Patents by Inventor Jorg Schultz

Jorg Schultz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Illumination system and REMA objective with lens displacement and operating process therefor
    Patent number: 6295122
    Abstract: An illumination system for a microlithography projection illumination equipment, in which a secondary light source is imaged on a reticle . The distortion of the image can be set by at least one variable optical path between optical elements, and the uniformity of the illumination is changed because of the changed distortion, in particular, in that the uniformity is increased toward the edge.
    Type: Grant
    Filed: March 5, 1999
    Date of Patent: September 25, 2001
    Inventors: Jörg Schultz, Johannes Wangler
  • Illumination system particularly for EUV lithography
    Patent number: 6198793
    Abstract: The invention concerns an illumination system for wavelengths ≦193 nm, particularly for EUV lithography, with at least one light source, which has an illumination A in a predetermined surface; at least one device for producing secondary light sources; at least one mirror or lens device comprising at least one mirror or one lens, which is or are organized into raster elements; one or more optical elements, which are arranged between the mirror or lens device comprising at least one mirror or one lens, which is or are organized into raster elements and the reticle plane, whereby the optical elements image the secondary light sources in the exit pupil of the illumination system.
    Type: Grant
    Filed: May 4, 1999
    Date of Patent: March 6, 2001
    Assignee: Carl-Zeiss-Stiftung Trading As Carl Zeiss
    Inventors: Jörg Schultz, Johannes Wangler, Karl-Heinz Schuster, Udo Dinger