Patents by Inventor Josef Lang

Josef Lang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080136155
    Abstract: The invention is based on a known rollover protection system for motor vehicles having two seat-related rotary bars permanently articulated to the vehicle body, said rotary bars each being fixable in the stored resting position by means of a holding device, and being rotatable into a locked support position by means of a sensor-controlled drive. To compactly design the system with several functional parts, the invention provides a toggle lever arrangement to convert the movement of the drive into a rotary bar movement, said arrangement being articulated to the drive and the rotary bar such that it is folded at least partially within the area framed by the rotary bar when the rotary bar is in its resting position.
    Type: Application
    Filed: December 4, 2007
    Publication date: June 12, 2008
    Applicant: Automotive Group ISE Innomotive Systems Europe GmbH
    Inventors: Mirko Janisch, Josef Lang, Reinhard Nowack
  • Patent number: 5167667
    Abstract: In the chemo-mechanical polishing, in particular, of semiconductor wafers, he abrasion and the geometrical quality of the wafers decreases with increasing service life of the polishing cloth. This can be prevented by treating the polishing cloth in each case after the polishing operation in a manner such that a pressure field is impressed, essentially without mechanical stress, on the polishing cloth, which pressure field causes a treatment liquid to flow through the interior of the polishing cloth and in this process the residues produced during polishing are rendered mobile and removed. A baseplate placed transversely across the polishing cloth and having a flat working surface provided with exit openings for the treatment liquid is suitable for carrying out the process. In the treatment, the treatment liquid is forced beneath the baseplate into the moving polishing cloth so that the latter is gradually traversed by the zone through which flow takes place.
    Type: Grant
    Filed: June 5, 1990
    Date of Patent: December 1, 1992
    Assignee: Wacker-Chemitronic Gesellschaft fur Elektronik-Grundstoffe mbH
    Inventors: Helene Prigge, Josef Lang
  • Patent number: 5110428
    Abstract: Semiconductor wafers, in particular, silicon wafers, with differently poled front and rear sides and high geometrical quality can be fabricated by double-sided polishing if the wafer surfaces are differently polarized during the polishing process. This can be achieved in a simple fashion, in that during polishing, an electric field is set up between the upper and lower polishing plates. This can be accomplished by providing the upper polishing plate between the plate surface and the polishing cloth with a thin conductive layer insulated with respect thereto, on which a voltage can be impressed, while both polishing plates are grounded to the frame.
    Type: Grant
    Filed: September 4, 1990
    Date of Patent: May 5, 1992
    Assignee: Wacker-Chemitronic Gesellschaft fur Elektronik-Grundstoffe mbH
    Inventors: Helene Prigge, Josef Lang
  • Patent number: 4419531
    Abstract: A photovoltaic solar module having at least one solar cell embedded in synthetic resin and resting on a flexible supporting element and which further includes a sheet-like rigid element reinforcing the solar cell.
    Type: Grant
    Filed: July 7, 1982
    Date of Patent: December 6, 1983
    Assignee: Siemens Aktiengesellschaft
    Inventors: Josef Lang, Reinhard Hollaus, Ulrike Reeh, Hans Denk, Reiner Habrich