Abstract: A glass sheet for pigment printing contains, as represented by mass percentage on the basis of oxides, from 60% to 75% of SiO2, from 2% to 12% of Al2O3, from 2% to 11% of MgO, from 0% to 10% of CaO, from 0% to 3% of SrO, from 0% to 3% of BaO, from 10% to 18% of Na2O, from 0% to 8% of K2O, and from 0% to 4% of ZrO2, or contains, from 60% to 75% of SiO2, from 1.5% to 12% of Al2O3, from 6% to 12% of MgO, from 0% to 4.5% of CaO, from 0% to 3% of SrO, from 0% to 3% of BaO, from 10% to 18% of Na2O, from 0% to 8% of K2O, and from 0% to 4% of ZrO2.

Abstract: An object of the present invention is to provide a glass for chemical strengthening which is capable of improving strength as compared with an ordinary soda lime silicate glass even when the same chemical strengthening treatment as that in a conventional process is applied and has good devitrification characteristics, a chemically strengthened glass using the glass for chemical strengthening, and a method for producing the chemically strengthened glass. The present invention provides a glass for chemical strengthening having a specific glass composition described in the present specification.

Abstract: A glass for chemical strengthening is a glass sheet containing, as expressed by mass percentage based on oxides, 60 to 75% of SiO2, 3 to 12% of Al2O3, 2 to 10% of MgO, 0 to 10% of CaO, 0 to 3% of SrO, 0 to 3% of BaO, 10 to 18% of Na2O, 0 to 8% of K2O, 0 to 3% of ZrO2, 0 to 0.3% of TiO2, 0.005 to 0.2% of Fe2O3, and 0.02 to 0.4% of SO3. The glass has a sheet thickness of 0.2 mm or more and 1.2 mm or less. A value of ?-OH measured without polishing both front and back surfaces of the glass sheet is lower than a value of ?-OH measured after polishing surface layers of both the front and back surfaces of the glass sheet by 50 ?m or more each.

Abstract: A glass for chemical strengthening that is a float-formed glass for chemical strengthening includes, as represented by mass percentage based on oxides, from 65 to 72% of SiO2, from 3.6 to 8.6% of Al2O3, from 3.3 to 6% of MgO, from 6.5 to 9% of CaO, from 13 to 16% of Na2O and from 0 to 0.9% of K2O. In the glass for chemical strengthening, (Na2O+K2O)/Al2O3 is from 2.2 to 5. The glass for chemical strengthening has a sheet thickness (t) of 0.1 mm or more and 2 mm or less. A SnO2 amount of a bottom surface in an unpolished state of the glass for chemical strengthening is 6.2 ?g/cm2 or less (0.1?t?1 mm) or (2t+4.2) ?g/cm2 or less (1<t?2 mm).

Abstract: A glass sheet for pigment printing contains, as represented by mass percentage on the basis of oxides, from 60% to 75% of SiO2, from 2% to 12% of Al2O3, from 2% to 11% of MgO, from 0% to 10% of CaO, from 0% to 3% of SrO, from 0% to 3% of BaO, from 10% to 18% of Na2O, from 0% to 8% of K2O, and from 0% to 4% of ZrO2, or contains, from 60% to 75% of SiO2, from 1.5% to 12% of Al2O3, from 6% to 12% of MgO, from 0% to 4.5% of CaO, from 0% to 3% of SrO, from 0% to 3% of BaO, from 10% to 18% of Na2O, from 0% to 8% of K2O, and from 0% to 4% of ZrO2.

Abstract: An object of the present invention is to provide a glass plate capable of suppressing deformation of a glass product that is subject to load in a heat treatment process at a temperature not more than the glass strain point, such as chemical strengthening and coating. The present invention relates to a glass plate for heat treatment, in which the dimensionless index determined by the following formula is 1.6×10?4 or less, the average viscosity ? is log ??15.1 log Pa·s or less, the relationship between the fictive temperature Tf and the annealing point Ta is Tf?(Ta+5), and when the plate thickness h of glass is 7×10?4 m or more, the displacement at the load point during the load applying time period is 78 ?m or less: Dimensionless index=load F×load applying time period/(average viscosity ?×plate thickness h2).

Abstract: An object of the present invention is to provide a glass for chemical strengthening which is capable of improving strength as compared with an ordinary soda lime silicate glass even when the same chemical strengthening treatment as that in a conventional process is applied and has good devitrification characteristics, a chemically strengthened glass using the glass for chemical strengthening, and a method for producing the chemically strengthened glass. The present invention provides a glass for chemical strengthening having a specific glass composition described in the present specification.

Abstract: A chemically strengthened glass contains, as expressed by mass percentage based on oxides, 60% to 75% of SiO2, 3% to 9% of Al2O3, 2% to 10% of MgO, 3% to 10% of CaO, 10% to 18% of Na2O, at most 4% of K2O, 0% to 3% of ZrO2, 0% to 0.3% of TiO2, and 0.02% to 0.4% of SO3. It has a temperature T2 at which a viscosity of a glass melt is 100 dPa·sec of 1530° C. or lower. In a chemically strengthened main surface thereof, it has a depth of a compressive stress layer of 8 ?m or more and a surface compressive stress of 500 MPa or more.

Abstract: A glass for chemical strengthening is a glass sheet containing, as expressed by mass percentage based on oxides, 60 to 75% of SiO2, 3 to 12% of Al2O3, 2 to 10% of MgO, 0 to 10% of CaO, 0 to 3% of SrO, 0 to 3% of BaO, 10 to 18% of Na2O, 0 to 8% of K2O, 0 to 3% of ZrO2, 0 to 0.3% of TiO2, 0.005 to 0.2% of Fe2O3, and 0.02 to 0.4% of SO3. The glass has a sheet thickness of 0.2 mm or more and 1.2 mm or less. A value of ?-OH measured without polishing both front and back surfaces of the glass sheet is lower than a value of ?-OH measured after polishing surface layers of both the front and back surfaces of the glass sheet by 50 ?m or more each.

Abstract: A glass is a glass sheet containing, as expressed by mass percentage based on oxides, 63 to 75% of SiO2, 3 to 12% of Al2O3, 3 to 10% of MgO, 0.5 to 10% of CaO, 0 to 3% of SrO, 0 to 3% of BaO, 10 to 18% of Na2O, 0 to 8% of K2O, 0 to 3% of ZrO2, and 0.005 to 0.25% of Fe2O3. The glass has a temperature (T2) at which a viscosity thereof reaches 102 dPa·s of 1525° C. or lower. In the glass, R2O/Al2O3 is 2.0 or more and 4.6 or less (in the formula, the R2O is Na2O+K2O).

Abstract: A glass for chemical strengthening is a glass plate. The glass plate includes, as represented by mass percentage based on the following oxides, 65 to 72% of SiO2, 3.4 to 8.6% of Al2O3, 3.3 to 6% of MgO, 6.5 to 9% of CaO, 13 to 16% of Na2O, 0 to 1% of K2O, 0 to 0.2% of TiO2, 0.01 to 0.15% of Fe2O3 and 0.02 to 0.4% of SO3. In the glass plate, (Na2O+K2O)/Al2O3 is 1.8 to 5.

Abstract: To provide a glass plate which has a low B2O3 content and which can be used as a glass plate for e.g. an LCD panel. A glass plate which comprises, as a glass matrix composition as represented by mass % based on oxide, from 53 to 74 mass % of SiO2, from 15 to 23 mass % of Al2O3, from 0 to 3 mass % of B2O3, from 2 to 17 mass % of MgO, from 0 to 12 mass % of CaO, from 0 to 6 mass % of SrO, from 6 to 28 mass % of MgO+CaO+SrO, from 0 to 9 mass % of Na2O, from 0 to 6 mass % of K2O and from 0.8 to 11 mass % of Na2O+K2O, contains from 100 to 500 ppm of SO3, has an average coefficient of thermal expansion from 50 to 350° C. of at most 60×10?7/° C., and has a strain point of at least 600° C.

Abstract: The invention provides a method for etching which is intended for reducing the thickness of a glass substrate, and which attains a high etching rate and is capable of inhibiting haze generation on the glass substrate surface. The invention relates to a method for etching a glass substrate surface, comprising etching the glass substrate surface in an amount of 1-690 ?m in terms of etching amount, in which the etching is conducted with an etchant having an HF concentration of 1-5 wt % and an HCl concentration of 1 wt % or higher.

Abstract: Provided is a glass plate for a substrate, which comprises, as a glass matrix composition as represented by mass % based on oxide: SiO2: 70 to 80, Al2O3: 0.1 to 5, B2O3: 0 to 3, MgO: 9.5 to 12, where the amount of CaO+SrO+BaO is 0 to 2, and the amount of Na2O+K2O is 12.5 to 15.5, which has a density of at most 2.5 g/cm3, has an average coefficient of thermal expansion from 50 to 350° C. of more than 75×10?7/° C. and at most 87×10?7/° C., has a glass transition point of at least 560° C., has a brittleness of at most 6.5 ?m?1/2, and has a heat shrinkage (C)of at most 20 ppm.

Abstract: To provide a glass plate for a substrate, which contains no B2O3 and which can be used as a glass plate for an LCD panel. A glass plate for a substrate, which contains substantially no B2O3, which comprises, as a glass matrix composition as represented by mass % based on oxide of SiO2: 68 to 80, Al2O3: 0.1 to 5, MgO: 9.5 to 12, CaO+SrO+BaO: 0 to 2, and Na2O+K2O: 12.5 to 15.5, and which has a density of at most 2.5 g/cm3, an average coefficient of thermal expansion from 50 to 350° C. of from more than 75×10?7/° C. to at most 87×10?7/° C., a glass transition point of at least 560° C. and a brittleness of at most 6.5 ?m?1/2.

Abstract: To provide a liquid crystal display panel which can be produced at low cost by using inexpensive alkali glass for at least an opposing glass substrate, which is free from troubles in a liquid crystal display due to panel warpage attributable to the thermal treatment since such treatment is not required in the production process, and further which is free from panel warpage which tends to bring a trouble in a liquid crystal display derived from the difference in the thermal expansion coefficient by change in ambient temperature at the time of use. A liquid crystal display panel comprising an array glass substrate and an opposing glass substrate facing it, in which a liquid crystal is filled between such substrates, and an ultraviolet curable resin is sealed at a peripheral area, wherein the above opposing glass substrate is an alkali glass substrate, and the difference in thermal expansion coefficient between the above array glass substrate and the above opposing glass substrate is at most 35×10?7/° C.

Abstract: A glass plate for a substrate, which contains no B2O3, and which can be as a glass plate for an LCD panel, which comprises, as a glass matrix composition as represented by mass % based on oxide of SiO2: 68 to 80, Al2O3: 0.1 to 5, MgO: 9.5 to 12, CaO+SrO+BaO: 0 to 2, and Na2O+K2O 6 to 14, and which has a density of at most 2.45 g/cm3, an average coefficient of thermal expansion from 50 to 350° C. of at most 75×10?7/° C., a glass transition point of at least 600° C. and a brittleness of at most 6.5 ?m?1/2.

Abstract: To provide an alkali-free glass excellent in the properties for glass substrates to be used for display, excellent in the resistance to reduction, and suitable for forming by a float process. An alkali-free glass consisting essentially of, as represented by mol %: SiO2 at least 60% and less than 66%, Al2O3 0 to 12%, B2O3 5 to 10%, MgO 0 to 18%, CaO 0 to 18%, SrO 0 to 18%, BaO 0 to 6%,? CaO + SrO 10 to 25%,? MgO + CaO + SrO + BaO 15.5 to 30%?? and containing substantially no alkali metal oxide.

Abstract: The invention provides a method for etching which is intended for reducing the thickness of a glass substrate, and which attains a high etching rate and is capable of inhibiting haze generation on the glass substrate surface. The invention relates to a method for etching a glass substrate surface, comprising etching the glass substrate surface in an amount of 1-690 ?m in terms of etching amount, in which the etching is conducted with an etchant having an HF concentration of 1-5 wt % and an HCl concentration of 1 wt % or higher.

Abstract: To provide a glass plate for a substrate, which contains no B2O3 and which can be used as a glass plate for an LCD panel. A glass plate for a substrate, which contains substantially no B2O3, which comprises, as a glass matrix composition as represented by mass % based on oxide of SiO2: 68 to 80, Al2O3: 0.1 to 5, MgO: 9.5 to 12, CaO+SrO+BaO: 0 to 2, and Na2O+K2O 6 to 14, and which has a density of at most 2.45 g/cm3, an average coefficient of thermal expansion from 50 to 350° C. of at most 75×10?7/° C., a glass transition point of at least 600° C. and a brittleness of at most 6.5 ?m?1/2.