Abstract: A woven tubular endoprosthesis comprising means for locking the endoprosthesis in a deployed configuration is disclosed. The means for locking the endoprosthesis may comprise locking protrusions, notches, a chemical bond, a curable bond, or other mechanism. The woven fibers comprising the endoprosthesis may be hollow and comprise circumferentially oriented polymeric chains, and may be filled with a curable material. A method of treatment using an endoprosthesis according to the invention is also disclosed.

Abstract: Novel endoprostheses comprising one or more photocurable materials are disclosed. Said endoprostheses may comprise regions wherein said photocurable materials are selectively disposed about said endoprosthesis and are cured according to desired parameters to achieve varying desired properties. Said properties may include but are not limited to cross-linking density, material density, modulus of elasticity, rate of erosion, extensibility, compressibility, mechanical strength, tensile strength, crystallinity, diffusion coefficient, and permeability.

Abstract: A method of removing water from a composition of matter comprises contacting a first composition of matter comprising water with a second composition of matter comprising: (1) at least one surfactant comprising at least one phosphate group and (2) a solvent comprising carbon dioxide, wherein at least a portion of the surfactant is soluble in the solvent, such that the at least one surfactant removes at least a portion of the water from the first composition.

Abstract: Methods of manufacturing polymeric intraluminal prostheses include annealing the polymeric material to selectively modify the crystallinity thereof. Annealing may be utilized to selectively modify various properties of the polymeric material of an intraluminal prosthesis, including: selectively increasing the modulus of the polymeric material; selectively increasing the hoop strength of the intraluminal prosthesis; selectively modifying the elution rate (increase or decrease) of a pharmacological agent subsequently disposed on or within the annealed polymeric material; selectively increasing/decreasing stress in the intraluminal prosthesis; and selectively modifying the polymeric material such that it erodes at a different rate.

Abstract: A process of forming a resist image in a microelectronic substrate, the process comprises the steps of: (a) providing a substrate having a polymer coating thereon, wherein the polymer is insoluble in water having a pH less than or equal to a specified pH (e.g., 7.0, 6, 5, or 4); then (b) imagewise exposing the coating to radiation such that exposed and unexposed coating portions are formed, with said exposed coating portions being soluble in water having a pH less than or equal to said specified pH7.0; and then (c) contacting said coating to a developing composition comprising carbon dioxide and water, said water having a specified pH less than or equal to 7.0 (and preferably a pH of about 2 or 3 to 4, 5 or 6; i.e. a specified pH less than or equal to 6, 5, or 4), so that said exposed coating portions are preferentially removed from the substrate as compared to said unexposed coating portions to form an image thereon.

Abstract: A method for carrying out the continuous polymerization of a monomer in a carbon dioxide reaction medium comprises the steps of: (a) providing an apparatus including a continuous reaction vessel and a separator; (b) carrying out a polymerization reaction in the reaction vessel by combining a monomer and a carbon dioxide reaction medium therein (and preferably by also combining an initiator therein), wherein the reaction medium is a liquid or supercritical fluid, and wherein the reaction produces a solid polymer product in the reaction vessel; then (c) withdrawing a continuous effluent stream from the reaction vessel during the polymerization reaction, wherein the effluent stream is maintained as a liquid or supercritical fluid; then (d) passing the continuous effluent stream through the separator and separating the solid polymer therefrom while maintaining at least a portion of the effluent stream as a liquid or supercritical fluid; and then (e) returning at least a portion of the continuous effluent stream t

Abstract: Methods of carrying out a reactive extrusion processes are described that include combining at least one polymer, oligomer, or combination thereof, a carbon dioxide containing fluid, and at least one reactant in an extruder to form a mixture such that the carbon dioxide containing fluid comes into intimate contact with the at least one polymer, oligomer, or combination thereof and assists in a reaction between the at least one polymer, oligomer, or combination thereof and the at least one reactant, and wherein the at least one polymer, oligomer, or combination thereof is modified upon reaction with the at least one reactant.

Abstract: Improved endoprostheses comprising a delivery configuration and a deployed configuration and methods of manufacture are disclosed. Some embodiments according to the invention comprise woven tubular structures and means for maintaining said structures in their expanded configurations. In one embodiment of the invention, locking elements disposed on one or more fibers maintain said endoprosthesis in its deployed configuration. In alternative embodiments, one or more axial members may maintain said endoprosthesis in its deployed configuration. In yet additional alternative embodiments, a chemical bond or thermocouple may maintain said endoprosthesis in its deployed configuration. Some embodiments according to the invention may comprise erodible material.

Abstract: Methods of manufacturing polymeric intraluminal prostheses include annealing the polymeric material to selectively modify the crystallinity thereof. Annealing may be utilized to selectively modify various properties of the polymeric material of an intraluminal prosthesis, including: selectively increasing the modulus of the polymeric material; selectively increasing the hoop strength of the intraluminal prosthesis; selectively modifying the elution rate (increase or decrease) of a pharmacological agent subsequently disposed on or within the annealed polymeric material; selectively increasing/decreasing stress in the intraluminal prosthesis; and selectively modifying the polymeric material such that it erodes at a different rate.

Abstract: A substrate is patterned by performing immersion lithography on a photoresist layer on the substrate using carbon dioxide. The immersion layer may be provided and/or removed and/or the photoresist layer may be developed, dried and/or removed using carbon dioxide. The immersion layer can include liquid and/or solid immersion layers. The need for organic solvents in immersion lithography can thereby be reduced or eliminated.

Abstract: A method of producing a foamed material comprises contacting a mixture comprising a first thermoplastic polymer and a second thermoplastic polymer with a blowing agent, wherein the first thermoplastic polymer has a higher percent crystallinity that the second thermoplastic polymer; and subjecting the mixture to conditions sufficient to create a thermodynamic instability in the blend foam the mixture, wherein the mixture comprising the first and second thermoplastic polymers has a percent crystallinity lower than the first thermoplastic polymer.

Abstract: Chemical mechanical polishing compositions including a carbon dioxide-based solvent, an oxidizing agent, and a chelating agent are formed and used with CMP processes and systems. Methods for determining the endpoint of a CMP process are also provided.

Abstract: Methods of forming a polymeric structure having a plurality of cells therein that include contacting a polymeric material that includes a first phase and a second phase with a composition comprising carbon dioxide to form the polymeric structure having a plurality of cells therein are described. Polymeric materials and microelectronic devices formed by such methods are also described.

Abstract: A method for forming a fluoropolymer comprises providing a reaction mixture comprising carbon dioxide, at least one fluoromonomer, and an initiator; and reacting the at least one fluoromonomer in the reaction mixture to form a fluoropolymer. The fluoropolymer has a multimodal molecular weight distribution.

Abstract: Methods for cleaning a microelectronic substrate in a cluster tool are described that include placing the substrate in a pressure chamber of a module in a cluster tool; pressurizing the pressure chamber; introducing liquid CO2 into the pressure chamber; cleaning the substrate in the pressure chamber; removing the liquid CO2 from the pressure chamber, depressurizing the pressure chamber, and removing the substrate from the pressure chamber. Apparatus for processing a microelectronic substrate are also disclosed that that include a transfer module, a first processing module that employs liquid carbon dioxide as a cleaning fluid coupled to the transfer module, a second processing module coupled to the transfer module, and a transfer mechanism coupled to the transfer module. The transfer mechanism is configured to move the substrate between the first processing module and the second processing module.

Abstract: Methods of forming a polymeric structure having a plurality of cells therein that include contacting a polymeric material that includes a first phase and a second phase with a composition comprising carbon dioxide to form the polymeric structure having a plurality of cells therein are described. Polymeric materials and microelectronic devices formed by such methods are also described.

Abstract: A process of forming a resist image in a microelectronic substrate comprises the steps of contacting the substrate with a composition first comprising carbon dioxide and a component selected from the group consisting of at least one polymeric precursor, at least one monomer, at least one polymeric material, and mixtures thereof to deposit the component on the substrate and form a coating thereon; then imagewise exposing the coating to radiation such that exposed and unexposed coating portions are formed; then subjecting the coating to a second composition comprising carbon dioxide having such that either one of the exposed or the unexposed coating portions are removed from the substrate and the other coating portion is developed and remains on the coating to form an image thereon.

Abstract: A method of removing water from a composition of matter comprises contacting a first composition of matter comprising water with a second composition of matter comprising: (1) at least one surfactant comprising at least one phosphate group and (2) a solvent comprising carbon dioxide, wherein at least a portion of the surfactant is soluble in the solvent, such that the at least one surfactant removes at least a portion of the water from the first composition

Abstract: A method for carrying out a catalysis reaction in carbon dioxide comprising contacting a fluid mixture with a catalyst bound to a polymer, the fluid mixture comprising at least one reactant and carbon dioxide, wherein the reactant interacts with the catalyst to form a reaction product. A composition of matter comprises carbon dioxide and a polymer and a reactant present in the carbon dioxide. The polymer has bound thereto a catalyst at a plurality of chains along the length of the polymer, and wherein the reactant interacts with the catalyst to form a reaction product.

Abstract: Methods and apparatus for chemical mechanical planarization of an article such as a semiconductor wafer use polishing slurries including a carbon dioxide solvent or a carbon dioxide-philic composition. A carbon dioxide cleaning solvent step and apparatus may also be employed.