Patents by Inventor Juergen Kleinschmidt

Juergen Kleinschmidt has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20020012371
    Abstract: Method and system for providing stabilization techniques for high repetition rate gas discharge lasers with active loads provided in the discharge circuitry design which may include a resistance provided in the discharge circuitry.
    Type: Application
    Filed: April 18, 2001
    Publication date: January 31, 2002
    Inventors: Igor Bragin, Vadim Berger, Juergen Kleinschmidt
  • Publication number: 20020001330
    Abstract: An excimer or molecular fluorine laser system includes a laser tube filled with a gas mixture including fluorine and a buffer gas, and multiple electrodes within the laser tube connected with a pulsed discharge circuit for energizing the gas mixture. At least one of the electrodes is longer than 28 inches in length, preferably two main electrodes are each extended to greater than 28 inches in length. The laser system further includes a resonator including the laser tube for generating a pulsed laser beam having a desired energy. The laser system is configured such that an output beam would be emitted having an energy below the desired energy if each of the electrodes were 28 inches in length or less, and the laser system outputs a beam at the desired energy due to the length of the electrodes being extended to a length greater than 28 inches.
    Type: Application
    Filed: February 22, 2001
    Publication date: January 3, 2002
    Inventors: Uwe Stamm, Juergen Kleinschmidt, Igor Bragin
  • Patent number: 6298080
    Abstract: A line-narrowed excimer or molecular fluorine laser system includes a gain medium surrounded by a resonator for generating a laser beam, a discharge circuit including a plurality of electrodes for energizing the gain medium and a line-narrowing unit within the resonator for narrowing the bandwidth of the laser system. The resonator includes a deformable resonator reflector. A technique for adjusting the bandwidth of the laser system includes adjusting a surface contour of the deformable resonator reflector. A desired bandwidth may be selected manually or using a processor which automatically controls the surface contour adjustment.
    Type: Grant
    Filed: December 1, 1999
    Date of Patent: October 2, 2001
    Assignee: Lambda Physik AG
    Inventors: Peter Heist, Jürgen Kleinschmidt
  • Patent number: 6272158
    Abstract: A wavelength calibration system determines an absolute wavelength of a narrowed spectral emission band of an excimer or molecular laser system. The system includes a module including an element which optically interacts with a component of an output beam of the laser within the tunable range of the laser system around the narrowed band. An inter-level resonance is detected by monitoring changes in voltage within the module, or photo-absorption is detected by photodetecting equipment. The absolute wavelength of the narrowed band is precisely determinable when the optical transitions occur and are detected. When the system specifically includes an ArF-excimer laser chamber, the module is preferably a galvatron containing an element that photo-absorbs around 193 nm and the element is preferably a gas or vapor selected from the group consisting of arsenic, carbon, oxygen, iron, gaseous hydrocarbons, halogenized hydrocarbons, carbon-contaminated inert gases, germanium and platinum vapor.
    Type: Grant
    Filed: October 4, 2000
    Date of Patent: August 7, 2001
    Assignee: Lambda Physik AG
    Inventors: Jürgen Kleinschmidt, Uwe Stamm, Klaus Vogler, Peter Lokai
  • Patent number: 6269110
    Abstract: A laser is provided having a gain medium including a laser gas and a photoabsorbing species. The photoabsorbing species has at least one photoabsorption line within an output emission spectrum of the laser. When the laser is an ArF-excimer laser, the photoabsorbing species is preferably either atomic carbon or molecular oxygen, which are formed after carbon- or oxygen-containing molecules introduced into the gain medium with the laser gas interact within the gain medium. An absolute wavelength of a narrowed emission of the laser can be calibrated when a narrowed output emission of the laser is tuned through at least one photoabsorption line of the photoabsorbing species. Preferably, a processor communicates with a detector and a wavelength selection unit, as well as a power supply when output beam energy is held constant, to automatically perform the calibration.
    Type: Grant
    Filed: October 5, 1998
    Date of Patent: July 31, 2001
    Assignee: Lambda Physik AG
    Inventors: Uwe Leinhos, Jürgen Kleinschmidt, Wolfgang Zschocke, Uwe Stamm
  • Patent number: 6243406
    Abstract: A gas mixture of a gas discharge laser such as an excimer or molecular fluorine laser is stabilized. The gas mixture of the laser includes a constituent halogen containing molecular species such as F2 or HCl which is subject to depletion from an initial optimum concentration. When the gas mixture is energized by a pulsed discharge circuit, the amplified spontaneous emission (ASE) signal is monitored. The status of the gas mixture is determined based on the monitored ASE signal. Stimulated emission is preferably filtered or blocked for more precise ASE signal monitoring. The gas mixture is preferably replenished using small halogen injections, total pressure adjustments and mini and partial gas replacements based on the evolving gas mixture status determined from the monitored ASE signal.
    Type: Grant
    Filed: October 14, 1999
    Date of Patent: June 5, 2001
    Inventors: Peter Heist, Matthias Kramer, Jürgen Kleinschmidt, Sergei Govorkov