Patents by Inventor Joy Cheng

Joy Cheng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7763319
    Abstract: A method of orienting microphase-separated domains is disclosed, comprising applying a composition comprising an orientation control component, and a block copolymer assembly component comprising a block copolymer having at least two microphase-separated domains in which the orientation control component is substantially immiscible with the block copolymer assembly component upon forming a film; and forming a compositionally vertically segregated film on the surface of the substrate from the composition. The orientation control component and block copolymer segregate during film forming to form the compositionally vertically-segregated film on the surface of a substrate, where the orientation control component is enriched adjacent to the surface of the compositionally segregated film adjacent to the surface of the substrate, and the block copolymer assembly is enriched at an air-surface interface.
    Type: Grant
    Filed: January 11, 2008
    Date of Patent: July 27, 2010
    Assignee: International Business Machines Corporation
    Inventors: Joy Cheng, Ho-Cheol Kim, Daniel P. Sanders, Linda Sundberg
  • Patent number: 7732594
    Abstract: The present invention provide a method for analyzing the DSG3 overexpression in tumor tissues with clinical features of cancer cells to validate that overexpression is relates to size, depth and migration of tumor. Therefore, DSG3 overexpression is capable for using in clinical applications, determining malignant degree of tumor, serving as molecular target in Head Neck Cancer (HNC). Moreover, a jamming sequence, RNA, is designed to act on DSG3 mRNA and is effective inhibition-specific DSG3 expression, and then inhibits cell growth, invasion and migration in HNC.
    Type: Grant
    Filed: March 17, 2009
    Date of Patent: June 8, 2010
    Assignees: Chang Gung University, Chang Gung Memorial Hospital
    Inventors: Joseph Tung-Chieh Chang, Ann-Joy Cheng, Yin-Ju Chen
  • Patent number: 7651735
    Abstract: Methods and a structure. A first film of a first block copolymer is formed inside a trough integrally disposed on an energetically neutral surface layer of a substrate. Line-forming microdomains are assembled of the first block copolymer, and form first self-assembled structures within the first film normal to the sidewalls and parallel to the surface layer. At least one microdomain is removed from the first film such that oriented structures remain in the trough oriented normal to the sidewalls and parallel to the surface layer. A second film of a second block copolymer is formed inside the trough. Line-forming microdomains are assembled of the second block copolymer, and form second self-assembled structures within the second film oriented normal to the oriented structures and parallel to the sidewalls. A second method and a structure are also provided.
    Type: Grant
    Filed: April 3, 2008
    Date of Patent: January 26, 2010
    Assignee: International Business Machines Corporation
    Inventors: Joy Cheng, Ho-Cheol Kim, Robert D. Miller
  • Publication number: 20100009132
    Abstract: A coating process comprises forming a patterned material layer on a substrate using a self-segregating polymeric composition comprising a polymeric photoresistive material and an antireflective coating material. The polymeric photoresistive material and the antireflective coating material that make up the self segregating composition are contained in a single solution. When depositing this solution on a substrate and removing the solvent, the two materials self-segregate into two layers. The substrate can comprise one of a ceramic, dielectric, metal, or semiconductor material and in some instances a material such as a BARC material that is not from the self segregating composition. The composition may also contain a radiation-sensitive acid generator and a base quencher. This produces a coated substrate having a uniaxial bilayer coating oriented in a direction orthogonal to the substrate with a top photoresistive coating layer and a bottom antireflective coating layer.
    Type: Application
    Filed: July 12, 2008
    Publication date: January 14, 2010
    Applicant: International Business Machines Corporation
    Inventors: Joy Cheng, Dario L. Goldfarb, David R. Medeiros, Daniel P. Sanders, Dirk Pfeifer, Libor Vylicky
  • Publication number: 20100009435
    Abstract: The present invention discloses a specific GRP78 expression-inhibition RNAi sequence, a medicine thereof and a method thereof, wherein an RNAi sequence 5?-AAGGATGGTTAATGATGCTGAGAA-3? complementary to GRP78 forms a special hair-pin structure inside cancer cells to specifically and effectively inhibit GRP78 expression and then inhibit the canceration process, including the growth, migration, invasion, and metastasis of cancer.
    Type: Application
    Filed: April 30, 2009
    Publication date: January 14, 2010
    Inventors: ANN-JOY CHENG, JOSEPH T. CHANG, CHING-CHI CHIU
  • Patent number: 7622456
    Abstract: The present invention provide a method for analyzing the DSG3 overexpression in tumor tissues with clinical features of cancer cells to validate that DSG3 overexpression is relates to size, depth and migration of tumor. Therefore, DSG3 overexpression is capable for using in clinical applications, determining malignant degree of tumor, serving as molecular target in Head Neck Cancer (HNC). Moreover, a jamming sequence, RNA, is designed to act on DSG3 mRNA and is effective inhibition-specific DSG3 expression, and then inhibits cell growth, invasion and migration in HNC.
    Type: Grant
    Filed: November 6, 2006
    Date of Patent: November 24, 2009
    Assignees: Non-Profit Organization Chang Gung Memorial Hospital, Chang Gung University
    Inventors: Joseph Tung-Chieh Chang, Ann-Joy Cheng, Yin-Ju Chen
  • Publication number: 20090233352
    Abstract: The present invention provide a method for analyzing the DSG3 overexpression in tumor tissues with clinical features of cancer cells to validate that overexpression is relates to size, depth and migration of tumor. Therefore, DSG3 overexpression is capable for using in clinical applications, determining malignant degree of tumor, serving as molecular target in Head Neck Cancer (HNC). Moreover, a jamming sequence, RNA, is designed to act on DSG3 mRNA and is effective inhibition-specific DSG3 expression, and then inhibits cell growth, invasion and migration in HNC.
    Type: Application
    Filed: March 17, 2009
    Publication date: September 17, 2009
    Applicants: CHANG GUNG UNIVERSITY, Non-Profit Organization Chang Gung Memorial Hospital
    Inventors: Joseph Tung-Chieh Chang, Ann-Joy Cheng, Yin-Ju Chen
  • Publication number: 20090212016
    Abstract: A Method. The method includes forming a substructure, on a substrate, including a feature having a sidewall of a first material and a bottom surface of a second material. Applying a solution including two immiscible polymers and third material to the substructure. The immiscible polymers include a first and second polymer. A selective chemical affinity of the first polymer for the material is greater than a selective chemical affinity of the second polymer for the material. The first polymer is segregated from the second polymer. The first polymer selectively migrates to the at least one sidewall, resulting in the first polymer being disposed between the at least one sidewall and the second polymer. The first polymer is selectively removed. The second polymer remains, resulting in forming structures including the substructure, the third material, and the second polymer. The substructure has a pattern. The pattern is transferred to the substrate.
    Type: Application
    Filed: February 22, 2008
    Publication date: August 27, 2009
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Joy Cheng, Daniel P. Sanders, Ratnam Sooriyakumaran
  • Publication number: 20090214823
    Abstract: Methods and a structure. The method includes applying a solution including two or more immiscible polymers to a substructure including features having at least one sidewall and a bottom surface. The immiscible polymers include a first polymer and a second polymer. The at least one sidewall includes a material. A selective chemical affinity of the first polymer for the material is greater than a selective chemical affinity of the second polymer for the material. The first polymer is segregated from the second polymer. The first polymer selectively migrates to the at least one sidewall, resulting in the first polymer being disposed between the at least one sidewall and the second polymer. One or more immiscible polymers is selectively removed. At least one immiscible polymer remains, resulting in forming structures including the substructure and the immiscible polymer remaining. Two additional methods and a structure are also included.
    Type: Application
    Filed: March 28, 2008
    Publication date: August 27, 2009
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Joy Cheng, Daniel P. Sanders, Ratnam Sooriyakumaran
  • Publication number: 20090181913
    Abstract: The present invention discloses a specific GRP78 expression-inhibition RNAi sequence, a medicine thereof and a method thereof, wherein an RNAi sequence 5?-AAGGATGGTTAATGATGCTGAGAA-3? complementary to GRP78 forms a special hair-pin structure inside cancer cells to specifically and effectively inhibit GRP78 expression and then inhibit the canceration process, including the growth, migration, invasion, and metastasis of cancer.
    Type: Application
    Filed: July 17, 2008
    Publication date: July 16, 2009
    Inventors: Ann-Joy CHENG, Joseph T. Chang, Ching-Chi Chiu
  • Publication number: 20090179001
    Abstract: Disclosed herein is a method of controlling the orientation of microphase-separated domains in a block copolymer film, comprising forming an orientation control layer comprising an epoxy-containing cycloaliphatic acrylic polymer on a surface of a substrate, irradiating and/or heating the substrate to crosslink the orientation control layer, and forming a block copolymer assembly layer comprising block copolymers which form microphase-separated domains, on a surface of the orientation control layer opposite the substrate. The orientation control layer can be selectively cross-linked to expose regions of the substrate, or the orientation control layer can be patterned without removing the layer, to provide selective patterning on the orientation control layer. In further embodiments, bilayer and trilayer imaging schemes are disclosed.
    Type: Application
    Filed: January 12, 2008
    Publication date: July 16, 2009
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Joy Cheng, Ho-Cheol Kim, Charles T. Rettner, Daniel P. Sanders, Ratnam Sooriyakumaran, Linda Sundberg
  • Publication number: 20090182093
    Abstract: A method of orienting microphase-separated domains is disclosed, comprising applying a composition comprising an orientation control component, and a block copolymer assembly component comprising a block copolymer having at least two microphase-separated domains in which the orientation control component is substantially immiscible with the block copolymer assembly component upon forming a film; and forming a compositionally vertically segregated film on the surface of the substrate from the composition. The orientation control component and block copolymer segregate during film forming to form the compositionally vertically-segregated film on the surface of a substrate, where the orientation control component is enriched adjacent to the surface of the compositionally segregated film adjacent to the surface of the substrate, and the block copolymer assembly is enriched at an air-surface interface.
    Type: Application
    Filed: January 11, 2008
    Publication date: July 16, 2009
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Joy Cheng, Ho-Cheol Kim, Daniel P. Sanders, Linda Sundberg
  • Publication number: 20090181472
    Abstract: The present invention discloses a labeled molecule for prognosing the tumor grade of head neck cancer and a method for the same, wherein a 78-kDA glucose regulated protein (GRP78) is adopted as a labeled molecule of head neck cancer. GRP78 is much more overexpressed in head neck cancer cells than in non-cancer cells. GRP78 also has relation with tumor size, tumor depth and tumor metastasis. Therefore, the present invention uses GRP78 overexpression as a reference for tumor grading of head neck cancer.
    Type: Application
    Filed: May 8, 2008
    Publication date: July 16, 2009
    Inventors: Ann-Joy CHENG, Joseph T. Chang, Ching-Chi Chiu
  • Publication number: 20090179002
    Abstract: Disclosed are methods of forming polymer structures comprising: applying a solution of a block copolymer assembly comprising at least one block copolymer to a neutral substrate having a chemical pattern thereon, the chemical pattern comprising alternating pinning and neutral regions that are chemically distinct and have a first spatial frequency given by the number of paired sets of pinning and neutral regions along a given direction on the substrate; and forming domains of the block copolymer that form by lateral segregation of the blocks in accordance with the underlying chemical pattern, wherein at least one domain of the block copolymer assembly has an affinity for the pinning regions, wherein a structure extending across the chemical pattern is produced, the structure having a uniform second spatial frequency given by the number of repeating sets of domains along the given direction that is at least twice that of the first spatial frequency.
    Type: Application
    Filed: April 3, 2008
    Publication date: July 16, 2009
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Joy Cheng, William D. Hinsberg, Ho-Cheol Kim, Charles T. Rettner, Daniel P. Sanders
  • Publication number: 20090181171
    Abstract: A method of orienting microphase-separated domains is disclosed, comprising applying a composition comprising an orientation control component, and a block copolymer assembly component comprising a block copolymer having at least two microphase-separated domains in which the orientation control component is substantially immiscible with the block copolymer assembly component upon forming a film; and forming a compositionally vertically segregated film on the surface of the substrate from the composition. The orientation control component and block copolymer segregate during film forming to form the compositionally vertically-segregated film on the surface of a substrate, where the orientation control component is enriched adjacent to the surface of the compositionally segregated film adjacent to the surface of the substrate, and the block copolymer assembly is enriched at an air-surface interface.
    Type: Application
    Filed: April 1, 2008
    Publication date: July 16, 2009
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Joy Cheng, Ho-Cheol Kim, Daniel P. Sanders, Linda Sundberg
  • Publication number: 20090107953
    Abstract: A method for producing surface features and an etch masking method. A combination is provided of a block copolymer and additional material. The block copolymer includes a first block of a first polymer covalently bonded to a second block of a second polymer. The additional material is miscible with the first polymer. A film is formed of the combination directly onto a surface of a first layer. Nanostructures of the additional material self-assemble within the first polymer block. The film of the combination and the first layer are etched. The nanostructures have an etch rate lower than an etch rate of the block copolymer and lower than an etch rate of the first layer. The film is removed and features remain on the surface of the first layer. Also included is an etch masking method where the nanostructures mask portions of the first layer from said etchant.
    Type: Application
    Filed: March 28, 2008
    Publication date: April 30, 2009
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Joy Cheng, Mark W. Hart, Hiroshi Ito, Ho-Cheol Kim, Robert Miller
  • Publication number: 20090107950
    Abstract: A method for producing surface features and an etch masking method. A combination is provided of a block copolymer and additional material. The block copolymer includes a first block of a first polymer covalently bonded to a second block of a second polymer. The additional material is miscible with the first polymer. A film is formed of the combination directly onto a surface of a first layer. Nanostructures of the additional material self-assemble within the first polymer block. The film of the combination and the first layer are etched. The nanostructures have an etch rate lower than an etch rate of the block copolymer and lower than an etch rate of the first layer. The film is removed and features remain on the surface of the first layer. Also included is an etch masking method where the nanostructures mask portions of the first layer from said etchant.
    Type: Application
    Filed: October 29, 2007
    Publication date: April 30, 2009
    Inventors: Joy Cheng, Mark W. Hart, Hiroshi Ito, Ho-Cheol Kim, Robert Miller
  • Patent number: 7521090
    Abstract: Disclosed herein is a method of controlling the orientation of microphase-separated domains in a block copolymer film, comprising forming an orientation control layer comprising an epoxy-containing cycloaliphatic acrylic polymer on a surface of a substrate, irradiating and/or heating the substrate to crosslink the orientation control layer, and forming a block copolymer assembly layer comprising block copolymers which form microphase-separated domains, on a surface of the orientation control layer opposite the substrate. The orientation control layer can be selectively cross-linked to expose regions of the substrate, or the orientation control layer can be patterned without removing the layer, to provide selective patterning on the orientation control layer. In further embodiments, bilayer and trilayer imaging schemes are disclosed.
    Type: Grant
    Filed: April 1, 2008
    Date of Patent: April 21, 2009
    Assignee: International Business Machines Corporation
    Inventors: Joy Cheng, Ho-Cheol Kim, Charles T. Rettner, Daniel P. Sanders, Ratnam Sooriyakumaran, Linda Sundberg
  • Patent number: 7521094
    Abstract: Disclosed herein is a method of forming polymer structures comprising applying a solution of a diblock copolymer assembly comprising at least one diblock copolymer that forms lamellae, to a neutral surface of a substrate having a chemical pattern thereon, the chemical pattern comprising alternating pinning and neutral regions that are chemically distinct and which have a chemical pattern spatial frequency given by the number of paired sets of pinning and neutral regions along a given direction on the substrate; and forming domains comprising blocks of the diblock copolymer. The domains form by lateral segregation of the blocks. At least one domain has an affinity for the pinning regions and forms on the pinning region, the domains so formed on the pinning region are aligned with the underlying chemical pattern, and domains that do not form on the pinning region form adjacent to and are aligned with the domains formed on the pinning regions.
    Type: Grant
    Filed: January 14, 2008
    Date of Patent: April 21, 2009
    Assignee: International Business Machines Corporation
    Inventors: Joy Cheng, William D. Hinsberg, Ho-Cheol Kim, Charles T. Rettner, Daniel P. Sanders
  • Publication number: 20090029354
    Abstract: The present invention provide a method for analyzing the DSG3 overexpression in tumor tissues with clinical features of cancer cells to validate that DSG3 overexpression is relates to size, depth and migration of tumor. Therefore, DSG3 overexpression is capable for using in clinical applications, determining malignant degree of tumor, serving as molecular target in Head Neck Cancer (HNC). Moreover, a jamming sequence, RNA, is designed to act on DSG3 mRNA and is effective inhibition-specific DSG3 expression, and then inhibits cell growth, invasion and migration in HNC.
    Type: Application
    Filed: November 6, 2006
    Publication date: January 29, 2009
    Applicants: NON-PROFIT ORGANIZATION CHANG GUNG MEMORIAL HOSPITAL, CHANG GUNG UNIVERSITY
    Inventors: Joseph Tung-Chieh Chang, Ann-Joy Cheng, Yin-Ju Chen