Patents by Inventor Joshua Jon Thornes
Joshua Jon Thornes has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240045341Abstract: A method for improving a lithographic process of imaging a portion of a design layout onto a substrate using a lithographic apparatus. The method includes computing a multi-variable cost function that is a function of: (i) a plurality of design variables that affect characteristics of the lithographic process and (ii) a radiation bandwidth of a radiation source of the lithographic apparatus; and reconfiguring one or more of the characteristics (e.g., EPE, image contrast, resist, etc.) of the lithographic process by adjusting one or more of the design variables (e.g., source, mask layout, bandwidth, etc.) until a termination condition is satisfied. The termination condition includes a speckle characteristic (e.g., a speckle contrast) maintained within a speckle specification associated with the radiation source and also maintaining an image contrast associated with the lithographic process within a desired range. The speckle characteristic being a function of the radiation bandwidth.Type: ApplicationFiled: December 9, 2021Publication date: February 8, 2024Applicants: ASML NETHERLANDS B.V., Cymer, LLCInventors: Willard Earl CONLEY, Duan-Fu Stephen HSU, Joshua Jon THORNES, Johannes Jacobus Matheus BASELMANS
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Patent number: 11768438Abstract: A method includes driving, while producing a burst of pulses at a pulse repetition rate, a spectral feature adjuster among a set of discrete states at a frequency correlated with the pulse repetition rate; and in between the production of the bursts of pulses (while no pulses are being produced), driving the spectral feature adjuster according to a driving signal defined by a set of parameters. Each discrete state corresponds to a discrete value of a spectral feature. The method includes ensuring that the spectral feature adjuster is in one of the discrete states that corresponds to a discrete value of the spectral feature of the amplified light beam when a pulse in the next burst is produced by adjusting one or more of: an instruction to the lithography exposure apparatus, the driving signal to the spectral feature adjuster, and/or the instruction to the optical source.Type: GrantFiled: October 21, 2022Date of Patent: September 26, 2023Assignee: Cymer, LLCInventors: Kevin Michael O'Brien, Thomas Patrick Duffey, Joshua Jon Thornes
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Patent number: 11754541Abstract: An apparatus includes: a gas maintenance system having a gas supply system fluidly connected to one or more gas discharge chambers; a detection apparatus fluidly connected to each gas discharge chamber; and a control system connected to the gas maintenance system and the detection apparatus. The detection apparatus includes: a vessel defining a reaction cavity that houses a metal oxide and is fluidly connected to the gas discharge chamber for receiving mixed gas including fluorine from the gas discharge chamber in the reaction cavity, the vessel enabling a reaction between the fluorine of the received mixed gas and the metal oxide to form a new gas mixture including oxygen; and an oxygen sensor fluidly connected to the new gas mixture to sense an amount of oxygen within the new gas mixture. The control system is configured to estimate a concentration of fluorine in the received mixed gas.Type: GrantFiled: September 10, 2018Date of Patent: September 12, 2023Assignee: Cymer, LLCInventors: Joshua Jon Thornes, Rahul Ahlawat, Edward Siqi Luo, Gamaralalage G. Padmabandu
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Patent number: 11747739Abstract: Systems, methods, and computer programs for increasing a contrast for a lithography system are disclosed. In one aspect, a method of optimizing a process for imaging a feature on a substrate using a photolithography system is disclosed, the method including obtaining an optical spectrum of a light beam for the imaging, wherein the light beam includes pulses having a plurality of different wavelengths, and narrowing the optical spectrum of the pulses of the light beam for the imaging to improve a quality metric of the imaging.Type: GrantFiled: February 10, 2020Date of Patent: September 5, 2023Assignees: ASML NETHERLANDS, CYMER, LLCInventors: Willard Earl Conley, Joshua Jon Thornes, Duan-Fu Stephen Hsu
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Patent number: 11686951Abstract: A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.Type: GrantFiled: April 26, 2021Date of Patent: June 27, 2023Assignees: Cymer, LLC, ASML Netherlands B.V.Inventors: Wilhelmus Patrick Elisabeth Maria op 't Root, Thomas Patrick Duffey, Herman Philip Godfried, Frank Everts, Joshua Jon Thornes, Brian Edward King
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Publication number: 20230152707Abstract: A set of the pulses of light in a light beam is passed through a mask toward a wafer during a single exposure pass; at least a first aerial image and a second aerial image on the wafer based on pulses of light in the set of pulses that pass through the mask is generated during a single exposure pass, the first aerial image is at a first plane on the wafer and the second aerial image is at a second plane on the wafer, the first plane and the second plane being spatially distinct from each other and separated from each other by a separation distance along the direction of propagation; and a three-dimensional semiconductor component is formed.Type: ApplicationFiled: October 26, 2022Publication date: May 18, 2023Inventors: Willard Earl Conley, Joshua Jon Thornes, Gregory Allen Rechtsteiner
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Publication number: 20230040812Abstract: A method includes driving, while producing a burst of pulses at a pulse repetition rate, a spectral feature adjuster among a set of discrete states at a frequency correlated with the pulse repetition rate; and in between the production of the bursts of pulses (while no pulses are being produced), driving the spectral feature adjuster according to a driving signal defined by a set of parameters. Each discrete state corresponds to a discrete value of a spectral feature. The method includes ensuring that the spectral feature adjuster is in one of the discrete states that corresponds to a discrete value of the spectral feature of the amplified light beam when a pulse in the next burst is produced by adjusting one or more of: an instruction to the lithography exposure apparatus, the driving signal to the spectral feature adjuster, and/or the instruction to the optical source.Type: ApplicationFiled: October 21, 2022Publication date: February 9, 2023Inventors: Kevin Michael O'Brien, Thomas Patrick Duffey, Joshua Jon Thornes
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Patent number: 11526082Abstract: A set of the pulses of light in a light beam is passed through a mask toward a wafer during a single exposure pass; at least a first aerial image and a second aerial image on the wafer based on pulses of light in the set of pulses that pass through the mask is generated during a single exposure pass, the first aerial image is at a first plane on the wafer and the second aerial image is at a second plane on the wafer, the first plane and the second plane being spatially distinct from each other and separated from each other by a separation distance along the direction of propagation; and a three-dimensional semiconductor component is formed.Type: GrantFiled: September 26, 2018Date of Patent: December 13, 2022Assignee: Cymer, LLCInventors: Willard Earl Conley, Joshua Jon Thornes, Gregory Allen Rechtsteiner
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Patent number: 11526083Abstract: A method includes driving, while producing a burst of pulses at a pulse repetition rate, a spectral feature adjuster among a set of discrete states at a frequency correlated with the pulse repetition rate; and in between the production of the bursts of pulses (while no pulses are being produced), driving the spectral feature adjuster according to a driving signal defined by a set of parameters. Each discrete state corresponds to a discrete value of a spectral feature. The method includes ensuring that the spectral feature adjuster is in one of the discrete states that corresponds to a discrete value of the spectral feature of the amplified light beam when a pulse in the next burst is produced by adjusting one or more of: an instruction to the lithography exposure apparatus, the driving signal to the spectral feature adjuster, and/or the instruction to the optical source.Type: GrantFiled: March 1, 2019Date of Patent: December 13, 2022Assignee: Cymer, LLCInventors: Kevin Michael O'Brien, Thomas Patrick Duffey, Joshua Jon Thornes
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Publication number: 20220255288Abstract: Apparatus for and method of generating multiple laser beams using multiple laser chambers. The relative timing of the beams is controllable so they may, for example, be interleaved, may overlap, or be prevented from overlapping, or may occur in rapid sequence. The beams may have different spectral and power characteristics such as different wavelengths. Also disclosed is a system in which at least one of the multiple laser chambers is configured to generate radiation of two different wavelengths.Type: ApplicationFiled: May 15, 2020Publication date: August 11, 2022Inventors: Walter Dale Gillespie, Joshua Jon Thornes, Thomas Patrick Duffey, Eric Anders Mason, Rabin Paudel
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Publication number: 20220255286Abstract: A deep ultraviolet (DUV) optical system includes: an optical source system including: a plurality of optical oscillators; a beam combiner; and a beam control apparatus between the optical oscillators and the beam combiner. The beam combiner is configured to receive and direct light emitted from any of the optical oscillators toward a scanner apparatus as an exposure light beam, and the beam control apparatus is configured to determine whether the beam combiner receives light from a particular one of the optical oscillators. The DUV optical lithography system also includes a control system coupled to the optical source system, the control system configured to: determine whether a condition exists in the DUV optical system, and based on a determination that the condition exists, perform a calibration action in a subset of the optical oscillators.Type: ApplicationFiled: May 15, 2020Publication date: August 11, 2022Inventors: Yingbo Zhao, Walter Dale Gillespie, Joshua Jon Thornes, Thomas Patrick Duffey, Eric Anders Mason
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Publication number: 20220163899Abstract: Systems, methods, and computer programs for increasing a contrast for a lithography system are disclosed. In one aspect, a method of optimizing a process for imaging a feature on a substrate using a photolithography system is disclosed, the method including obtaining an optical spectrum of a light beam for the imaging, wherein the light beam includes pulses having a plurality of different wavelengths, and narrowing the optical spectrum of the pulses of the light beam for the imaging to improve a quality metric of the imaging.Type: ApplicationFiled: February 10, 2020Publication date: May 26, 2022Applicants: ASML Nethlands B. V., Cymer, LLCInventors: Willard Earl CONLEY, Joshua Jon THORNES, Duan-Fu Stephen HSU
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Publication number: 20210349404Abstract: Systems, methods, and computer programs for increasing a depth of focus for a lithography system are disclosed. In one aspect, a method includes providing an optical spectrum, a mask pattern, and a pupil design, that together are configured to provide the lithography system with a depth of focus. The method also includes iteratively varying the optical spectrum and an assist feature in the mask pattern to provide a modified optical spectrum and a modified mask pattern that increases the depth of focus. The method further includes configuring a component of the lithography system based on the modified optical spectrum and the modified mask pattern that increases the depth of focus.Type: ApplicationFiled: October 11, 2019Publication date: November 11, 2021Applicants: ASML NETHERLANDS B.V., CYMER, LLCInventors: Willard Earl CONLEY, Joshua Jon THORNES, Duan-Fu Stephen HSU, Gregory Allen RECHTSTEINER
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Publication number: 20210239998Abstract: A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.Type: ApplicationFiled: April 26, 2021Publication date: August 5, 2021Inventors: Wilhelmus Patrick Elisabeth Maria op 't Root, Thomas Patrick Duffey, Herman Philip Godfried, Frank Everts, Joshua Jon Thornes, Brian Edward King
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Patent number: 11054665Abstract: A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.Type: GrantFiled: July 3, 2019Date of Patent: July 6, 2021Assignees: Cymer, LLC, ASML Netherlands B.V.Inventors: Wilhelmus Patrick Elisabeth Maria op 't Root, Thomas Patrick Duffey, Herman Philip Godfried, Frank Everts, Joshua Jon Thornes, Brian Edward King
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Patent number: 11050213Abstract: Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.Type: GrantFiled: June 24, 2020Date of Patent: June 29, 2021Assignees: Cymer, LLC, ASML Netherlands B.V.Inventors: Joshua Jon Thornes, Tanuj Aggarwal, Kevin Michael O'Brien, Frank Everts, Herman Philip Godfried, Russell Allen Burdt
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Publication number: 20210018846Abstract: A method includes driving, while producing a burst of pulses at a pulse repetition rate, a spectral feature adjuster among a set of discrete states at a frequency correlated with the pulse repetition rate; and in between the production of the bursts of pulses (while no pulses are being produced), driving the spectral feature adjuster according to a driving signal defined by a set of parameters. Each discrete state corresponds to a discrete value of a spectral feature. The method includes ensuring that the spectral feature adjuster is in one of the discrete states that corresponds to a discrete value of the spectral feature of the amplified light beam when a pulse in the next burst is produced by adjusting one or more of: an instruction to the lithography exposure apparatus, the driving signal to the spectral feature adjuster, and/or the instruction to the optical source.Type: ApplicationFiled: March 1, 2019Publication date: January 21, 2021Inventors: Kevin Michael O'Brien, Thomas Patrick Duffey, Joshua Jon Thornes
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Publication number: 20200340965Abstract: An apparatus includes: a gas maintenance system having a gas supply system fluidly connected to one or more gas discharge chambers; a detection apparatus fluidly connected to each gas discharge chamber; and a control system connected to the gas maintenance system and the detection apparatus. The detection apparatus includes: a vessel defining a reaction cavity that houses a metal oxide and is fluidly connected to the gas discharge chamber for receiving mixed gas including fluorine from the gas discharge chamber in the reaction cavity, the vessel enabling a reaction between the fluorine of the received mixed gas and the metal oxide to form a new gas mixture including oxygen; and an oxygen sensor fluidly connected to the new gas mixture to sense an amount of oxygen within the new gas mixture. The control system is configured to estimate a concentration of fluorine in the received mixed gas.Type: ApplicationFiled: September 10, 2018Publication date: October 29, 2020Inventors: Joshua Jon Thornes, Rahul Ahlawat, Edward Siqi Luo, Gamaralalage G. Padmabandu
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Publication number: 20200321746Abstract: Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.Type: ApplicationFiled: June 24, 2020Publication date: October 8, 2020Inventors: Joshua Jon Thornes, Tanuj Aggarwal, Kevin Michael O'Brien, Frank Everts, Herman Philip Godfried, Russell Allen Burdt
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Publication number: 20200301286Abstract: A set of the pulses of light in a light beam is passed through a mask toward a wafer during a single exposure pass; at least a first aerial image and a second aerial image on the wafer based on pulses of light in the set of pulses that pass through the mask is generated during a single exposure pass, the first aerial image is at a first plane on the wafer and the second aerial image is at a second plane on the wafer, the first plane and the second plane being spatially distinct from each other and separated from each other by a separation distance along the direction of propagation; and a three-dimensional semiconductor component is formed.Type: ApplicationFiled: September 26, 2018Publication date: September 24, 2020Inventors: Willard Earl Conley, Joshua Jon Thornes, Gregory Allen Rechtsteiner