Patents by Inventor Joseph C. Olson
Joseph C. Olson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11456152Abstract: Embodiments described herein relate to methods and apparatus for forming gratings having a plurality of fins with different slant angles on a substrate and forming fins with different slant angles on successive substrates using angled etch systems and/or an optical device. The methods include positioning portions of substrates retained on a platen in a path of an ion beam. The substrates have a grating material disposed thereon. The ion beam is configured to contact the grating material at an ion beam angle ? relative to a surface normal of the substrates and form gratings in the grating material.Type: GrantFiled: December 5, 2019Date of Patent: September 27, 2022Assignee: APPLIED MATERIALS, INC.Inventors: Joseph C. Olson, Morgan Evans, Rutger Meyer Timmerman Thijssen
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Patent number: 11456205Abstract: Methods of producing grating materials with variable height fins are provided. In one example, a method may include providing a mask layer atop a substrate, the mask layer including a first opening over a first processing area and a second opening over a second processing area. The method may further include etching the substrate to recess the first and second processing areas, forming a grating material over the substrate, and etching the grating material in the first and second processing areas to form a plurality of structures oriented at a non-zero angle with respect to a vertical extending from a top surface of the substrate.Type: GrantFiled: May 11, 2020Date of Patent: September 27, 2022Assignee: Applied Materials, Inc.Inventors: Morgan Evans, Joseph C. Olson, Rutger Meyer Timmerman Thijssen, Daniel Distaso, Ryan Boas
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Publication number: 20220301926Abstract: Systems and methods discussed herein can be used to form gratings at various slant angles across a grating material on a single substrate by determining an ion beam angle and changing the angle of an ion beam among and between ion beam angles to form gratings with varying angles and cross-sectional geometries. The substrate can be rotated around a central axis, and one or more process parameters, such as a duty cycle of the ion beam, can be modulated to form a grating with a depth gradient.Type: ApplicationFiled: June 3, 2022Publication date: September 22, 2022Inventors: Rutger MEYER TIMMERMAN THIJSSEN, Joseph C. OLSON, Morgan EVANS
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Publication number: 20220260764Abstract: Embodiments described herein relate to methods of forming gratings with different slant angles on a substrate and forming gratings with different slant angles on successive substrates using angled etch systems. The methods include positioning portions of substrates retained on a platen in a path of an ion beam. The substrates have a grating material disposed thereon. The ion beam is configured to contact the grating material at an ion beam angle relative to a surface normal of the substrates and form gratings in the grating material. The substrates are rotated about an axis of the platen resulting in rotation angles ? between the ion beam and a surface normal of the gratings. The gratings have slant angles relative to the surface normal of the substrates. The rotation angles ? selected by an equation ?=cos?1 (tan()/tan()).Type: ApplicationFiled: May 5, 2022Publication date: August 18, 2022Inventors: Rutger MEYER TIMMERMAN THIJSSEN, Morgan EVANS, Joseph C. OLSON
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Patent number: 11404278Abstract: An optical grating component may include a substrate, and an optical grating, the optical grating being disposed on the substrate. The optical grating may include a plurality of angled structures, disposed at a non-zero angle of inclination with respect to a perpendicular to a plane of the substrate, wherein the plurality of angled structures are arranged to define a variable depth along a first direction, the first direction being parallel to the plane of the substrate.Type: GrantFiled: September 22, 2020Date of Patent: August 2, 2022Assignee: Varian Semiconductor Equipment Associates, Inc.Inventors: John Hautala, Morgan Evans, Rutger Meyer Timmerman Thijssen, Joseph C. Olson
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Publication number: 20220238295Abstract: Methods of producing grating materials with variable height are provided. In one example, a method may include providing a grating material atop a substrate, and positioning a shadow mask between the grating material and an ion source, wherein the shadow mask is separated from the grating material by a distance. The method may further include etching the grating material using an ion beam passing through a set of openings of the shadow mask, wherein a first depth of a first portion of the grating material is different than a second depth of a second portion of the grating material.Type: ApplicationFiled: April 18, 2022Publication date: July 28, 2022Applicant: Applied Materials, Inc.Inventors: Joseph C. Olson, Morgan Evans, Thomas Soldi, Rutger Meyer Timmerman Thijssen, Maurice Emerson Peploski
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Patent number: 11397289Abstract: Embodiments described herein relate to methods of forming gratings with different slant angles on a substrate and forming gratings with different slant angles on successive substrates using angled etch systems. The methods include positioning portions of substrates retained on a platen in a path of an ion beam. The substrates have a grating material disposed thereon. The ion beam is configured to contact the grating material at an ion beam angle ? relative to a surface normal of the substrates and form gratings in the grating material. The substrates are rotated about an axis of the platen resulting in rotation angles ? between the ion beam and a surface normal of the gratings. The gratings have slant angles ?? relative to the surface normal of the substrates. The rotation angles ? selected by an equation ?=cos?1(tan(??)/tan(?)).Type: GrantFiled: April 17, 2019Date of Patent: July 26, 2022Assignee: Applied Materials, Inc.Inventors: Rutger Meyer Timmerman Thijssen, Morgan Evans, Joseph C. Olson
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Patent number: 11387073Abstract: A system and method that is capable of measuring the incident angle of an ion beam, especially an ion beam comprising heavier ions, is disclosed. In one embodiment, X-rays, rather than ions, are used to determine the channeling direction. In another embodiment, the workpiece is constructed, at least in part, of a material having a high molecular weight such that heaver ion beams can be measured. Further, in another embodiment, the parameters of the ion beam are measured across an entirety of the beam, allowing components of the ion implantation system to be further tuned to create a more uniform beam.Type: GrantFiled: March 24, 2020Date of Patent: July 12, 2022Assignee: Applied Materials, Inc.Inventors: Frank Sinclair, Jonathan Gerald England, Joseph C. Olson
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Patent number: 11380578Abstract: Systems and methods discussed herein can be used to form gratings at various slant angles across a grating material on a single substrate by determining an ion beam angle and changing the angle of an ion beam among and between ion beam angles to form gratings with varying angles and cross-sectional geometries. The substrate can be rotated around a central axis, and one or more process parameters, such as a duty cycle of the ion beam, can be modulated to form a grating with a depth gradient.Type: GrantFiled: October 18, 2019Date of Patent: July 5, 2022Assignee: APPLIED MATERIALS, INC.Inventors: Rutger Meyer Timmerman Thijssen, Joseph C. Olson, Morgan Evans
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Patent number: 11367589Abstract: Embodiments described herein relate to methods and apparatus for forming gratings having a plurality of fins with different slant angles on a substrate and forming fins with different slant angles on successive substrates using angled etch systems and/or an optical device. The methods include positioning portions of substrates retained on a platen in a path of an ion beam. The substrates have a grating material disposed thereon. The ion beam is configured to contact the grating material at an ion beam angle ? relative to a surface normal of the substrates and form gratings in the grating material.Type: GrantFiled: December 5, 2019Date of Patent: June 21, 2022Assignee: Applied Materials, Inc.Inventors: Joseph C. Olson, Morgan Evans, Rutger Meyer Timmerman Thijssen
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Publication number: 20220161363Abstract: Embodiments of the present application generally relate to methods for forming a plurality of gratings. The methods generally include depositing a material over one or more protected regions of a waveguide combiner disposed on a substrate, the material having a thickness inhibiting removal of a grating material disposed on the waveguide combiner when an ion beam is directed toward the substrate, and directing the ion beam toward the substrate. The methods disclosed herein allow for formation of a plurality of gratings in one or more unprotected regions, while no gratings are formed in the protected regions.Type: ApplicationFiled: February 11, 2022Publication date: May 26, 2022Inventors: Morgan EVANS, Joseph C. OLSON, Rutger MEYER TIMMERMAN THIJSSEN
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Patent number: 11335531Abstract: Methods of producing grating materials with variable height are provided. In one example, a method may include providing a grating material atop a substrate, and positioning a shadow mask between the grating material and an ion source, wherein the shadow mask is separated from the grating material by a distance. The method may further include etching the grating material using an ion beam passing through a set of openings of the shadow mask, wherein a first depth of a first portion of the grating material is different than a second depth of a second portion of the grating material.Type: GrantFiled: February 13, 2020Date of Patent: May 17, 2022Assignee: Applied Materials, Inc.Inventors: Joseph C. Olson, Morgan Evans, Thomas Soldi, Rutger Meyer Timmerman Thijssen, Maurice Emerson Peploski
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Publication number: 20220139691Abstract: Provided herein are approaches for performing electrodynamic mass analysis with a radio frequency (RF) biased ion source to reduce ion beam energy spread. In some embodiments, a system may include an ion source including a power supply, the ion source operable to generate a plasma within a chamber housing, and an extraction power assembly including a first power supply and a second power supply electrically coupled with the chamber housing of the ion source, wherein the first power supply and the second power supply are operable to bias the chamber housing of the ion source with a time modulated voltage to extract an ion beam from the ion source. The system may further include an electrodynamic mass analysis (EDMA) assembly operable to receive the ion beam and perform mass analysis on the ion beam.Type: ApplicationFiled: November 3, 2020Publication date: May 5, 2022Applicant: Applied Materials, Inc.Inventors: Alexandre Likhanskii, Joseph C. Olson, Frank Sinclair, Peter F. Kurunczi
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Publication number: 20220119955Abstract: Embodiments of the present disclosure include positioning a mask over a substrate, wherein the mask has a planar surface separated from a top surface of the substrate by a mask distance, and wherein a mask opening is provided through the planar surface. The method may further include positioning a mask element across the mask opening, the mask element including one or more solid portions and one or more openings, and depositing, through the mask opening, a deposition material onto the substrate, wherein the deposition material has a variable profile as a result of the one or more solid portions and the one or more openings.Type: ApplicationFiled: October 16, 2020Publication date: April 21, 2022Applicant: Applied Materials, Inc.Inventors: M. Arif Zeeshan, Shantanu Kallakuri, Joseph C. Olson
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Publication number: 20220100078Abstract: Methods and devices for producing substrates with variable height features are provided. In one example, a proximity mask may include a plate positioned over a substrate, wherein at least a portion of the plate is separated from the substrate by a distance. The plate may include a first opening and a second opening, wherein the first opening is defined by a first perimeter having a first shape, wherein the second opening is defined by a second perimeter having a second shape, and wherein the first shape is different than the second shape.Type: ApplicationFiled: September 25, 2020Publication date: March 31, 2022Applicant: Applied Materials, Inc.Inventors: M. Arif Zeeshan, Ross Bandy, Peter F. Kurunczi, Shantanu Kallakuri, Thomas Soldi, Joseph C. Olson
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Publication number: 20220077794Abstract: Embodiments of the present disclosure generally relate to substrate support assemblies for retaining a surface of a substrate having one or more devices disposed on the surface without contacting the one or more devices and deforming the substrate, and a system having the same. In one embodiment, the substrate support assembly includes an edge ring coupled to a body of the substrate support assembly. A controller is coupled to actuated mechanisms of a plurality of pixels coupled to the body of the substrate support assembly such that portions of pixels corresponding to a portion of the surface of a substrate to be retained are positioned to support the portion without contacting one or more devices disposed on the surface of the substrate to be retained on the support surface.Type: ApplicationFiled: November 17, 2021Publication date: March 10, 2022Inventors: Wayne MCMILLAN, Visweswaren SIVARAMAKRISHNAN, Joseph C. OLSON, Ludovic GODET, Rutger MEYER TIMMERMAN THIJSSEN, Naamah ARGAMAN
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Publication number: 20220051880Abstract: A plasma source may include a plasma chamber, where the plasma chamber has a first side, defining a first plane and an extraction assembly, disposed adjacent to the side of the plasma chamber, where the extraction assembly includes at least two electrodes. A first electrode may be disposed immediately adjacent the side of the plasma chamber, wherein a second electrode defines a vertical displacement from the first electrode along a first direction, perpendicular to the first plane, wherein the first electrode comprises a first aperture, and the second electrode comprises a second aperture. The first aperture may define a lateral displacement from the second aperture along a second direction, parallel to the first plane, wherein the vertical displacement and the lateral displacement define a non-zero angle of inclination with respect to a perpendicular to the first plane.Type: ApplicationFiled: October 29, 2021Publication date: February 17, 2022Applicant: APPLIED Materials, Inc.Inventors: Peter F. Kurunczi, Morgan Evans, Joseph C. Olson
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Patent number: 11247298Abstract: Embodiments of the present application generally relate to methods for forming a plurality of gratings. The methods generally include depositing a material over one or more protected regions of a waveguide combiner disposed on a substrate, the material having a thickness inhibiting removal of a grating material disposed on the waveguide combiner when an ion beam is directed toward the substrate, and directing the ion beam toward the substrate. The methods disclosed herein allow for formation of a plurality of gratings in one or more unprotected regions, while no gratings are formed in the protected regions.Type: GrantFiled: December 17, 2019Date of Patent: February 15, 2022Assignee: Applied Materials, Inc.Inventors: Morgan Evans, Joseph C. Olson, Rutger Meyer Timmerman Thijssen
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Patent number: 11226439Abstract: Optical grating components and methods of forming are provided. In some embodiments, a method includes providing a substrate, and etching a plurality of trenches into the substrate to form an optical grating. The optical grating may include a plurality of angled trenches, wherein a depth of a first trench of the plurality of trenches varies between at least one of the following: a first lengthwise end of the first trench and a second lengthwise end of the first trench, and between a first side of the first trench and a second side of the first trench.Type: GrantFiled: December 20, 2018Date of Patent: January 18, 2022Assignee: APPLIED Materials, Inc.Inventors: Joseph C. Olson, Ludovic Godet, Costel Biloiu
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Patent number: 11226441Abstract: Methods of producing gratings with trenches having variable height are provided. In one example, a method of forming a diffracted optical element may include providing an optical grating layer over a substrate, patterning a hardmask over the optical grating layer, and forming a sacrificial layer over the hardmask, the sacrificial layer having a non-uniform height measured from a top surface of the optical grating layer. The method may further include etching a plurality of angled trenches into the optical grating layer to form an optical grating, wherein a first depth of a first trench of the plurality of trenches is different than a second depth of a second trench of the plurality of trenches.Type: GrantFiled: October 16, 2020Date of Patent: January 18, 2022Assignee: Applied Materials, Inc.Inventors: Morgan Evans, Rutger Meyer Timmerman Thijssen, Joseph C. Olson