Abstract: Embodiments of the present invention provide a method, system and computer program product for computer assisted pattern drafting in garment development. In an embodiment of the invention, a pattern making method includes initially acquiring a multiplicity of different two-dimensional image slices of a human form. Thereafter, a panel of a portion of a pattern of a garment is selected for processing in a data processing system and a metric computational rule for the selected panel is mapped to one of the two-dimensional image slices. A measurement of the one of the two-dimensional image slices is then acquired and the mapped metric computational rule is applied using the acquired measurement to produce a measurement for the selected panel.

Abstract: A cybersecurity training system uses lures and training actions to help train a user of an electronic device to recognize and act appropriately in situations that could compromise electronic device security. The system includes a library of cybersecurity training actions and a library of brand items. The system retrieves a template for a cybersecurity training action from the first library, automatically modifies the retrieved template to include a brand or branded content from the second library, and causes the cybersecurity training action according to the modified template instantiated with the branded content to be sent to the user's electronic device.

Abstract: An electronic message analysis system of a cybersecurity network assesses whether a received message is a mock malicious message in response to, receiving a user activation action that indicates that the user has reported the received message as a potentially malicious message. The system does this by determining whether any header field of a header section of the message starts with a predetermined key. For any header field that starts with the predetermined key, the system determines whether a value that follows the predetermined key satisfies a trusted sender rule. If the value that follows the predetermined key satisfies the trusted sender rule, the system determines that the received message originated from a trusted sender. If the value that immediately follows the predetermined key does not satisfy the trusted sender rule, the system determines that the received message did not originate from a trusted sender.

Abstract: In a cybersecurity network, a system identifies and classifies non-malicious messages by receiving a user notification indicating that the user has reported a received message as potentially malicious message, and determining whether the received message is legitimate or potentially malicious. When the system determines that the message is a legitimate, it further analyzes the message to assign a class that may include trusted internal sender, trusted external sender, or training a simulated phishing message. It will then cause the user's device to provide the user with information corresponding to the assigned class. The system may also quarantine a received message and release the message from the quarantine only after determining that the message is legitimate and receiving a user acknowledgment.

Abstract: An ion implantation apparatus, system, and method are provided for transferring a plurality of workpieces between vacuum and atmospheric pressures, wherein an alignment mechanism is operable to align a plurality of workpieces for generally simultaneous transportation to a dual-workpiece load lock chamber. The alignment mechanism comprises a characterization device, an elevator, and two vertically-aligned workpiece supports for supporting two workpieces. First and second atmospheric robots are configured to generally simultaneously transfer two workpieces at a time between load lock modules, the alignment mechanism, and a FOUP. Third and fourth vacuum robots are configured to transfer one workpiece at a time between the load lock modules and a process module.

Abstract: An ion implantation system has a process chamber having a process environment, and an ion implantation apparatus configured to implant ions into a workpiece supported by a chuck within the process chamber. A load lock chamber isolates the process (vacuum) environment from an atmospheric environment, wherein a load lock workpiece support supports the workpiece therein. An isolation chamber is coupled to the process chamber with a pre-implant cooling environment defined therein. An isolation gate valve selectively isolates the pre-implant cooling environment from the process environment wherein the isolation chamber comprises a pre-implant cooling workpiece support for supporting and cooling the workpiece. The isolation gate valve is the only access path for the workpiece to enter and exit the isolation chamber. A pressurized gas selectively pressurizes the pre-implant cooling environment to a pre-implant cooling pressure that is greater than the process pressure for expeditious cooling of the workpiece.

Abstract: An ion implantation system has a process chamber having a process environment, and an ion implantation apparatus configured to implant ions into a workpiece supported by a chuck within the process chamber. A load lock chamber isolates the process (vacuum) environment from an atmospheric environment, wherein a load lock workpiece support supports the workpiece therein. An isolation chamber is coupled to the process chamber with a pre-implant cooling environment defined therein. An isolation gate valve selectively isolates the pre-implant cooling environment from the process environment wherein the isolation chamber comprises a pre-implant cooling workpiece support for supporting and cooling the workpiece. The isolation gate valve is the only access path for the workpiece to enter and exit the isolation chamber. A pressurized gas selectively pressurizes the pre-implant cooling environment to a pre-implant cooling pressure that is greater than the process pressure for expeditious cooling of the workpiece.

Abstract: A cybersecurity training system uses lures and training actions to help train a user of an electronic device to recognize and act appropriately in situations that could compromise electronic device security. The system includes a library of cybersecurity training actions and a library of brand items. The system retrieves a template for a cybersecurity training action from the first library, automatically modifies the retrieved template to include a brand or branded content from the second library, and causes the cybersecurity training action according to the modified template instantiated with the branded content to be sent to the user's electronic device.

Abstract: A cybersecurity training system uses lures and training actions to help train a user of an electronic device to recognize and act appropriately in situations that could compromise security. The system includes an administrator interface by which an administrator may customize a lure and/or a training action with branded content. When used in a lure, this enables the lure to appear to the user as if it were a legitimate, non-threatening action from the brand. If the user falls for the lure, the system may provide the user with cybersecurity training, which may automatically include content that is tailored for the selected brand.

Abstract: An ion implantation system has an ion implantation apparatus coupled to first and second dual load lock assemblies, each having a respective first and second chamber separated by a common wall. Each first chamber has a pre-heat apparatus configured to heat a workpiece to a first temperature. Each second chamber has a post-cool apparatus configured to cool the workpiece to a second temperature. A thermal chuck retains the workpiece in a process chamber for ion implantation, and the thermal chuck is configured to heat the workpiece to a third temperature. A pump and vent are in selective fluid communication with the first and second chambers.

Abstract: A cybersecurity training system uses lures and training actions to help train a user of an electronic device to recognize and act appropriately in situations that could compromise security. The system includes an administrator interface by which an administrator may customize a lure and/or a training action with branded content. When used in a lure, this enables the lure to appear to the user as if it were a legitimate, non-threatening action from the brand. If the user falls for the lure, the system may provide the user with cybersecurity training, which may automatically include content that is tailored for the selected brand.

Abstract: An ion implantation system has an ion implantation apparatus coupled to first and second dual load lock assemblies, each having a respective first and second chamber separated by a common wall. Each first chamber has a pre-heat apparatus configured to heat a workpiece to a first temperature. Each second chamber has a post-cool apparatus configured to cool the workpiece to a second temperature. A thermal chuck retains the workpiece in a process chamber for ion implantation, and the thermal chuck is configured to heat the workpiece to a third temperature. A pump and vent are in selective fluid communication with the first and second chambers.

Abstract: An ion implantation apparatus, system, and method are provided for a transferring a plurality of workpieces between vacuum and atmospheric pressures, wherein an alignment mechanism is operable to align a plurality of workpieces for generally simultaneous transportation to a dual-workpiece load lock chamber. The alignment mechanism comprises a characterization device, an elevator, and two vertically-aligned workpiece supports for supporting two workpieces. First and second atmospheric robots are configured to generally simultaneously transfer two workpieces at a time between load lock modules, the alignment mechanism, and a FOUP. Third and fourth vacuum robots are configured to transfer one workpiece at a time between the load lock modules and a process module.

Abstract: A workpiece or semiconductor wafer is tilted as a ribbon beam is swept up and/or down the workpiece. In so doing, the implant angle or the angle of the ion beam relative to the workpiece remains substantially constant across the wafer. This allows devices to be formed substantially consistently on the wafer. Resolving plates move with the beam as the beam is scanned up and/or down. This allows desired ions to impinge on the wafer, but blocks undesirable contaminants.

Abstract: A transfer system for use with a tool for processing a work-piece at low or vacuum pressure such as an ion implanter for implanting silicon wafers. An enclosure defines a low pressure region for processing of work-pieces placed at a work-piece processing station within the low pressure region. A two tier multiple work-piece isolation load lock transfers work-pieces from a higher pressure region to the lower pressure for processing and back to said higher pressure subsequent to said processing. A first robot transfers work-pieces within the low pressure region from the load locks to a processing station within the low pressure region. Multiple other robots positioned outside the low pressure region transfers work-pieces to and from the two tier work-piece isolation load locks from a source of said work-pieces prior to processing and to a destination of said work-pieces after said processing.

Abstract: A bi-propellant rocket motor having controlled thermal management is disclosed. The rocket motor produces thrust using a solid or gel-phase primary propellant that can be either fuel- or oxidizer-rich, with a complementary self-pressurizing secondary propellant selected to balance the primary propellant in terms of the equivalence ratio. The motor houses multiple propellant grains arranged in such a configuration that each chamber containing a primary grain serves as both propellant storage and the main combustion chamber for that propellant grain as it burns with the secondary propellant. The secondary propellant is stored separately, and the flow routed past the primary propellant chamber to provide cooling for adjacent primary propellant chambers limiting the temperature rise in the motor structure.

Abstract: A workpiece or semiconductor wafer is tilted as a ribbon beam is swept up and/or down the workpiece. In so doing, the implant angle or the angle of the ion beam relative to the workpiece remains substantially constant across the wafer. This allows devices to be formed substantially consistently on the wafer. Resolving plates move with the beam as the beam is scanned up and/or down. This allows desired ions to impinge on the wafer, but blocks undesirable contaminants.

Abstract: An ion implantation apparatus, system, and method are provided for transferring a plurality of workpieces between vacuum and atmospheric pressures, wherein an alignment mechanism is operable to align a plurality of workpieces for generally simultaneous transportation to a dual-workpiece load lock chamber. The alignment mechanism comprises a characterization device, an elevator, and two vertically-aligned workpiece supports for supporting two workpieces. First and second atmospheric robots are configured to generally simultaneously transfer two workpieces at a time between load lock modules, the alignment mechanism, and a FOUP. Third and fourth vacuum robots are configured to transfer one workpiece at a time between the load lock modules and a process module.

Abstract: An ion implantation apparatus, system, and method are provided for a transferring a plurality of workpieces between vacuum and atmospheric pressures, wherein an alignment mechanism is operable to align a plurality of workpieces for generally simultaneous transportation to a dual-workpiece load lock chamber. The alignment mechanism comprises a characterization device, an elevator, and two vertically-aligned workpiece supports for supporting two workpieces. First and second atmospheric robots are configured to generally simultaneously transfer two workpieces at a time between load lock modules, the alignment mechanism, and a FOUP. Third and fourth vacuum robots are configured to transfer one workpiece at a time between the load lock modules and a process module.

Abstract: An ion implantation cluster tool for implanting ions into a workpiece is provided, wherein a plurality of beamline assemblies having a respective plurality of ion beamlines associated therewith are positioned about a common process chamber. Each of the plurality of ion beamline assemblies are selectively isolated from the common process chamber, and the plurality of beamline intersect at a processing region of the process chamber. A scanning apparatus positioned within the common process chamber is operable to selectively translate a workpiece holder in one or more directions through each of the plurality of ion beamlines within the processing region, and a common dosimetry apparatus within the common process chamber is operable to measure one or more properties of each of the plurality of ion beamlines. A load lock chamber is operably coupled to the common process chamber for exchange of workpieces between the common process chamber and an external environment.