Abstract: A method for measuring pollution that includes providing a plurality of analyte sensors arranged in a grid over a sensing area, wherein the analyte sensors measure a pollutant, and positioning at least one current sensor in the sensing area. A pollution source is localized using a pollution source locator including a dispersion model and at least one hardware processor to interpolate a location of a pollution source from variations in current measured from the current sensors and measurements of pollutants from the analyte sensors.

Abstract: A method for measuring pollution that includes providing a plurality of analyte sensors arranged in a grid over a sensing area, wherein the analyte sensors measure a pollutant, and positioning at least one current sensor in the sensing area. A pollution source is localized using a pollution source locator including a dispersion model and at least one hardware processor to interpolate a location of a pollution source from variations in current measured from the current sensors and measurements of pollutants from the analyte sensors.

Abstract: A silicon-on-insulator substrate which includes a semiconductor substrate, a buried oxide layer, and a semiconductor layer is provided. A hard mask layer is formed over a first region of the silicon-on-insulator substrate. A first silicon-germanium layer is epitaxially grown on the semiconductor layer within a second region of the silicon-on-insulator substrate. The second region is at least a portion of the semiconductor layer not covered by the hard mask layer. A thermal annealing process is performed, such that germanium atoms from the first silicon-germanium layer are migrated to the portion of the semiconductor layer to form a second silicon-germanium layer. The hard mask layer is removed. A layer of semiconductor material is epitaxially grown on top of the semiconductor layer and the second silicon-germanium layer, where the layer of semiconductor material composed of the same material as semiconductor layer.

Abstract: Heuristic-based techniques for gas leak source identification are provided. In one aspect, a method for identifying a location of a gas leak source includes: obtaining gas sensor data and wind data synchronously from a gas leak detection system having a network of interconnected motes comprising gas sensors and wind sensors, with the gas sensors arranged around possible gas leak sources in a given area of interest; identifying the location of the gas leak source using the gas sensor data and wind data; and determining a magnitude of gas leak from the gas leak source using the location of the gas leak source and a distance d between the location of the gas leak source and a select one of the gas sensors from which the gas sensor data was obtained. A gas leak detection system is also provided.

Abstract: A technique relates to a trilayer Josephson junction structure. A dielectric layer is on a base electrode layer that is on a substrate. A counter electrode layer is on the dielectric layer. First and second counter electrodes are formed from the counter electrode layer. First and second dielectric layers are formed from the dielectric layer. First and second base electrodes are formed from base electrode layer. The first counter electrode, first dielectric layer, and first base electrode form a first stack. The second counter electrode, second dielectric layer, and second base electrode form a second stack. A shunting capacitor is between first and second base electrodes. An ILD layer is deposited on the substrate, the first and second counter electrodes, and the first and second base electrodes. A contact bridge connects the first and second counter electrodes. An air gap is formed underneath the contact bridge by removing ILD.

Abstract: A technique relates to a superconducting qubit. A Josephson junction includes a first superconductor and a second superconductor formed on a non-superconducting metal. A capacitor is coupled in parallel with the Josephson junction.

Abstract: Field effect transistors include a stack of nanosheets of vertically arranged channel layers. A gate stack is formed over, around, and between the vertically arranged channel layers. Spacers are formed, with at least one top pair of spacers being positioned above an uppermost channel layer. The top pair of spacers each has a curved lower portion with a curved surface in contact with the gate stack and a straight upper portion that extends vertically from the curved portion along a straight sidewall of the gate stack.

Abstract: Techniques for forming dual III-V semiconductor channel materials to enable fabrication of different device types on the same chip/wafer are provided. In one aspect, a method of forming dual III-V semiconductor channel materials on a wafer includes the steps of: providing a wafer having a first III-V semiconductor layer on an oxide; forming a second III-V semiconductor layer on top of the first III-V semiconductor layer, wherein the second III-V semiconductor layer comprises a different material with an electron affinity that is less than an electron affinity of the first III-V semiconductor layer; converting the first III-V semiconductor layer in at least one second active area to an insulator using ion implantation; and removing the second III-V semiconductor layer from at least one first active area selective to the first III-V semiconductor layer.

Abstract: A technique relates to a superconducting qubit. A Josephson junction includes a first superconductor and a second superconductor formed on a non-superconducting metal. A capacitor is coupled in parallel with the Josephson junction.

Abstract: A silicon-on-insulator substrate which includes a semiconductor substrate, a buried oxide layer, and a semiconductor layer is provided. A hard mask layer is formed over a first region of the silicon-on-insulator substrate. A first silicon-germanium layer is epitaxially grown on the semiconductor layer within a second region of the silicon-on-insulator substrate. The second region is at least a portion of the semiconductor layer not covered by the hard mask layer. A thermal annealing process is performed, such that germanium atoms from the first silicon-germanium layer are migrated to the portion of the semiconductor layer to form a second silicon-germanium layer. The hard mask layer is removed. A layer of semiconductor material is epitaxially grown on top of the semiconductor layer and the second silicon-germanium layer, where the layer of semiconductor material composed of the same material as semiconductor layer.

Abstract: A gas sensor enclosure is provided. The gas sensor enclosure includes at least two coaxial shells, a gas sensor, a gas permeable membrane that exposes a portion of the gas sensor to gas exchange through one of the at least two coaxial shells and a screen. The screen encloses the at least two coaxial shells, the gas sensor and the gas permeable membrane.

Abstract: Field effect transistors include a stack of nanosheets of vertically arranged channel layers. A source and drain region is positioned at respective ends of the vertically arranged channel layers. A gate stack is formed over, around, and between the vertically arranged channel layers. The transistor includes a plurality of internal spacers, each formed between the gate stack and a respective source or drain region, with at least one pair of spacers being positioned above an uppermost channel layer.

Abstract: The present invention involves a multimodal sensor network for analyte detection. A first mode may involve low-power detection and a second mode may involve determining an analyte concentration and transmitting data associated with the analyte concentration. Specifically, the first mode may include establishing an analyte sensor network in a detection region, detecting an analyte in the detection region, and generating an electrical signal in response to the detecting the analyte. In response to the electrical signal exceeding a first threshold, the analyte detection system may operate in the second mode. The second mode may include requesting data associated with the one or more environmental conditions, determining an analyte concentration based on one or more environmental conditions transmitting data associated with the analyte concentration.

Abstract: The present invention involves a multimodal sensor network for analyte detection. A first mode may involve low-power detection and a second mode may involve determining an analyte concentration and transmitting data associated with the analyte concentration. Specifically, the first mode may include establishing an analyte sensor network in a detection region, detecting an analyte in the detection region, and generating an electrical signal in response to the detecting the analyte. In response to the electrical signal exceeding a first threshold, the analyte detection system may operate in the second mode. The second mode may include requesting data associated with the one or more environmental conditions, determining an analyte concentration based on one or more environmental conditions transmitting data associated with the analyte concentration.

Abstract: A technique relates to a superconducting qubit. A Josephson junction includes a first superconductor and a second superconductor formed on a non-superconducting metal. A capacitor is coupled in parallel with the Josephson junction.

Abstract: A technique relates to protecting a tunnel junction. A first electrode paddle and a second electrode paddle are on a substrate. The first and second electrode paddles oppose one another. A sacrificial shorting strap is formed on the substrate. The sacrificial shorting strap connects the first electrode paddle and the second electrode paddle; The tunnel junction is formed connecting the first electrode paddle and the second electrode paddle, after forming the sacrificial shorting strap. The substrate is mounted on a portion of a quantum cavity. The portion of the quantum cavity is placed in a vacuum chamber. The sacrificial shorting strap is etched away in the vacuum chamber while the substrate is mounted to the portion of the quantum cavity, such that the sacrificial shorting strap no longer connects the first and second electrode paddles. The tunnel junction has been protected from electrostatic discharge by the sacrificial shorting strap.

Abstract: Atmospheric particle detectors having a hybrid measurement cavity and light baffle are provided. In one aspect, an atmospheric particle detector includes: an optical measurement cavity; a light baffle attached to the optical measurement cavity, wherein the light baffle is configured to i) permit unobstructed airflow into the optical measurement cavity and ii) block ambient light from entering the optical measurement cavity; a photodetector on a first side of the optical measurement cavity; a retro reflector on a second side of the optical measurement cavity opposite the photodetector, and a light source configured to produce a light beam that passes through the optical measurement cavity without illuminating the photodetector. A method for particle detection using the atmospheric particle detector is also provided.

Abstract: A technique relates to a superconducting airbridge on a structure. A first ground plane, resonator, and second ground plane are formed on a substrate. A first lift-off pattern is formed of a first lift-off resist and a first photoresist. The first photoresist is deposited on the first lift-off resist. A superconducting sacrificial layer is deposited while using the first lift-off pattern. The first lift-off pattern is removed. A cross-over lift-off pattern is formed of a second lift-off resist and a second photoresist. The second photoresist is deposited on the second lift-off resist. A cross-over superconducting material is deposited to be formed as the superconducting airbridge while using the cross-over lift-off pattern. The cross-over lift-off pattern is removed. The superconducting airbridge is formed to connect the first and second ground planes by removing the superconducting sacrificial layer underneath the cross-over superconducting material. The superconducting airbridge crosses over the resonator.

Abstract: Field effect transistors and methods of forming the same include forming a stack of nanosheets of alternating layers of channel material and sacrificial material. A layer of sacrificial material forms a top layer of the stack. A dummy gate is formed over the stack. Stack material outside of a region covered by the dummy gate is removed. The sacrificial material is etched to form recesses in the sacrificial material layers. Spacers are formed in the recesses in the sacrificial material layers. At least one pair of spacers is formed in recesses above an uppermost layer of channel material. The dummy gates are etched away. The top layer of sacrificial material protects an uppermost layer of channel material from damage from the anisotropic etch. The sacrificial material is etched away to expose the layers of channel material. A gate stack is formed over, around, and between the layers of channel material.

Abstract: The present invention involves a multimodal sensor network for analyte detection. A first mode may involve low-power detection and a second mode may involve determining an analyte concentration and transmitting data associated with the analyte concentration. Specifically, the first mode may include establishing an analyte sensor network in a detection region, detecting an analyte in the detection region, and generating an electrical signal in response to the detecting the analyte. In response to the electrical signal exceeding a first threshold, the analyte detection system may operate in the second mode. The second mode may include requesting data associated with the one or more environmental conditions, determining an analyte concentration based on one or more environmental conditions transmitting data associated with the analyte concentration.