Abstract: An illumination system for illuminating a mask in a microlithographic exposure apparatus has an optical axis and a pupil surface. The system can include an array of reflective or transparent beam deflection elements such as mirrors. Each deflection element can be adapted to deflect an impinging light ray by a deflection angle that is variable in response to a control signal. The beam deflection elements can be arranged in a first plane. The system can further include an optical raster element, which includes a plurality of microlenses and/or diffractive structures. The beam deflection elements), which can be arranged in a first plane, and the optical raster element, which can be arranged in a second plane, can commonly produce a two-dimensional far field intensity distribution. An optical imaging system can optically conjugate the first plane to the second plane.

Abstract: The invention provides for a cermet powder containing 75-90% by weight of at least one hard material powder, from 10 to 25% by weight of one or more matrix metal powders and up to 3% by weight of at least one modifier, wherein the matrix metal powder or powders contain from 0 to 38% by weight of cobalt, from 0 to 38% by weight of nickel, from 0 to 20% by weight of aluminum, from 0 to 90% by weight of iron and from 10 to 35% by weight of chromium and the sum of the contents of iron and chromium is in the range from 10 to 95% by weight and the sum of the contents of cobalt, nickel and iron is in the range from 65 to 95% by weight. The invention also relates to a cermet and a process to make the cermet containing the cermet powder and shaped article coated with the cermet powder and a process to make the shaped article.

Abstract: An immersion lithography objective has a housing in which at least one first optical element is arranged, a second optical element, which follows the first optical element in the direction of the optical axis of the objective, an immersion medium that adjoins the second optical element being located downstream of the latter in the direction of the optical axis, and a retaining structure for the second optical element. The retaining structure has a greater stiffness in the direction of the optical axis than in a direction perpendicular to the optical axis.

Abstract: A chassis for a mopping system is provided wherein the mopping system is retained on the chassis on a mopping system receptacle. The mopping system may include a bucket and/or a wiping cloth press and/or a wiping cloth spinner. The chassis includes a braking device which is adapted to switch the chassis from a release position to a blocking position upon the application of a force to the mopping system receptacle. In the release position, the chassis is rollable and in the blocking position, the chassis is secured against rolling away.

Abstract: A mopping device includes a mopping head having at least one of a mopping cloth, a mopping cover, a mopping bundle, and a mopping pad. The mopping device further includes a handle and a multi-turn actuator.

Abstract: In an extraction device comprising a suction apparatus (16) with an electric motor (32) and an centrifugal separator (14) exhibiting an inlet cylinder (22), a vertically arranged dip pipe (30) and a lateral suction nozzle (24) through which a laden gas stream enters the inlet cylinder (22), it is provided with a view to creating a low-cost and easy-to-handle extraction device of a compact design, having a centrifugal separator, that the electric motor (32) is arranged inside the dip pipe (30).

Abstract: A projection objective of a microlithographic projection exposure apparatus has a plurality of optical elements, for example lenses or mirrors. The objective furthermore includes an actuator for exerting a mechanical force that deforms a selected optical element of the projection objective. A manipulator modifies the spatial position of one of the optical elements as a function of the force exerted by the actuator.

Abstract: A microlithographic projection exposure apparatus contains an illumination system for generating projection light and a projection lens with which a reticle that is capable of being arranged in an object plane of the projection lens can be imaged onto a light-sensitive layer that is capable of being arranged in an image plane of the projection lens. The projection lens is designed for immersion mode, in which a final lens element of the projection lens on the image side is immersed in an immersion liquid. A terminating element that is transparent in respect of the projection is fastened between the final lens element on the image side and the light-sensitive layer.

Abstract: A projection objective of a microlithographic projection exposure apparatus has a plurality of optical elements, for example lenses or mirrors. The objective furthermore includes an actuator for exerting a mechanical force that deforms a selected optical element of the projection objective. A manipulator modifies the spatial position of one of the optical elements as a function of the force exerted by the actuator.

Abstract: An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.

Abstract: A fiber cable for helicopter rescue winches includes a plurality of load-bearing synthetic-fiber strands braided with one another, at least one electrically conductive insert, and a wear indicator providing a visual check of a state of the fiber cable.

Abstract: A mopping device includes a mop plate including a first mopping wing and a second mopping wing. The first and second mopping wings are configured to fold toward one another, and the first and second mopping wings each include a first material and each include at least one sliding element made of a second material. The mopping device further includes a first squeezing arm and a second squeezing arm disposed movably relative to the first and second mopping wings. The first and second squeezing arms are configured to respectively slide on the respective at least one sliding element and fold the first and second mopping wings toward one another.

Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

Abstract: An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.

Abstract: The present invention relates to a method and a device for controlling multiple actuators with a controller and multiple actuators controllable by the controller. At least several groups of actuators are individually controllable by the controller and to each actuator or each group of actuators is assigned at least one memory storage unit, which can store at least one parameter for controlling one or more actuators. At least two parameters are assigned to each actuator or each group of actuators, with one position of the actuator(s) being assigned to each of the parameters.

Abstract: An immersion lithography objective has a housing in which at least one first optical element is arranged, a second optical element, which follows the first optical element in the direction of the optical axis of the objective, an immersion medium that adjoins the second optical element being located downstream of the latter in the direction of the optical axis, and a retaining structure for the second optical element. The retaining structure has a greater stiffness in the direction of the optical axis than in a direction perpendicular to the optical axis.

Abstract: A telecommunication system includes a base station, a router allocated to the base station, and several subscriber stations that are connected to the base station via an access network. Subscriber station routers set up a telecommunication link with the base station router. The base station router controls the variable transfer rates that are allocated to a telecommunication link between the base station and the subscriber station. The access network is only loaded with the transfer bandwidth that is actually required for data transmission.

Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

Abstract: Electroplating electrolyte compositions including CA.(nAl(C3H7)3(2?n)AlR3) where n is 0 and less than or equal to 2; C is Li, Na, K, Rb, Cs, NR?4, or mixtures thereof wherein R? is H, CH3, C2H5, C3H7, C4H9, C5H11, C6H13, C7H15, C8H17, or mixtures thereof; A is H, F, Cl, Br, or mixtures thereof; R is H, halogen, CH3, C2H5, C3H7, C4H9, C5H9, C5H11, C6H13, C7H15, C8H17, or mixtures thereof; and an aromatic hydrocarbon, aliphatic hydrocarbon, or mixtures thereof are described. Aluminum and magnesium/aluminum electroplating compositions including C.(nAl(C3H7)4(1?n)AlR4) where n is 0 and less than or equal to 1, where C is a cation such as li, Na, K, Rb, Cs, or mixtures thereof; R is H or an alkyl such as CH3, C2H5, C3H7, C4H9, C5H9, C5H11, C6H13, C7H15, C8H17, or mixtures thereof are also described. The aluminum and magnesium/aluminum electroplating compositions formulation can include a solvent such as, an aromatic hydrocarbon aliphatic hydrocarbon, or mixtures thereof.

Abstract: A foldable wiper plate includes a first plate wing pivotable about a first axis, and a second plate wing pivotable about a second axis differing from the first axis. The first plate wing includes a first lock-in device that releasably interlocks the first plate wing with the second axis.