Patents by Inventor Joshua Jon Thornes
Joshua Jon Thornes has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10727642Abstract: Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.Type: GrantFiled: September 11, 2017Date of Patent: July 28, 2020Assignees: Cymer, LLC, ASML Netherlands B.V.Inventors: Joshua Jon Thornes, Tanuj Aggarwal, Kevin Michael O'Brien, Frank Everts, Herman Philip Godfried, Russell Allen Burdt
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Patent number: 10627724Abstract: A method of controlling output of a radiation source, the method including: periodically monitoring an output energy of the radiation source; determining a difference between a reference energy signal and the monitored output energy; determining a feedback value; determining a desired output energy of the radiation source for a subsequent time period; and controlling an input parameter of the radiation source in dependence on the determined desired output energy during the subsequent time period. If the magnitude of the determined difference between the monitored output energy of the radiation source and the reference energy signal exceeds a threshold value: the determined difference does not contribute to the feedback value; and the determined difference is spread over the subsequent time period according to a reference energy signal adjustment profile and the reference energy signal adjustment profile is added to the reference energy signal for the subsequent time period.Type: GrantFiled: August 23, 2016Date of Patent: April 21, 2020Assignees: ASML Netherlands B.V., CYMER, LLCInventors: Frank Everts, Wilhelmus Patrick Elisabeth Maria Op 't Root, Herman Philip Godfried, Joshua Jon Thornes, Kevin Michael O'Brien, Leon Pieter Paul Saanen, Tanuj Aggarwal
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Publication number: 20190324286Abstract: A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.Type: ApplicationFiled: July 3, 2019Publication date: October 24, 2019Inventors: Wilhelmus Patrick Elisabeth Maria op 't Root, Thomas Patrick Duffey, Herman Philip Godfried, Frank Everts, Joshua Jon Thornes, Brian Edward King
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Patent number: 10451890Abstract: A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.Type: GrantFiled: January 16, 2017Date of Patent: October 22, 2019Assignee: Cymer, LLCInventors: Wilhelmus Patrick Elisabeth Maria op 't Root, Thomas Patrick Duffey, Herman Philip Godfried, Frank Everts, Joshua Jon Thornes, Brian Edward King
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Patent number: 10267687Abstract: Techniques for controlling an optical system include accessing a measured value of a property of a particular pulse of a pulsed light beam emitted from the optical system, the property being related to an amount of coherence of the light beam; comparing the measured value of the property of the light beam to a target value of the property; determining whether to generate a control signal based on the comparison; and if a control signal is generated based on the comparison, adjusting the amount of coherence in the light beam by modifying an aspect of the optical system based on the control signal to reduce an amount of coherence of a pulse that is subsequent to the particular pulse.Type: GrantFiled: February 26, 2018Date of Patent: April 23, 2019Assignee: Cymer, LLCInventors: Thomas Frederick Allen Bibby, Joshua Jon Thornes, Rostislav Rokitski, Thomas Patrick Duffey
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Patent number: 10234769Abstract: An optical lithography system is monitored. Information is received from the optical lithography system; a rule is accessed, the rule being associated with one or more of an event in the optical lithography system and an amount of time; a module stored in a library of modules is identified based on the accessed rule; whether a particular condition exists in the optical lithography system is determined using the identified module and the information received from the optical lithography system; and if the particular condition exists, a command signal is generated based on one or more characteristics of the particular condition and provided to an optical source of the optical lithography system. The command signal is based on the determined particular condition, and the command signal is sufficient to change one or more operating parameters of the optical source.Type: GrantFiled: May 22, 2017Date of Patent: March 19, 2019Assignee: Cymer, LLCInventors: Andrei Dorobantu, Joshua Jon Thornes, Kevin M. O'Brien, Matthew Ryan Graham
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Publication number: 20180335701Abstract: An optical lithography system is monitored. Information is received from the optical lithography system; a rule is accessed, the rule being associated with one or more of an event in the optical lithography system and an amount of time; a module stored in a library of modules is identified based on the accessed rule; whether a particular condition exists in the optical lithography system is determined using the identified module and the information received from the optical lithography system; and if the particular condition exists, a command signal is generated based on one or more characteristics of the particular condition and provided to an optical source of the optical lithography system. The command signal is based on the determined particular condition, and the command signal is sufficient to change one or more operating parameters of the optical source.Type: ApplicationFiled: May 22, 2017Publication date: November 22, 2018Inventors: Andrei Dorobantu, Joshua Jon Thornes, Kevin M. O'Brien, Matthew Ryan Graham
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Patent number: 10095118Abstract: Methods and apparatus for in situ compensation for damage or misalignment of optical elements are disclosed. Also disclosed are methods and apparatus for facilitating alignment of replacement optical elements so that the amount of time in a system including the optical elements can be reduced. Also disclosed are methods and apparatus for processing an image of a beam generated by an optical system to extract information indicative of an extent of damage to optical elements in the optical system and/or misalignment of the optical elements. Information pertaining to an extent of damage to optical elements in the optical system can be used to optimally schedule maintenance events for the optical system.Type: GrantFiled: July 12, 2016Date of Patent: October 9, 2018Assignee: CYMER, LLCInventors: Thomas Frederick Allen Bibby, Khalid Khulusi Tahboub, Donald James Haran, Rostislav Rokitski, Joshua Jon Thornes
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Publication number: 20180253014Abstract: A method of controlling output of a radiation source, the method including: periodically monitoring an output energy of the radiation source; determining a difference between a reference energy signal and the monitored output energy; determining a feedback value; determining a desired output energy of the radiation source for a subsequent time period; and controlling an input parameter of the radiation source in dependence on the determined desired output energy during the subsequent time period. If the magnitude of the determined difference between the monitored output energy of the radiation source and the reference energy signal exceeds a threshold value: the determined difference does not contribute to the feedback value; and the determined difference is spread over the subsequent time period according to a reference energy signal adjustment profile and the reference energy signal adjustment profile is added to the reference energy signal for the subsequent time period.Type: ApplicationFiled: August 23, 2016Publication date: September 6, 2018Applicants: ASML Netherlands B.V., Cymer, LLCInventors: Frank EVERTS, Wilhelmus Patrick Elisabeth Maria OP 'T ROOT, Herman Philip GODFRIED, Joshua Jon THORNES, Kevin Michael O"BRIEN, Leon Pieter Paul SAANEN, Tanuj AGGARWAL
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Publication number: 20180203248Abstract: A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.Type: ApplicationFiled: January 16, 2017Publication date: July 19, 2018Inventors: Wilhelmus Patrick Elisabeth Maria op `t Root, Thomas Patrick Duffey, Herman Philip Godfried, Frank Everts, Joshua Jon Thornes, Brian Edward King
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Publication number: 20180180487Abstract: Techniques for controlling an optical system include accessing a measured value of a property of a particular pulse of a pulsed light beam emitted from the optical system, the property being related to an amount of coherence of the light beam; comparing the measured value of the property of the light beam to a target value of the property; determining whether to generate a control signal based on the comparison; and if a control signal is generated based on the comparison, adjusting the amount of coherence in the light beam by modifying an aspect of the optical system based on the control signal to reduce an amount of coherence of a pulse that is subsequent to the particular pulse.Type: ApplicationFiled: February 26, 2018Publication date: June 28, 2018Inventors: Thomas Frederick Allen Bibby, Joshua Jon Thornes, Rostislav Rokitski, Thomas Patrick Duffey
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Patent number: 9997888Abstract: A spectral feature of a pulsed light beam produced by an optical source is controlled by a method. The method includes producing a pulsed light beam at a pulse repetition rate; directing the pulsed light beam toward a substrate received in a lithography exposure apparatus to expose the substrate to the pulsed light beam; modifying a pulse repetition rate of the pulsed light beam as it is exposing the substrate. The method includes determining an amount of adjustment to a spectral feature of the pulsed light beam, the adjustment amount compensating for a variation in the spectral feature of the pulsed light beam that correlates to the modification of the pulse repetition rate of the pulsed light beam. The method includes changing the spectral feature of the pulsed light beam by the determined adjustment amount as the substrate is exposed to thereby compensate for the variation in the spectral feature.Type: GrantFiled: October 17, 2016Date of Patent: June 12, 2018Assignee: Cymer, LLCInventors: Willard Earl Conley, Eric Anders Mason, Joshua Jon Thornes
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Publication number: 20180109068Abstract: A spectral feature of a pulsed light beam produced by an optical source is controlled by a method. The method includes producing a pulsed light beam at a pulse repetition rate; directing the pulsed light beam toward a substrate received in a lithography exposure apparatus to expose the substrate to the pulsed light beam; modifying a pulse repetition rate of the pulsed light beam as it is exposing the substrate. The method includes determining an amount of adjustment to a spectral feature of the pulsed light beam, the adjustment amount compensating for a variation in the spectral feature of the pulsed light beam that correlates to the modification of the pulse repetition rate of the pulsed light beam. The method includes changing the spectral feature of the pulsed light beam by the determined adjustment amount as the substrate is exposed to thereby compensate for the variation in the spectral feature.Type: ApplicationFiled: October 17, 2016Publication date: April 19, 2018Inventors: Willard Earl Conley, Eric Anders Mason, Joshua Jon Thornes
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Patent number: 9945730Abstract: Techniques for controlling an optical system include accessing a measured value of a property of a particular pulse of a pulsed light beam emitted from the optical system, the property being related to an amount of coherence of the light beam; comparing the measured value of the property of the light beam to a target value of the property; determining whether to generate a control signal based on the comparison; and if a control signal is generated based on the comparison, adjusting the amount of coherence in the light beam by modifying an aspect of the optical system based on the control signal to reduce an amount of coherence of a pulse that is subsequent to the particular pulse.Type: GrantFiled: September 2, 2016Date of Patent: April 17, 2018Assignee: Cymer, LLCInventors: Thomas Frederick Allen Bibby, Joshua Jon Thornes, Rostislav Rokitski, Thomas Patrick Duffey
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Publication number: 20180066995Abstract: Techniques for controlling an optical system include accessing a measured value of a property of a particular pulse of a pulsed light beam emitted from the optical system, the property being related to an amount of coherence of the light beam; comparing the measured value of the property of the light beam to a target value of the property; determining whether to generate a control signal based on the comparison; and if a control signal is generated based on the comparison, adjusting the amount of coherence in the light beam by modifying an aspect of the optical system based on the control signal to reduce an amount of coherence of a pulse that is subsequent to the particular pulse.Type: ApplicationFiled: September 2, 2016Publication date: March 8, 2018Inventors: Thomas Frederick Allen Bibby, Joshua Jon Thornes, Rostislav Rokitski, Thomas Patrick Duffey
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Publication number: 20180017875Abstract: Methods and apparatus for in situ compensation for damage or misalignment of optical elements are disclosed. Also disclosed are methods and apparatus for facilitating alignment of replacement optical elements so that the amount of time in a system including the optical elements can be reduced. Also disclosed are methods and apparatus for processing an image of a beam generated by an optical system to extract information indicative of an extent of damage to optical elements in the optical system and/or misalignment of the optical elements. Information pertaining to an extent of damage to optical elements in the optical system can be used to optimally schedule maintenance events for the optical system.Type: ApplicationFiled: July 12, 2016Publication date: January 18, 2018Inventors: Thomas Frederick Allen BIBBY, Khalid Khulusi Tahboub, Donald James Haran, Rostislav Rokitski, Joshua Jon Thornes
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Publication number: 20180006425Abstract: Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.Type: ApplicationFiled: September 11, 2017Publication date: January 4, 2018Inventors: Joshua Jon Thornes, Tanuj Aggarwal, Kevin Michael O'Brien, Frank Everts, Herman Philip Godfried, Russell Allen Burdt
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Patent number: 9762023Abstract: Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.Type: GrantFiled: December 21, 2015Date of Patent: September 12, 2017Assignees: CYMER, LLC, ASML NETHERLANDS B.V.Inventors: Joshua Jon Thornes, Tanuj Aggarwal, Kevin Michael O'Brien, Frank Everts, Herman Philip Godfried, Russell Allen Burdt
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Publication number: 20170179677Abstract: Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.Type: ApplicationFiled: December 21, 2015Publication date: June 22, 2017Inventors: Joshua Jon THORNES, Tanuj AGGARWAL, Kevin Michael O'BRIEN, Frank EVERTS, Herman Philip GODFRIED, Russell Allen BURDT
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Patent number: 8873600Abstract: Systems and methods for automatically performing a high accuracy gas refill in a laser chamber of a two chamber gas discharge laser such as an excimer laser are disclosed. Based upon a target pressure and halogen concentration that is either predetermined or entered by a user, and with no further user action, a non-halogen containing gas is added to the chamber to a first pressure, followed by the addition of halogen containing gas to a second pressure which is greater than a target pressure for the chamber, such that the halogen content in the gas at the second pressure is at a desired concentration. The gas in the chamber is bled until the pressure drops to the target pressure. The amount of non-halogen containing gas added is estimated automatically, and the amount of halogen containing gas is measured so that the desired concentration is obtained, taking into account both temperature and any gas remaining in the fill pipes from prior laser operation.Type: GrantFiled: June 30, 2011Date of Patent: October 28, 2014Assignee: Cymer, LLCInventors: Rui Jiang, Joshua Jon Thornes, Daniel Jason Riggs, Kevin Michael O'Brien