Abstract: Provided are an apparatus and method for eliminating multi-user interference in a codebook-based beamforming system. A transmitter for providing a service to multi-users in the codebook-based beamforming system includes a beamformer for generating beamformed user signals by multiplying transmit data of users, to whom the service is to be provided, by corresponding weighting factor vectors using feedback information; a null space generator for generating a null space matrix orthogonal to weighting factor vectors of other users; and a projector for projecting the beamformed user signals on the corresponding null space matrix and transmitting the resulting signals through a plurality of antennas. Because the multi-user signals can maintain orthogonality, the performance degradation caused by the multi-user interference can be prevented.

Abstract: A direct methanol fuel cell is described. The DMFC uses a solid electrolyte that prevents methanol crossover. Optional chemical barriers may be employed to prevent CO2 contamination of the electrolyte.

Abstract: A user allocating apparatus and method in a multiple antenna mobile communication system supporting multi-user diversity is provided. Each user calculates effective Signal-to-Interference Noise Ratios (SINRs) and bit loading over every possible detection order and selects a detection order maximizing the number of channels with a minimum product of the minimum symbol distance of a modulation scheme and an effective SINR, thereby minimizing an average error probability. A base station receives detection orders from users and selects a user with a maximum detection order value. The base station then transmits data to the selected user using modulation schemes determined by the user for the transmit antennas.

Abstract: Disclosed are: (i) a method for fabricating a MIM capacitor in a semiconductor device, which can produce a MIM capacitor in fewer process steps; and (ii) a semiconductor device in which a MIM capacitor having a larger capacitance relative to conventional approaches is formed. The method comprises the steps of: (a) forming a capping layer, a bottom metal layer, a dielectric layer and a top metal layer above a semiconductor substrate in successive order; (b) forming a photoresist pattern on the top metal layer, the photoresist pattern masking a region to form the MIM capacitor; and (c) etching the top metal layer, the dielectric layer and the bottom metal layer in successive order using the photoresist pattern as a mask, thus forming the MIM capacitor including a top electrode, a dielectric insulator and a bottom electrode of which side walls are substantially collinear and have sidewalls that are substantially perpendicular to the capping layer.

Abstract: A method to clean a dual damascene structure includes forming a photoresist pattern on an interlayer dielectric; forming a dual damascene structure by etching the interlayer dielectric using the photoresist pattern as an etch mask; removing the photoresist pattern by an ashing process; and cleaning the dual damascene structure with a cleaning solution mixture that includes a first solution for removing polymer (that may be formed during the etching of the interlayer dielectric) and photoresist residue, and a second solution for removing native oxide (that may be formed on the bottom of the dual damascene structure). The first solution may include an organic solution further including hydroxylamine, and the second solution includes an HF solution or buffered HF solution. The cleaning step may also use an additive that has metal corrosion resistance.

Abstract: Methods for forming a copper interconnect of a semiconductor device are disclosed. A disclosed method comprises forming a lower metal interconnect; sequentially depositing a capping layer, a first insulating layer, and a second insulating layer on the lower metal interconnect; forming a via hole by etching the first insulating layer and the second insulating layer; forming a trench and terraces by etching the second insulating layer; and exposing at least a portion of the top surface of the lower metal interconnect by etching the capping layer.

Abstract: Methods and apparatus for cleaning a semiconductor device are disclosed. A disclosed method comprises forming a capping layer on top of a substrate including a bottom interconnect layer; depositing and patterning an insulating layer on the capping layer to form a damascene structure; etching a portion of the capping layer exposed by the damascene structure; and (d) removing polymers and copper impurities due to the etching by using a HF vapor gas.

Abstract: A method and apparatus for determining a shuffling pattern in a DSTTD. In the apparatus, a channel estimator estimates channel characteristics from a plurality of transmit antennas to a plurality of receive antennas. A shuffling pattern selector calculates a minimum receive SNR for each of all available shuffling patterns, and selects a shuffling pattern having the largest minimum receive SNR as the optimum shuffling pattern. This efficient shuffling pattern selection directly improves BER performance at a receiver.

Abstract: A method, machine-readable code and automated system for assaying or monitoring the extent of joint or bone deformity reported by a summarized score that may include joint space narrowing, bone erosion and periarticular osteoporosis in a joint-degenerative or joint-damaging disease in a subject are disclosed. From a digitized image of one of the subject's straight bone terminated with a joint such as fingers, coordinates of right and left bone contours of a selected middle or proximal phalange are determined, and these coordinates are in turn used to determine the coordinates of a minimum width in the middle region of the phalange and one or more apices in a region adjacent at least one side of a joint of the selected phalange. These latter coordinates are used in selecting a reference joint contour representing normal-bone contour for that phalange, or the contour of the patient phalange from an earlier x-ray image.