Abstract: A semiconductor wafer washing system can execute a method in which the washing solution is quickly changed over and over again without the need to alter the structure of the system. The wafer washing system includes a washing solution supply section in which a plurality of chemicals are stored separately, and from which selected ones of the chemicals can be supplied in a predetermined ratio into a washing tank. A circulation section includes circulation piping connected to the washing tank for circulating the washing solution to and from the tank. A discharge section selectively discharges residual chemicals or washing solution from the washing solution supply section, the washing tank and the circulation section. A controller controls the flow of chemicals and washing solution in the washing solution supply section, the circulation section and the discharge section, respectively.

Abstract: A semiconductor wafer washing system can execute a method in which the washing solution is quickly changed over and over again without the need to alter the structure of the system. The wafer washing system includes a washing solution supply section in which a plurality of chemicals are stored separately, and from which selected ones of the chemicals can be supplied in a predetermined ratio into a washing tank. A circulation section includes circulation piping connected to the washing tank for circulating the washing solution to and from the tank. A discharge section selectively discharges residual chemicals or washing solution from the washing solution supply section, the washing tank and the circulation section. A controller controls the flow of chemicals and washing solution in the washing solution supply section, the circulation section and the discharge section, respectively.

Abstract: An apparatus and a method reduces charging time of a multi-battery with a plurality of battery units. A charging process and apparatus charges a first battery unit of a multi-battery, keeps checking whether a current charging the first battery unit reaches a prescribed value, selects and charges a selected second battery unit of the multi-battery along with the first battery unit if the preset value is reached, and charges the second battery unit with a limited maximum magnitude current when the first battery unit is completely charged. Dual-charging operations for both first and second battery units conducted in the present charging process can reduce total charging time of the multi-battery.

Abstract: A wafer cleaning device is disclosed in which a brush is integrally formed with a nozzle for supplying pure water, such that a uniform water screen is formed on a surface of a wafer and particles on the wafer can be entirely removed. The cleaning device includes injectors for ejecting pure water supplied from a pure water supplier onto a wafer; nozzles disposed at one end of each of the injectors; and a brush for cleaning the wafer while moving horizontally between a center and edges of the wafer. The injectors include a first injector for ejecting pure water at an upper position of the wafer toward the center of the wafer, and a second injector disposed adjacent to the brush along one side of a brush arm, the brush arm supporting the brush and moving the brush and second injector toward the wafer.

Abstract: An apparatus and a method reduces charging time of a multi-battery with a plurality of battery units. A charging process and apparatus charges a first battery unit of a multi-battery, keeps checking whether a current charging the first battery unit reaches a prescribed value, selects and charges a selected second battery unit of the multi-battery along with the first battery unit if the preset value is reached, and charges the second battery unit with a limited maximum magnitude current when the first battery unit is completely charged. Dual-charging operations for both first and second battery units conducted in the present charging process can reduce total charging time of the multi-battery.

Abstract: A semiconductor wafer washing system can execute a method in which the washing solution is quickly changed over and over again without the need to alter the structure of the system. The wafer washing system includes a washing solution supply section in which a plurality of chemicals are stored separately, and from which selected ones of the chemicals can be supplied in a predetermined ratio into a washing tank. A circulation section includes circulation piping connected to the washing tank for circulating the washing solution to and from the tank. A discharge section selectively discharges residual chemicals or washing solution from the washing solution supply section, the washing tank and the circulation section. A controller controls the flow of chemicals and washing solution in the washing solution supply section, the circulation section and the discharge section, respectively.

Abstract: A wafer cleaning device is disclosed in which a brush is integrally formed with a nozzle for supplying pure water, such that a uniform water screen is formed on a surface of a wafer and particles on the wafer can be entirely removed. The cleaning device includes injectors for ejecting pure water supplied from a pure water supplier onto a wafer; nozzles disposed at one end of each of the injectors; and a brush for cleaning the wafer while moving horizontally between a center and edges of the wafer. The injectors include a first injector for ejecting pure water at an upper position of the wafer toward the center of the wafer, and a second injector disposed adjacent to the brush along one side of a brush arm, the brush arm supporting the brush and moving the brush and second injector toward the wafer.

Abstract: A PDMA polymer for a photosensitive resin composition. The PDMA polymer is obtained by polymerizing an acrylamide, N,N-dimetylacrylamide monomer, and a vinyl-type silane. The PDMA polymer having a molecular weight of 1,000,000.about.

Abstract: The present invention relates to photoresist solution for phosphor slurry for use in the color cathode ray tube. The photoresist solution of the present invention comprises Diazo or Bisazide photosensitizer; polymer. which is mixed with said Diazo or Bisazide photosensitizer, obtained by polymerization of hydroxy ethyl acrylate base. The photoresist solution of the present invention improves the adhesive strength by using of the Diazo or Bisazide photosensitizer and the polymer, thus the green, blue and red phosphor screen being uniformly formed and the color residue being disappeared. Further, since the photosensitizer not containing heavy metal is used, it does not cause any environmental problem. Also, it can be stored for a long time by using the initiator without hydrochloric acid at the time of polymerization.