Patents by Inventor Joseph C. Olson

Joseph C. Olson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11380578
    Abstract: Systems and methods discussed herein can be used to form gratings at various slant angles across a grating material on a single substrate by determining an ion beam angle and changing the angle of an ion beam among and between ion beam angles to form gratings with varying angles and cross-sectional geometries. The substrate can be rotated around a central axis, and one or more process parameters, such as a duty cycle of the ion beam, can be modulated to form a grating with a depth gradient.
    Type: Grant
    Filed: October 18, 2019
    Date of Patent: July 5, 2022
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Rutger Meyer Timmerman Thijssen, Joseph C. Olson, Morgan Evans
  • Patent number: 11367589
    Abstract: Embodiments described herein relate to methods and apparatus for forming gratings having a plurality of fins with different slant angles on a substrate and forming fins with different slant angles on successive substrates using angled etch systems and/or an optical device. The methods include positioning portions of substrates retained on a platen in a path of an ion beam. The substrates have a grating material disposed thereon. The ion beam is configured to contact the grating material at an ion beam angle ? relative to a surface normal of the substrates and form gratings in the grating material.
    Type: Grant
    Filed: December 5, 2019
    Date of Patent: June 21, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Joseph C. Olson, Morgan Evans, Rutger Meyer Timmerman Thijssen
  • Publication number: 20220161363
    Abstract: Embodiments of the present application generally relate to methods for forming a plurality of gratings. The methods generally include depositing a material over one or more protected regions of a waveguide combiner disposed on a substrate, the material having a thickness inhibiting removal of a grating material disposed on the waveguide combiner when an ion beam is directed toward the substrate, and directing the ion beam toward the substrate. The methods disclosed herein allow for formation of a plurality of gratings in one or more unprotected regions, while no gratings are formed in the protected regions.
    Type: Application
    Filed: February 11, 2022
    Publication date: May 26, 2022
    Inventors: Morgan EVANS, Joseph C. OLSON, Rutger MEYER TIMMERMAN THIJSSEN
  • Patent number: 11335531
    Abstract: Methods of producing grating materials with variable height are provided. In one example, a method may include providing a grating material atop a substrate, and positioning a shadow mask between the grating material and an ion source, wherein the shadow mask is separated from the grating material by a distance. The method may further include etching the grating material using an ion beam passing through a set of openings of the shadow mask, wherein a first depth of a first portion of the grating material is different than a second depth of a second portion of the grating material.
    Type: Grant
    Filed: February 13, 2020
    Date of Patent: May 17, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Joseph C. Olson, Morgan Evans, Thomas Soldi, Rutger Meyer Timmerman Thijssen, Maurice Emerson Peploski
  • Publication number: 20220139691
    Abstract: Provided herein are approaches for performing electrodynamic mass analysis with a radio frequency (RF) biased ion source to reduce ion beam energy spread. In some embodiments, a system may include an ion source including a power supply, the ion source operable to generate a plasma within a chamber housing, and an extraction power assembly including a first power supply and a second power supply electrically coupled with the chamber housing of the ion source, wherein the first power supply and the second power supply are operable to bias the chamber housing of the ion source with a time modulated voltage to extract an ion beam from the ion source. The system may further include an electrodynamic mass analysis (EDMA) assembly operable to receive the ion beam and perform mass analysis on the ion beam.
    Type: Application
    Filed: November 3, 2020
    Publication date: May 5, 2022
    Applicant: Applied Materials, Inc.
    Inventors: Alexandre Likhanskii, Joseph C. Olson, Frank Sinclair, Peter F. Kurunczi
  • Publication number: 20220119955
    Abstract: Embodiments of the present disclosure include positioning a mask over a substrate, wherein the mask has a planar surface separated from a top surface of the substrate by a mask distance, and wherein a mask opening is provided through the planar surface. The method may further include positioning a mask element across the mask opening, the mask element including one or more solid portions and one or more openings, and depositing, through the mask opening, a deposition material onto the substrate, wherein the deposition material has a variable profile as a result of the one or more solid portions and the one or more openings.
    Type: Application
    Filed: October 16, 2020
    Publication date: April 21, 2022
    Applicant: Applied Materials, Inc.
    Inventors: M. Arif Zeeshan, Shantanu Kallakuri, Joseph C. Olson
  • Publication number: 20220100078
    Abstract: Methods and devices for producing substrates with variable height features are provided. In one example, a proximity mask may include a plate positioned over a substrate, wherein at least a portion of the plate is separated from the substrate by a distance. The plate may include a first opening and a second opening, wherein the first opening is defined by a first perimeter having a first shape, wherein the second opening is defined by a second perimeter having a second shape, and wherein the first shape is different than the second shape.
    Type: Application
    Filed: September 25, 2020
    Publication date: March 31, 2022
    Applicant: Applied Materials, Inc.
    Inventors: M. Arif Zeeshan, Ross Bandy, Peter F. Kurunczi, Shantanu Kallakuri, Thomas Soldi, Joseph C. Olson
  • Publication number: 20220077794
    Abstract: Embodiments of the present disclosure generally relate to substrate support assemblies for retaining a surface of a substrate having one or more devices disposed on the surface without contacting the one or more devices and deforming the substrate, and a system having the same. In one embodiment, the substrate support assembly includes an edge ring coupled to a body of the substrate support assembly. A controller is coupled to actuated mechanisms of a plurality of pixels coupled to the body of the substrate support assembly such that portions of pixels corresponding to a portion of the surface of a substrate to be retained are positioned to support the portion without contacting one or more devices disposed on the surface of the substrate to be retained on the support surface.
    Type: Application
    Filed: November 17, 2021
    Publication date: March 10, 2022
    Inventors: Wayne MCMILLAN, Visweswaren SIVARAMAKRISHNAN, Joseph C. OLSON, Ludovic GODET, Rutger MEYER TIMMERMAN THIJSSEN, Naamah ARGAMAN
  • Publication number: 20220051880
    Abstract: A plasma source may include a plasma chamber, where the plasma chamber has a first side, defining a first plane and an extraction assembly, disposed adjacent to the side of the plasma chamber, where the extraction assembly includes at least two electrodes. A first electrode may be disposed immediately adjacent the side of the plasma chamber, wherein a second electrode defines a vertical displacement from the first electrode along a first direction, perpendicular to the first plane, wherein the first electrode comprises a first aperture, and the second electrode comprises a second aperture. The first aperture may define a lateral displacement from the second aperture along a second direction, parallel to the first plane, wherein the vertical displacement and the lateral displacement define a non-zero angle of inclination with respect to a perpendicular to the first plane.
    Type: Application
    Filed: October 29, 2021
    Publication date: February 17, 2022
    Applicant: APPLIED Materials, Inc.
    Inventors: Peter F. Kurunczi, Morgan Evans, Joseph C. Olson
  • Patent number: 11247298
    Abstract: Embodiments of the present application generally relate to methods for forming a plurality of gratings. The methods generally include depositing a material over one or more protected regions of a waveguide combiner disposed on a substrate, the material having a thickness inhibiting removal of a grating material disposed on the waveguide combiner when an ion beam is directed toward the substrate, and directing the ion beam toward the substrate. The methods disclosed herein allow for formation of a plurality of gratings in one or more unprotected regions, while no gratings are formed in the protected regions.
    Type: Grant
    Filed: December 17, 2019
    Date of Patent: February 15, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Morgan Evans, Joseph C. Olson, Rutger Meyer Timmerman Thijssen
  • Patent number: 11226439
    Abstract: Optical grating components and methods of forming are provided. In some embodiments, a method includes providing a substrate, and etching a plurality of trenches into the substrate to form an optical grating. The optical grating may include a plurality of angled trenches, wherein a depth of a first trench of the plurality of trenches varies between at least one of the following: a first lengthwise end of the first trench and a second lengthwise end of the first trench, and between a first side of the first trench and a second side of the first trench.
    Type: Grant
    Filed: December 20, 2018
    Date of Patent: January 18, 2022
    Assignee: APPLIED Materials, Inc.
    Inventors: Joseph C. Olson, Ludovic Godet, Costel Biloiu
  • Patent number: 11226441
    Abstract: Methods of producing gratings with trenches having variable height are provided. In one example, a method of forming a diffracted optical element may include providing an optical grating layer over a substrate, patterning a hardmask over the optical grating layer, and forming a sacrificial layer over the hardmask, the sacrificial layer having a non-uniform height measured from a top surface of the optical grating layer. The method may further include etching a plurality of angled trenches into the optical grating layer to form an optical grating, wherein a first depth of a first trench of the plurality of trenches is different than a second depth of a second trench of the plurality of trenches.
    Type: Grant
    Filed: October 16, 2020
    Date of Patent: January 18, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Morgan Evans, Rutger Meyer Timmerman Thijssen, Joseph C. Olson
  • Patent number: 11205978
    Abstract: Embodiments of the present disclosure generally relate to substrate support assemblies for retaining a surface of a substrate having one or more devices disposed on the surface without contacting the one or more devices and deforming the substrate, and a system having the same. In one embodiment, the substrate support assembly includes an edge ring coupled to a body of the substrate support assembly. A controller is coupled to actuated mechanisms of a plurality of pixels coupled to the body of the substrate support assembly such that portions of pixels corresponding to a portion of the surface of a substrate to be retained are positioned to support the portion without contacting one or more devices disposed on the surface of the substrate to be retained on the support surface.
    Type: Grant
    Filed: December 13, 2019
    Date of Patent: December 21, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Wayne McMillan, Visweswaren Sivaramakrishnan, Joseph C. Olson, Ludovic Godet, Rutger Meyer Timmerman Thijssen, Naamah Argaman
  • Publication number: 20210391155
    Abstract: A processing system may include a plasma chamber operable to generate a plasma, and an extraction assembly, arranged along a side of the plasma chamber. The extraction assembly may include an extraction plate including an extraction aperture, the extraction plate having a non-planar shape, and generating an extracted ion beam at a high angle of incidence with respect to a perpendicular to a plane of a substrate, when the plane of the substrate is arranged parallel to the side of the plasma chamber.
    Type: Application
    Filed: January 27, 2021
    Publication date: December 16, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Christopher Campbell, Costel Biloiu, Peter F. Kurunczi, Jay R. Wallace, Kevin M. Daniels, Kevin T. Ryan, Minab B. Teferi, Frank Sinclair, Joseph C. Olson
  • Patent number: 11195703
    Abstract: A plasma source may include a plasma chamber, where the plasma chamber has a first side, defining a first plane and an extraction assembly, disposed adjacent to the side of the plasma chamber, where the extraction assembly includes at least two electrodes. A first electrode may be disposed immediately adjacent the side of the plasma chamber, wherein a second electrode defines a vertical displacement from the first electrode along a first direction, perpendicular to the first plane, wherein the first electrode comprises a first aperture, and the second electrode comprises a second aperture. The first aperture may define a lateral displacement from the second aperture along a second direction, parallel to the first plane, wherein the vertical displacement and the lateral displacement define a non-zero angle of inclination with respect to a perpendicular to the first plane.
    Type: Grant
    Filed: November 13, 2019
    Date of Patent: December 7, 2021
    Assignee: APPLIED Materials, Inc.
    Inventors: Peter F. Kurunczi, Morgan Evans, Joseph C. Olson
  • Patent number: 11193198
    Abstract: Embodiments of the disclosure relate to systems and methods for forming devices on a substrate. For example, a method for forming devices on a substrate can include projecting one or more ion beams from one or more ion beam chambers to form one or more devices on a first surface of a substrate and projecting one or more ion beams from one or more ion beam chambers to form one or more devices on a second surface of a substrate. In these embodiments, the first surface and the second surface are on opposite sides of the substrate. Therefore, the ion beams can form the devices on both sides of the substrate.
    Type: Grant
    Filed: December 6, 2019
    Date of Patent: December 7, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Joseph C. Olson, Ludovic Godet, Rutger Meyer Timmerman Thijssen, Morgan Evans, Jinxin Fu
  • Publication number: 20210351069
    Abstract: Methods of producing grating materials with variable height fins are provided. In one example, a method may include providing a mask layer atop a substrate, the mask layer including a first opening over a first processing area and a second opening over a second processing area. The method may further include etching the substrate to recess the first and second processing areas, forming a grating material over the substrate, and etching the grating material in the first and second processing areas to form a plurality of structures oriented at a non-zero angle with respect to a vertical extending from a top surface of the substrate.
    Type: Application
    Filed: May 11, 2020
    Publication date: November 11, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Morgan Evans, Joseph C. Olson, Rutger Meyer Timmerman Thijssen, Daniel Distaso, Ryan Boas
  • Publication number: 20210333450
    Abstract: Embodiments described herein relate to methods of forming gratings with different slant angles on a substrate and forming gratings with different slant angles on successive substrates using angled etch systems. The methods include positioning portions of substrates retained on a platen in a path of an ion beam. The substrates have a grating material disposed thereon. The ion beam is configured to contact the grating material at an ion beam angle ? relative to a surface normal of the substrates and form gratings in the grating material. The substrates are rotated about an axis of the platen resulting in rotation angles ? between the ion beam and a surface normal of the gratings. The gratings have slant angles ?? relative to the surface normal of the substrates. The rotation angles ? selected by an equation ?=cos?1(tan(??)/tan(?)).
    Type: Application
    Filed: April 17, 2019
    Publication date: October 28, 2021
    Inventors: Rutger MEYER TIMMERMAN THIJSSEN, Morgan EVANS, Joseph C. OLSON
  • Publication number: 20210313154
    Abstract: A system having an auxiliary plasma source, disposed proximate the workpiece, for use with an ion beam is disclosed. The auxiliary plasma source is used to create ions and radicals which drift toward the workpiece and may form a film. The ion beam is then used to provide energy so that the ions and radicals can process the workpiece. Further, various applications of the system are also disclosed. For example, the system can be used for various processes including deposition, implantation, etching, pre-treatment and post-treatment. By locating an auxiliary plasma source close to the workpiece, processes that were previously not possible may be performed. Further, two dissimilar processes, such as cleaning and implanting or implanting and passivating can be performed without removing the workpiece from the end station.
    Type: Application
    Filed: June 14, 2021
    Publication date: October 7, 2021
    Inventors: Christopher Hatem, Peter F. Kurunczi, Christopher A. Rowland, Joseph C. Olson, Anthony Renau
  • Publication number: 20210305011
    Abstract: A system and method that is capable of measuring the incident angle of an ion beam, especially an ion beam comprising heavier ions, is disclosed. In one embodiment, X-rays, rather than ions, are used to determine the channeling direction. In another embodiment, the workpiece is constructed, at least in part, of a material having a high molecular weight such that heaver ion beams can be measured. Further, in another embodiment, the parameters of the ion beam are measured across an entirety of the beam, allowing components of the ion implantation system to be further tuned to create a more uniform beam.
    Type: Application
    Filed: March 24, 2020
    Publication date: September 30, 2021
    Inventors: Frank Sinclair, Jonathan Gerald England, Joseph C. Olson