Patents by Inventor Juhwan Kim

Juhwan Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190231898
    Abstract: The present invention relates to a pharmaceutical composition for preventing or treating an inflammatory disease and a metabolic disease, which includes hyaluronic acid nanoparticles, and more particularly, to a pharmaceutical composition for preventing or treating an inflammatory disease and a metabolic disease, which includes hyaluronic acid nanoparticles formed in such a way that 5?-cholanic acid or polycaprolactone binds to a hydrophobic moiety of hyaluronic acid through self-assembly in an aqueous solution state.
    Type: Application
    Filed: September 28, 2017
    Publication date: August 1, 2019
    Applicant: AJOU UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION
    Inventors: Wook KIM, Hwa Seung HAN, Jae Hyung PARK, Jun Gi RHO, Juhwan YOON
  • Publication number: 20190170311
    Abstract: A lamp for a vehicle includes an array module including a plurality of micro Light Emitting Diode (LED) chips. The array module has a shape that is concave in a first direction.
    Type: Application
    Filed: December 5, 2018
    Publication date: June 6, 2019
    Inventors: Shinwoo YOON, Juhwan SEOL, Yongkyo KIM
  • Patent number: 10007136
    Abstract: A display device includes: a display panel which displays an image; an intermediate frame on which the display panel is disposed; and a lower frame coupled to the intermediate frame and in which a coupling hole is defined. The intermediate frame defines: a support portion thereof extended facing a lower surface of the display panel, and a coupling portion thereof extending from a lower surface of the support portion and toward the lower frame. The coupling portion of the intermediate frame extends through the coupling hole defined in the lower frame to be attached to a surface of the lower frame.
    Type: Grant
    Filed: March 25, 2016
    Date of Patent: June 26, 2018
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Minsu Jung, Byungchan Kim, Juhwan Kim, Kyuhun Shim, Cheolse Lee, Chunghui Lee
  • Patent number: 9864221
    Abstract: A display apparatus is disclosed. In one aspect, the display apparatus includes a flexible display panel configured to display images and a first frame arranged on the front surface of the flexible display panel and curved in a first direction. The display apparatus also includes a second frame arranged on a rear surface of the flexible display panel and curved in the first direction and a spacer arranged on at least one of the first and second frames. The spacer is configured to adjust the distance between the first and second frames.
    Type: Grant
    Filed: April 9, 2015
    Date of Patent: January 9, 2018
    Assignee: Samsung Display Co., Ltd.
    Inventors: Hyunwoo Lee, Chunghui Lee, Byungchan Kim, Juhwan Kim
  • Patent number: 9784911
    Abstract: A display device includes: a display panel which display an image with light and has a curvature; a light source which generates and emits the light to the display panel; a light guide plate which guides the light emitted from the light source to the display panel, the light guide plate having a curvature and defining a light incidence surface thereof through which the light is incident; a circuit board which faces the light incidence surface of the light guide plate and on which the light source is mounted; and an alignment member which is between the circuit board and the light guide plate and aligns the light source with the light incidence surface of the light guide plate.
    Type: Grant
    Filed: March 28, 2016
    Date of Patent: October 10, 2017
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Minsu Jung, Byungchan Kim, Juhwan Kim, Cheolse Lee, Chunghui Lee
  • Publication number: 20160363724
    Abstract: A display device includes: a display panel which display an image with light and has a curvature; a light source which generates and emits the light to the display panel; a light guide plate which guides the light emitted from the light source to the display panel, the light guide plate having a curvature and defining a light incidence surface thereof through which the light is incident; a circuit board which faces the light incidence surface of the light guide plate and on which the light source is mounted; and an alignment member which is between the circuit board and the light guide plate and aligns the light source with the light incidence surface of the light guide plate.
    Type: Application
    Filed: March 28, 2016
    Publication date: December 15, 2016
    Inventors: Minsu JUNG, Byungchan KIM, Juhwan KIM, Cheolse LEE, Chunghui LEE
  • Publication number: 20160342015
    Abstract: A display device includes: a display panel which displays an image; an intermediate frame on which the display panel is disposed; and a lower frame coupled to the intermediate frame and in which a coupling hole is defined. The intermediate frame defines: a support portion thereof extended facing a lower surface of the display panel, and a coupling portion thereof extending from a lower surface of the support portion and toward the lower frame. The coupling portion of the intermediate frame extends through the coupling hole defined in the lower frame to be attached to a surface of the lower frame.
    Type: Application
    Filed: March 25, 2016
    Publication date: November 24, 2016
    Inventors: Minsu JUNG, Byungchan KIM, Juhwan KIM, Kyuhun SHIM, Cheolse LEE, Chunghui LEE
  • Publication number: 20160028042
    Abstract: A display apparatus is disclosed. In one aspect, the display apparatus includes a flexible display panel configured to display images and a first frame arranged on the front surface of the flexible display panel and curved in a first direction. The display apparatus also includes a second frame arranged on a rear surface of the flexible display panel and curved in the first direction and a spacer arranged on at least one of the first and second frames. The spacer is configured to adjust the distance between the first and second frames.
    Type: Application
    Filed: April 9, 2015
    Publication date: January 28, 2016
    Inventors: Hyunwoo LEE, Chunghui LEE, Byungchan KIM, Juhwan KIM
  • Patent number: 8466239
    Abstract: Provided are a polymer containing a thiophene unit and a thienylenevinylene unit, and an organic field effect transistor and an organic solar cell containing the polymer. The film may be formed by coating a substrate with a polymer containing a thiophene unit and a thienylenevinylene unit using a solution process. Therefore, the production cost may be reduced and a large-scale device may be suitably manufactured since there is no need for an expensive vacuum system to form films. Also, the polymer according to one embodiment of the present invention containing a thiophene unit and a thienylenevinylene unit has very excellent flatness since the thiophene unit is continuously coupled with a vinyl group having excellent flatness. Therefore, the polymer may be useful in further improving the charge mobility since it has high crystallinity caused by the improved ordering property between molecules. Such crystallinity may be further improved by the heat treatment.
    Type: Grant
    Filed: December 10, 2010
    Date of Patent: June 18, 2013
    Assignee: Gwangju Institute of Science and Technology
    Inventors: Dong-Yu Kim, Juhwan Kim, Bogyu Lim, Kang-Jan Baeg, Byung-Kwan Yu
  • Publication number: 20110284082
    Abstract: Provided are a polymer containing a thiophene unit and a thienylenevinylene unit, and an organic field effect transistor and an organic solar cell containing the polymer. The film may be formed by coating a substrate with a polymer containing a thiophene unit and a thienylenevinylene unit using a solution process. Therefore, the production cost may be reduced and a large-scale device may be suitably manufactured since there is no need for an expensive vacuum system to form films. Also, the polymer according to one embodiment of the present invention containing a thiophene unit and a thienylenevinylene unit has very excellent flatness since the thiophene unit is continuously coupled with a vinyl group having excellent flatness. Therefore, the polymer may be useful in further improving the charge mobility since it has high crystallinity caused by the improved ordering property between molecules. Such crystallinity may be further improved by the heat treatment.
    Type: Application
    Filed: December 10, 2010
    Publication date: November 24, 2011
    Applicant: GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Dong-Yu Kim, Juhwan Kim, Bogyu Lim, Kang-Jan Baeg, Byung-Kwan Yu
  • Patent number: 7934174
    Abstract: One embodiment provides a system for using a database to quickly identify a manufacturing problem area in a layout. During operation, the system receives a first check-figure which identifies a first area in a first layout, wherein the first area is associated with a first feature. Next, the system determines a first sample using the first check-figure, wherein the first sample represents the first layout's geometry within a first ambit of the first check-figure, wherein the first sample's geometry is expected to affect the shape of the first feature. The system then performs a model-based simulation using the first sample to obtain a first simulation-result which indicates whether the first feature is expected to have manufacturing problems. Next, the system stores the first simulation-result in a database which is used to quickly determine whether a second feature is expected to have manufacturing problems.
    Type: Grant
    Filed: July 27, 2009
    Date of Patent: April 26, 2011
    Assignee: Synopsys, Inc.
    Inventors: Zong Wu Tang, Daniel N. Zhang, Juhwan Kim, Hua Song, Weiping Fang, Lawrence S. Melvin, III
  • Publication number: 20090288047
    Abstract: One embodiment provides a system for using a database to quickly identify a manufacturing problem area in a layout. During operation, the system receives a first check-figure which identifies a first area in a first layout, wherein the first area is associated with a first feature. Next, the system determines a first sample using the first check-figure, wherein the first sample represents the first layout's geometry within a first ambit of the first check-figure, wherein the first sample's geometry is expected to affect the shape of the first feature. The system then performs a model-based simulation using the first sample to obtain a first simulation-result which indicates whether the first feature is expected to have manufacturing problems. Next, the system stores the first simulation-result in a database which is used to quickly determine whether a second feature is expected to have manufacturing problems.
    Type: Application
    Filed: July 27, 2009
    Publication date: November 19, 2009
    Applicant: SYNOPSYS, INC.
    Inventors: Zong Wu Tang, Daniel N. Zhang, Juhwan Kim, Hua Song, Weiping Fang, Lawrence S. Melvin, III
  • Patent number: 7584450
    Abstract: One embodiment provides a system for using a database to quickly identify a manufacturing problem area in a layout. During operation, the system receives a first check-figure which identifies a first area in a first layout, wherein the first area is associated with a first feature. Next, the system determines a first sample using the first check-figure, wherein the first sample represents the first layout's geometry within a first ambit of the first check-figure, wherein the first sample's geometry is expected to affect the shape of the first feature. The system then performs a model-based simulation using the first sample to obtain a first simulation-result which indicates whether the first feature is expected to have manufacturing problems. Next, the system stores the first simulation-result in a database which is used to quickly determine whether a second feature is expected to have manufacturing problems.
    Type: Grant
    Filed: December 12, 2006
    Date of Patent: September 1, 2009
    Assignee: Synopsys, Inc.
    Inventors: Zong Wu Tang, Daniel N. Zhang, Juhwan Kim, Hua Song, Weiping Fang, Lawrence S. Melvin, III
  • Patent number: 7415402
    Abstract: Mask shops typically use carbon to repair any clear defects identified on a mask, irrespective of the type of mask. However, carbon can have different characteristics than the original patterning material on the mask. Therefore, a mask that is repaired using carbon may not optically perform as if it were defect-free. An automated method of repairing a clear defect on an attenuated phase shifting mask (PSM) provides an optimized plug size/shape. In this method, a repair solution to the clear defect can be simulated, thereby allowing the repair decision for an attenuated PSM to be advantageously made at the same time that inspection is done and before actual repair. Simulation can include performing model-based OPC on the repair solution.
    Type: Grant
    Filed: May 3, 2005
    Date of Patent: August 19, 2008
    Assignee: Synopsys, Inc.
    Inventors: Juhwan Kim, Keun-Young Kim
  • Publication number: 20070198958
    Abstract: One embodiment provides a system for using a database to quickly identify a manufacturing problem area in a layout. During operation, the system receives a first check-figure which identifies a first area in a first layout, wherein the first area is associated with a first feature. Next, the system determines a first sample using the first check-figure, wherein the first sample represents the first layout's geometry within a first ambit of the first check-figure, wherein the first sample's geometry is expected to affect the shape of the first feature. The system then performs a model-based simulation using the first sample to obtain a first simulation-result which indicates whether the first feature is expected to have manufacturing problems. Next, the system stores the first simulation-result in a database which is used to quickly determine whether a second feature is expected to have manufacturing problems.
    Type: Application
    Filed: December 12, 2006
    Publication date: August 23, 2007
    Inventors: Zong Wu Tang, Daniel N. Zhang, Juhwan Kim, Hua Song, Weiping Fang, Lawrence S. Melvin
  • Patent number: 7191428
    Abstract: A method for performing layout verification involves identifying feature centerlines in a mask layout, and then performing lithography simulation along the centerlines to generate a set of intensity distributions. At each local maxima or minima in the intensity distributions, further lithography simulation can be performed to determine an exposure pattern width at those local maxima/minima (check positions). The exposure pattern widths can then be evaluated to determine whether an actual pinch or bridge defect will be generated at those locations. If defect generation is likely (based on the lithographical simulation) at a particular location, the corresponding portion of the mask layout can be redesigned to avoid defect generation during actual production. In this method, accurate layout verification can be performed with a minimum of time-consuming lithography modeling.
    Type: Grant
    Filed: May 31, 2005
    Date of Patent: March 13, 2007
    Assignee: Synopsys, Inc.
    Inventors: ZongWu Tang, Juhwan Kim, Daniel Zhang, Haiqing Wei, Gang Huang
  • Publication number: 20060271906
    Abstract: A method for performing layout verification involves identifying feature centerlines in a mask layout, and then performing lithography simulation along the centerlines to generate a set of intensity distributions. At each local maxima or minima in the intensity distributions, further lithography simulation can be performed to determine an exposure pattern width at those local maxima/minima (check positions). The exposure pattern widths can then be evaluated to determine whether an actual pinch or bridge defect will be generated at those locations. If defect generation is likely (based on the lithographical simulation) at a particular location, the corresponding portion of the mask layout can be redesigned to avoid defect generation during actual production. In this method, accurate layout verification can be performed with a minimum of time-consuming lithography modeling.
    Type: Application
    Filed: May 31, 2005
    Publication date: November 30, 2006
    Applicant: Synopsys, Inc.
    Inventors: ZongWu Tang, Juhwan Kim, Daniel Zhang, Haiqing Wei, Gang Huang
  • Patent number: 7079642
    Abstract: A method for recording and/or simultaneously monitoring voice and screen activities of a computer work station screen from another computer and reducing the processing load on the computers. Further it provides a method to score and rate an agent using the computer work station while simultaneously monitoring the voice and screen activities of the agent on his computer work station. In another embodiment it provides a method for only updating the portions of the agent's computer work station screen which are changed on the other computer being used to moniter without updating the areas not changed.
    Type: Grant
    Filed: January 28, 2004
    Date of Patent: July 18, 2006
    Assignee: Stratasoft, Inc.
    Inventors: Arthur Jerijian, Juhwan Kim
  • Publication number: 20050196688
    Abstract: Mask shops typically use carbon to repair any clear defects identified on a mask, irrespective of the type of mask. However, carbon can have different characteristics than the original patterning material on the mask. Therefore, a mask that is repaired using carbon may not optically perform as if it were defect-free. An automated method of repairing a clear defect on an attenuated phase shifting mask (PSM) provides an optimized plug size/shape. In this method, a repair solution to the clear defect can be simulated, thereby allowing the repair decision for an attenuated PSM to be advantageously made at the same time that inspection is done and before actual repair. Simulation can include performing model-based OPC on the repair solution.
    Type: Application
    Filed: May 3, 2005
    Publication date: September 8, 2005
    Applicant: Synopsys, Inc.
    Inventors: Juhwan Kim, Keun-Young Kim
  • Patent number: 6927003
    Abstract: Mask shops typically use carbon to repair any clear defects identified on a mask, irrespective of the type of mask. However, carbon can have different characteristics than the original patterning material on the mask. Therefore, a mask that is repaired using carbon may not optically perform as if it were defect-free. An automated method of repairing a clear defect on an attenuated phase shifting mask (PSM) provides an optimized plug size/shape. In this method, a repair solution to the clear defect can be simulated, thereby allowing the repair decision for an attenuated PSM to be advantageously made at the same time that inspection is done and before actual repair. Simulation can include performing model-based OPC on the repair solution.
    Type: Grant
    Filed: February 11, 2003
    Date of Patent: August 9, 2005
    Assignee: Synopsys, Inc.
    Inventors: Juhwan Kim, Keun-Young Kim