuration in which the circuitry provides an effective reverse bias voltage that causes the optoelectronic element to be capable of generating a photocurrent when light to which the optoelectronic element is sensitive strikes the optoelectronic element.
    Type: Grant
    Filed: March 23, 2017
    Date of Patent: September 14, 2021
    Assignees: Dow Global Technologies LLC, Rohm and Haas Company, The Board of Trustees of the University of Illinois, Rohm and Haas Electronic Materials LLC
    Inventors: Peter Trefonas, III, Kishori Deshpande, Trevor Ewers, Edward Greer, Jaebum Joo, Bong Hoon Kim, Nuri Oh, Jong Keun Park, Moonsub Shim, Jieqian Zhang
  • Publication number: 20210200084
    Abstract: A polymer comprising a first repeating unit derived from a monomer comprising a hydroxy-aryl group; a second repeating unit derived from a monomer comprising a hydroxy-aryl group protected with an acetal or ketal group; a third repeating unit derived from a (meth)acrylate monomer comprising a cycloaliphatic group; and a fourth repeating unit derived from a monomer comprising an acid-sensitive group, wherein the first, the second, the third, and the fourth repeating units are different from each other.
    Type: Application
    Filed: December 31, 2019
    Publication date: July 1, 2021
    Inventors: Jong Keun Park, Emad Aqad, Yang Song, Chunyi Wu, Colin Liu, Mingqi Li
  • Publication number: 20210108065
    Abstract: A polymer comprising: a first repeating unit comprising a tertiary ester acid labile group; and a second repeating unit of Formula (1): wherein R1 to R5 are as provided herein; R2 and R3 together do not form a ring; each A is independently a halogen, a carboxylic acid or ester, a thiol, a straight chain or branched C1-20 alkyl, a monocyclic or polycyclic C3-20 cycloalkyl, a monocyclic or polycyclic C3-20 fluorocycloalkenyl, a monocyclic or polycyclic C3-20 heterocycloalkyl, a monocyclic or polycyclic C6-20 aryl, or a monocyclic or polycyclic C4-20 heteroaryl, each of which is substituted or unsubstituted; and m is an integer of 0 to 4.
    Type: Application
    Filed: October 15, 2019
    Publication date: April 15, 2021
    Inventors: Yang SONG, Jong Keun PARK, Emad AQAD, Mingqi LI, Colin LIU, James W. THACKERAY, Peter TREFONAS, III
  • Patent number: 10949026
    Abstract: Provided is a method of creating an image on an array of optoelectronic elements comprising (a) providing a device comprising an array of optoelectronic elements and circuitry connected to each optoelectronic element, wherein the optoelectronic element comprises plural quantum dots or plural nanorods, and wherein the circuitry is configured to be capable of switching each optoelectronic element independently between an effective forward bias configuration and a reverse-bias configuration, (b) imposing an effective reverse bias on two or more of the optoelectronic elements, (c) providing circuitry that will detect the onset of photocurrent from an individual effective reverse biased optoelectronic element and that will respond to the photocurrent by changing the bias on the individual optoelectronic element to an effective forward bias.
    Type: Grant
    Filed: March 23, 2017
    Date of Patent: March 16, 2021
    Assignees: Dow Global Technologies LLC, Rohm and Haas Company, The Board of Trustees of the University of Illinois, Rohm and Haas Electronic Materials LLC
    Inventors: Peter Trefonas, III, Seongyong Cho, Kishori Deshpande, Trevor Ewers, Jaebum Joo, Edward Greer, Bong Hoon Kim, Nuri Oh, Jong Keun Park, Moonsub Shim, Jieqian Zhang
  • Publication number: 20210005668
    Abstract: Provided is a device comprising a light-emitting optoelectronic element and a photocurrent-generating optoelectronic element, wherein the device further comprises an opaque element that prevents light emitted by the light-emitting optoelectronic element from reaching the photocurrent-generating optoelectronic element via a pathway within the device.
    Type: Application
    Filed: March 23, 2017
    Publication date: January 7, 2021
    Inventors: Peter Trefonas, III, Seongyong Cho, Kishori Deshpande, Trevor Ewers, Edward Greer, Jaebum Joo, Nuri Oh, Jong Keun Park, Moonsub Shim, Jieqian Zhang
  • Publication number: 20200356001
    Abstract: A photoresist composition, including a polymer having a C6-30 hydroxyaromatic group, a solvent, and a sulfonium salt having Formula (I): wherein, in Formula (I), R, R1 to R8, X, n, and Rf are the same as described in the specification.
    Type: Application
    Filed: May 10, 2019
    Publication date: November 12, 2020
    Inventors: Tomas Marangoni, Mingqi Li, Jong Keun Park, Emad Aqad, Xisen Hou, James F. Cameron
  • Publication number: 20200209743
    Abstract: A photoresist composition, including a polymer having a C6-30 hydroxyaromatic group, a solvent, and a sulfonium salt having Formula (I): wherein, in Formula (I), R, R1 to R8, X, n, and Rf are the same as described in the specification.
    Type: Application
    Filed: December 31, 2018
    Publication date: July 2, 2020
    Inventors: Tomas Marangoni, Mingqi Li, Jong Keun Park, Emad Aqad, Amy M. Kwok
  • Publication number: 20190204742
    Abstract: Methods of forming an electronic device, comprise: (a) providing a semiconductor substrate comprising one or more layers to be patterned; (b) forming a photoresist layer over the one or more layers to be patterned, wherein the photoresist layer is formed from a composition that comprises: a matrix polymer comprising a unit having an acid labile group; a photoacid generator; and an organic solvent; (c) coating a photoresist overcoat composition over the photoresist layer, wherein the overcoat composition comprises: a matrix polymer; an additive polymer; a basic quencher; and an organic solvent; wherein the additive polymer has a lower surface energy than a surface energy of the matrix polymer, and wherein the additive polymer is present in the overcoat composition in an amount of from 1 to 20 wt % based on total solids of the overcoat composition; (d) exposing the photoresist layer to activating radiation; (e) heating the substrate in a post-exposure bake process; and (f) developing the exposed film with an or
    Type: Application
    Filed: December 19, 2018
    Publication date: July 4, 2019
    Inventors: Choong-Bong Lee, Stefan J. Caporale, Jason A. DeSISTO, Jong Keun Park, Cong Liu, Cheng-Bai Xu, Cecily Andes
  • Publication number: 20190172878
    Abstract: Provided is an optoelectronic device comprising an optoelectronic element and circuitry connected to the optoelectronic element, wherein the optoelectronic element comprises plural quantum dots or plural nanorods, and wherein the circuitry is configured to be capable of switching the optoelectronic element between a configuration in which the circuitry provides an effective forward bias voltage that causes the optoelectronic element to emit light and a configuration in which the circuitry provides an effective reverse bias voltage that causes the optoelectronic element to be capable of generating a photocurrent when light to which the optoelectronic element is sensitive strikes the optoelectronic element.
    Type: Application
    Filed: March 23, 2017
    Publication date: June 6, 2019
    Inventors: Peter Trefonas, III, Kishori Deshpande, Trevor Ewers, Edward Greer, Jaebum Joo, Bong Hoon Kim, Nuri Oh, Jong Keun Park, Moonsub Shim, Jieqian Zhang
  • Publication number: 20190114032
    Abstract: Provided is a method of creating an image on an array of optoelectronic elements comprising (a) providing a device comprising an array of optoelectronic elements and circuitry connected to each optoelectronic element, wherein the optoelectronic element comprises plural quantum dots or plural nanorods, and wherein the circuitry is configured to be capable of switching each optoelectronic element independently between an effective forward bias configuration and a reverse-bias configuration, (b) imposing an effective reverse bias on two or more of the optoelectronic elements, (c) providing circuitry that will detect the onset of photocurrent from an individual effective reverse biased optoelectronic element and that will respond to the photocurrent by changing the bias on the individual optoelectronic element to an effective forward bias.
    Type: Application
    Filed: March 23, 2017
    Publication date: April 18, 2019
    Inventors: Peter Trefonas, III, Seongyong Cho, Kishori Deshpande, Trevor Ewers, Jaebum Joo, Edward Greer, Bong Hoon Kim, Nuri Oh, Jong Keun Park, Moonsub Shim, Jieqian Zhang